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1. 发明申请

WO2019228611A1 METHODS OF HANDLING MASKS IN A VACUUM SYSTEM, AND VACUUM SYSTEM 审中-公开
公开(公告)号：WO2019228611A1
公开(公告)日：2019-12-05
申请号：PCT/EP2018/064056
申请日：2018-05-29
申请人： APPLIED MATERIALS, INC. , ZANG, Sebastian Gunther , BANGERT, Stefan , KURITA, Shinichi , HENRICH, Jürgen , SAUER, Andreas
发明人： ZANG, Sebastian Gunther , BANGERT, Stefan , KURITA, Shinichi , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/04 , C23C14/56 , H01L21/677
摘要： A method of handling masks in a vacuum system is described. The method includes (a) transporting a mask carrier (10) carrying a first mask (11) in a non-horizontal orientation (V) along a transport path in the vacuum system, (b) changing the orientation of the mask carrier (10) carrying the first mask (11) from the non-horizontal orientation (V) to an essentially horizontal orientation (H), and (c) unloading the first mask (11) from the mask carrier (10) arranged in the essentially horizontal orientation (H) in the vacuum system. According to a further aspect, a vacuum system including a mask handling module for handling masks is described. (FIG. 1C)

2. 发明申请

WO2019170252A1 VACUUM PROCESSING SYSTEM AND METHOD OF OPERATING A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2019170252A1
公开(公告)日：2019-09-12
申请号：PCT/EP2018/055925
申请日：2018-03-09
申请人： APPLIED MATERIALS, INC. , ZANG, Sebastian Gunther , HENRICH, Jürgen , SAUER, Andreas
发明人： ZANG, Sebastian Gunther , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/56 , C23C14/04 , C23C16/04 , C23C16/54 , H01L21/67 , H01L21/677
摘要： A vacuum processing system for processing a substrate is described. The processing system includes a first processing chamber connected to a first cluster chamber; a first processing station for processing the substrate in the first processing chamber; a second processing chamber connected to a second cluster chamber; a first transfer chamber connected to the first cluster chamber and the second cluster chamber, the first transfer chamber has a first length extending between the first cluster chamber and the second cluster chamber, the first transfer chamber being sized to accommodate the substrate; a second transfer chamber connected to the second cluster chamber, the second transfer chamber having a second length smaller than the first length; a substrate transportation arrangement provided to route the substrate in an orientation deviating from vertical by 15° or less through the first processing chamber, the second processing chamber, the first cluster chamber, the second cluster chamber, the first transfer chamber, and the second transfer chamber.

3. 发明申请

WO2018184690A1 SUPPLY LINE GUIDE FOR A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2018184690A1
公开(公告)日：2018-10-11
申请号：PCT/EP2017/058373
申请日：2017-04-07
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , SAUER, Andreas
发明人： BRÜNING, Andre , SAUER, Andreas
IPC分类号： B01J3/02 , C23C14/56
摘要： A supply line guide (100) for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement (110) including a plurality of connected elements (115), wherein the connected elements (115) are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube (120) provided around the guiding arrangement (110).

4. 发明申请

WO2018166634A1 METHODS OF HANDLING A MASK DEVICE IN A VACUUM SYSTEM, MASK HANDLING APPARATUS, AND VACUUM SYSTEM 审中-公开
公开(公告)号：WO2018166634A1
公开(公告)日：2018-09-20
申请号：PCT/EP2017/058826
申请日：2017-04-12
申请人： APPLIED MATERIALS,INC. , ZANG, Sebastian Gunther , SAUER, Andreas
发明人： ZANG, Sebastian Gunther , SAUER, Andreas
IPC分类号： H01L21/677
摘要： A method of handling a mask device configured for masked deposition on a substrate is described. The method includes: loading (Y1) a mask device (10) into a vacuum system (100); attaching (Y3) the mask device (10) to a mask carrier (15) in the vacuum system; and transporting the mask carrier (15) that holds the mask device (10) in a non-horizontal orientation along a transport path in the vacuum system (100). A further mask handling method includes: transporting a mask carrier (15) that holds a mask device (10) in a non- horizontal orientation (V) along a transport path in a vacuum system (100); detaching (X1) the mask device (10) from the mask carrier (15) in the vacuum system (100); and unloading (X3) the mask device (10) from the vacuum system (100). According to a further aspect, a mask handling assembly (20) for handling a mask device as well as a vacuum system with at least one mask handling assembly are described.

