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1. 发明专利

JP2012015113A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2012015113A
公开(公告)日：2012-01-19
申请号：JP2011154407
申请日：2011-07-13
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/20 , G01B15/00 , G01B15/04 , G01N23/00 , G01Q30/06 , G01Q30/18 , G01Q30/20 , G21K7/00 , H01J37/21 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a method and a device enabling highly precise inspection and measurement even if different electrification phenomena are included by considering the possibility that accurate inspection and measurement become difficult due to the different electrifications.SOLUTION: A device and a method are configured to subtract the potential obtained from a potential measurement result of the surface potential of a charged particle beam scanning point on the basis of potential distribution having wider range than the scanning point. With this configuration, accurate inspection and measurement can be performed by a scanning charged particle beam device even if there are electrification phenomena different in properties.
摘要翻译：要解决的问题：为了提供一种能够通过考虑由于不同的通电导致精确的检查和测量变得困难的可能性而包括不同的通电现象，从而能够进行高度精确的检查和测量的装置。解决方案：一种装置和方法被配置为基于具有比扫描点宽的范围的电位分布从电荷粒子束扫描点的表面电位的潜在测量结果中减去获得的电位。利用该配置，即使具有不同性质的通电现象，也可以通过扫描带电粒子束装置进行精确的检查和测量。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2007207764A Scanning charged-particle beam microscope 审中-公开
标题翻译：扫描充电颗粒光束显微镜
公开(公告)号：JP2007207764A
公开(公告)日：2007-08-16
申请号：JP2007046082
申请日：2007-02-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , TODOKORO HIDEO , SATO MITSUGI
IPC分类号： H01J37/09 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a scanning charged-particle beam microscope capable of aiming at gaining both of improvements in resolution and that in depth of focus.
SOLUTION: In the scanning charged-particle microscope, a passage opening for limiting the passage of charged-particle beams is arranged between a charged particle beam source and a scanning deflector, and the passage opening has a member for limiting the passage of charged-particle beams at the center of the opening.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种扫描带电粒子束显微镜，其能够瞄准获得分辨率和聚焦深度方面的改善。解决方案：在扫描带电粒子显微镜中，用于限制带电粒子束通过的通道开口被布置在带电粒子束源和扫描偏转器之间，并且通道开口具有用于限制带电粒子束在开口的中心。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2006332069A Roughness judgment method of test piece and charged particle beam device 有权
标题翻译：测试片和充电颗粒光束装置的粗糙度判断方法
公开(公告)号：JP2006332069A
公开(公告)日：2006-12-07
申请号：JP2006188799
申请日：2006-07-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKANE ATSUSHI , YAMAGUCHI SATOSHI , KOMURO OSAMU , OZAWA YASUHIKO , TODOKORO HIDEO
IPC分类号： H01J37/22 , G01B15/04 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a judgement method and a device suitable for judgement of roughness of a line and a space pattern formed on a test piece.
SOLUTION: Charged particle beams are made to incline, or a test-piece stage is made to incline, so that the charged particle beams may be inclined against an optical axis and the expansions of the detected signals in line scanning direction of the charged particle beams are measured, and they are compared with the expansions of the charged particle beams when scanned along the optical axis, thereby, based on the increase and decrease of the expansions, the roughness state of the scanned part is judged.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种判断方法和适用于判断在测试片上形成的线的粗糙度和空间图案的装置。
解决方案：使带电粒子束倾斜，或者使试片台倾斜，使得带电粒子束可以相对于光轴倾斜，并且检测到的信号在线扫描方向上的扩展测量带电粒子束，并将其与沿着光轴扫描时的带电粒子束的扩展进行比较，从而基于扩展的增加和减少，判断扫描部分的粗糙度状态。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2006156134A Reflection imaging-type electron microscope 审中-公开
标题翻译：反射成像电子显微镜
公开(公告)号：JP2006156134A
公开(公告)日：2006-06-15
申请号：JP2004345113
申请日：2004-11-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： MURAKOSHI HISAYA , TODOKORO HIDEO , HASEGAWA MASAKI
IPC分类号： H01J37/29
摘要： PROBLEM TO BE SOLVED: To increase the contrast of a mirror electron microscope. SOLUTION: A separator 4 for separating an irradiated electron beam 101 and a reflected electron beam 102 of the mirror electron microscope is positioned between an objective lens 5 and an intermediate lens 8, and a restriction diaphragm 14 is positioned in a position 43 where the intermediate lens 8 projects an electron beam diffraction image of the reflected electron beam 102 formed in a focus position 41 of the objective lens 5. The restriction of the reflected electron beam using the restriction diaphragm 14 improves the contrast of a mirror electron microscope image. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：增加镜电子显微镜的对比度。解决方案：用于分离被照射的电子束101和镜电子显微镜的反射电子束102的分离器4位于物镜5和中间透镜8之间，并且限制膜14位于位置43 其中中间透镜8投影形成在物镜5的聚焦位置41的反射电子束102的电子束衍射图像。使用限制膜14的反射电子束的限制改善了镜像电子显微镜图像的对比度。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2010257994A Inspection method and inspection device using electron beam 有权
标题翻译：使用电子束的检查方法和检查装置
公开(公告)号：JP2010257994A
公开(公告)日：2010-11-11
申请号：JP2010179920
申请日：2010-08-11
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： IWABUCHI HIROKO , TODOKORO HIDEO , MORI HIROYOSHI , SATO MITSUGI , USAMI YASUTSUGU , ICHIHASHI MIKIO , FUKUHARA SATORU , SHINADA HIROYUKI , KANEKO YUTAKA , SUGIYAMA KATSUYA , TAKATO ATSUKO , TOOYAMA HIROSHI
IPC分类号： H01J37/28 , H01J37/244 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an inspection method and device, capable of performing the inspection at a higher speed, using an electron beam.
