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1. 发明申请

WO2019096375A1 APPARATUS FOR HEAT TREATMENT OF A SUBSTRATE, APPARATUS FOR TRANSPORTING A FLEXIBLE SUBSTRATE, AND METHOD FOR HEAT TREATMENT OF A SUBSTRATE 审中-公开
公开(公告)号：WO2019096375A1
公开(公告)日：2019-05-23
申请号：PCT/EP2017/079288
申请日：2017-11-15
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , BUSCHBECK, Wolfgang , HEIN, Stefan
发明人： SCHNAPPENBERGER, Frank , BUSCHBECK, Wolfgang , HEIN, Stefan
IPC分类号： C23C14/54 , C23C14/56 , C23C16/46 , C23C16/48 , C23C16/54 , G05D23/27 , H01K1/32 , H01L21/67
CPC分类号： C23C16/46 , C23C14/541 , C23C14/562 , C23C16/481 , C23C16/545 , H01L21/67115 , H01L21/67248 , H01L21/67253
摘要： According to a first aspect, the present disclosure provides an apparatus for heat treatment of a substrate comprising at least one heating element, and at least one shield, wherein the at least one shield is moveable between a first position and a second position between the substrate and the at least one heating element, and the at least one shield comprises at least one reflective surface. According to a further aspect, the present disclosure provides an apparatus for transporting a flexible substrate comprising the apparatus for heat treatment of a substrate according to the first aspect, a substrate transport controller, and a sensor, wherein the substrate is transported past the apparatus for heat treatment of a substrate. According to a further aspect, the present disclosure provides a method for heat treatment of a substrate comprising emitting radiation towards the substrate, and temporarily reflecting the radiation to restrict the heating of the substrate.

2. 发明申请

WO2017207053A1 GUIDING DEVICES AND WEB COATING PROCESS 审中-公开
标题翻译：指导设备和网涂工艺
公开(公告)号：WO2017207053A1
公开(公告)日：2017-12-07
申请号：PCT/EP2016/062539
申请日：2016-06-02
申请人： APPLIED MATERIALS, INC. , METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
发明人： METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , B65H23/00
CPC分类号： C23C14/562 , B65H20/14 , B65H2406/361 , B65H2801/87
摘要： A roller device (100) for guiding a web (200) and for controlling the temperature of the web (200) in contact with the roller device in a web coating process under vacuum conditions is described. The roller device includes a curved surface (101) of the roller device (100) for contacting the web (200), wherein the curved surface (101) includes a web guiding region (103). The roller device further includes a group of gas outlets (104) in the curved surface (101) and a gas distribution system (105) for selectively providing the gas flow to a first subgroup of gas outlets (104) and for selectively preventing the gas from flowing to a second subgroup of the gas outlets (104). The roller device further includes a driving unit (110) for rotating the curved surface (101), wherein the curved surface (101) is adapted for inducing a movement of the web (200) upon rotation of the curved surface.
摘要翻译：描述了用于在真空条件下在幅材涂布工艺中引导幅材（200）并且用于控制幅材（200）与辊子设备接触的温度的辊子装置（100）。滚轮装置包括用于接触腹板（200）的滚轮装置（100）的弯曲表面（101），其中弯曲表面（101）包括腹板引导区域（103）。该滚轮装置还包括在弯曲表面（101）中的一组气体出口（104）和用于选择性地将气流提供给第一组气体出口（104）并用于选择性地防止气体从流动到气体出口（104）的第二子组。所述滚轮装置还包括用于旋转所述弯曲表面（101）的驱动单元（110），其中所述弯曲表面（101）适于在所述弯曲表面旋转时引起所述腹板（200）的移动。

3. 发明申请

WO2014118062A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：通用沉积平台，加工站及其操作方法
公开(公告)号：WO2014118062A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051259
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C16/455 , C23C16/54 , H01J37/32 , H05H1/24
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括一个基板支架，该基板支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿基板支撑件的表面引导基板，对应于第一处理区域的第一沉积源和至少一个第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理气体出口，其中处理气体入口和处理气体出口布置在电极表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口至少设置在电极的表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极表面之间。该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