5. 发明申请

WO2018166621A1 DEPOSITION APPARATUS, VACUUM SYSTEM, AND METHOD OF OPERATING A DEPOSITION APPARATUS 审中-公开
公开(公告)号：WO2018166621A1
公开(公告)日：2018-09-20
申请号：PCT/EP2017/056382
申请日：2017-03-17
申请人： APPLIED MATERIALS, INC. , ZANG, Sebastian Gunther , SAUER, Andreas , HEIMEL, Oliver
发明人： ZANG, Sebastian Gunther , SAUER, Andreas , HEIMEL, Oliver
IPC分类号： C23C14/24 , C23C14/56 , H01L51/00
CPC分类号： C23C14/24 , C23C14/56 , H01L51/0011
摘要： The present disclosure provides a deposition apparatus (100) for a vacuum deposition process. The deposition apparatus includes a vacuum chamber (130), a movable deposition source (110) arranged in the vacuum chamber, and a supply arrangement (120) providing a supply passage for media supply lines for the movable deposition source, wherein the supply arrangement comprises an axially deflectable element (122).

6. 发明申请

WO2018153481A1 APPARATUS FOR VACUUM PROCESSING 审中-公开
公开(公告)号：WO2018153481A1
公开(公告)日：2018-08-30
申请号：PCT/EP2017/054358
申请日：2017-02-24
申请人： APPLIED MATERIALS, INC. , HEYMANNS, Matthias , BANGERT, Stefan , HEIMEL, Oliver , SAUER, Andreas , ZANG, Sebastian Gunther
发明人： HEYMANNS, Matthias , BANGERT, Stefan , HEIMEL, Oliver , SAUER, Andreas , ZANG, Sebastian Gunther
IPC分类号： C23C14/04 , C23C14/56
摘要： The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a second track arrangement (130) configured for transportation of a mask carrier (140), and a holding arrangement configured for positioning the substrate carrier (120) and the mask carrier (140) with respect to each other. The first track arrangement (110) includes a first portion configured to support the substrate carrier (120) at a first end (12) of the substrate (10) and a second portion configured to support the substrate carrier (120) at a second end (14) of the substrate (10) opposite the first end (12) of the substrate (10). The second track arrangement (120) includes a further first portion configured to support the mask carrier (140) at a first end (22) of a mask (20) and a further second portion configured to support the mask carrier (140) at a second end (24) of the mask (20) opposite the first end (22) of the mask (20). A first distance (D) between the first portion and the second portion of the first track arrangement (110) and a second distance (D') between the further first portion and the further second portion of the second track arrangement (130) are essentially the same.

7. 发明申请

WO2017198296A1 APPARATUS FOR CONTINUOUS PROCESSING OF A FLEXIBLE SUBSTRATE IN A VACUUM AND METHOD THEREFOR 审中-公开
标题翻译：用于在真空中连续处理柔性基板的装置及其方法
公开(公告)号：WO2017198296A1
公开(公告)日：2017-11-23
申请号：PCT/EP2016/061136
申请日：2016-05-18
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
发明人： SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
IPC分类号： B41F31/02 , B41F33/00 , B05C1/08
CPC分类号： B41F33/00 , B05B1/083 , B05C1/0813 , B05C1/0878 , B41F31/027
摘要： An apparatus (100) for continuous processing of a flexible substrate in a vacuum is provided. The apparatus includes a processing roller (110); a doctor blade assembly (120) having a doctor blade (121) extending in an axial direction of the processing roller (110); and a force transmission assembly (130) configured for moving the doctor blade assembly (120) towards a surface (111) of the processing roller (110). The force transmission assembly (130) includes a pressure unit (131) for applying a force on the doctor blade assembly (120) and a counter-pressure unit (132) for applying a counter-force on the doctor blade assembly (120).
摘要翻译：提供了一种用于在真空中连续处理柔性衬底的设备（100）。该设备包括处理辊（110）; 具有在所述处理辊（110）的轴向上延伸的刮刀（121）的刮刀组件（120）; 以及力传递组件（130），所述力传递组件（130）构造成用于朝向所述处理辊（110）的表面（111）移动所述刮刀组件（120）。力传递组件（130）包括用于在刮片组件（120）上施加力的压力单元（131）和用于在刮片组件（120）上施加反作用力的反压单元（132）。

