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1. 发明申请

WO2018077388A1 MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE, EVAPORATION SOURCE, DEPOSITION APPARATUS, AND METHOD THEREFOR 审中-公开
标题翻译：用于测量沉积速率的测量组件，蒸发源，沉积装置及其方法
公开(公告)号：WO2018077388A1
公开(公告)日：2018-05-03
申请号：PCT/EP2016/075681
申请日：2016-10-25
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , SCHÜSSLER, Uwe , LANDGRAF, Heike , LOPP, Andreas , STAAF, Hans
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , SCHÜSSLER, Uwe , LANDGRAF, Heike , LOPP, Andreas , STAAF, Hans
IPC分类号： C23C14/04 , C23C14/12 , C23C14/24 , C23C14/54 , G01B7/06
CPC分类号： C23C14/546 , C23C14/042 , C23C14/12 , C23C14/24
摘要： A measurement assembly (100) for measuring a deposition rate of an evaporated material is described. The measurement assembly (100) includes: a first oscillation crystal (110) for measuring the deposition rate; a second oscillation crystal (120) for measuring the deposition rate; and a movable shutter (140). The movable shutter (140) is configured for blocking the evaporated material provided from a first measurement outlet (151), the first measurement outlet directed for providing evaporated material to the first oscillation crystal (110). Further, the movable shutter (140) is configured for blocking the evaporated material provided from a second measurement outlet (152), the second measurement outlet directed for providing evaporated material to the second oscillation crystal (120).
摘要翻译：描述用于测量蒸发材料的沉积速率的测量组件（100）。测量组件（100）包括：用于测量沉积速率的第一振荡晶体（110）第二振荡晶体（120），用于测量沉积速率; 和可动快门（140）。可移动遮光器（140）被配置用于阻挡从第一测量出口（151）提供的蒸发材料，第一测量出口指向用于将蒸发材料提供给第一振荡晶体（110）。此外，可动快门（140）被配置用于阻挡从第二测量出口（152）提供的蒸发材料，第二测量出口指向用于向第二振荡晶体（120）提供蒸发材料。

2. 发明申请

WO2017050355A1 DIFFUSION BARRIER FOR OSCILLATION CRYSTALS, MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE AND METHOD THEREOF 审中-公开
标题翻译：用于振荡晶体的扩散障碍物，用于测量沉积速率的测量装置及其方法
公开(公告)号：WO2017050355A1
公开(公告)日：2017-03-30
申请号：PCT/EP2015/071758
申请日：2015-09-22
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike
IPC分类号： G01N29/02 , C23C14/54 , G01N29/24 , G01N29/32 , H01L41/113
CPC分类号： G01N29/022 , C23C14/546 , G01N29/2443 , G01N29/32 , G01N2291/0256 , G01N2291/0426 , H01L41/0533
摘要： A detection element for a measurement assembly adapted to measure a deposition rate of an evaporated material on a substrate. The detection element comprising: an oscillation crystal for detecting the deposition rate; and a barrier layer comprising a barrier material covering at least a portion of the oscillation crystal configured to prevent the evaporated material from diffusing into the oscillation crystal.
摘要翻译：一种用于测量组件的检测元件，其适于测量衬底上蒸发的材料的沉积速率。检测元件包括：用于检测沉积速率的振荡晶体; 以及阻挡层，其包括覆盖所述振荡晶体的至少一部分的阻挡材料，所述阻挡材料构造成防止所述蒸发材料扩散到所述振荡晶体中。

