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2. 发明专利

JP6118898B2 荷電粒子線装置、試料観察方法有权
公开(公告)号：JP6118898B2
公开(公告)日：2017-04-19
申请号：JP2015519699
申请日：2014-03-12
申请人：株式会社日立ハイテクノロジーズ
发明人：大南祐介 , 坂詰卓 , 伊東祐博
IPC分类号： H01J37/244 , H01J37/20 , H01J37/22 , H01J37/26
CPC分类号： H01J37/22 , G01N23/046 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/26 , H01J37/261 , H01J37/28 , G01N2223/3307 , G01N2223/418 , H01J2237/047 , H01J2237/10 , H01J2237/221 , H01J2237/226 , H01J2237/2443 , H01J2237/2445 , H01J2237/24578 , H01J2237/2611 , H01J2237/2802

3. 发明专利

JP6021764B2 検査装置および検査方法有权
公开(公告)号：JP6021764B2
公开(公告)日：2016-11-09
申请号：JP2013180138
申请日：2013-08-30
申请人：株式会社東芝
发明人：池田隆洋
IPC分类号： G01B15/06 , G01B15/04
CPC分类号： H01J37/28 , H01J2237/226 , H01J2237/2611

4. 发明专利

JP5308624B2 Systems and methods for determining a cross sectional feature of the structure elements using a reference structure element 有权
公开(公告)号：JP5308624B2
公开(公告)日：2013-10-09
申请号：JP2006520256
申请日：2004-07-12
申请人：アプライドマテリアルズイスラエルリミテッド
发明人：ズヴィカローゼンベルグ， , オヴァディャメナデヴァ， , アヴィラムタム，
IPC分类号： G01N23/225 , G01B15/04 , G01R31/305 , G01R31/307 , H01J37/28 , H01L21/66
CPC分类号： H01J37/1478 , G01B15/04 , G01N23/2251 , G01R31/307 , H01J37/28 , H01J2237/24578 , H01J2237/2487 , H01J2237/2611 , H01J2237/2814 , H01J2237/2816 , H01J2237/2817
摘要： A system and method for determining a cross sectional feature of a measured structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method starts by a first step of scanning, at a first tilt state, a first portion of a reference structural element and at least the first traverse section of the measured structural element, to determine a first relationship between the reference structural element and the first traverse section. The first step is followed by a second step of scanning, at a second tilt state, a second portion of a reference structural element and at least the second traverse section of the measured structural element, to determine a second relationship between the reference structural element and the second traverse section. The method ends by a third step of determining a cross sectional feature of the measured structural element in response to the first and second relationships.

5. 发明专利

JP5051295B2 Fine structure inspection method, the fine structure inspection apparatus, and a fine structure inspection program 有权
标题翻译：空值
公开(公告)号：JP5051295B2
公开(公告)日：2012-10-17
申请号：JP2010503931
申请日：2009-03-19
申请人：凸版印刷株式会社
发明人：秀充波木井 , 勲米倉
IPC分类号： G01B15/00 , G01N23/225 , H01J37/22 , H01L21/66
CPC分类号： G01B15/04 , G01B2210/56 , G01N23/00 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/10152 , G06T2207/30148 , G21K7/00 , H01J2237/221 , H01J2237/2611 , H01J2237/2809 , H01J2237/2817

6. 发明专利

JPWO2009116634A1 微細構造体検査方法、微細構造体検査装置、および微細構造体検査プログラム有权
公开(公告)号：JPWO2009116634A1
公开(公告)日：2011-07-21
申请号：JP2010503931
申请日：2009-03-19
申请人：凸版印刷株式会社
发明人：米倉　勲 , 勲米倉 , 秀充波木井 , 秀充波木井
IPC分类号： G01B15/00
CPC分类号： G01B15/04 , G01B2210/56 , G01N23/00 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/10152 , G06T2207/30148 , G21K7/00 , H01J2237/221 , H01J2237/2611 , H01J2237/2809 , H01J2237/2817
摘要：サンプル微細構造パターンの側壁角度を検査する微細構造体検査方法であって:複数のSEM条件の下で前記サンプル微細構造パターンのSEM写真を撮像する工程と;前記SEM写真における前記サンプル微細構造パターンのエッジ部位のホワイトバンド幅を測定する工程と;前記複数のSEM条件間の変化に伴う前記ホワイトバンド幅の変化量に基づいて、前記サンプル微細構造パターンの側壁角度を算出する工程と;を備えることを特徴とする微細構造体検査方法。

