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1. 发明申请

US20230137731A1 CARBON COATED HYDROGEN FUEL CELL BIPOLAR PLATES 有权
公开(公告)号：US20230137731A1
公开(公告)日：2023-05-04
申请号：US17904232
申请日：2021-07-14
申请人： Nanofilm Technologies International Limited
发明人： Xu SHI , Zhi TANG
IPC分类号： H01M8/0213 , H01M8/0228 , H01M8/0206 , H01M8/021 , C23C14/02 , C23C14/06
摘要： A bipolar plate for a PEM hydrogen fuel cell is coated with a carbon-containing coating, the carbon-containing coating comprising in order: a) a titanium seed layer; b) a titanium nitride interfacial layer; and c) a a-C top layer, and wherein the bipolar plate is formed from stainless steel. Methods for making such coated plates are described. The a-C has a density of greater than 2.0 g/cm3, a molar hydrogen content of 5% or less, an sp2 carbon content of 40% to 80% and an sp3 carbon content of 20% to 60%. The coated plates possess good electrical conductivity and are resistant to corrosion.

2. 发明申请

US20230126038A1 METHOD FOR DECORATING A SUBSTRATE 有权
公开(公告)号：US20230126038A1
公开(公告)日：2023-04-27
申请号：US17938140
申请日：2022-10-05
申请人： Comadur SA
发明人： Jan LINTYMER , Alexis BOULMAY
IPC分类号： C23C14/02 , C23C16/02 , C23C14/58 , C23C16/56 , B44C3/00 , C25D5/00 , C25D5/48 , G03F7/16
摘要： A method for decorating a substrate which includes the succession of the following steps: provide the substrate; deposit a layer of a sacrificial material over a surface of the substrate; structure the sacrificial material layer so as to create in this sacrificial material layer a plurality of cavities to form a decorative or technical pattern; eliminate the sacrificial material layer except at the location where the pattern is provided.

3. 发明申请

US20230069946A1 LASER-CONTRASTED GOLF CLUB HEAD AND MANUFACTURING PROCESS 有权
公开(公告)号：US20230069946A1
公开(公告)日：2023-03-09
申请号：US18055204
申请日：2022-11-14
申请人： Acushnet Company
发明人： Stephanie LUTTRELL , Vincent S. JACOBSON , Kevin WOLFE
IPC分类号： A63B53/04 , C23C14/02
摘要： A golf club head having a laser-generated features to create contrast on the club face of the golf club head. The club face includes a central region, a toe region, and a heel region. The central region includes a first plurality of laser-generated features that provide a height-intersection coverage of the central region, a width-intersection coverage of the central region, and a surface-area coverage of the central region. The toe region includes a second plurality of laser-generated features that provide a height-intersection coverage of the toe region, a width-intersection coverage of the toe region, and a surface-area coverage of the toe region. The heel region includes a third plurality of laser-generated features that provide a height-intersection coverage of the heel region, a width-intersection coverage of the heel region, and a surface-area coverage of the heel region.

4. 发明授权

US11583935B2 Coated cutting tool 有权
公开(公告)号：US11583935B2
公开(公告)日：2023-02-21
申请号：US15560440
申请日：2016-03-25
申请人： TUNGALOY CORPORATION
发明人： Shigeki Tanaka
IPC分类号： B23B27/14 , C23C30/00 , C23C28/04 , C23C14/02 , B23B51/00 , B23C5/16 , C23C14/06
摘要： A coated cutting tool is provided which allows for satisfactory machining over a long period of time, particularly in the machining of difficult-to-machine materials with low thermal conductivity. The coated cutting tool includes a substrate and a coating layer formed on a surface of the substrate, wherein: at least one layer of the coating layer comprises a predetermined layer containing a compound having a composition represented by the formula: (AlXTi1-X)N [wherein x denotes an atomic ratio of the Al element based on a total of the Al element and the Ti element, and x satisfies 0.60≤x≤0.85]; a value of an orientation index TC (311) of a cubic (311) plane of the predetermined layer is from 2.5 or more to 4.2 or less; and an average thickness of the predetermined layer is from 1.0 μm or more to 12.0 μm or less.