3. 发明申请

WO2014154692A1 DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：用于柔性基板的沉积平台及其操作方法
公开(公告)号：WO2014154692A1
公开(公告)日：2014-10-02
申请号：PCT/EP2014/055967
申请日：2014-03-25
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , MORRISON, Neil
发明人： DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , MORRISON, Neil
IPC分类号： C23C16/54 , C23C14/56 , C23C16/509 , C23C16/455
CPC分类号： C23C16/545 , C23C14/562 , C23C16/44 , C23C16/4409 , C23C16/45519 , C23C16/509
摘要： An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate having the thin film deposited thereon, wherein the unwinding shaft and the winding shaft are arranged in the first chamber portion, at least one gap sluice for separating the first chamber portion from the second chamber portion, wherein the gap sluice is configured such that the flexible substrate can move there through and the gap sluice can be opened and closed for providing a vacuum seal, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion for providing a vacuum connection. Further, the third chamber portion has a convex shaped chamber wall portion, wherein the third chamber portion has at least two openings provided therein, particularly wherein the at least two openings are essentially parallel to the convex shaped chamber wall portion; and wherein the first processing station and the at least one second processing station are configured to be received in the at least two openings, wherein the flange portions of the first processing station and the second processing station provide a vacuum tight connection with the third chamber.
摘要翻译：描述了一种用于处理柔性基板的装置。该装置包括具有第一室部分，第二室部分和第三室部分的真空室，用于支撑要处理的柔性基板的退绕轴和支撑其上沉积有薄膜的柔性基板的卷绕轴，其中，退绕轴和卷绕轴布置在第一室部分中，至少一个间隙闸道用于将第一室部分与第二室部分分离，其中间隙闸门构造成使得柔性基板可以在那里移动并且间隙闸门可以打开和关闭以提供真空密封，具有旋转轴线和弯曲外表面的涂布滚筒，用于通过第一真空处理区域和至少一个第二真空处理区域沿着弯曲的外表面引导基板，其中第一涂布滚筒的一部分设置在第二室部分中，涂布滚筒的其余部分是pr 在第三室部分中排出第一处理站，对应于第一处理区域的第一处理站和对应于至少一个第二真空处理区域的至少一个第二处理站，其中第一处理站和第二处理站各自包括凸缘部分用于提供真空连接。此外，第三室部分具有凸形室壁部分，其中第三室部分具有设置在其中的至少两个开口，特别是其中至少两个开口基本上平行于凸形室壁部分; 并且其中所述第一处理站和所述至少一个第二处理站被配置为被接收在所述至少两个开口中，其中所述第一处理站和所述第二处理站的所述凸缘部分与所述第三室提供真空密封连接。

4. 发明申请

WO2014118062A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：通用沉积平台，加工站及其操作方法
公开(公告)号：WO2014118062A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051259
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C16/455 , C23C16/54 , H01J37/32 , H05H1/24
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括一个基板支架，该基板支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿基板支撑件的表面引导基板，对应于第一处理区域的第一沉积源和至少一个第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理气体出口，其中处理气体入口和处理气体出口布置在电极表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口至少设置在电极的表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极表面之间。该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

5. 发明申请

WO2018130300A1 LAYER SYSTEM ADAPTED FOR USE IN AN ELECTRO-OPTICAL DEVICE AND METHOD FOR MANUFACTURING A LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130300A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050692
申请日：2017-01-13
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： C23C16/02 , C23C16/40 , C23C16/54 , C23C28/04 , G06F3/044 , H01L51/50
摘要： A layer system (100) adapted for use in an electro-optical device is described. The layer system includes a flexible substrate (101), a planarization layer (110) provided on the flexible substrate (101), and a transparent conductive oxide layer (120) provided on the planarization layer (110), wherein the planarization layer (110) is configured to encapsulate defects on the flexible substrate (101), and wherein the planarization layer is configured to covalently bind to the surface of the flexible substrate.

6. 发明申请

WO2017054890A1 VARIABLE SHAPER SHIELD FOR EVAPORATORS AND METHOD FOR DEPOSITING AN EVAPORATED SOURCE MATERIAL ON A SUBSTRATE 审中-公开
标题翻译：用于蒸发器的可变形状防护罩和在基底上沉积蒸发源材料的方法
公开(公告)号：WO2017054890A1
公开(公告)日：2017-04-06
申请号：PCT/EP2015/072865
申请日：2015-10-02
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04 , H01L51/00
CPC分类号： C23C14/24 , C23C14/042 , C23C14/044 , H01L51/0011
摘要： A shielding device (320) for an evaporation source configured to guide evaporated source material through a plurality of outlets distributed along a length direction of the evaporation source. The shielding device including three or more spaced-apart shaper shield segments (325) configured for blocking evaporated source material (312) depending on the emission angle of the plume of evaporated source material from the plurality of outlets in a plane parallel to the length direction of the evaporation source.
摘要翻译：一种用于蒸发源的屏蔽装置（320），其构造成将蒸发的源材料引导通过沿蒸发源的长度方向分布的多个出口。所述屏蔽装置包括三个或更多个间隔开的成形器屏蔽段（325），其构造成用于根据来自多个出口的蒸发源材料的羽流在与长度方向平行的平面中的发射角来阻挡蒸发的源材料（312）的蒸发源。

