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1. 发明申请

WO2009082224A1 GRATING FOR EUV-RADIATION, METHOD FOR MANUFACTURING THE GRATING AND WAVEFRONT MEASUREMENT SYSTEM 审中-公开
标题翻译：用于EUV辐射的光刻，制造光栅和波形测量系统的方法
公开(公告)号：WO2009082224A1
公开(公告)日：2009-07-02
申请号：PCT/NL2008/050836
申请日：2008-12-19
申请人： ASML NETHERLANDS B.V. , KRUIZINGA, Borgert , WEHRENS, Martijn Gerard Dominique , NIJKERK, Michiel David , FEENSTRA, Kornelis Frits
发明人： KRUIZINGA, Borgert , WEHRENS, Martijn Gerard Dominique , NIJKERK, Michiel David , FEENSTRA, Kornelis Frits
IPC分类号： G02B5/18 , G03F7/20
CPC分类号： G02B5/1838 , G02B5/1857 , G02B5/1861 , G03F7/70316 , G03F7/706 , G21K1/06 , G21K1/067
摘要： A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
摘要翻译：用于EUV辐射的光栅包括多条反射线。每个反射线包括多个第一反射点和彼此之间布置的多个第二反射点。第一反射点和第二反射点被配置为反映相互相位差为180±10度±360度的EUV辐射。

2. 发明申请

WO2016139055A2 RADIATION SYSTEM 审中-公开
标题翻译：辐射系统
公开(公告)号：WO2016139055A2
公开(公告)日：2016-09-09
申请号：PCT/EP2016/053216
申请日：2016-02-16
申请人： ASML NETHERLANDS B.V.
发明人： NIENHUYS, Han-Kwang , BOGAART, Erik, Willem , DONKER, Rilpho, Ludovicus , KRUIZINGA, Borgert , LOOPSTRA, Erik, Roelof , BOTMA, Hako , DE VRIES, Gosse, Charles , FRIJNS, Olav, Waldemar, Vladimir , BASELMANS, Johannes, Jacobus, Matheus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/70025 , G03F7/7005 , G03F7/70075 , G03F7/70991 , H01S3/2308 , H05G2/008
摘要： A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
摘要翻译：包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统，修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束改变装置是从分束装置输出的分支辐射束。

3. 发明申请

WO2016134892A2 RADIATION BEAM APPARATUS 审中-公开
标题翻译：辐射波束装置
公开(公告)号：WO2016134892A2
公开(公告)日：2016-09-01
申请号：PCT/EP2016/051174
申请日：2016-01-21
申请人： ASML NETHERLANDS B.V.
发明人： DE VRIES, Gosse, Charles , DONKER, Rilpho, Ludovicus , NIENHUYS, Han-Kwang , VAN OOSTEN, Anton, Bernhard , KRUIZINGA, Borgert
IPC分类号： G03F7/20 , G02B5/18
CPC分类号： G03F7/70158 , G02B5/1861 , G02B27/4222 , G02B27/4255 , G03F7/702 , G03F7/70558 , G03F7/70991
摘要： An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.
摘要翻译：一种用于在光束接收位置接收输入辐射光束并从光束接收位置输出一个或多个输出辐射光束的设备。该设备包括：光学元件; 和一个运动机制。光学元件包括用于接收输入辐射束的多个部分。移动机构可操作以移动多个部分，从而选择性地将多个部分中的每一个定位在光束接收位置处。当多个部分中的一个部分布置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束以形成一个或多个输出辐射束。由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由其他部分中的每一个形成的对应的输出辐射束的方向相同。多个部分中的每个部分的一个或多个特性不同于其他部分的特性，使得由多个部分中的每个部分形成的一个或多个输出辐射束中的至少一个的功率不同于对应输出辐射束由至少一个其他部分形成。

4. 发明申请

WO2015044182A2 BEAM DELIVERY APPARATUS AND METHOD 审中-公开
标题翻译：光束传输装置和方法
公开(公告)号：WO2015044182A2
公开(公告)日：2015-04-02
申请号：PCT/EP2014/070335
申请日：2014-09-24
申请人： ASML NETHERLANDS B.V.
发明人： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC分类号： G03F7/20
CPC分类号： G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
摘要： A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
摘要翻译：
在光刻系统内使用的传送系统。该光束输送系统包括光学元件，该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。

5. 发明申请

WO2017153085A1 MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：测量系统，光刻设备和器件制造方法
公开(公告)号：WO2017153085A1
公开(公告)日：2017-09-14
申请号：PCT/EP2017/051603
申请日：2017-01-26
申请人： ASML NETHERLANDS B.V.
发明人： NIENHUYS, Han-Kwang , NAKIBOGLU, Günes , PETIT, Rita, Marguerite, Albin, Lambertine , PEN, Hermen, Folken , VAN DE MOESDIJK, Remco, Yuri , VAN BOXTEL, Frank, Johannes, Jacobus , KRUIZINGA, Borgert
IPC分类号： G03F7/20 , G03F1/84
摘要： A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system comprising a light source and a detector system; the light source being configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively; the detector system being configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor; the processor being configured to: ∙ receive the signals; ∙ determine, based on the signals as received, a characteristic of the object; and ∙ determine a deformation of the pattern based on the characteristic.
摘要翻译：描述了一种用于确定具有前表面和后表面并且设置有图案的物体的变形的测量系统，所述测量系统包括：处理器和干涉仪系统，所述干涉仪系统包括光源和检测器系统; 所述光源被配置为向所述物体上的多个位置中的每一个发射测量光束，以便在所述相应的多个位置中的每一个处分别产生从所述物体的前表面和后表面离开的反射测量光束; 所述检测器系统被配置为接收相应的反射测量光束并将代表所接收的反射测量光束的信号输出到所述处理器; 该处理器被配置为：·接收信号; ∙根据收到的信号确定物体的特性; 并根据特性确定图案的变形。

6. 发明申请

WO2014202585A2 LITHOGRAPHIC METHOD 审中-公开
标题翻译：光刻方法
公开(公告)号：WO2014202585A2
公开(公告)日：2014-12-24
申请号：PCT/EP2014/062691
申请日：2014-06-17
申请人： ASML NETHERLANDS B.V.
发明人： NIKIPELOV, Andrey , FRIJNS, Olav , DE VRIES, Gosse , LOOPSTRA, Erik , BANINE, Vadim , DE JAGER, Pieter , DONKER, Rilpho , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter , LUITEN, Otger , AKKERMANS, Johannes , GRIMMINCK, Leonardus , LITVINENKO, Vladimir
IPC分类号： H01S3/09
CPC分类号： G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
摘要翻译：一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备，其中所述方法还包括减少EUV辐射的功率波动通过使用基于反馈的控制回路来监测自由电子激光器并相应地调整自由电子激光器的操作而被传送到光刻基片。

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