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1. 发明公开

US20230282442A1 GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTICLE BEAM APPARATUS HAVING A GAS SUPPLY DEVICE 审中-公开
公开(公告)号：US20230282442A1
公开(公告)日：2023-09-07
申请号：US18079074
申请日：2022-12-12
申请人： Carl Zeiss Microscopy GmbH
发明人： Andreas Schmaunz , Gero Walter , Bernd Stenke , Gerald Schmid
IPC分类号： H01J37/16 , H01J37/10
CPC分类号： H01J37/16 , H01J37/10 , H01J2237/006 , H01J2237/0492 , H01J2237/166
摘要： The invention relates to a gas reservoir (3000) for receiving a precursor (3035). The gas reservoir (3000) has a gas-receiving unit (3004) which is arranged in a first receiving unit (3002) of a basic body (3001), and a sliding unit (3007) which is arranged movably in a second receiving unit (3003) of the basic body (3001). The gas-receiving unit (3004) has a movable closure unit (3006) for opening or closing a gas outlet opening (3005) of the gas-receiving unit (3004). In a first position of the sliding unit (3007), both a first opening (3009) of a sliding-unit line device (3008) is fluidically connected to a first basic body opening (3011) and a second opening (3010) of the sliding-unit line device (3008) is fluidically connected to a second basic body opening (3012). In the second position of the sliding unit (3007), both the first opening (3009) is arranged at an inner wall (3015) of the second receiving unit (3003) and the second opening (3010) is arranged at the movable closure unit (3006).

2. 发明授权

US11749495B2 Bandpass charged particle energy filtering detector for charged particle tools 有权
公开(公告)号：US11749495B2
公开(公告)日：2023-09-05
申请号：US17494784
申请日：2021-10-05
申请人： KLA Corporation
发明人： Youfei Jiang , Michael Steigerwald
IPC分类号： H01J37/244 , H01J37/28 , H01J37/05 , H01J37/147
CPC分类号： H01J37/244 , H01J37/05 , H01J37/1471 , H01J37/28 , H01J2237/0492 , H01J2237/2448 , H01J2237/24475
摘要： Methods and systems for detecting charged particles from a specimen are provided. One system includes a first repelling mesh configured to repel charged particles from a specimen having an energy lower than a first predetermined energy and a second repelling mesh configured to repel the charged particles that pass through the first repelling mesh and have an energy that is lower than a second predetermined energy. The system also includes a first attracting mesh configured to attract the charged particles that pass through the first repelling mesh, are repelled by the second repelling mesh, and have an energy that is higher than the first predetermined energy and lower than the second predetermined energy. The system further includes a first detector configured to generate output responsive to the charged particles that pass through the first attracting mesh.

3. 发明授权

US09799485B2 Particle beam system and method for operating a particle optical unit 有权
公开(公告)号：US09799485B2
公开(公告)日：2017-10-24
申请号：US14730505
申请日：2015-06-04
申请人： Carl Zeiss Microscopy GmbH
发明人： Ingo Mueller , Nicole Bengesser , Christof Riedesel , Thomas Kemen , Joerg Jacobi , Arne Thoma , Markus Doering , Dirk Zeidler , Juergen Kynast , Gerd Benner
IPC分类号： H01J37/21 , H01J37/10 , H01J37/28
CPC分类号： H01J37/21 , H01J37/10 , H01J37/28 , H01J2237/0435 , H01J2237/0492 , H01J2237/28 , H01J2237/31764 , H01J2237/31774
摘要： A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

4. 发明授权

US09646805B2 Focused ion beam system and method of making focal adjustment of ion beam 有权
公开(公告)号：US09646805B2
公开(公告)日：2017-05-09
申请号：US14533494
申请日：2014-11-05
申请人： JEOL Ltd.
发明人： Tomohiro Mihira
IPC分类号： H01J37/28 , H01J37/153 , H01J37/304 , H01J37/21 , H01J37/30
CPC分类号： H01J37/304 , H01J37/21 , H01J37/28 , H01J37/3005 , H01J2237/0492 , H01J2237/08 , H01J2237/10 , H01J2237/21 , H01J2237/216 , H01J2237/2448 , H01J2237/30472 , H01J2237/31749
摘要： A focused ion beam system is offered which can make a focal adjustment without relying on the structure of a sample while suppressing damage to the sample to a minimum. Also, a method of making this focal adjustment is offered. The focused ion beam system has an ion source for producing an ion beam, a lens system for focusing the beam onto the sample, a detector for detecting secondary electrons emanating from the sample, and a controller for controlling the lens system. The controller is operative to provide control such that the sample is irradiated with the ion beam without scanning the beam and that a focus of the ion beam is varied by varying the intensity of the objective lens during the ion beam irradiation. Also, the controller measures the intensity of a signal indicating secondary electrons emanating from the sample while the intensity of the objective lens is being varied. Furthermore, the controller makes a focal adjustment of the ion beam on the basis of the intensity of the objective lens obtained when the measured intensity of the signal indicating secondary electrons is minimal.