7. 发明申请

WO2016202387A1 METHOD FOR MEASURING A DEPOSITION RATE AND DEPOSITION RATE CONTROL SYSTEM 审中-公开
标题翻译：测量沉积速率和沉积速率控制系统的方法
公开(公告)号：WO2016202387A1
公开(公告)日：2016-12-22
申请号：PCT/EP2015/063636
申请日：2015-06-17
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , KOCH, Thomas , BANGERT, Stefan
发明人： DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , KOCH, Thomas , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/54 , G05B21/02
CPC分类号： C23C14/24 , C23C14/542 , C23C14/546 , G05B21/02
摘要： A method (100) for measuring a deposition rate of evaporated material is described. The method includes measuring (110) the deposition rate with a time interval ∆T between a first measurement M1 and a second measurement M2, and adjusting (120) the time interval ∆T dependent on the measured deposition rate. Further, a deposition rate control system (200) is described. The deposition rate control system includes a deposition rate measurement assembly (210) for measuring a deposition rate of the evaporated material, and a controller (220) connected to the deposition rate measurement assembly (210) and to an evaporation source (300), wherein the controller is configured to provide a control signal to the deposition rate measurement assembly (210).
摘要翻译：描述了用于测量蒸发材料的沉积速率的方法（100）。该方法包括以第一测量M1和第二测量M2之间的时间间隔ΔT来测量（110）沉积速率，并且根据测量的沉积速率来调整（120）时间间隔ΔT。此外，描述了沉积速率控制系统（200）。沉积速率控制系统包括用于测量蒸发材料的沉积速率的沉积速率测量组件（210）和连接到沉积速率测量组件（210）和蒸发源（300）的控制器（220），其中控制器被配置为向沉积速率测量组件（210）提供控制信号。

8. 发明申请

WO2018130289A1 HARDCOAT LAYER SYSTEM AND METHOD FOR MANUFACTURING A HARDCOAT LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130289A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050598
申请日：2017-01-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： C23C16/02 , C23C16/32 , C23C16/40 , C23C16/54 , C23C28/04 , G06F3/044
摘要： A hardcoat layer system (100) adapted for use in a touch screen panel is described. The hardcoat layer system (100) includes a flexible substrate (101) and a layer stack (110) provided on the flexible substrate (101). The layer stack (110) includes an adhesion promotion layer (111) provided on the flexible substrate (101) and an inorganic hardcoat top layer (113). The adhesion promotion layer (111) is configured to covalently bind to the surface of the flexible substrate, wherein a mechanical property of the adhesion promotion layer (111) at an interface (102) to the flexible substrate (101) is adapted to a mechanical property of the flexible substrate (101).

9. 发明申请

WO2018130288A1 BARRIER LAYER SYSTEM AND METHOD FOR MANUFACTURING A BARRIER LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130288A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050597
申请日：2017-01-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： B32B15/08 , B32B15/082 , B32B15/085 , B32B15/09 , B32B15/095 , B32B23/00 , B32B23/04 , B32B27/10 , B32B27/28 , B32B27/30 , B32B27/32 , B32B27/36 , B32B27/40 , B32B29/00 , C23C16/30
摘要： A barrier layer system (100) adapted for use in an electro-optical device is described. The barrier layer system includes a flexible substrate (101); a first barrier layer (110) and a second barrier layer (120), wherein the first barrier layer (110) and the second barrier layer (120) are configured to have barrier properties against water/oxygen permeation. Further, the barrier layer system includes a polymeric buffer layer (115) provided between the first barrier layer (110) and the second barrier layer (120), wherein the polymeric buffer layer (115) is configured to increase a permeation path length between the first barrier layer (110) and the second barrier layer (120).

10. 发明申请

WO2014118063A1 GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
标题翻译：通过可调隔离壁进行气体分离
公开(公告)号：WO2014118063A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051261
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/458 , C23C14/562 , C23C16/45519 , C23C16/545 , H01J37/32449 , H01J37/32513 , H01J37/32761 , H01J37/3277 , Y10T29/49826
摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.
摘要翻译：描述了在柔性基板上涂覆薄膜的装置。该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通气体分离单元的位置。

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