专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US11735398B2 Plasma flood gun for charged particle apparatus 有权
公开(公告)号：US11735398B2
公开(公告)日：2023-08-22
申请号：US17222431
申请日：2021-04-05
申请人： PIE Scientific LLC
发明人： Ximan Jiang
IPC分类号： H01J37/32 , H01J37/317
CPC分类号： H01J37/32706 , H01J37/32357 , H01J37/32871 , H01J37/3174 , H01J2237/153 , H01J2237/184
摘要： A method for altering surface charge on an insulating surface of a first sample includes generating first plasma inside a plasma source, causing the first plasma to diffuse into a first vacuum chamber to generate second downstream plasma, immersing the first sample in the second downstream plasma, and applying a first bias voltage to a conductive layer of the first sample, or applying a first bias voltage to a metal holder that holds the first sample.

2. 发明申请

US20180366295A1 Distortion Correction Method and Electron Microscope 审中-公开
公开(公告)号：US20180366295A1
公开(公告)日：2018-12-20
申请号：US16012057
申请日：2018-06-19
申请人： JEOL Ltd.
发明人： Shigeyuki Morishita
IPC分类号： H01J37/153 , H01J37/22 , H01J37/14 , H01J37/28
CPC分类号： H01J37/153 , H01J37/14 , H01J37/226 , H01J37/28 , H01J37/302 , H01J2237/153 , H01J2237/1534 , H01J2237/24585 , H01J2237/2802
摘要： There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.

3. 发明授权

US09362084B2 Electro-optical element for multiple beam alignment 有权
标题翻译：用于多光束对准的电光元件
公开(公告)号：US09362084B2
公开(公告)日：2016-06-07
申请号：US13458936
申请日：2012-04-27
申请人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
发明人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/708 , G03F7/70825 , G03F7/70975 , H01J37/3174 , H01J37/3177 , H01J2237/024 , H01J2237/03 , H01J2237/0437 , H01J2237/1502 , H01J2237/153
摘要： The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
摘要翻译：本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

4. 发明授权

US08344320B2 Electron microscope with electron spectrometer 失效
标题翻译：电子显微镜用电子光谱仪
公开(公告)号：US08344320B2
公开(公告)日：2013-01-01
申请号：US12985708
申请日：2011-01-06
申请人： Shohei Terada , Yoshihumi Taniguchi , Kazutoshi Kaji
发明人： Shohei Terada , Yoshihumi Taniguchi , Kazutoshi Kaji
IPC分类号： H01J37/147 , H01J37/28 , G01N23/02 , G21K5/04
CPC分类号： H01J37/26 , H01J37/05 , H01J37/224 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/10 , H01J2237/153 , H01J2237/24485 , H01J2237/2485 , H01J2237/30433
摘要： A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.
摘要翻译：通过使用激励电流的参数设计方法，通过模拟来确定多透镜的最佳条件，调整透镜电子显微镜的电子光谱仪的多个多极透镜的透镜调整方法和透镜调整系统的多极镜头作为参数。

5. 发明授权

US08309936B2 Ion deflector for two-dimensional control of ion beam cross sectional spread 有权
标题翻译：离子导流板二维控制离子束横截面扩展
公开(公告)号：US08309936B2
公开(公告)日：2012-11-13
申请号：US12708886
申请日：2010-02-19
申请人： Holger Kreckel , Hjalmar Bruhns , Daniel Wolf Savin
发明人： Holger Kreckel , Hjalmar Bruhns , Daniel Wolf Savin
IPC分类号： H01J3/34
CPC分类号： H01J37/1472 , H01J2237/151 , H01J2237/153
摘要： An ion deflector, for deflecting a beam of charged particles along an arc in a deflection plane, includes a pair of non-spherical deflection electrodes adapted for being charged with different voltages. The pair of deflection electrodes are configured to control, in both the deflection plane and in a direction perpendicular to the deflection plane, a cross sectional spread of charged particles in a deflected beam that exits the ion deflector. In some embodiments, a first electrode has a first height perpendicular to the deflection plane and a second electrode has a different second height.
摘要翻译：用于沿着偏转平面中的电弧偏转带电粒子束的离子偏转器包括一对适于用不同电压充电的非球面偏转电极。一对偏转电极被配置为在偏转平面和垂直于偏转平面的方向上控制带电粒子在离开离子偏转器的偏转光束中的横截面扩展。在一些实施例中，第一电极具有垂直于偏转平面的第一高度，而第二电极具有不同的第二高度。

