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21. 发明申请

WO2014118062A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：通用沉积平台，加工站及其操作方法
公开(公告)号：WO2014118062A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051259
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C16/455 , C23C16/54 , H01J37/32 , H05H1/24
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括一个基板支架，该基板支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿基板支撑件的表面引导基板，对应于第一处理区域的第一沉积源和至少一个第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理气体出口，其中处理气体入口和处理气体出口布置在电极表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口至少设置在电极的表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极表面之间。该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

22. 发明申请

WO2010035128A4 EVAPORATOR FOR ORGANIC MATERIALS AND METHOD FOR EVAPORATING ORGANIC MATERIALS 审中-公开
公开(公告)号：WO2010035128A4
公开(公告)日：2010-04-01
申请号：PCT/IB2009/006988
申请日：2009-09-29
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
发明人： HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
IPC分类号： C23C14/24
摘要： An evaporator for vaporizing an organic material to be deposited on a flexible substrate is described. The evaporator includes an evaporation tube having a wall encompassing a cavity for vaporizing the organic material; at least one heating device arranged adjacent to the wall and being adapted to heat the evaporation tube; at least one nozzle assembly protruding from the evaporation tube, wherein the nozzle assembly further comprises a nozzle cover with an opening; and a shutter for selectively opening and closing the opening of the nozzle cover, wherein the shutter is adapted to have in operation of the evaporation tube a temperature within a shutter temperature range of 140°C such that the temperature of the nozzle cover is within the shutter temperature range.

23. 发明申请

WO2019096375A1 APPARATUS FOR HEAT TREATMENT OF A SUBSTRATE, APPARATUS FOR TRANSPORTING A FLEXIBLE SUBSTRATE, AND METHOD FOR HEAT TREATMENT OF A SUBSTRATE 审中-公开
公开(公告)号：WO2019096375A1
公开(公告)日：2019-05-23
申请号：PCT/EP2017/079288
申请日：2017-11-15
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , BUSCHBECK, Wolfgang , HEIN, Stefan
发明人： SCHNAPPENBERGER, Frank , BUSCHBECK, Wolfgang , HEIN, Stefan
IPC分类号： C23C14/54 , C23C14/56 , C23C16/46 , C23C16/48 , C23C16/54 , G05D23/27 , H01K1/32 , H01L21/67
CPC分类号： C23C16/46 , C23C14/541 , C23C14/562 , C23C16/481 , C23C16/545 , H01L21/67115 , H01L21/67248 , H01L21/67253
摘要： According to a first aspect, the present disclosure provides an apparatus for heat treatment of a substrate comprising at least one heating element, and at least one shield, wherein the at least one shield is moveable between a first position and a second position between the substrate and the at least one heating element, and the at least one shield comprises at least one reflective surface. According to a further aspect, the present disclosure provides an apparatus for transporting a flexible substrate comprising the apparatus for heat treatment of a substrate according to the first aspect, a substrate transport controller, and a sensor, wherein the substrate is transported past the apparatus for heat treatment of a substrate. According to a further aspect, the present disclosure provides a method for heat treatment of a substrate comprising emitting radiation towards the substrate, and temporarily reflecting the radiation to restrict the heating of the substrate.

24. 发明申请

WO2018130289A1 HARDCOAT LAYER SYSTEM AND METHOD FOR MANUFACTURING A HARDCOAT LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130289A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050598
申请日：2017-01-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： C23C16/02 , C23C16/32 , C23C16/40 , C23C16/54 , C23C28/04 , G06F3/044
摘要： A hardcoat layer system (100) adapted for use in a touch screen panel is described. The hardcoat layer system (100) includes a flexible substrate (101) and a layer stack (110) provided on the flexible substrate (101). The layer stack (110) includes an adhesion promotion layer (111) provided on the flexible substrate (101) and an inorganic hardcoat top layer (113). The adhesion promotion layer (111) is configured to covalently bind to the surface of the flexible substrate, wherein a mechanical property of the adhesion promotion layer (111) at an interface (102) to the flexible substrate (101) is adapted to a mechanical property of the flexible substrate (101).

