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61. 发明申请

US20160260576A1 Method and System for Reducing Charging Artifacts in Scanning Electron Microscopy Images 有权
标题翻译：扫描电子显微镜图像中减少充电装置的方法和系统
公开(公告)号：US20160260576A1
公开(公告)日：2016-09-08
申请号：US15058062
申请日：2016-03-01
申请人： KLA-Tencor Corporation
发明人： Christopher Sears , Ben Clarke
IPC分类号： H01J37/22 , H01J37/28 , H01J37/153 , H01J37/26
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/004 , H01J2237/153 , H01J2237/226
摘要： A scanning electron microscopy apparatus for mitigating charging artifacts includes a scanning electron microscopy sub-system for acquiring multiple images from a sample. The images include one or more sets of complimentary images. The one or more sets of complimentary images include a first image acquired along a first scan direction and a second image acquired along a second scan direction opposite to the first scan direction. The apparatus includes a controller communicatively coupled to the scanning electron microscopy sub-system. The controller is configured to receive images of the sample from the scanning electron microscopy sub-system. The controller is further configured to generate a composite image by combining the one or more sets of complimentary images.
摘要翻译：用于减轻充电伪像的扫描电子显微镜装置包括用于从样品获取多个图像的扫描电子显微镜子系统。图像包括一组或多组互补图像。一组或多组互补图像包括沿着第一扫描方向获取的第一图像和沿着与第一扫描方向相反的第二扫描方向获取的第二图像。该装置包括通信地耦合到扫描电子显微镜子系统的控制器。控制器被配置为从扫描电子显微镜子系统接收样品的图像。控制器还被配置为通过组合一组或多组互补图像来生成合成图像。

62. 发明授权

US09437394B1 Method of operating a charged particle microscope and charged particle microscope operating according to such method 有权
标题翻译：根据这种方法操作带电粒子显微镜和带电粒子显微镜的方法
公开(公告)号：US09437394B1
公开(公告)日：2016-09-06
申请号：US14228391
申请日：2014-03-28
申请人： Carl Zeiss Microscopy GmbH , Carl Zeiss Microscopy Ltd.
发明人： Simon Diemer , Janina Schulz , Emanuel Heindl , David Roddom
IPC分类号： G01N23/00 , H01J37/21 , H01J37/26
CPC分类号： H01J37/21 , H01J37/222 , H01J37/263 , H01J2237/153 , H01J2237/21 , H01J2237/216
摘要： A method of operating a charged particle microscope comprises: providing settings of a focus, an x-stigmator and an y-stigmator of the charged particle microscope; and then repeatedly performing adjusting the charged particle microscope to the settings, recording an image of an object using the settings, determining a sharpness measure from the recorded image, and changing at least one of the settings of the focus, the x-stigmator and the y-stigmator based on the sharpness measure until a stop criterion is fulfilled. Herein, the determining of the sharpness measure comprises: determining an orientation of an intensity gradient at each of a plurality of locations within one of the recorded image and a processed image generated by processing the recorded image, and determining the sharpness measure based on the plurality of determined orientations.
摘要翻译：操作带电粒子显微镜的方法包括：提供带电粒子显微镜的焦点，x-标示器和y-标示符的设置; 然后重复执行调整带电粒子显微镜的设置，使用设置记录对象的图像，从所记录的图像确定锐度度量，并且改变焦点的设置中的至少一个，x标记符和基于锐度测量的y-stigmator直到达到停止标准。这里，清晰度测量的确定包括：确定记录图像之一内的多个位置中的每个位置处的强度梯度的方向和通过处理记录图像而生成的处理图像，以及基于多个确定的方向。