6. 发明授权

US07888641B2 Electron microscope with electron spectrometer 有权
标题翻译：电子显微镜用电子光谱仪
公开(公告)号：US07888641B2
公开(公告)日：2011-02-15
申请号：US12183726
申请日：2008-07-31
申请人： Shohei Terada , Yoshihumi Taniguchi , Kazutoshi Kaji
发明人： Shohei Terada , Yoshihumi Taniguchi , Kazutoshi Kaji
IPC分类号： H01J37/05 , H01J37/147
CPC分类号： H01J37/26 , H01J37/05 , H01J37/224 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/10 , H01J2237/153 , H01J2237/24485 , H01J2237/2485 , H01J2237/30433
摘要： A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.
摘要翻译：通过使用激励电流的参数设计方法，通过模拟来确定多透镜的最佳条件，调整透镜电子显微镜的电子光谱仪的多个多极透镜的透镜调整方法和透镜调整系统的多极镜头作为参数。

7. 发明申请

US20100181480A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20100181480A1
公开(公告)日：2010-07-22
申请号：US12688095
申请日：2010-01-15
申请人： Tomokazu SHIMAKURA , Masaki HASEGAWA
发明人： Tomokazu SHIMAKURA , Masaki HASEGAWA
IPC分类号： G01N23/225
CPC分类号： H01J37/026 , H01J37/04 , H01J37/20 , H01J37/28 , H01J2237/0455 , H01J2237/153 , H01J2237/1536 , H01J2237/2008
摘要： According to the present invention, a charged particle beam device has an unlimitedly rotatable sample stage and an electric field control electrode for correcting electric field distortion at a sample peripheral part. A voltage is applied to a sample on the unlimitedly rotatable sample stage through a retarding electrode that is in contact with a holder receiver at a rotation center of a rotary stage. An equipotential plane on the electric field control electrode is varied by applying a voltage to the electric field control electrode, and following this the equipotential plane at a sample edge is corrected, which enables the sample to be observed as far as its edge.
摘要翻译：根据本发明，带电粒子束装置具有无限旋转的样品台和用于校正样品周边部分的电场失真的电场控制电极。通过在旋转台的旋转中心处与保持器接收器接触的延迟电极将电压施加到无限可旋转的样品台上的样品。通过向电场控制电极施加电压来改变电场控制电极上的等电位面，并且在此之后校正样品边缘处的等电位面，使得可以将样品观察到其边缘。

8. 发明授权

US07705328B2 Broad ribbon beam ion implanter architecture with high mass-energy capability 有权
标题翻译：具有高质量能量能力的宽带束离子注入架构
公开(公告)号：US07705328B2
公开(公告)日：2010-04-27
申请号：US11932117
申请日：2007-10-31
申请人： Shu Satoh , Manny Sieradzki
发明人： Shu Satoh , Manny Sieradzki
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/045 , H01J2237/057 , H01J2237/153
摘要： A ribbon ion beam system, comprising an ion source configured to generate a ribbon ion beam along a first beam path, wherein the ribbon ion beam enters a mass analysis magnet having a height dimension (h1) and a long dimension (w1) that is perpendicular to an xy plane, wherein the mass analysis magnet is configured with its momentum dispersive xy plane to receive the ribbon ion beam and to provide magnetic fields to transmit the ribbon ion beam along a second beam path, wherein the ribbon ion beam exiting the mass analysis magnet is divergent in the non-dispersive xz plane and convergent in the xy plane, a mass selection slit for receiving the divergent ribbon ion beam and selecting desired ion species of the ribbon ion beam exiting the mass analysis magnet, an angle correction device configured to receive the divergent ribbon ion beam exiting the mass selection slit into a parallel ribbon ion beam in the horizontal xz plane and a diverging ribbon ion beam in an xy plane along a third beam path, and wherein the parallel ribbon beam has a variable height (h2) and a long dimension, width (w2).
摘要翻译：一种带状离子束系统，包括被配置为沿着第一光束路径产生带状离子束的离子源，其中所述带状离子束进入具有垂直于所述第一光束路径的高度尺寸（h1）和长尺寸（w1）的质量分析磁体其中所述质量分析磁体被配置有其动量分散xy平面以接收带状离子束并且提供磁场以沿着第二光束路径透射带状离子束，其中离开质量分析的带状离子束磁体在非分散xz平面中发散并且在xy平面中收敛，质量选择狭缝用于接收发散带状离子束并选择离开质量分析磁体的带离子束的期望离子种类，角度校正装置被配置为将离开质量选择狭缝的发散带状离子束接收在水平xz平面中的平行带状离子束中，并沿着第三层在xy平面中分散带状离子束光束路径，并且其中所述平行带状束具有可变高度（h2）和长尺寸宽度（w2）。