25. 发明申请

WO2018130288A1 BARRIER LAYER SYSTEM AND METHOD FOR MANUFACTURING A BARRIER LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130288A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050597
申请日：2017-01-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： B32B15/08 , B32B15/082 , B32B15/085 , B32B15/09 , B32B15/095 , B32B23/00 , B32B23/04 , B32B27/10 , B32B27/28 , B32B27/30 , B32B27/32 , B32B27/36 , B32B27/40 , B32B29/00 , C23C16/30
摘要： A barrier layer system (100) adapted for use in an electro-optical device is described. The barrier layer system includes a flexible substrate (101); a first barrier layer (110) and a second barrier layer (120), wherein the first barrier layer (110) and the second barrier layer (120) are configured to have barrier properties against water/oxygen permeation. Further, the barrier layer system includes a polymeric buffer layer (115) provided between the first barrier layer (110) and the second barrier layer (120), wherein the polymeric buffer layer (115) is configured to increase a permeation path length between the first barrier layer (110) and the second barrier layer (120).

26. 发明申请

WO2015086602A1 SUBSTRATE SPREADING DEVICE FOR VACUUM PROCESSING APPARATUS, VACUUM PROCESSING APPARATUS WITH SUBSTRATE SPREADING DEVICE AND METHOD FOR OPERATING SAME 审中-公开
标题翻译：用于真空加工装置的基板传送装置，具有基板扩展装置的真空处理装置及其操作方法
公开(公告)号：WO2015086602A1
公开(公告)日：2015-06-18
申请号：PCT/EP2014/077062
申请日：2014-12-09
申请人： APPLIED MATERIALS, INC. , RIES, Florian , SAUER, Andreas , HEIN, Stefan
发明人： RIES, Florian , SAUER, Andreas , HEIN, Stefan
IPC分类号： C23C14/56 , C23C16/54 , C23C16/46 , C23C16/48 , H01J37/32 , C23C14/50 , C23C16/458
CPC分类号： B05C9/08 , B05C1/0826 , B05C1/12 , B05C9/14 , B05C13/00 , B05C15/00 , B05D3/12 , B65G23/34 , C23C14/50 , C23C14/562 , C23C16/0209 , C23C16/458 , C23C16/46 , C23C16/481 , C23C16/545 , G11B5/85 , H01J37/3277
摘要： A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.
摘要翻译：描述了用于处理柔性基板的处理装置，特别是用于处理柔性基板的真空处理装置。处理装置包括真空室; 所述真空室内的处理滚筒，其中所述处理滚筒被构造成围绕沿第一方向延伸的轴线旋转; 以及与所述处理鼓相邻的加热装置，其中所述加热装置被配置为沿所述第一方向铺展所述基板或者用于在所述第一方向上保持所述基板的扩展，并且其中所述加热装置具有与所述加工装置的方向平行的方向的尺寸基板输送方向为至少20mm。

27. 发明申请

WO2014118064A1 WEB GUIDE CONTROL UNIT, WEB PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME 审中-公开
标题翻译： WEB指导控制单元，WEB处理装置及其操作方法
公开(公告)号：WO2014118064A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051262
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan
发明人： HEIN, Stefan
IPC分类号： B65H23/188 , B65H23/04
CPC分类号： B65H23/044 , B65H23/038 , B65H23/048 , B65H23/1888 , B65H2301/51145 , B65H2404/1526 , B65H2511/242 , B65H2515/312 , B65H2515/314 , B65H2553/22 , B65H2553/23 , B65H2553/26 , B65H2553/822 , B65H2557/264 , B65H2701/1732 , B65H2701/1752 , B65H2220/02 , B65H2220/01
摘要： A web guide control unit (10) for guiding a web is provided. The web guide control unit (10) includes a web guide control unit (501) for guiding a web. The web guide control unit includes a single guide roller (201). The guide roller includes an adjustment unit (310) and two tension measurement units (301, 302) for measuring the tension of the web at a first location (215) and a second location (216) of the guide roller. The present disclosure also provides a web processing apparatus with at least one web guide control unit (01) as described herein is provided. "Processing" as used herein is typically understood as "coating". A method for guiding a web by means of the web guide control or the web processing apparatus is also disclosed.
摘要翻译：提供了一种用于引导网的卷筒纸引导控制单元（10）。卷筒纸引导控制单元（10）包括用于引导网的卷筒纸引导控制单元（501）。卷筒纸引导控制单元包括单个导辊（201）。引导辊包括调节单元（310）和两个张力测量单元（301,302），用于在引导辊的第一位置（215）和第二位置（216）处测量腹板的张力。本公开还提供了一种具有如本文所述的至少一个卷筒纸引导控制单元（01）的卷材处理设备。通常将本文所用的“加工”理解为“涂覆”。还公开了通过卷筒纸引导控制或纸幅处理装置引导纸幅的方法。