63. 发明授权

US09312093B1 Particle beam device comprising an electrode unit 有权
标题翻译：粒子束装置包括电极单元
公开(公告)号：US09312093B1
公开(公告)日：2016-04-12
申请号：US14321921
申请日：2014-07-02
申请人： Carl Zeiss Microscopy GmbH
发明人： Joerg Fober , Edgar Fichter , Kai Schubert , Dirk Preikszas , Christian Hendrich , Momme Mommsen , Michael Schnell , Lorenz Lechner
IPC分类号： H01J37/26 , H01J37/147
CPC分类号： H01J37/1471 , H01J37/24 , H01J37/26 , H01J2237/0266 , H01J2237/032 , H01J2237/1504 , H01J2237/153
摘要： A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.
摘要翻译：粒子束装置包括用于产生具有带电粒子的粒子束的束发生器和具有第一电极和第二电极的电极单元，其中第一电极与第二电极相互作用，特别是用于引导，成形，对准或校正粒子束。此外，粒子束装置包括使用电连接与第一电极和第二电极中的至少一个连接的低通滤波器。另外，粒子束装置包括具有用于粒子束通过的开口的安装单元，其中至少一个低通滤波器，第一电极和第二电极布置在安装单元处。电极单元可以包括多于两个电极，例如多达16个电极。

64. 发明申请

US20140138542A1 SCANNING ELECTRON MICROSCOPE AND SCANNING TRANSMISSION ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜和扫描传输电子显微镜
公开(公告)号：US20140138542A1
公开(公告)日：2014-05-22
申请号：US14232526
申请日：2012-07-19
申请人： Hiromi Inada , Kuniyasu Nakamura
发明人： Hiromi Inada , Kuniyasu Nakamura
IPC分类号： H01J37/26 , H01J37/28
CPC分类号： H01J37/263 , G01N23/2206 , H01J37/153 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0455 , H01J2237/0492 , H01J2237/153 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/225 , H01J2237/226 , H01J2237/24475 , H01J2237/2448 , H01J2237/2611 , H01J2237/2802
摘要： A scanning transmission electron microscope according to the present invention includes an electron lens system having a small spherical aberration coefficient for enabling three-dimensional observation of a 0.1 nm atomic size structure. The scanning transmission electron microscope according to the present invention also includes an aperture capable of changing an illumination angle; an illumination electron lens system capable of changing the probe size of an electron beam probe and the illumination angle; a secondary electron detector (9); a transmission electron detector (13); a forward scattered electron beam detector (12); a focusing unit (16); an image processor for identifying image contrast; an image processor for computing image sharpness; a processor for three-dimensional reconstruction of an image; and a mixer (18) for mixing a secondary electron signal and a specimen forward scattered electron signal.
摘要翻译：根据本发明的扫描透射电子显微镜包括具有小球面像差系数的电子透镜系统，用于实现0.1nm原子尺寸结构的三维观察。根据本发明的扫描透射电子显微镜还包括能够改变照明角度的孔; 能够改变电子束探头的探头尺寸和照明角度的照明电子透镜系统; 二次电子检测器（9）; 透射电子检测器（13）; 前向散射电子束检测器（12）; 聚焦单元（16）; 用于识别图像对比度的图像处理器; 用于计算图像清晰度的图像处理器; 用于图像的三维重建的处理器; 以及用于混合二次电子信号和样本前向散射电子信号的混合器（18）。

65. 发明申请

US20130300854A1 CHARGED PARTICLE MICROSCOPE AND MEASUREMENT IMAGE CORRECTION METHOD THEREOF 有权
标题翻译：充电颗粒显微镜及其测量图像校正方法
公开(公告)号：US20130300854A1
公开(公告)日：2013-11-14
申请号：US13981326
申请日：2011-11-02
申请人： Shuangqi Dong , Norio Sato , Susumu Koyama
发明人： Shuangqi Dong , Norio Sato , Susumu Koyama
IPC分类号： H04N5/217
CPC分类号： H04N5/217 , H01J37/222 , H01J37/26 , H01J2237/153
摘要： A charged particle microscope corrects distortion in an image caused by effects of drift in the sampling stage by measuring the correction reference image in a shorter time than the observation image, making corrections by comparing the shape of the observation image with the shape of the correction reference image, and reducing distortion in the observation images. The reference image for distortion correction is measured at the same position and magnification as when acquiring images for observation. In order to reduce effects from drift, the reference image is at this time measured within a shorter time than the essential observation image. The shape of the observation image is corrected by comparing the shapes of the reference image and observation image, and correcting the shape of the observation image to match the reference image.
摘要翻译：带电粒子显微镜通过在比观察图像更短的时间内测量校正参考图像来校正由采样阶段的漂移效应引起的图像中的失真，通过将观察图像的形状与校正基准的形状进行比较来进行校正图像，减少观察图像的失真。与获取观察图像时相同的位置和倍率测量用于失真校正的参考图像。为了减少漂移的影响，此时在比基本观察图像更短的时间内测量参考图像。通过比较参考图像和观察图像的形状以及校正观察图像的形状以匹配参考图像来校正观察图像的形状。