5. 发明申请

US20170025243A1 Apparatus of Plural Charged-Particle Beams 审中-公开
标题翻译：多次充电粒子束装置
公开(公告)号：US20170025243A1
公开(公告)日：2017-01-26
申请号：US15216258
申请日：2016-07-21
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/10 , H01J37/06
CPC分类号： H01J37/1474 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/1478 , H01J37/28 , H01J2237/024 , H01J2237/0453 , H01J2237/0492 , H01J2237/103 , H01J2237/1205 , H01J2237/1516 , H01J2237/1534 , H01J2237/1536
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
摘要翻译：提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点上。使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

6. 发明申请

US20150357157A1 PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE OPTICAL UNIT 有权
标题翻译：粒子束系统和操作颗粒光单元的方法
公开(公告)号：US20150357157A1
公开(公告)日：2015-12-10
申请号：US14730505
申请日：2015-06-04
申请人： Carl Zeiss Microscopy GmbH
发明人： Ingo Mueller , Nicole Bengesser , Christof Riedesel , Thomas Kemen , Joerg Jacobi , Arne Thoma , Markus Doering , Dirk Zeidler , Juergen Kynast , Gerd Benner
IPC分类号： H01J37/21 , H01J37/26 , H01J37/10
CPC分类号： H01J37/21 , H01J37/10 , H01J37/28 , H01J2237/0435 , H01J2237/0492 , H01J2237/28 , H01J2237/31764 , H01J2237/31774
摘要： A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.
摘要翻译：用于操作多光束粒子光学单元的方法包括提供粒子 - 光学部件的效果的第一设置，其中粒子 - 光学成像可以通过至少两个参数来表征。该方法还包括确定矩阵A和确定矩阵S.该方法还包括定义表征期望成像的参数值，以及以这样的方式提供组件的效果的第二设置，使得粒子光学成像可以通过具有定义值的参数来表征。

7. 发明申请

US20150340201A1 APPARATUS AND METHOD OF APPLYING SMALL-ANGLE ELECTRON SCATTERING TO CHARACTERIZE NANOSTRUCTURES ON OPAQUE SUBSTRATE 有权
标题翻译：将小角度电子散射应用于特征基片上的纳米结构的装置和方法
公开(公告)号：US20150340201A1
公开(公告)日：2015-11-26
申请号：US14720122
申请日：2015-05-22
申请人： Industrial Technology Research Institute
发明人： Wen-Li Wu , Yun-San Chien , Wei-En Fu , Yen-Song Chen , Hsin-Chia Ho
IPC分类号： H01J37/29 , H01J37/147 , H01J37/145 , H01J37/06
CPC分类号： H01J37/29 , G01N23/20058 , H01J37/04 , H01J37/06 , H01J37/145 , H01J37/295 , H01J2237/0492 , H01J2237/255
摘要： An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.
摘要翻译：提供了一种用于反射或后向散射模式的小角度电子束散射测量的装置和方法。该装置包括电子源，样品前的电子准直光学器件，样品后的电子投影光学器件，能够保持样品的样品台，以及电子检测器模块。从源发射的电子被准直并定位成将纳米结构撞击在样品上。由撞击电子和纳米结构之间的相互作用产生的信号被电子投影光学器件进一步放大，以在由电子检测器模块记录之前达到足够的角度分辨率。