4. 发明申请

WO2018192668A1 MATERIAL DEPOSITION ARRANGEMENT, A METHOD FOR DEPOSITING MATERIAL AND A MATERIAL DEPOSITION CHAMBER 审中-公开
公开(公告)号：WO2018192668A1
公开(公告)日：2018-10-25
申请号：PCT/EP2017/059505
申请日：2017-04-21
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , HEIN, Stefan , HOFMANN, Annabelle
发明人： SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , HEIN, Stefan , HOFMANN, Annabelle
IPC分类号： C23C14/24 , C23C14/54 , C23C16/455 , F16K49/00 , C23C16/52
摘要： A material deposition arrangement chamber (1000) for depositing a material on a substrate is described. The material deposition arrangement chamber comprises a vacuum generation device (1060) and a material deposition arrangement (100) having a valve element (200), configured to regulate the material flow-through of the material to be deposited.

5. 发明申请

WO2014118063A1 GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
标题翻译：通过可调隔离壁进行气体分离
公开(公告)号：WO2014118063A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051261
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/458 , C23C14/562 , C23C16/45519 , C23C16/545 , H01J37/32449 , H01J37/32513 , H01J37/32761 , H01J37/3277 , Y10T29/49826
摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.
摘要翻译：描述了在柔性基板上涂覆薄膜的装置。该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通气体分离单元的位置。

6. 发明申请

WO2010035130A2 EVAPORATOR FOR ORGANIC MATERIALS 审中-公开
标题翻译：有机材料蒸发器
公开(公告)号：WO2010035130A2
公开(公告)日：2010-04-01
申请号：PCT/IB2009/006990
申请日：2009-09-29
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HOFFMANN, Gerd
发明人： HEIN, Stefan , HOFFMANN, Gerd
IPC分类号： C23C14/24
CPC分类号： B01B1/005 , B05D1/60 , B05D2252/02 , C23C14/12 , C23C14/243
摘要： An evaporator for vaporizing organic material is described. The evaporator includes a first chamber having a nozzle adapted to be directed to a substrate to be coated; at least one second chamber for vaporizing the organic material; at least one vapour channel for guiding vaporized organic material from the at least one second chamber to the first chamber; wherein the first chamber is adapted to provide vaporized organic material to the nozzle corresponding to a first virtual sublimation surface, and the at least one second chamber being adapted to provide during operation a second sublimation surface area, wherein the second sublimation surface area corresponds to at least 70 percent of the first virtual sublimation surface.
摘要翻译：描述了蒸发有机材料的蒸发器。蒸发器包括具有适于被引导到待涂覆的基底的喷嘴的第一腔室; 至少一个用于汽化有机材料的第二室; 用于将蒸发的有机材料从所述至少一个第二室引导到所述第一室的至少一个蒸气通道; 其中所述第一室适合于向所述喷嘴提供对应于第一虚拟升华表面的蒸发的有机材料，并且所述至少一个第二室适于在操作期间提供第二升华表面积，其中所述第二升华表面积对应于至少70％的第一个虚拟升华表面。

7. 发明申请

WO2019105534A1 DEPOSITION APPARATUS, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：WO2019105534A1
公开(公告)日：2019-06-06
申请号：PCT/EP2017/080694
申请日：2017-11-28
申请人： APPLIED MATERIALS, INC. , HABERKORN, Edgar , LORENZ, Stefan , HEIN, Stefan , MORRISON, Neil , KUKLA, Reiner , KURTHEN, Christof , DEPPISCH, Thomas
发明人： HABERKORN, Edgar , LORENZ, Stefan , HEIN, Stefan , MORRISON, Neil , KUKLA, Reiner , KURTHEN, Christof , DEPPISCH, Thomas
IPC分类号： C23C14/06 , C23C14/34 , C23C14/56 , C23C14/58
摘要： A deposition apparatus (100) for coating a flexible substrate (10) is described. The deposition apparatus includes a first spool chamber (110) housing a storage spool (112) for providing the flexible substrate (10), a deposition chamber (120) arranged downstream from the first spool chamber (110), and a second spool chamber (150) arranged downstream from the deposition chamber (120) and housing a wind-up spool (152) for winding the flexible substrate (10) thereon after deposition. The deposition chamber (120) includes a coating drum (122) for guiding the flexible substrate past a plurality of deposition units (121) including at least one deposition unit (124) having a graphite target (125). Further, the deposition chamber (120) includes a coating treatment device (160) configured to densify a layer deposited on the flexible substrate.