28. 发明申请

WO2014118063A1 GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
标题翻译：通过可调隔离壁进行气体分离
公开(公告)号：WO2014118063A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051261
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/458 , C23C14/562 , C23C16/45519 , C23C16/545 , H01J37/32449 , H01J37/32513 , H01J37/32761 , H01J37/3277 , Y10T29/49826
摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.
摘要翻译：描述了在柔性基板上涂覆薄膜的装置。该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通气体分离单元的位置。

29. 发明申请

WO2011036078A1 MODULAR SUBSTRATE PROCESSING SYSTEM AND METHOD 审中-公开
标题翻译：模块化基板处理系统及方法
公开(公告)号：WO2011036078A1
公开(公告)日：2011-03-31
申请号：PCT/EP2010/063542
申请日：2010-09-15
申请人： APPLIED MATERIALS, INC. , HERZOG, André , MORRISON, Neil , HEIN, Stefan , SAUER, Peter
发明人： HERZOG, André , MORRISON, Neil , HEIN, Stefan , SAUER, Peter
IPC分类号： H01L21/00 , B65H23/26 , B65H23/06
CPC分类号： H01L21/67132 , B65H23/24 , B65H23/32 , B65H2601/254 , B65H2801/87
摘要： A modular substrate processing system is provided for processing a flexible substrate. The system includes at least two process modules arranged adjacent to each other in a horizontal direction. The process modules include gas cushion rollers adapted for contactless guiding of the flexible substrate and for diverting the flexible substrate in vertical directions.
摘要翻译：提供了一种用于处理柔性基板的模块化基板处理系统。该系统包括沿水平方向彼此相邻布置的至少两个处理模块。处理模块包括适于柔性基板的非接触式引导和用于在垂直方向上转移柔性基板的气垫辊。

30. 发明申请

WO2010035128A2 EVAPORATOR FOR ORGANIC MATERIALS AND METHOD FOR EVAPORATING ORGANIC MATERIALS 审中-公开
标题翻译：有机材料蒸发器及有机材料蒸发方法
公开(公告)号：WO2010035128A2
公开(公告)日：2010-04-01
申请号：PCT/IB2009/006988
申请日：2009-09-29
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
发明人： HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
IPC分类号： C23C14/24
CPC分类号： B01B1/005 , B05D1/60 , B05D2252/02 , C23C14/12 , C23C14/243
摘要： An evaporator for vaporizing an organic material to be deposited on a flexible substrate is described. The evaporator includes an evaporation tube having a wall encompassing a cavity for vaporizing the organic material; at least one heating device arranged adjacent to the wall and being adapted to heat the evaporation tube; at least one nozzle assembly protruding from the evaporation tube, wherein the nozzle assembly further comprises a nozzle cover with an opening; and a shutter for selectively opening and closing the opening of the nozzle cover, wherein the shutter is adapted to have in operation of the evaporation tube a temperature within a shutter temperature range of 140°C such that the temperature of the nozzle cover is within the shutter temperature range.
摘要翻译：描述了用于蒸发要沉积在柔性基底上的有机材料的蒸发器。蒸发器包括蒸发管，其具有围绕用于汽化有机材料的空腔的壁; 至少一个加热装置，其布置成邻近所述壁并适于加热所述蒸发管; 至少一个从所述蒸发管突出的喷嘴组件，其中所述喷嘴组件还包括具有开口的喷嘴盖; 以及用于选择性地打开和关闭喷嘴盖的开口的快门，其中快门适于使蒸发管的操作中的温度在140℃的快门温度范围内，使得喷嘴盖的温度在快门温度范围。

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