8. 发明授权

US09018581B2 Transmission electron microscope 有权
标题翻译：透射电子显微镜
公开(公告)号：US09018581B2
公开(公告)日：2015-04-28
申请号：US13757939
申请日：2013-02-04
申请人： JEOL Ltd.
发明人： Kazuya Omoto
IPC分类号： H01J37/10 , H01J37/153 , H01J37/05 , H01J37/04 , H01J37/26
CPC分类号： H01J37/10 , H01J37/04 , H01J37/05 , H01J37/153 , H01J37/26 , H01J2237/0492 , H01J2237/057 , H01J2237/1532
摘要： A transmission electron microscope (100) includes an electron beam source (2), an illumination lens (10), an objective lens (20), an intermediate lens system (30), a pair of transfer lenses (40) located behind the intermediate lens system (30), and an energy filter (60) for separating the electrons of the beam L transmitted through the specimen (S) according to energy. The transfer lenses (40) transfer the first image to the entrance crossover plane (S1) of the energy filter (60) and to transfer the second image to the entrance image plane (A1) of the filter (60). An image plane (A3) is formed between the first transfer lens (40a) and the second transfer lens (40b).
摘要翻译：透射电子显微镜（100）包括电子束源（2），照明透镜（10），物镜（20），中间透镜系统（30），位于中间的后面的一对转印透镜透镜系统（30）和能量过滤器（60），用于根据能量分离透过样本（S）的光束L的电子。传送透镜（40）将第一图像传送到能量过滤器（60）的入口交叉平面（S1），并将第二图像传送到过滤器（60）的入射图像平面（A1）。在第一转印透镜（40a）和第二转印透镜（40b）之间形成像平面（A3）。

9. 发明申请

US20140145089A1 APPARATUS HAVING A MAGNETIC LENS CONFIGURED TO DIVERGE AN ELECTRON BEAM 有权
标题翻译：具有配置为分散电子束的磁性镜头的装置
公开(公告)号：US20140145089A1
公开(公告)日：2014-05-29
申请号：US14171357
申请日：2014-02-03
申请人： Micron Technology, Inc.
发明人： Shixin WANG
IPC分类号： H01J37/14 , H01J29/64
CPC分类号： H01J37/14 , H01J29/64 , H01J37/09 , H01J37/153 , H01J37/28 , H01J2237/045 , H01J2237/0492 , H01J2237/103 , H01J2237/1405 , H01J2237/1534
摘要： Apparatus having a magnetic lens configured to diverge an electron beam are useful in three-dimensional imaging using an electron microscope. The magnetic lens includes a body member having a core and defining a gap, and a winding surrounding a portion of the core. The body member and winding are configured such that an electrical current through the winding produces a magnetic field proximate to the gap.
摘要翻译：具有配置成发散电子束的磁性透镜的装置在使用电子显微镜的三维成像中是有用的。磁性透镜包括具有芯并限定间隙的主体部件和围绕芯部的一部分的绕组。身体构件和绕组被配置成使得通过绕组的电流产生靠近间隙的磁场。

10. 发明授权

US08653485B2 Projection lens arrangement 有权
标题翻译：投影镜头布置
公开(公告)号：US08653485B2
公开(公告)日：2014-02-18
申请号：US13397814
申请日：2012-02-16
申请人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
发明人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
IPC分类号： H01J37/10 , H01J37/147 , H01J37/30
CPC分类号： H01J37/10 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/1471 , H01J37/1478 , H01J37/30 , H01J37/3007 , H01J37/3177 , H01J2237/0437 , H01J2237/0492
摘要： The invention relates to a charged particle multi-beamlet lithographic system for exposing a target using a plurality of beamlets. The system comprises a beamlet generator for generating a plurality of beamlets, a beamlet blanker for controllably blanking beamlets, and an array of projection lens systems for projecting unblanked beamlets on to the surface of the target. The beamlet generator comprises at least one charged particle source for generating a charged particle beam, a sub-beam generator for defining a plurality of sub-beams from the charged particle beam, a sub-beam manipulator array for influencing the sub-beams, and an aperture array for defining beamlets from the sub-beams.
摘要翻译：本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束光刻系统。该系统包括用于产生多个子束的子波发生器，用于可控制地遮挡子束的子束消除器，以及用于将未平坦化的子束投影到目标表面上的投影透镜系统的阵列。小波发生器包括用于产生带电粒子束的至少一个带电粒子源，用于从带电粒子束定义多个子光束的子光束发生器，用于影响子光束的子光束操纵器阵列，以及用于从子光束定义子束的孔径阵列。

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