8. 发明申请

WO2018149510A1 DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE AND METHOD OF COATING A FLEXIBLE SUBSTRATE 审中-公开
公开(公告)号：WO2018149510A1
公开(公告)日：2018-08-23
申请号：PCT/EP2017/053790
申请日：2017-02-20
申请人： APPLIED MATERIALS, INC. , METT, Valerius , DEPPISCH, Thomas , HEIN, Stefan , ULRICH, Jürgen , KURTHEN, Christof
发明人： METT, Valerius , DEPPISCH, Thomas , HEIN, Stefan , ULRICH, Jürgen , KURTHEN, Christof
IPC分类号： C23C14/56 , C23C16/54 , C23C16/44
CPC分类号： C23C14/562 , C23C14/564 , C23C14/566 , C23C16/4409 , C23C16/545
摘要： A deposition apparatus (100) for coating a flexible substrate (10) with at least one layer is described. The deposition apparatus comprises: a first spool chamber (110) configured for housing a storage spool for providing the flexible substrate; a first deposition chamber (120) arranged downstream from the first spool chamber and comprising a first coating drum (122) configured for guiding the flexible substrate past a first plurality of deposition units (121); a second deposition chamber (140) arranged downstream from the first deposition chamber (120) and comprising a second coating drum (142) configured for guiding the flexible substrate past a second plurality of deposition units (141); a second spool chamber arranged downstream from the second deposition chamber (140) and configured for housing a wind-up spool for winding the flexible substrate thereon after deposition; and a roller assembly configured to transport the flexible substrate (10) along a partially convex and partially concave substrate transportation path from the first spool chamber to the second spool chamber. Further, a method of coating a flexible substrate, particularly with the described deposition apparatus, is described.

9. 发明申请

WO2018130300A1 LAYER SYSTEM ADAPTED FOR USE IN AN ELECTRO-OPTICAL DEVICE AND METHOD FOR MANUFACTURING A LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130300A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050692
申请日：2017-01-13
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： C23C16/02 , C23C16/40 , C23C16/54 , C23C28/04 , G06F3/044 , H01L51/50
摘要： A layer system (100) adapted for use in an electro-optical device is described. The layer system includes a flexible substrate (101), a planarization layer (110) provided on the flexible substrate (101), and a transparent conductive oxide layer (120) provided on the planarization layer (110), wherein the planarization layer (110) is configured to encapsulate defects on the flexible substrate (101), and wherein the planarization layer is configured to covalently bind to the surface of the flexible substrate.

10. 发明申请

WO2010089662A2 MODULAR PVD SYSTEM FOR FLEX PV 审中-公开
标题翻译： FLEX PV模块化PVD系统
公开(公告)号：WO2010089662A2
公开(公告)日：2010-08-12
申请号：PCT/IB2010/000231
申请日：2010-02-05
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HERZOG, Andre , SAUER, Peter , MORRISON, Neil
发明人： HEIN, Stefan , HERZOG, Andre , SAUER, Peter , MORRISON, Neil
IPC分类号： H01L31/042 , H01L31/045 , H01L21/203
CPC分类号： H01L31/1876 , C23C14/086 , C23C14/205 , C23C14/562 , C23C14/568 , H01L21/67155 , H01L21/67173 , H01L21/67207 , H01L21/67236 , Y02E10/50 , Y02P70/521
摘要： A system for thin film deposition on a flexible substrate having at least a first deposition region is described. The system includes a first chamber being based on a platform, wherein the first deposition region is within the first chamber, wherein the first chamber has a first support member configuration configured for supporting at least two different substrate guiding systems and wherein one substrate guiding system is supported by the first support member configuration, and wherein the platform is configured for at least two different deposition units and wherein one deposition unit of the at least two different deposition units is enclosed by the first chamber.
摘要翻译：描述了具有至少第一沉积区域的柔性基板上的薄膜沉积系统。该系统包括基于平台的第一室，其中第一沉积区域在第一室内，其中第一室具有构造成用于支撑至少两个不同的衬底引导系统的第一支撑构件配置，并且其中一个衬底引导系统是由所述第一支撑构件构造支撑，并且其中所述平台构造成用于至少两个不同的沉积单元，并且其中所述至少两个不同沉积单元中的一个沉积单元被所述第一室包围。

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