专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2018156234A1 COMPACT STORAGE RING EXTREME ULTRAVIOLET FREE ELECTRON LASER 审中-公开
公开(公告)号：WO2018156234A1
公开(公告)日：2018-08-30
申请号：PCT/US2017/065625
申请日：2017-12-11
申请人： LYNCEAN TECHNOLOGIES, INC.
发明人： RUTH, Ronald, D. , LOEWEN, Roderick, J. , FESER, Michael
IPC分类号： H01S4/00 , G03F7/20
CPC分类号： H01S4/00 , G03F7/70025 , H01S3/0903 , H05H9/048 , H05H2007/041
摘要： A high power extreme ultraviolet (EUV) beam is produced. An electron beam is injected in a compact electron storage ring configured for emission of free-electron laser (FEL) radiation. The electron beam is passed through a magnetic undulator on each of a plurality of successive revolutions of the electron beam around the compact electron storage ring. The electron beam is induced to microbunch and radiate coherently while passing through the magnetic undulator. A portion of the free-electron laser radiation at an extreme ultraviolet wavelength produced by an interaction of the electron beam through the magnetic undulator is outputted.

2. 发明申请

WO2017036717A3 BEAM SPLITTING APPARATUS 审中-公开
标题翻译：光束分裂装置
公开(公告)号：WO2017036717A3
公开(公告)日：2017-08-17
申请号：PCT/EP2016068513
申请日：2016-08-03
申请人： ASML NETHERLANDS BV
发明人： DE VRIES GOSSE CHARLES , NIENHUYS HAN-KWANG
IPC分类号： G02B5/18 , G02B6/293 , G02B27/10 , G03F7/20 , H01S3/09
CPC分类号： G03F7/70991 , G02B5/1838 , G02B5/1857 , G02B5/1861 , G02B6/29314 , G02B27/1086 , G02B27/1093 , G03F7/70025 , G03F7/70033 , G03F7/70158 , G03F7/70208 , G03F7/70316 , G03F7/7055 , G03F7/70566 , H01S3/0903
摘要： A beam-splitting apparatus (40) arranged to receive an input radiation beam (B) and split the input radiation beam (B) into a plurality of output radiation beams (Ba - Bj). The beam-splitting apparatus (40) comprising a plurality of reflective diffraction gratings (41-45) arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings (42-45) being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings (41-44). The reflective diffraction gratings are arranged such that the optical path of each output radiation beam (Ba - Bj) includes no more than one instance of a diffraction order which is not a 0th diffraction order.
摘要翻译：一个分束装置（40），用于接收输入辐射束（B）并将输入辐射束（B）分成多个输出辐射束（Ba-Bj）。所述分束设备（40）包括布置成接收辐射束并被配置为形成包括多个衍射级的衍射图案的多个反射式衍射光栅（41-45），至少一些所述反射式衍射光栅（42 -45）被布置成接收在另一个反射式衍射光栅（41-44）处形成的第0衍射级。反射式衍射光栅被布置为使得每个输出辐射束（Ba-Bj）的光路包括不多于一个衍射级数的非零级衍射级。

3. 发明申请

WO2017108311A1 A LITHOGRAPHIC SYSTEM AND METHOD 审中-公开
标题翻译：光刻系统和方法
公开(公告)号：WO2017108311A1
公开(公告)日：2017-06-29
申请号：PCT/EP2016/078482
申请日：2016-11-23
申请人： ASML NETHERLANDS B.V.
发明人： BANINE, Vadim, Yevgenyevich , ENDENDIJK, Wilfred, Edward , NIENHUYS, Han-Kwang , DONKER, Rilpho, Ludovicus , LOOPSTRA, Erik, Roelof
IPC分类号： G03F7/20 , H01S3/09
CPC分类号： G03F7/70991 , G03F7/7005 , G03F7/70208 , H01S3/0903
摘要： A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter configured to split the second radiation beam into a second plurality of sub-beams, and a switch assembly, wherein the switch assembly is configured to receive a first sub-beam which is one of the first plurality of sub-beams; receive a second sub-beam which is one of the second plurality of sub-beams, in a first configuration to transmit the first sub-beam along a desired path, and in a second configuration to transmit the second sub-beam along said desired path.
摘要翻译：系统包括配置成提供第一辐射束的第一辐射源，配置成将第一辐射束分成第一多个子束的第一分离器，配置成提供第二辐射束的第二辐射源，第二辐射束，被配置为将第二辐射束分成第二多个子束的至少一个另外的分束器，以及开关组件，其中开关组件被配置为接收作为第一子束之一的第一子束多个子光束; 以第一配置接收作为所述第二多个子束中的一个的第二子束，以沿期望路径传输所述第一子束，并且在第二配置中沿着所述期望路径传输所述第二子束