9. 发明申请

US20090108198A1 BROAD RIBBON BEAM ION IMPLANTER ARCHITECTURE WITH HIGH MASS-ENERGY CAPABILITY 有权
标题翻译：具有高能量能力的BROAD RIBBON BEAM离子植绒建筑
公开(公告)号：US20090108198A1
公开(公告)日：2009-04-30
申请号：US11932117
申请日：2007-10-31
申请人： Shu Satoh , Manny Sieradzki
发明人： Shu Satoh , Manny Sieradzki
IPC分类号： H01J49/30
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/045 , H01J2237/057 , H01J2237/153
摘要： A ribbon ion beam system, comprising an ion source configured to generate a ribbon ion beam along a first beam path, wherein the ribbon ion beam enters a mass analysis magnet having a height dimension (h1) and a long dimension (w1) that is perpendicular to an xy plane, wherein the mass analysis magnet is configured with its momentum dispersive xy plane to receive the ribbon ion beam and to provide magnetic fields to transmit the ribbon ion beam along a second beam path, wherein the ribbon ion beam exiting the mass analysis magnet is divergent in the non-dispersive xz plane and convergent in the xy plane, a mass selection slit for receiving the divergent ribbon ion beam and selecting desired ion species of the ribbon ion beam exiting the mass analysis magnet, an angle correction device configured to receive the divergent ribbon ion beam exiting the mass selection slit into a parallel ribbon ion beam in the horizontal xz plane and a diverging ribbon ion beam in an xy plane along a third beam path, and wherein the parallel ribbon beam has a variable height (h2) and a long dimension, width (w2).
摘要翻译：一种带状离子束系统，包括被配置为沿着第一光束路径产生带状离子束的离子源，其中所述带状离子束进入具有垂直于所述第一光束路径的高度尺寸（h1）和长尺寸（w1）的质量分析磁体其中所述质量分析磁体被配置有其动量分散xy平面以接收带状离子束并且提供磁场以沿着第二光束路径透射带状离子束，其中离开质量分析的带状离子束磁体在非分散xz平面中发散并且在xy平面中收敛，质量选择狭缝用于接收发散带状离子束并选择离开质量分析磁体的带离子束的期望离子种类，角度校正装置被配置为将离开质量选择狭缝的发散带状离子束接收在水平xz平面中的平行带状离子束中，并沿着第三层在xy平面中分散带状离子束光束路径，并且其中所述平行带状束具有可变高度（h2）和长尺寸宽度（w2）。

10. 发明授权

US06903338B2 Method and apparatus for reducing substrate edge effects in electron lenses 有权
标题翻译：减少电子透镜中基板边缘效应的方法和装置
公开(公告)号：US06903338B2
公开(公告)日：2005-06-07
申请号：US10600050
申请日：2003-06-20
申请人： Marian Mankos , David L. Adler
发明人： Marian Mankos , David L. Adler
IPC分类号： H01L21/66 , G01N23/203 , G01Q30/02 , G01Q30/20 , G21K7/00 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： H01J37/20 , H01J2237/153 , Y10T428/12528
摘要： One embodiment disclosed pertains to a method for inspecting a substrate. The method includes inserting the substrate into a holding place of a substrate holder, moving the substrate holder under an electron beam, and applying a voltage to a conductive element of the substrate holder. The voltage applied to the conductive element reduces a substrate edge effect. Another embodiment disclosed relates to an apparatus for holding a substrate that reduces a substrate edge effect. The apparatus includes a holding place for insertion of the substrate and a conductive element. The conductive element is positioned so as to be located within a gap between an edge of the holding place and an edge of the substrate.
摘要翻译：所公开的一个实施例涉及用于检查基板的方法。该方法包括将基板插入基板保持器的保持位置，将基板保持器移动到电子束下方，并向基板保持器的导电元件施加电压。施加到导电元件的电压降低了衬底边缘效应。公开的另一实施例涉及一种用于保持降低衬底边缘效应的衬底的装置。该装置包括用于插入基板和导电元件的保持位置。导电元件被定位成位于保持位置的边缘和基板的边缘之间的间隙内。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式