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1. 发明专利

JP2007207763A Charged-particle beam microscope, image formation method, and computer for evaluating image resolution 有权
标题翻译：充电颗粒光束显微镜，图像形成方法和计算机，用于评估图像分辨率
公开(公告)号：JP2007207763A
公开(公告)日：2007-08-16
申请号：JP2007038076
申请日：2007-02-19
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , SATO MITSUGI , TODOKORO HIDEO , OTAKA TADASHI , IIIZUMI TAKASHI , TAKANE ATSUSHI
IPC分类号： H01J37/22 , G01B15/00 , G01N23/225 , H01J37/24 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an image evaluation method capable of evaluating the image resolution of a microscope image objectively. SOLUTION: In the image evaluation method, resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high precision and good repeatability can be obtained for the evaluation value of the image resolution. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够客观地评价显微镜图像的图像分辨率的图像评价方法。解决方案：在图像评估方法中，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的一部分上执行平均并且平均值被建立为图像的整个区域或图像的部分的分辨率评估值。该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得图像分辨率评估值的高精度和良好重复性的图像分辨率评估值。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006319351A Pattern inspection method and pattern inspection device 审中-公开
标题翻译：模式检验方法和图案检测装置
公开(公告)号：JP2006319351A
公开(公告)日：2006-11-24
申请号：JP2006171190
申请日：2006-06-21
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI ATSUKO , TERASAWA TSUNEO , OTAKA TADASHI , IIIZUMI TAKASHI , KOMURO OSAMU
IPC分类号： H01L21/66 , G01B15/04 , G01B15/08
摘要： PROBLEM TO BE SOLVED: To provide a pattern edge shape inspection method and a pattern inspection device which quantitatively analyze, by the nondestructive inspection, line edge shapes of a micropattern featuring materials, processes and exposure optical systems, and find out faults in manufacturing processes and image distortions.
SOLUTION: The pattern inspection method involves inspecting a pattern shape from the two-dimensional distribution information (42) of a secondary electron intensity or a reflected electron intensity obtained by the observation (41) of the pattern formed on a substrate by a scanning microscope using charged particle beams, and comprises a step (45) of detecting a set of edge points expressing the edge points of the pattern in a two-dimensional surface by the threshold value method, a step (48) of obtaining an approximate line for the set of the detected edge points, and a step of determining an edge roughness shape and characteristic by calculating (49) a difference between the set of the edge points and the approximate line, wherein as the threshold value used in the threshold method, a plurality of values are used.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种图案边缘形状检查方法和图案检查装置，其通过非破坏性检查定量分析具有材料，工艺和曝光光学系统的微图案的线边缘形状，并且发现缺陷制造过程和图像扭曲。解决方案：图案检查方法包括从二维电子强度的二维分布信息（42）检测图案形状或通过由基板上形成的图案的观察（41）获得的二次电子强度或反射电子强度来检查图案形状使用带电粒子束的扫描显微镜，并且包括通过阈值法检测表示二维表面中的图案的边缘点的一组边缘点的步骤（45）;获得近似线的步骤（48）对于所检测的边缘点的集合，以及通过计算（49）边缘点的集合和近似线之间的差异来确定边缘粗糙度形状和特性的步骤，其中作为阈值方法中使用的阈值，使用多个值。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2011134719A Charged particle beam adjustment method and charged particle beam device 有权
标题翻译：充电粒子束调整方法和充电粒子束装置
公开(公告)号：JP2011134719A
公开(公告)日：2011-07-07
申请号：JP2011028065
申请日：2011-02-14
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SATO MITSUGI , OTAKA TADASHI , ESUMI MAKOTO , TAKANE ATSUSHI , YOSHIDA MASASHI
IPC分类号： H01J37/04 , H01J37/147 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device, capable of facilitating adjustment of an optical axis inspite of changed conditions of charged particle beams, and to provide a method for adjustment of the charged particle beam device. SOLUTION: A first gap among sample images is detected when changing an optical element into two conditions when a deflection condition of an alignment deflector is changed into a first condition, a second gap among the sample images is detected when changing the optical element into two conditions when the deflection condition of the alignment deflector is changed into a second condition, and an operation condition of the alignment deflector is determined on the basis of information of the two gaps. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种带电粒子束装置，其能够促进调整带电粒子束的变化条件的光轴，并提供调整带电粒子束装置的方法。解决方案：当将对准偏转器的偏转状态改变为第一状态时，在将光学元件改变为两个条件时，检测样本图像之间的第一间隙，在改变光学元件时检测样本图像之间的第二间隙在将对准偏转器的偏转状态变更为第二状态的情况下，成为两个状态，并且基于两个间隙的信息来确定对准偏转器的动作状态。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2007266016A electronic microscope 审中-公开