4. 发明申请

WO2015067467A1 FREE ELECTRON LASER 审中-公开
标题翻译：免费电子激光
公开(公告)号：WO2015067467A1
公开(公告)日：2015-05-14
申请号：PCT/EP2014/072588
申请日：2014-10-22
申请人： ASML NETHERLANDS B.V.
发明人： AKKERMANS, Johannes, , AMENT, Lucas , BANINE, Vadim , COENEN, Teis, Johan , DE JAGER, Pieter , DE VRIES, Gosse , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , LUITEN, Otger , NIKIPELOV, Andrey
IPC分类号： H01S3/09 , H05H9/00 , H01J25/12 , H01J23/027 , H05H7/12
CPC分类号： H01S3/0903 , G03F7/70208 , H01J23/027 , H01J25/10 , H05H9/00
摘要： A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.
摘要翻译：一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。电子源可操作以产生聚束电子束。线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。减速单元包括一个或多个谐振腔（33）和能量耗散机构。聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

5. 发明申请

WO2011141024A3 GENERATION OF SHORT-WAVE ULTRASHORT LIGHT PULSES AND USE THEREOF 审中-公开
标题翻译：生产短波超短光脉冲及其用途
公开(公告)号：WO2011141024A3
公开(公告)日：2012-04-19
申请号：PCT/DE2011075111
申请日：2011-05-16
申请人： HELMHOLTZ ZENTRUM DRESDEN , DEBUS ALEXANDER , BUSSMANN MICHAEL
发明人： DEBUS ALEXANDER , BUSSMANN MICHAEL
IPC分类号： H01S3/09 , H01S3/094 , H01S3/102 , H01S4/00 , H05G2/00
CPC分类号： G02B27/44 , G02B27/00 , G02B27/4233 , H01S3/0057 , H01S3/0903 , H01S3/094 , H01S3/1024 , H01S4/00 , H05G2/00
摘要： The invention relates to an arrangement for generating extremely ultrashort and short-wave light pulses with the aid of the traveling-wave Thomson scattering process, wherein dispersive elements are arranged between an electron, particle, or radiation source, which is synchronized with a laser system, and an optical element that focuses in a direction, and to the use of said arrangement to superpose a pulse-front tilted light pulse of high power with an ultrashort pulse of relativistic electrons in a laser-line focus. By varying the laser pulse-front tilt, narrow-band radiation pulses in a wide wavelength range from EUV to X-ray wavelengths and having a high number of protons are obtained, and the bandwidth and coherence properties can also be modified. Said arrangement can be used, among other things, in EUV lithography, in the planning and optimal design of laser systems and electron sources, in material analysis by means of phase contrast imaging, and in superconductor research. The proposed arrangement can be produced to be smaller and cheaper than current comparable arrangements.
摘要翻译：本发明涉及一种装置，用于由所述行波汤姆逊散射方法来产生极端超短和短波光脉冲，所述电子束，颗粒或辐射源，其与激光系统同步之间色散元件，并且在一个方向上的光学元件的聚焦被布置，以及用于叠加pulsfrontverkippten光脉冲的高功率与线聚焦的超短脉冲激光的相对论电子使用这种布置。通过改变Laserpulsfrontverkippung得到高光子数的窄带辐射脉冲在宽波长范围内的EUV到X波长和还可以调节带宽和相干特性。这样的安排可以ü。一。在EUV光刻技术中，规划和最佳激光系统和电子源的设计，其中，由相位对比成像（相位constrast成像）的材料分析，超导体研究中使用。建议安排更小，比同类安排今天实现更便宜。

6. 发明申请

WO2007040713A2 COUPLED NANO-RESONATING ENERGY EMITTING STRUCTURES 审中-公开
标题翻译：联合纳米能量发射结构
公开(公告)号：WO2007040713A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/027430
申请日：2006-07-14
申请人： VIRGIN ISLANDS MICROSYSTEMS, INC.
发明人： GORRELL, Jonathan , DAVIDSON, Mark , MAINES, Michael, E.
IPC分类号： G01K1/08
CPC分类号： H01Q1/366 , B82Y10/00 , B82Y30/00 , H01J25/00 , H01S3/09 , H01S3/0903
摘要： A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating structure and to transmit the coupled energy outside said nano-resonating structure. The nano-resonant substructures may have various shapes and may include parallel rows of structures. The rows may be symmetric or asymmetric, tilted, and / or staggered.
摘要翻译：耦合的纳米谐振结构包括多个纳米谐振子结构，其构造并适于将来自带电粒子束的能量耦合到所述纳米谐振结构中并将耦合的能量传输到所述纳米谐振结构外部。纳米谐振子结构可以具有各种形状并且可以包括平行的结构行。行可以是对称的或不对称的，倾斜的和/或交错的。

