会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • System and method for self alignment of pad mask
    • 垫面罩自身对准的系统和方法
    • US08997026B1
    • 2015-03-31
    • US13470080
    • 2012-05-11
    • Jason Sweis
    • Jason Sweis
    • G06F17/50
    • G06F17/5068G03F1/70
    • A system and method provide semiconductor fabrication mask creation techniques that align the device features patterned with a first core mask with one or more pad features patterned with a subsequent pad mask. Shapes representing the pad features may be included in the core mask by reducing on all sides, the shape of the pad feature in the core mask by the width of the spacer material. A pad mask then may be created to include a shape of the pad feature that may overlap a portion of the spacer material pattern created by the shape of the pad feature in the core mask. Data sets may be generated from a circuit design to create the masks that may be fabricated with the described techniques.
    • 系统和方法提供半导体制造掩模创建技术,其将图案化的设备特征与第一核心掩模对准,其中一个或多个衬垫特征与随后的衬垫掩模图案化。 代表焊盘特征的形状可以通过减少所有侧面,将芯掩模中的焊盘特征的形状减小到间隔物材料的宽度来包括在芯掩模中。 然后可以创建焊盘掩模以包括可以与由芯掩模中的焊盘特征的形状产生的间隔材料图案的一部分重叠的焊盘特征的形状。 可以从电路设计产生数据集以创建可以用所述技术制造的掩模。