标题翻译：电子显微镜
公开(公告)号：JP2007266016A
公开(公告)日：2007-10-11
申请号：JP2007190304
申请日：2007-07-23
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KAJI KAZUTOSHI , TERADA SHOHEI , OTAKA TADASHI
IPC分类号： H01J37/26 , H01J37/05 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an energy filter device capable of providing an electron beam having a small energy width, and to provide an electron microscope having a small electron beam probe diameter on a sample surface. SOLUTION: When the electron beam is deviated from the center of an opening of a slit, the deviation is accurately corrected based on intensity variation of secondary electrons generated from a sample or the like. The sample is observed by using the electron beam having passed through the opening center of the slit. Since the influence of aberration of an object lens can be diminished, an electron microscope image having high spatial resolution can be observed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够提供具有小能量宽度的电子束的能量过滤器装置，并且在样品表面上提供具有小电子束探针直径的电子显微镜。解决方案：当电子束偏离狭缝的开口的中心时，基于从样品等产生的二次电子的强度变化，精确地校正偏差。通过使用通过狭缝的开口中心的电子束来观察样品。由于可以减小物镜的像差的影响，所以可以观察到具有高空间分辨率的电子显微镜图像。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007128913A Image evaluation method and microscope 有权
标题翻译：图像评估方法和显微镜
公开(公告)号：JP2007128913A
公开(公告)日：2007-05-24
申请号：JP2007024988
申请日：2007-02-05
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , SATO MITSUGI , TODOKORO HIDEO , OTAKA TADASHI , IIIZUMI TAKASHI , TAKANE ATSUSHI
IPC分类号： H01J37/28 , H01J37/22 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an image evaluation method to objectively evaluate image resolution of a microscope image.
SOLUTION: The image evaluation method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image and averaged over the entire area of the image or the portion of the image, and that average is to be a resolution evaluation value of the entire area of the image or the portion of the image. With this structure, this method eliminates subjective impressions of an evaluator in evaluation of microscope image resolution, so that image resolution evaluation values of high accuracy and good repeatability can be obtained.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种客观评价显微镜图像的图像分辨率的图像评价方法。解决方案：图像评估方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，并在图像的整个区域或图像的一部分上进行平均并且该平均值是图像的整个区域或图像的部分的分辨率评估值。通过这种结构，该方法消除了评估者在显微镜图像分辨率评估中的主观印象，从而可以获得高精度和良好重复性的图像分辨率评估值。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2004171801A Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：JP2004171801A
公开(公告)日：2004-06-17
申请号：JP2002333020
申请日：2002-11-18
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KAJI KAZUTOSHI , TERADA SHOHEI , OTAKA TADASHI
IPC分类号： H01J37/26 , H01J37/05 , H01J37/28
CPC分类号： H01J37/28 , H01J37/05 , H01J2237/2594
摘要： PROBLEM TO BE SOLVED: To provide an energy filter device capable of providing an electron beam having a small energy width, and to provide an electron microscope having a small electron beam probe diameter on a sample surface.
SOLUTION: When the electron beam is deviated from the center of an opening of a slit, the deviation is accurately corrected based on intensity variation of secondary electrons generated from a sample or the like. The sample is observed by using the electron beam having passed through the opening center of the the slit. Since the influence of aberration of an object lens can be diminished, an electron microscope image having high spatial resolution can be observed.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够提供具有小能量宽度的电子束的能量过滤器装置，并且在样品表面上提供具有小电子束探针直径的电子显微镜。解决方案：当电子束偏离狭缝的开口的中心时，基于从样品等产生的二次电子的强度变化，精确地校正偏差。通过使用通过狭缝的开口中心的电子束来观察样品。由于可以减小物镜的像差的影响，所以可以观察到具有高空间分辨率的电子显微镜图像。版权所有（C）2004，JPO