66. 发明授权

US08378299B2 Twin beam charged particle column and method of operating thereof 有权
标题翻译：双束带电粒子柱及其操作方法
公开(公告)号：US08378299B2
公开(公告)日：2013-02-19
申请号：US13045068
申请日：2011-03-10
申请人： Jürgen Frosien
发明人： Jürgen Frosien
IPC分类号： G01B15/00
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/04756 , H01J2237/1514 , H01J2237/153 , H01J2237/24465 , H01J2237/24592 , H01J2237/2817
摘要： A column for a charged particle beam device is described. The column includes a charged particle emitter for emitting a primary charged particle beam as one source of the primary charged particle beam; a biprism adapted for acting on the primary charged particle beam so that two virtual sources are generated; and a charged particle beam optics adapted to focus the charged particle beam simultaneously on two positions of a specimen corresponding to images of the two virtual sources.
摘要翻译：描述带电粒子束装置的柱。该柱包括用于发射初级带电粒子束作为初级带电粒子束的一个源的带电粒子发射器; 适于作用于初级带电粒子束的双棱镜，从而产生两个虚拟源; 以及带电粒子束光学器件，其适于将带电粒子束同时聚焦在对应于两个虚拟源的图像的样本的两个位置上。

67. 发明申请

US20120217393A1 Electron Microscope 有权
标题翻译：电子显微镜
公开(公告)号：US20120217393A1
公开(公告)日：2012-08-30
申请号：US13505951
申请日：2010-11-01
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H01J37/26
CPC分类号： H01J37/04 , H01J37/026 , H01J37/14 , H01J37/145 , H01J37/153 , H01J37/28 , H01J2237/004 , H01J2237/0044 , H01J2237/121 , H01J2237/153
摘要： A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.
摘要翻译：扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

68. 发明授权

US07663102B2 High current density particle beam system 有权
标题翻译：高电流密度粒子束系统
公开(公告)号：US07663102B2
公开(公告)日：2010-02-16
申请号：US10593246
申请日：2005-02-17
申请人： Juergen Frosien
发明人： Juergen Frosien
IPC分类号： H01J37/09
CPC分类号： H01J37/09 , H01J2237/0453 , H01J2237/153
摘要： The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.
摘要翻译：本发明涉及带电粒子束装置。这些装置包括用于发射带电粒子的发射器; 具有至少两个孔的孔布置，用于将发射的带电粒子分离成至少两个独立的带电粒子束; 以及用于聚焦至少两个独立带电粒子束的物镜，由此独立带电粒子束聚焦到焦平面内的相同位置上。

69. 发明授权

US07605381B2 Charged particle beam alignment method and charged particle beam apparatus 有权
公开(公告)号：US07605381B2
公开(公告)日：2009-10-20
申请号：US10734261
申请日：2003-12-15
申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： H01L21/027
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

70. 发明授权

US07405402B1 Method and apparatus for aberration-insensitive electron beam imaging 有权
标题翻译：用于像差不敏感电子束成像的方法和装置
公开(公告)号：US07405402B1
公开(公告)日：2008-07-29
申请号：US11360930
申请日：2006-02-22
申请人： Srinivas Vedula , Amir Azordegan , Laurence Hordon , Alan D. Brodie , Gian Francesco Lorusso , Takuji Tada
发明人： Srinivas Vedula , Amir Azordegan , Laurence Hordon , Alan D. Brodie , Gian Francesco Lorusso , Takuji Tada
IPC分类号： G01N23/00 , G21K7/00 , H01J3/14
CPC分类号： G01N23/04 , H01J37/21 , H01J37/28 , H01J2237/0492 , H01J2237/153 , H01J2237/2817
摘要： One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及用于衬底表面的自动成像的电子束装置。电子源被配置为发射电子，并且枪形透镜被配置为聚焦由电子源发射的电子以形成电子束。聚光透镜系统被配置为接收电子束并且将其数值孔径减小到超低数值孔径。物镜被配置为将超低数值孔径光束聚焦到衬底表面上。还公开了其他实施例。

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