8. 发明申请

WO2017108081A1 FILM FORMING APPARATUS 审中-公开
标题翻译：成膜装置
公开(公告)号：WO2017108081A1
公开(公告)日：2017-06-29
申请号：PCT/EP2015/080841
申请日：2015-12-21
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HOFMANN, Annabelle
发明人： SAUER, Andreas , HOFMANN, Annabelle
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C16/545
摘要： An apparatus for processing a thin film on a substrate is described. The apparatus includes a vacuum chamber comprising a housing, a rear wall and a removable closing plate; a processing drum being arranged between the rear wall and the removable closing plate inside the vacuum chamber, the processing drum being at least partially surrounded by a processing region; a first process separating wall portion attached to the removable closing plate; a second process separating wall portion attached to the housing or the rear wall; wherein in a closed position of the removable closing plate, the first process separating wall portion and the second process separating wall portion jointly provide a process separating wall dividing the processing region into adjacent processing sections.
摘要翻译：描述了用于处理衬底上的薄膜的设备。该设备包括真空室，该真空室包括壳体，后壁和可移除的封闭板; 在所述真空室内部的所述后壁和所述可移除封闭板之间布置处理鼓，所述处理鼓至少部分地被处理区域围绕; 第一过程分离壁部分，该壁部分连接到可移除封闭板; 第二过程分离壁部分连接到壳体或后壁; 其中在所述可移除封闭板的关闭位置中，所述第一工艺分离壁部分和所述第二工艺分离壁部分共同提供将所述处理区域分成相邻处理部分的工艺分离壁。

9. 发明申请

WO2017084720A1 CARRIER FOR FLEXIBLE SUBSTRATES 审中-公开
标题翻译：载体用于柔性基板
公开(公告)号：WO2017084720A1
公开(公告)日：2017-05-26
申请号：PCT/EP2015/077249
申请日：2015-11-20
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
发明人： HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C16/545
摘要： The present disclosure provides an apparatus (100) for supporting a flexible substrate (10) in a vacuum processing chamber. The apparatus (100) includes a coating drum rotatable around a rotational axis (105), wherein the coating drum has a support surface (110) configured for supporting the fiexible substrate (10), wherein the support surface (110) is symmetrical with respect to the rotational axis (105), and wherein a first distance (120) between the rotational axis (105) and a center portion (112) of the support surface (110) in a direction perpendicular to the rotational axis (105) is smaller than a second distance (122) between the rotational axis (105) and a periphery (114, 116) of the support surface (110).
摘要翻译：本公开提供了一种用于在真空处理室中支撑柔性衬底（10）的设备（100）。所述设备（100）包括可围绕旋转轴线（105）旋转的涂布鼓，其中所述涂布鼓具有构造成用于支撑所述柔性基板（10）的支撑表面（110），其中所述支撑表面（110）到旋转轴线（105），并且其中旋转轴线（105）与支撑表面（110）的中心部分（112）之间在垂直于旋转轴线（105）的方向上的第一距离（120）较小比旋转轴线（105）与支撑表面（110）的周边（114,116）之间的第二距离（122）

10. 发明申请

WO2015149849A1 VACUUM PROCESSING SYSTEM AND METHOD FOR MOUNTING A PROCESSING SYSTEM 审中-公开
标题翻译：真空加工系统和安装加工系统的方法
公开(公告)号：WO2015149849A1
公开(公告)日：2015-10-08
申请号：PCT/EP2014/056605
申请日：2014-04-02
申请人： APPLIED MATERIALS, INC. , RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
发明人： RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/52 , C23C14/56 , C23C16/54
CPC分类号： C23C14/24 , C23C14/52 , C23C14/56 , C23C14/562 , C23C16/54 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate (260; 560) is provided. The processing system includes a first chamber (110) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a second chamber (120) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a maintenance zone (130) between the first chamber (110) and the second chamber (120; 220; 420; 520); and a first process chamber (140) for depositing material on the flexible substrate, wherein the second chamber (140) is provided between the maintenance zone (130) and the first process chamber (110). The maintenance zone (130) allows for maintenance access to at least one of the first chamber (110) and the second chamber (120).
摘要翻译：提供了一种用于柔性基板（260; 560）的真空处理系统（100）。处理系统包括适于容纳用于提供柔性基底的供应辊中的一个的第一室（110）和用于储存柔性基板（260; 560）的卷取辊。适于容纳用于提供所述柔性基板的供应辊中的一个的第二室（120）和用于存储所述柔性基板（260; 560）的卷取辊; 在所述第一室（110）和所述第二室（120; 220; 420; 520）之间的维护区（130）; 以及用于在所述柔性基板上沉积材料的第一处理室（140），其中所述第二室（140）设置在所述维护区（130）和所述第一处理室（110）之间。维护区域（130）允许维护对第一室（110）和第二室（120）中的至少一个的通路。

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