7. 发明申请

WO1997007574A1 FREE ELECTRON LASER WITH SAFETY CIRCUIT 审中-公开
标题翻译：免费电子激光与安全电路
公开(公告)号：WO1997007574A1
公开(公告)日：1997-02-27
申请号：PCT/GB1996001811
申请日：1996-07-30
申请人： BRITISH NUCLEAR FUELS PLC , HARTLEY, John, Raymond
发明人： BRITISH NUCLEAR FUELS PLC
IPC分类号： H01S03/09
CPC分类号： H01S3/0903
摘要： In a free electron laser system with energy recovery, the system having an electron gun (110) to supply a beam of electrons; a wriggler array (114) to supply a spatially alternating magnetic field to the electron beam whereby a microwave beam (118) is generated; separating means (115) to spatially separate the microwave beam and the electron beam emerging from the wriggler array; electron collection means to receive the separated electron beam; and a high voltage, low current supply (122) and a low voltage, high current supply (124) connected in series to supply the gun (110); the high voltage supply also being connected between the electron collection means (120) and the gun (110); any instabilities are sensed by sensing the current through the high voltage supply (122); comparing the sensed current with a preset value; and disconnecting the EHT supply (122) from the gun (110) when the preset value is exceeded.
摘要翻译：在具有能量回收的自由电子激光系统中，该系统具有供给电子束的电子枪（110）用于向电子束提供空间交变的磁场的扭矩阵列（114），从而产生微波波束（118）; 分离装置（115），以空间地分离微波束和从扭矩阵列出射的电子束; 电子收集装置，用于接收分离的电子束; 以及串联连接以供应枪（110）的高电压，低电流源（122）和低电压，高电流源（124）; 高压电源也连接在电子收集装置（120）和枪（110）之间; 通过感测通过高压电源（122）的电流来感测任何不稳定性; 将感测的电流与预设值进行比较; 并且当超过预设值时，从喷枪（110）断开EHT电源（122）。

8. 发明申请

WO1993010584A1 CAVITY RESONATOR INCORPORATING WAVEGUIDE FILTER 审中-公开
标题翻译：加入波导过滤器的CAVITY谐振器
公开(公告)号：WO1993010584A1
公开(公告)日：1993-05-27
申请号：PCT/US1992009966
申请日：1992-11-18
申请人： HUGHES AIRCRAFT COMPANY
发明人： HUGHES AIRCRAFT COMPANY , DOLEZAL, Franklin, A. , GREGOIRE, Daniel, J. , HARVEY, Robin, J.
IPC分类号： H01S03/09
CPC分类号： H01S3/0903 , H01P7/06
摘要： A waveguide filter (22, 24) is incorporated into a cavity resonator (20) for a free-electron laser or the like by coating a material layer (24) on the inner peripheral surface of a hollow waveguide member (22). A high pass filter configuration is provided when the conductivity of the material layer (24) is higher than that of the waveguide member (22), such that electromagnetic signals having wavelengths longer than the skin depth of the material layer (24) pass into and are affected by the lower conductivity waveguide member (22). Reversing the conductivities produces a low pass filter configuration in which signals having wavelengths shorter than the skin depth are affected by the material layer (24). A bandpass filter configuration is provided by adding an additional material layer (32) of low conductivity to a high pass filter, whereas a band exclusion filter configuration is produced by adding an additional material layer (32) of high conductivity to a low pass filter.

9. 发明申请

WO2016016453A1 ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：投影曝光系统的照明设备
公开(公告)号：WO2016016453A1
公开(公告)日：2016-02-04
申请号：PCT/EP2015/067728
申请日：2015-07-31
申请人： CARL ZEISS SMT GMBH
发明人： PATRA, Michael , DEGÜNTHER, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70191 , G03F7/70208 , G03F7/70558 , G03F7/70991 , H01S3/0903
摘要： For controlling an intensity distribution of an illumination radiation (3) impinging on an object field, an illumination apparatus (35) for a projection exposure apparatus for microlithography comprises a means for spatially displacing an illumination beam (9 i ) relative to a first facet mirror of an illumination optical unit.
摘要翻译：为了控制照射在物场上的照射辐射（3）的强度分布，用于微光刻的投影曝光装置的照明装置（35）包括用于相对于第一面反射镜空间移动照明光束（9i）的装置，照明光学单元。

10. 发明申请

WO2015135912A3 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2015135912A3
公开(公告)日：2015-11-12
申请号：PCT/EP2015054913
申请日：2015-03-10
申请人： ASML NETHERLANDS BV
发明人： LOOPSTRA ERIK ROELOF , BANINE VADIM YEVGENYEVICH , BARTRAIJ PETRUS RUTGERUS , DONKER RILPHO LUDOVICUS , AKKERMANS JOHANNES ANTONIUS GERARDUS
IPC分类号： G03F7/20 , H01S3/09 , H05H7/00 , H05H7/04
CPC分类号： G03F7/70008 , G03F7/70025 , G03F7/7005 , G03F7/70208 , G03F7/70808 , H01S3/0903 , H05H7/04
摘要： The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another.
摘要翻译：本发明涉及一种自由电子激光器。自由电子激光器包括可操作以发射电子束的电子源，可操作以将电子束加速到相对论能量的粒子加速器，可操作以沿着周期性路径引导相对论电子束的波动器，以便刺激相干能量的发射辐射和转向单元，其可操作以改变电子束的轨迹，以便引导来自第一路径的电子束，电子束沿着第一路径在第一方向上传播到第二路径，电子束沿着第二路径基本上在第二路径中传播方向，其中第一路径和第二路径彼此垂直分离。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式