7. 发明专利

JP2011040240A Charged particle beam device, and image display method 有权
标题翻译：充电颗粒光束装置和图像显示方法
公开(公告)号：JP2011040240A
公开(公告)日：2011-02-24
申请号：JP2009185396
申请日：2009-08-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： HIRATO TATSUYA , KOMURO HIROYUKI , KAWAMATA SHIGERU
IPC分类号： H01J37/147 , H01J37/153 , H01J37/22
CPC分类号： H01J37/28 , A61B6/022 , G02B27/2207 , G02B27/2214 , H01J37/1478 , H01J37/153 , H01J2237/2611
摘要： PROBLEM TO BE SOLVED: To provide a parallax image display means and an operation screen capable of providing an acquisition means for acquiring not only right and left parallax images from above but also from an oblique direction, and capable of changing over three-dimensional observation methods in a charged particle beam device. SOLUTION: The charged particle beam device, provided with charged particle sources, an objective lens focusing primary charge particle beams released from the charged particle sources, a scanning deflector scanning the primary charged particle beams on a sample, and a detector for detecting signal particles generated from the sample by scanning of the primary charged particle beams, for obtaining a sample image with the use of the signal particles of the detector, is further provided with a deflector for deflecting an irradiation angle of the primary charged particle beams toward the sample, a first as well as a second power source independent from each other for flowing currents to the deflector, and a switch for changing over voltages to be impressed from the two power sources at a one-line unit or a one-frame unit of scanning of the primary charged particle beams. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种视差图像显示装置和操作画面，其能够提供用于从上方而且从倾斜方向获取左右视差图像的获取装置，带电粒子束装置中的三维观察方法。解决方案：带有带电粒子源的带电粒子束装置，聚焦从带电粒子源释放的主要电荷粒子束的物镜，扫描样品上的初级带电粒子束的扫描偏转器和用于检测的检测器通过扫描主带电粒子束从样品产生的信号粒子，为了使用检测器的信号粒子获得样本图像，还设置有偏转器，用于将初级带电粒子束的照射角度偏向样品，彼此独立的第一和第二电源，用于将流动流向偏转器;以及开关，用于以单线单位或一帧单位从两个电源转换要施加的电压扫描初级带电粒子束。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP4469572B2 Measurement method of undercut utilizing Sem 有权
公开(公告)号：JP4469572B2
公开(公告)日：2010-05-26
申请号：JP2003270078
申请日：2003-07-01
申请人：ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人：ジアン・フランセスコ・ロルッソ , ルカ・グレラ
IPC分类号： G01B15/00 , G01N23/225 , G01Q30/02 , G01Q30/04 , G01Q30/20 , H01J37/28 , H01L21/66
CPC分类号： G01N23/2251 , H01J37/28 , H01J2237/2611 , H01J2237/2815
摘要： The disclosure relates to measuring an undercut of a feature on a specimen using a scanning electron microscope (SEM). In accordance with one embodiment, a method for measuring the undercut includes illuminating the feature with a primary electron beam at an incident angle, changing the incident angle of the primary electron beam over a set of angles, measuring an intensity of scattered electrons from the feature for each incident angle in the set of angles, and determining a discontinuity in the intensities as a function of the incident angle.

9. 发明专利

JP4262690B2 Shape measuring apparatus and a shape measuring method 有权
公开(公告)号：JP4262690B2
公开(公告)日：2009-05-13
申请号：JP2005074249
申请日：2005-03-16
申请人：株式会社日立ハイテクノロジーズ
发明人：敦宮本 , 麻紀田中 , 秀俊諸熊
IPC分类号： G01B15/04 , G01N23/203 , G01N23/225 , H01L21/66
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/226 , H01J2237/2611
摘要： In the past, when a shape was corrected by adjusting parameters of a shape calculating equation proper for a measuring method used in measuring a two-dimensional or three-dimensional shape by correlating the parameters and a shape index value, the degree of freedom of modifying a shape by correction depended on a model equation used in the calculation of the shape, and therefore such a shape correction method was unsuitable for objects of correction having a number of shape variations. According to the present invention, the three-dimensional shape is corrected by fitting a curvature equation to a three-dimensional shape of a semiconductor pattern measured by any three-dimensional shape measuring method and by adjusting parameters of the curvature equation based on a shape index value separately calculated. The relations between the shape index value and the parameters are stored in a data base, and at the time of measurement the measured shapes are corrected based on the relations mentioned above.

10. 发明专利

JP2009026749A Scanning electron microscope, and imaging method using scanning electron microscope 有权
标题翻译：扫描电子显微镜和使用扫描电子显微镜的成像方法
公开(公告)号：JP2009026749A
公开(公告)日：2009-02-05
申请号：JP2008157604
申请日：2008-06-17
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TACHIBANA ICHIRO , SATO MITSUGI , SUZUKI NAOMASA
IPC分类号： H01J37/21 , H01J37/04 , H01J37/28
CPC分类号： G01N23/225 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/21 , H01J2237/2611 , H01J2237/2814 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope in which an image forming position of a focusing lens can be changed in a high speed and in an excellent reproducibility in order to obtain a deep focusing depth in a low-magnification image and a high resolution image in a high-magnification image.
SOLUTION: The scanning electron microscope is provided with a testpiece holding portion for holding a testpiece, an electron beam source, a focusing lens for focusing electron beams discharged from the electron beam source, an objective lens for irradiating the focused bean on the testpiece as a micro spot, a scanning coil for scanning the electron beam on the testpiece, a detecting unit for detecting a testpiece signal generated from the testpiece by an electron beam irradiation, and a display portion for displaying as an image the testpiece signal detected by the detecting unit. In a magnetic field generated by the focusing lens, there are provided electrodes of an axial symmetry and a voltage is impressed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种扫描电子显微镜，其中聚焦透镜的图像形成位置可以以高速度和优异的再现性改变，以便在低倍率图像中获得深度聚焦深度以及高倍率图像中的高分辨率图像。解决方案：扫描电子显微镜设置有用于保持试件的试件保持部分，电子束源，用于聚焦从电子束源放出的电子束的聚焦透镜，用于将聚焦的豆照射在作为微点的试样，用于扫描试件上的电子束的扫描线圈，用于通过电子束照射检测从试件产生的试验信号的检测单元和用于将作为图像检测的试验信号作为图像显示的显示部分，检测单元。在由聚焦透镜产生的磁场中，提供轴向对称的电极并施加电压。版权所有（C）2009，JPO＆INPIT

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