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1. 发明申请

US20190006145A1 METHOD OF VERIFYING OPERATION PARAMETER OF SCANNING ELECTRON MICROSCOPE 审中-公开
公开(公告)号：US20190006145A1
公开(公告)日：2019-01-03
申请号：US16021017
申请日：2018-06-28
申请人： NGR Inc.
发明人： Koji KANEKO
IPC分类号： H01J37/22 , G06T7/60 , G06T7/13 , H01J37/28
CPC分类号： H01J37/222 , G06T7/13 , G06T7/60 , G06T2207/10061 , G06T2207/30168 , H01J37/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1501 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： A method capable of verifying whether operation parameters, such as a focus parameter and an astigmatism correction parameter, of a scanning electron microscope are correctly adjusted. This method includes: determining a ratio of a length of an edge in a first direction to a length of the edge in a second direction perpendicular to the first direction, the edge being an edge of a pattern selected from design data; generating images of the pattern while changing an operation parameter of a scanning electron microscope; calculating an edge sharpness in the first direction of each of the images and calculating an edge sharpness in the second direction of each of the images; determining a ratio of a peak value of the edge sharpness in the first direction to a peak value of the edge sharpness in the second direction; and emitting an alarm if the ratio of the peak values does not coincide with the ratio of the lengths of the edge.

2. 发明申请

US20180144905A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD 审中-公开
公开(公告)号：US20180144905A1
公开(公告)日：2018-05-24
申请号：US15806872
申请日：2017-11-08
申请人： NuFlare Technology, Inc.
发明人： Osamu IIZUKA , Yukitaka SHIMIZU
IPC分类号： H01J37/302 , H01J37/317 , H01J37/04 , H01J37/20 , H01J37/10 , H01J37/153 , H01J37/147 , H01J37/244
CPC分类号： H01J37/302 , H01J37/045 , H01J37/10 , H01J37/147 , H01J37/153 , H01J37/20 , H01J37/244 , H01J37/304 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/1532 , H01J2237/20221 , H01J2237/21 , H01J2237/24514 , H01J2237/24564 , H01J2237/24592 , H01J2237/31774 , H01J2237/31798
摘要： According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

3. 发明授权

US09953802B2 Method and device for manipulating particle beam 有权
公开(公告)号：US09953802B2
公开(公告)日：2018-04-24
申请号：US15112716
申请日：2015-01-21
申请人： Ramot at Tel-Aviv University Ltd.
发明人： Roy Shiloh , Yossi Lereah , Ady Arie
IPC分类号： G21K1/08 , H01J37/153 , H01J37/26
CPC分类号： H01J37/153 , H01J37/26 , H01J37/261 , H01J37/263 , H01J2237/1532 , H01J2237/1534 , H01J2237/2614
摘要： A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.

4. 发明授权

US09928989B2 Method for automatic correction of astigmatism 有权
公开(公告)号：US09928989B2
公开(公告)日：2018-03-27
申请号：US15620942
申请日：2017-06-13
申请人： Intelligent Virus Imaging Inc
发明人： Ida-Maria Sintorn , Rickard Nordstrom , Gustaf Kylberg
IPC分类号： H01J37/153 , H01J37/26
CPC分类号： H01J37/153 , H01J37/26 , H01J2237/1532 , H01J2237/223
摘要： The method is for automatic astigmatism correction of a lens system. A first image of a first frequency spectrum in a microscope is provided. The first image of a view is not in focus. The first image is then imaged. A first roundness measure of a distribution and directions of intensities in the first image is determined. The lens is changed to a second stigmator setting to provide a second image of a second frequency spectrum. The second image of the view is not in focus. The second image is the same view as the first image of the view at the first stigmator setting. A second roundness measure of a distribution and directions of intensities in the second image is determined. The first roundness measure is compared with the second roundness measure. The image with the roundness measure indicating the roundest distribution is selected.

5. 发明授权

US09754759B2 Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device 有权
公开(公告)号：US09754759B2
公开(公告)日：2017-09-05
申请号：US14947241
申请日：2015-11-20
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Benjamin John Cook , Dieter Winkler
IPC分类号： H01J37/12 , H01J37/147
CPC分类号： H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/1205 , H01J2237/1516 , H01J2237/1532 , H01J2237/1534
摘要： An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.