5. 发明授权

US11561446B2 Fabrication of electrochromic devices 有权
公开(公告)号：US11561446B2
公开(公告)日：2023-01-24
申请号：US16806972
申请日：2020-03-02
申请人： View, Inc.
发明人： Sridhar Karthik Kailasam , Robin Friedman , Dane Thomas Gillaspie , Anshu A. Pradhan , Robert T. Rozbicki , Disha Mehtani
IPC分类号： G02F1/15 , G02F1/155 , G02F1/1524 , G02F1/1523 , H01B5/14 , H01B13/00 , G02F1/1333 , G02F1/153 , C23C14/34 , C23C14/02 , C23C14/06 , C23C14/08 , G02F1/13 , H01J37/34
摘要： Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 108 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

6. 发明授权

US11555237B1 System and method for vapor deposition of substrates with circular substrate frame that rotates in a planetary motion and curved lens support arms 有权
公开(公告)号：US11555237B1
公开(公告)日：2023-01-17
申请号：US16397877
申请日：2019-04-29
申请人： Quantum Innovations, Inc.
发明人： Norman L. Kester , Cliff J. Leidecker , John B. Glarum , Wade E. Nielson , Briant D. Walton
IPC分类号： C23C14/22 , C23C14/54 , G02B1/18 , C23C14/02 , C23C14/58 , G02B1/12 , G02B1/10 , C23C14/50
摘要： A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of sequentially ordered deposition chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A substrate fixture contains a substrate. The substrate fixture comprises a fixture frame. The fixture frame is defined by multiple circular members adjacently joined in a circular arrangement. Each circular member has a fixture frame opening sized to receive the substrate. Lens support arms may integrate into the circular members, extending in a curved disposition into the fixture frame opening to retain the substrate. A deposition method is also disclosed.

7. 发明申请

US20230009488A1 METHOD AND DEVICE FOR PRODUCING LAYERED NANOCARBON STRUCTURES 有权
公开(公告)号：US20230009488A1
公开(公告)日：2023-01-12
申请号：US17854612
申请日：2022-06-30
申请人： Lion Alternative Energy PLC
发明人： Kostas Liapis
IPC分类号： C01B32/28 , C23C14/02 , C23C14/06 , C23C14/35 , C01B32/26
摘要： Methods for producing layered nanocarbon structures placing a workpiece in a working chamber, applying a vacuum to the chamber, processing the workpiece surface with gas ions, applying a material sublayer to the workpiece surface, depositing carbon ions from a carbon plasma on the workpiece surface to apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface. The methods include irradiating the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a graphite sp2 carbon coating layer on the sp3 carbon coating layer and irradiating the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a linear chain and polymer sp1 carbon coating layer on the sp2 carbon coating layer.

8. 发明授权

US11542587B2 TiCN having reduced growth defects by means of HiPIMS 有权
公开(公告)号：US11542587B2
公开(公告)日：2023-01-03
申请号：US16095369
申请日：2017-04-21
申请人： Oerlikon Surface Solutions AG, Pfäffikon
发明人： Denis Kurapov , Siegfried Krassnitzer
IPC分类号： C23C14/00 , H01J37/34 , C23C14/02 , C23C14/35 , C23C14/06 , C23C14/34
摘要： A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas; preferably argon, and at least nitrogen gas as the reactive gas, wherein: the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferably CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere having only nitrogen gas as the reactive gas, wherein the Ti targets are preferably operated by means of a first power supply device or a first power supply unit and the graphite targets are operated with pulsed power by means of a second power supply device or a second power supply unit.

9. 发明申请

US20220396865A1 SPUTTER DEPOSITION APPARATUS AND METHOD 有权
公开(公告)号：US20220396865A1
公开(公告)日：2022-12-15
申请号：US17776709
申请日：2020-11-10
申请人： Dyson Technology Limited
发明人： Michael Edward RENDALL , Robert Ian Joseph GRUAR
IPC分类号： C23C14/02 , C23C14/54 , C23C14/50
摘要： Certain examples described herein relate to a sputter deposition apparatus including a guiding member to guide a substrate in a conveyance direction, a plasma source to generate a plasma, and a magnet arrangement. The magnet arrangement is configured to confine the plasma within the apparatus to a pre-treatment zone, within which the substrate is exposed to the plasma in use. The magnet arrangement is also configured to confine the plasma within the apparatus to a sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of a target material to the substrate in use. The pre-treatment and sputter deposition zones are disposed about the guiding member.

10. 发明申请

US20220389560A1 Method for Producing a Coating 有权
公开(公告)号：US20220389560A1
公开(公告)日：2022-12-08
申请号：US17775437
申请日：2020-11-06
申请人： Oerikon Surface Solutions AG, Pfäffikon
发明人： Mathias Maier , Othmar Zueger
IPC分类号： C23C14/00 , C23C14/02 , C23C14/14 , C23C16/00 , C23C16/30
摘要： The invention relates to a method of forming a coating for deposition to non-metallic surfaces, comprising the steps of applying (120) a semiconductor material to a substrate to form a semiconductor material layer and simultaneously or subsequently applying (140) metallic material or additional semiconductor material, wherein the metallic material or additional semiconductor material is introduced into the semiconductor material layer in a targeted manner to tailor the optical properties of the coating.

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