SOLUTION: An electron beam 36 from an electron gun 1 is converged by an objective lens 9 and decelerated by a retarding voltage impressed to a sample 13; the sample 13 is scanned by the electron beam, while being moved; secondary electrons 33 generated from the sample 13 are accelerated by the retarding voltage to make a nearly parallel beam which is deflected by an E×B deflector 18, arranged between the objective lens 9 and the sample 13 and has a secondary electron generating body 19 irradiated; and second secondary electrons 20 are generated from the secondary electron generating body 19, and second detected by a charged particle detector 21. The output signal detected is stored as an image signal, and the image stored is compared in an operation section 29 and a defect determining section 30 to thereby determine defects.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够使用电子束以更高速度进行检查的检查方法和装置。解决方案：来自电子枪1的电子束36被物镜9会聚并通过施加到样品13的延迟电压而减速; 样品13被电子束扫描同时被移动; 从样品13产生的二次电子33被延迟电压加速，以形成由配置在物镜9和样品13之间的E×B偏转器18偏转的近似平行的光，并且具有照射的二次电子发生体19 ; 并且从二次电子发生体19产生第二二次电子20，并且由带电粒子检测器21检测出第二二次电子20.检测出的输出信号作为图像信号存储，并且在操作部29中比较存储的图像和缺陷确定部30，从而确定缺陷。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2007207763A Charged-particle beam microscope, image formation method, and computer for evaluating image resolution 有权
标题翻译：充电颗粒光束显微镜，图像形成方法和计算机，用于评估图像分辨率
公开(公告)号：JP2007207763A
公开(公告)日：2007-08-16
申请号：JP2007038076
申请日：2007-02-19
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , SATO MITSUGI , TODOKORO HIDEO , OTAKA TADASHI , IIIZUMI TAKASHI , TAKANE ATSUSHI
IPC分类号： H01J37/22 , G01B15/00 , G01N23/225 , H01J37/24 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an image evaluation method capable of evaluating the image resolution of a microscope image objectively. SOLUTION: In the image evaluation method, resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high precision and good repeatability can be obtained for the evaluation value of the image resolution. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够客观地评价显微镜图像的图像分辨率的图像评价方法。解决方案：在图像评估方法中，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的一部分上执行平均并且平均值被建立为图像的整个区域或图像的部分的分辨率评估值。该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得图像分辨率评估值的高精度和良好重复性的图像分辨率评估值。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006138856A Distance measuring method of testpiece 审中-公开
标题翻译： TESTPIECE的距离测量方法
公开(公告)号：JP2006138856A
公开(公告)日：2006-06-01
申请号：JP2005328896
申请日：2005-11-14
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： MIZUNO FUMIO , TODOKORO HIDEO
IPC分类号： G01B15/00 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To measure distance which has been considered difficult between a specified structure, such as a structure with a surface structure, having large and hard unevenness and a structure embedded inside a testpiece, and a structure embedded at a depth different from that of the specified structure.