7. 发明专利

JP2003037139A Pattern inspecting method and apparatus 有权
标题翻译：图案检查方法和装置
公开(公告)号：JP2003037139A
公开(公告)日：2003-02-07
申请号：JP2001224017
申请日：2001-07-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI ATSUKO , TERASAWA TSUNEO , OTAKA TADASHI , IIIZUMI TAKASHI , KOMURO OSAMU
IPC分类号： G01B15/00 , G01N21/956 , G01N23/225 , G03F7/20 , G06T7/00 , H01L21/66
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a pattern edge shape inspecting method for quantitatively analyzing a line edge shape of a micro pattern for representing characteristics of materials, processes and an optical system in a semiconductor manufacturing process by using a nondestructive test, and finding defects in the manufacturing process and image distortion of an observing apparatus.
SOLUTION: The method for inspecting the pattern shape by using information of a two-dimensional distribution of secondary electron intensity or reflecting electron intensity (42) obtained by observing the pattern formed on a substrate by using a scanning microscope utilizing a charged particle beam (41), is provided with a process for detecting a set of edge points for indicating edge locations of the pattern in a two-dimensional plane by using a threshold method (45), a process for obtaining an approximate line related to the set of the edge points (48), and a process for finding the shape and property of edge roughness by calculating a difference between the set of the edge points and the approximate line (49). The threshold method uses a plurality of thresholds.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种图案边缘形状检查方法，用于通过使用非破坏性测试来定量分析用于表示材料，工艺和半导体制造过程中的光学系统的特征的微图案的线边缘形状，并且发现缺陷观察装置的制造过程和图像失真。解决方案：使用通过使用带电粒子束（41）的扫描显微镜观察形成在基板上的图案而获得的二次电子强度或反射电子强度（42）的二维分布的信息来检查图案形状的方法）具有用于通过使用阈值方法（45）来检测用于指示二维平面中的图案的边缘位置的一组边缘点的处理，用于获得与所述边缘的集合相关的近似线的处理点（48），以及通过计算边缘点集合和近似线条（49）之间的差异来求出边缘粗糙度的形状和性质的处理。阈值方法使用多个阈值。

