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    • 2. 发明授权
    • Growth of polycrystalline semiconductor film with intermetallic
nucleating layer
    • 具有金属间成核层的多晶半导体膜的生长
    • US4132571A
    • 1979-01-02
    • US765497
    • 1977-02-03
    • Jerome J. CuomoThomas H. DiStefanoRobert Rosenberg
    • Jerome J. CuomoThomas H. DiStefanoRobert Rosenberg
    • C23C14/02C23C16/00C30B11/12C30B23/02C30B25/02C30B25/18B01J17/26
    • C30B29/06C23C14/02C23C16/003C30B11/12C30B23/02C30B25/18Y10S148/061Y10S148/154
    • A method is disclosed for fabricating a thin elemental semiconductor, e.g., Si or Ge, film with columnar grains in a filamentary structure, by the use of an intermetallic compound incorporating the elemental semiconductor to form a nucleating layer for the growth of the semiconducting film. The semiconductor is grown from vapor phase by the technique of either vacuum evaporation or chemical vapor deposition, e.g., by decomposition of SiH.sub.4. The semiconductor e.g., Si, is initially deposited onto a thin film of a specific metal, e.g., Pt or Ni, on any inert substrate, e.g., SiO.sub.2 or Al.sub.2 O.sub.3, which is held at a temperature, e.g., 900.degree. C, above the eutectic point, i.e., 830.degree. C, of an intermetallic compound and the metallic film, and below the eutectic point, i.e., 979.degree. C, of another intermetallic compound and the semiconductor.Deposition of the semiconductor onto the metallic film produces a layer of liquid comprising the semiconductor and metal, which increases in thickness until the metallic layer is completely consumed. Additional deposition of the semiconductor produces a supersaturated liquid from which large crystallites of the intermetallic precipitate. With increasing deposition of semiconductor, the crystallites of intermetallic material continue to grow until they consume all of the metal in the liquid, at which point no liquid remains. Continuing deposition of semiconductor material results in the growth of filamentary crystallites of the semiconductor out of the intermetallic surface. The result is a columnar film of the semiconductor with a filamentary structure originating from the crystallites of intermetallic nucleating material.
    • 公开了通过使用掺入元素半导体的金属间化合物形成用于半导体膜的生长的成核层来制造薄元素半导体的方法,例如具有丝状结构的柱状晶粒的Si或Ge薄膜。 通过真空蒸发或化学气相沉积的技术,例如通过SiH 4的分解,从气相生长半导体。 半导体例如Si最初沉积在特定金属(例如Pt或Ni)的薄膜上,任何惰性基底上,例如SiO 2或Al 2 O 3,其保持在例如900℃以上的温度 共晶点,即830℃的金属间化合物和金属膜,低于另一种金属间化合物和半导体的共晶点,即979℃。