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    • 1. 发明专利
    • Method of manufacturing oxide layer
    • 制造氧化层的方法
    • JP2009242900A
    • 2009-10-22
    • JP2008092685
    • 2008-03-31
    • National Institute Of Advanced Industrial & TechnologyTdk CorpTdk株式会社独立行政法人産業技術総合研究所
    • TSUCHIYA TETSUOMIYAMOTO YUKI
    • C23C18/12C23C26/00H01G4/33H01L21/316H01L21/8246H01L27/105
    • PROBLEM TO BE SOLVED: To provide a manufacturing method for an oxide layer containing Ba and TI in which a metal layer of Cu or the like is hardly oxidized, the crystallinity is excellent, and any crack is hardly generated.
      SOLUTION: This manufacturing method includes an amorphous layer forming step of forming amorphous layers 20B, 20C of the oxide containing Ba and Ti on a metal layer 14, and a crystallizing step of crystallizing the amorphous layer 20C of the oxide containing Ba and Ti. In the amorphous layer forming step, the amorphous layers 20B, 20C of the oxide containing Ba and Ti of the thickness of 300-660 nm are formed by repeating once or a plurality of times the combination of forming a precursor layer of the oxide containing Ba and Ti with the application of the ultraviolet pulse laser beam of 1-100mJ/cm
      2 per pulse to the precursor layer of the oxide containing Ba and Ti. Further, in the crystallizing step, the ultraviolet pulse laser beam of 60-400mJ/cm
      2 per pulse is applied to the amorphous layer 20C of the oxide.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 解决的问题为了提供一种含有Cu等的金属层几乎不被氧化的含有Ba和TI的氧化物层的制造方法,结晶度优异,几乎不产生裂纹。 解决方案:该制造方法包括在金属层14上形成含有Ba和Ti的氧化物的非晶层20B,20C的非晶层形成步骤和使包含Ba的氧化物的非晶层20C结晶的结晶步骤 钛 在非晶层形成工序中,通过重复一次或多次形成包含Ba的氧化物的前体层的组合,形成厚度为300-660nm的包含Ba和Ti的氧化物的非晶层20B,20C 和Ti,每个脉冲施加1-100mJ / cm 2 SP / 2的紫外脉冲激光束到包含Ba和Ti的氧化物的前体层。 此外,在结晶步骤中,对氧化物的非晶层20C施加每脉冲60-400mJ / cm 2 SP / 2的紫外脉冲激光束。 版权所有(C)2010,JPO&INPIT
    • 5. 发明专利
    • Method of producing superconducting oxide material
    • 生产超导氧化物材料的方法
    • JP2009252641A
    • 2009-10-29
    • JP2008101536
    • 2008-04-09
    • Japan Steel Works Ltd:TheNational Institute Of Advanced Industrial & Technology株式会社日本製鋼所独立行政法人産業技術総合研究所
    • NAKAMURA TETSUSHIGESATO RYOSUKEKOYANAGI KUNIHIKOEBISAWA TAKASHIOTSU HIDEHIKOSOMA MITSUGITSUCHIYA TETSUOKUMAGAI TOSHIYATSUKADA KENICHI
    • H01B13/00C01G1/00C01G3/00H01L39/24
    • PROBLEM TO BE SOLVED: To provide a method of producing a superconducting oxide material that achieves the same effect as that obtained by back irradiation even when forming a thinner film by overglazing without limiting laser irradiation conditions and even when forming films on both sides of a substrate.
      SOLUTION: The method of producing an epitaxially grown superconducting coating material includes: a process (1) of applying a solution of metallic organic compound having an oxide for forming a superconducting material onto the substrate and drying it; a provisional firing process (2) of pyrolizing an organic matter in the metallic organic compound; and a full-scale firing process (3) of performing conversion into a superconducting material, wherein, when a laser is irradiated between the processes (1) and (2), a scattering mechanism is disposed immediately before a surface coated with the solution of metallic organic compound where the superconducting material is formed, and a laser, after being once scattered, is irradiated to the organic compound solution.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种制造超导氧化物材料的方法,即使在不限制激光照射条件的情况下甚至当在两侧形成膜时,通过过度玻璃形成较薄的膜也能获得与通过反向照射获得的效果相同的效果 的基底。 解决方案:制备外延生长的超导涂层材料的方法包括:将具有用于形成超导材料的氧化物的金属有机化合物溶液施加到基底上并干燥的方法(1) 对金属有机化合物中的有机物进行热处理的暂时烧制工序(2) 以及进行超导材料的转换的全尺寸焙烧工序(3),其中,当在工序(1)和(2)之间照射激光时,散射机构紧接在被涂覆有 其中形成超导材料的金属有机化合物和被一次散射的激光照射到有机化合物溶液上。 版权所有(C)2010,JPO&INPIT
    • 9. 发明专利
    • Infrared sensor and manufacturing method therefor
    • 红外传感器及其制造方法
    • JP2007225532A
    • 2007-09-06
    • JP2006049492
    • 2006-02-27
    • National Institute Of Advanced Industrial & TechnologyNec Corp日本電気株式会社独立行政法人産業技術総合研究所
    • TSUCHIYA TETSUOMIZUTA SUSUMUKUMAGAI TOSHIYASASAKI NARIHITOKURASHINA HARUJI
    • G01J1/02H01L37/00
    • G01J5/20
    • PROBLEM TO BE SOLVED: To provide a manufacturing method suitable for mass production and having the effects of improving TCR in an infrared sensor, using vanadium oxide as a resistor for bolometer.
      SOLUTION: The method of manufacturing an infrared sensor includes a process for forming a bridge structure 2 by an insulation material on an Si substrate 1; a process for forming a vanadium oxide thin film by a dry film forming method on the bridge structure; a process for changing the material, characteristics by irradiating the formed vanadium oxide thin film with a laser beam; a process for forming the vanadium oxide thin film 4 changing the material characteristics as the resistor 4' for the bolometer of a prescribed pattern; and a process for forming the resistor for the bolometer formed on the prescribed pattern and a protective layer 6 by the insulation material so as to cover the bridge structure.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供适合于批量生产并且具有改善红外传感器中的TCR的效果的制造方法,使用氧化钒作为测辐射热计的电阻器。 解决方案:制造红外线传感器的方法包括通过Si衬底1上的绝缘材料形成桥结构2的工艺; 通过干式成膜法在桥结构上形成氧化钒薄膜的方法; 通过用激光束照射所形成的氧化钒薄膜来改变材料的特性的方法; 形成氧化钒薄膜4的方法,该方法改变作为规定图案的辐射热计的电阻器4'的材料特性; 以及通过绝缘材料形成用于形成在规定图案上的测辐射热板的电阻器和保护层6以覆盖桥结构的工艺。 版权所有(C)2007,JPO&INPIT