8. 发明专利

JP2008151797A Length measuring method by scanning electron microscope 有权
标题翻译：通过扫描电子显微镜的长度测量方法
公开(公告)号：JP2008151797A
公开(公告)日：2008-07-03
申请号：JP2008000264
申请日：2008-01-07
申请人： Fujitsu Ltd , Hitachi Ltd , 富士通株式会社 , 株式会社日立製作所
发明人： OTAKA TADASHI , NAGAI KOICHI
IPC分类号： G01B15/00 , G01N23/225 , H01J37/21
摘要： PROBLEM TO BE SOLVED: To provide a length measuring method by a scanning electron microscope, capable of preventing a length measuring error from being generated by the constitution of a sample, a kind of film or the like.
SOLUTION: In this length measuring method by the scanning electron microscope, the scanning electron microscope is auto-focused with a measuring point, using an output from a sensor for detecting a distance from an objective lens to the sample, and a change of a sample signal emitted from the sample is monitored while changing an excitation current of the objective lens, to detect the excitation current ΔIobj of the objective lens corresponding to a focus shift. The excitation current ΔIobj of the objective lens is converted into an acceleration voltage ΔV of an electron beam getting incident upon the sample, and the acceleration voltage of the electron beam getting incident upon the sample is changed by the acceleration voltage ΔV. The length is measured thereafter in the measuring point.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供通过扫描电子显微镜的长度测量方法，能够防止通过样品的构成，膜的种类等而产生长度测量误差。解决方案：在扫描电子显微镜的这种长度测量方法中，扫描电子显微镜使用来自用于检测从物镜到样品的距离的传感器的输出和测量点自动聚焦，并且改变在改变物镜的激励电流的同时监视从样本发射的采样信号，以检测与聚焦偏移相对应的物镜的激励电流ΔIobj。物镜的激励电流ΔIobj被转换成入射到样品的电子束的加速电压ΔV，并且入射到样品上的电子束的加速电压由加速电压ΔV变化。此后在测量点测量长度。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2006138864A Sample dimension measuring method and scanning electron microscope 审中-公开
标题翻译：样品尺寸测量方法和扫描电子显微镜
公开(公告)号：JP2006138864A
公开(公告)日：2006-06-01
申请号：JP2005364195
申请日：2005-12-19
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NASU OSAMU , KAWADA HIROKI , OTAKA TADASHI , FUKAYA RITSUO , ESUMI MAKOTO
IPC分类号： G01B15/00 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To accurately measure the length of a pattern or the like, formed on a surface of a semiconductor sample or the like regardless of suppression or reduction in the volume.
SOLUTION: In a charged particle beam system for measuring the line width or the like of a pattern formed on a sample based on secondary electrons emitted from a sample by scanning on the sample with a charged particle beam, interval of the scanning line of the charged particle beam is set not to exceed an irradiation density determined based on the physical properties of the sample. Alternatively, a length measurement value is operated based on a prestored approximate function.
COPYRIGHT: (C)2006,JPO&NCIPI

10. 发明专利

JP2007227401A Charged particle beam device and control device of scanning electron microscope 有权
标题翻译：充电颗粒光束装置和扫描电子显微镜的控制装置
公开(公告)号：JP2007227401A
公开(公告)日：2007-09-06
申请号：JP2007140962
申请日：2007-05-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA ATSUSHI , OTAKA TADASHI
IPC分类号： H01J37/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To rapidly and accurately move an observation position to an observation visual field. SOLUTION: The charged particle beam device comprises a means for detecting a position difference between a target position on a chip pattern and a visual field predetermined position within a microscopic observation visual field after moving a sample stage; a means for storing the result; and a means for determining, at the time of movement to the position in the next observation, a new movement target position in consideration of the preliminarily stored position difference and the previously adapted movement target position. When a pattern on another wafer with the same pattern as the one used last time baked in the same alignment or on the same wafer as the one used last time is observed, the previous movement target instruction position to the sample stage is changed in consideration of the previous observation visual field position slippage registered in the corresponding observation position, and the sample stage is moved according to the instruction position. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：将观察位置快速准确地移动到观察视野。带电粒子束装置包括用于在移动样品台之后检测芯片图案上的目标位置与微观观察视野内的视场预定位置之间的位置差异的装置; 用于存储结果的方法; 以及用于在考虑到预先存储的位置差和先前适应的移动目标位置时确定在下次观察中移动到位置时的新的移动目标位置的装置。当观察到与上次使用的相同图案的图案与上次使用的相同图案的图案在与上次使用的相同的对准或相同的晶片上烘烤时，考虑到先前的移动目标指示位置到样品台，先前的观察视野位置滑移记录在相应的观察位置，并且样本台根据指示位置移动。版权所有（C）2007，JPO＆INPIT

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