SOLUTION: By incident energy that reaches a wiring pattern as the specified structure embedded inside the testpiece 2 to be reflected thereat and escape from the surface of the testpiece, electronic beams as charged particles are irradiated to a region containing the wiring pattern to scan the region. The reflected beams, reflected at the specified structure and secondary electron beams, which are discharged at the surface of the test piece when the incident energy escape from the surface of the test piece, are detected, and then the distance between the specified structure and the structure embedded at a different depth from that of the specified structure is determined.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了测量在诸如具有大而硬的不均匀性的表面结构的结构的特定结构和嵌入在试件内的结构之间已经被认为是困难的距离，以及嵌入在深度与指定结构不同。解决方案：按照嵌入在试件2内的特定结构的布线图案的入射能量，从反射面向试件的表面放出，将带电粒子的电子束照射到包含布线图案的区域扫描区域。检测在入射能量从试验片表面逃逸时在试片表面排出的以规定结构反射的反射光束和二次电子束，然后指定结构与确定嵌入与指定结构不同深度的结构。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006019301A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2006019301A
公开(公告)日：2006-01-19
申请号：JP2005193288
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/21 , H01J37/20 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method and a charged particle beam device suitable for reducing focus offset, magnification fluctuation, measurement length error in the charged particle beam device caused by charging on a sample. SOLUTION: In order to achieve the object, this invention provides a method of measuring the potential distribution on the sample by an electrostatic potentiometer for measuring the potential on the sample while the sample carried in by a carry-in mechanism of a charged particle beam passes. Further the invention provides a method of measuring local charging at a specified point on the sample and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Further the invention provides a method of correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适用于减少对样品充电引起的带电粒子束装置中的聚焦偏移，放大波动，测量长度误差的带电粒子束照射方法和带电粒子束装置。解决方案：为了实现该目的，本发明提供了一种通过静电电位计测量样品上的电势分布的方法，用于测量样品上的电位，而样品由携带的携带机构携带粒子束通过。此外，本发明提供了一种在样品上的特定点测量局部充电的方法，并且从这些局部静电电荷分离和测量广域静电电荷量。此外，本发明提供了一种基于通过在至少两个带电粒子光学条件下测量指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2005338096A Pattern measuring method and charged particle beam device 有权
标题翻译：图案测量方法和充电颗粒光束装置
公开(公告)号：JP2005338096A
公开(公告)日：2005-12-08
申请号：JP2005193289
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： G01B15/04 , H01J37/21 , H01J37/28 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method suitable for reducing a focus deviation, a magnification fluctuation and a measured length value error in a charged particle beam device due to a charging on a sample and to provide the charged particle beam device. SOLUTION: To achieve the above those objects, a method is disclosed for measuring an electrical potential distribution on the sample with a static electrometer which measures the electrical potential on the sample during passing the sample loaded by a loading mechanism of the charged particle beam. Another method is disclosed for measuring a local charge at a specified point on the sample, and isolating and measuring a wide area charge quantity from this local charge quantity. Further, the charge quantity of the specified point is measured under at least two charged particle optical conditions, the fluctuation of the dimensional measured value due to the fluctuation of the charge quantity at the specified point is measured using the charged particle beam. Another method is disclosed for correcting the measured length value or the magnification based on the above fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适合于减少由于对样品进行充电而导致的带电粒子束装置中的聚焦偏差，放大波动和测量的长度值误差的带电粒子束照射方法，并且提供带电粒子束装置。解决方案：为了实现上述目的，公开了一种用静电静电计测量样品上的电势分布的方法，该静电静电计测量在通过由带电粒子的装载机构加载的样品时样品上的电势光束。公开了用于测量样品上指定点处的局部电荷以及从该局部电荷量分离和测量广域电荷量的另一种方法。此外，在至少两个带电粒子光学条件下测量指定点的电荷量，使用带电粒子束测量由于指定点处的电荷量的波动引起的尺寸测量值的波动。公开了用于基于上述波动来校正测量长度值或倍率的另一种方法。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2005024564A Test method and test apparatus using electron beam 审中-公开
标题翻译：使用电子束的测试方法和测试装置
公开(公告)号：JP2005024564A
公开(公告)日：2005-01-27
申请号：JP2004218051
申请日：2004-07-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： IWABUCHI HIROKO , TODOKORO HIDEO , MORI HIROYOSHI , SATO MITSUGI , USAMI YASUTSUGU , ICHIHASHI MIKIO , FUKUHARA SATORU , SHINADA HIROYUKI , KANEKO YUTAKA , TAKATO ATSUKO , TOOYAMA HIROSHI , SUGIYAMA KATSUYA
IPC分类号： G01N23/225 , H01J37/04 , H01J37/153 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a test method and a test apparatus using an electron beam capable of heighten resolution, achieving high speeds and compactness, and improving reliability.
SOLUTION: A voltage is impressed on a sample via a sample stage. The electron beam is made convergent on the sample to scan it. The sample stage is continuously moved during the scan. When defects in the sample are detected by detecting charged particles generated from the sample, the interval size between the sample stage and a shield frame is determined based on a discharge limit which occurs between the sample stage and the shield frame. At least a hexapole coil for correcting the shape of the electron beam is provided. The crossover of the electron beam is blanked and deflected as a fulcrum of blanking during the movement of the sample. The size of a voltage impressed on the sample is determined according to the type of the sample.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供使用能够提高分辨率的电子束的测试方法和测试装置，实现高速度和紧凑性，并提高可靠性。解决方案：通过样品台对样品施加电压。使电子束收敛在样品上进行扫描。扫描期间样品台继续移动。当通过检测从样品产生的带电粒子来检测样品中的缺陷时，基于在样品台和屏蔽框架之间发生的放电极限来确定样品台和屏蔽框架之间的间隔尺寸。至少提供了用于校正电子束形状的六极线圈。在样品移动期间，电子束的交叉被消隐和偏转为消隐的支点。根据样品的类型确定施加在样品上的电压的大小。版权所有（C）2005，JPO＆NCIPI

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