6. 发明授权

US09607806B2 Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams 有权
公开(公告)号：US09607806B2
公开(公告)日：2017-03-28
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K1/08 , H01J37/30 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

7. 发明授权

US09607805B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US09607805B2
公开(公告)日：2017-03-28
申请号：US15150858
申请日：2016-05-10
申请人： Hermes Microvision Inc.
发明人： Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
摘要： One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

8. 发明申请

US20170018396A1 METHOD FOR AUTOMATIC CORRECTION OF ASTIGMATISM 有权
标题翻译：自动校正方法
公开(公告)号：US20170018396A1
公开(公告)日：2017-01-19
申请号：US15124099
申请日：2015-06-17
申请人： INTELLIGENT VIRUS IMAGING INC.
发明人： Ida-Maria Sintorn , Rickard Nordstrom Nordstrom , Gustaf Kylberg
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , H01J2237/1532 , H01J2237/223
摘要： The method is for automatic astigmatism correction of a lens system. A first image is provided that is not in focus at a first stigmator setting of a set of lenses. A calculating device calculates a corresponding first Fourier spectrum image. A distribution and direction of pixels of the Fourier spectrum image are determined by calculating a first vector and a second vector. The first vector is compared with the second vector. The lens system is changed from a first stigmator setting to a second stigmator setting to provide a second image. A corresponding Fourier spectrum image is calculated. The distribution and direction of pixels of the second Fourier spectrum image is determined by calculating a third vector and a fourth vector. The third vector is compared to the fourth vector. The image that has the lowest vector ratio is selected.
摘要翻译：该方法用于透镜系统的自动散光校正。提供在一组透镜的第一施放器设置处不聚焦的第一图像。计算装置计算对应的第一傅立叶光谱图像。通过计算第一矢量和第二矢量来确定傅里叶谱图像的像素的分布和方向。将第一个向量与第二个向量进行比较。透镜系统从第一施放器设置改变为第二施放器设置以提供第二图像。计算相应的傅立叶光谱图像。通过计算第三矢量和第四矢量来确定第二傅立叶光谱图像的像素的分布和方向。将第三个向量与第四个向量进行比较。选择具有最低矢量比的图像。

9. 发明申请

US20160233049A1 Charged Particle Beam Device 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20160233049A1
公开(公告)日：2016-08-11
申请号：US15022662
申请日：2014-05-02
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yuko SASAKI , Hiroyuki ITO
IPC分类号： H01J37/153 , H01J37/12
CPC分类号： H01J37/153 , H01J37/12 , H01J37/141 , H01J37/147 , H01J2237/103 , H01J2237/1532 , H01J2237/1534
摘要： Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.
摘要翻译：提供了一种能够使几乎没有像差的光束倾斜的多功能带电粒子束装置。通过用多极，平行电流线等形成局部发散场，通过常规旋转对称透镜，偏转器或像散校正器将光束轴与局部发散场匹配并抵消从另一个发生的像差来校正像差旋转对称凸透镜场。

10. 发明授权

US09312091B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US09312091B2
公开(公告)日：2016-04-12
申请号：US14396769
申请日：2013-04-18
申请人： Hitachi High-Technologies Corporation
发明人： Yasunari Sohda , Tasuku Yano , Muneyuki Fukuda , Noritsugu Takahashi , Hajime Kawano , Hiroyuki Ito
IPC分类号： G21K5/04 , H01J37/141 , H01J37/153 , H01J37/28 , H01J37/147
CPC分类号： H01J37/141 , H01J37/147 , H01J37/1475 , H01J37/153 , H01J37/28 , H01J2237/1405 , H01J2237/1532 , H01J2237/1536
摘要： In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.
摘要翻译：为了提供在诸如进行宽视场扫描的情况下能够减少偏转彗形像差的带电粒子束装置，带电粒子束装置设置有电磁物镜和在其上具有样品放置，其中电磁物镜设置有：多个磁路; 物镜线圈; 设置成面向样品的开口; 设置在比开口端部更靠物镜线圈侧的内透镜偏转器。

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