专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2008261891A Sample manufacturing method 有权
标题翻译：样品制造方法
公开(公告)号：JP2008261891A
公开(公告)日：2008-10-30
申请号：JP2008205173
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus.
SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle below 90° to remove the target periphery of a minute sample and subsequently the sample stage is rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种样品制造方法，用于从包含诸如电子部件等的样品例如半导体晶片或器件的样品中分离含有期望区域的微小样品，而不倾斜样品台进行微小区域的分析或观察，以及样品制造装置。
解决方案：以低于90°的照射角度的聚合离子束照射样品的表面以去除微小样品的目标周边，随后样品台在垂直于样品表面的片段上旋转。将凝结的离子束照射到样品表面的照射角度被固定以照射样品以分离微小样品。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2005268231A Image evaluating method and microscope 有权
标题翻译：图像评估方法和显微镜
公开(公告)号：JP2005268231A
公开(公告)日：2005-09-29
申请号：JP2005136787
申请日：2005-05-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , SATO MITSUGI , TODOKORO HIDEO , OTAKA TADASHI , IIIZUMI TAKASHI , TAKANE ATSUSHI
IPC分类号： H01J37/22 , H01J37/04 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an image evaluating method to objectively evaluate image resolution of a microscope image.
SOLUTION: The image evaluating method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaged over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluated value of the entire area of the image or the portion of the image. The constitution eliminates subjective impressions of an evaluator from evaluating microscope image resolution, therefor image resolution evaluated values attaining high accuracy and good repeatability.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种客观评价显微镜图像的图像分辨率的图像评估方法。解决方案：图像评估方法的特征在于，在图像的整个区域或图像的整个区域上的图像的整个区域或图像的整个区域上的部分区域获得图像的部分区域中的分辨率并且平均值被建立为图像的整个区域或图像的部分的分辨率评估值。该结构消除了评估者对评估显微镜图像分辨率的主观印象，因此图像分辨率评估值达到高精度和良好的重复性。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2008298797A Sample preparing device 有权
标题翻译：样品制备装置
公开(公告)号：JP2008298797A
公开(公告)日：2008-12-11
申请号：JP2008223457
申请日：2008-09-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28 , H01J37/147 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a sample preparing method and device for microregion assay, observation or measurement of a minute sample by separating or separating/preparing the minute sample containing a desired specific region from samples of electronic components such as semiconductor wafer and device, etc. without inclining the sample stage.
SOLUTION: This sample preparing method is characterized by that the sample surface is irradiated with focused ion beams at irradiation angle of not more than 90 degrees or less, the area around the target minute sample is removed, the sample stage is rotated with vertical line segment to the sample surface as an axis of rotation and then the sample is irradiated with the focused ion beam at the irradiation angle of the beam to the sample surface fixed, separating or separating/preparing the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于微区域测定的样品制备方法和装置，通过从诸如半导体晶片的电子部件的样品中分离或分离/制备含有所需特定区域的微量样品来观察或测量微小样品和设备等，而不倾斜样品台。解决方案：该样品制备方法的特征在于，以不大于90度或更小的照射角度照射聚焦离子束，取出目标微小样品周围的区域，样品台用垂直线段到样品表面作为旋转轴，然后将样品用聚束离子束照射到束的照射角度，固定，分离或分离/制备微小样品。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008261892A Sample manufacturing method 审中-公开
标题翻译：样品制造方法
公开(公告)号：JP2008261892A
公开(公告)日：2008-10-30
申请号：JP2008205228
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus.
SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle of below 90° to remove the target periphery of a minute sample and the sample stage is subsequently rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种样品制造方法，用于从包含诸如电子部件等的样品例如半导体晶片或器件的样品中分离含有期望区域的微小样品，而不倾斜样品台进行微小区域的分析或观察，以及样品制造装置。
解决方案：以低于90°的照射角度的聚合离子束照射样品的表面以去除微小样品的目标周边，并且样品台随后在垂直于表面的片段上旋转样品。将凝结的离子束照射到样品表面的照射角度被固定以照射样品以分离微小样品。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2008203271A Method and device for producing sample 审中-公开
标题翻译：生产样品的方法和装置
公开(公告)号：JP2008203271A
公开(公告)日：2008-09-04
申请号：JP2008122126
申请日：2008-05-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28 , G01N1/32
摘要： PROBLEM TO BE SOLVED: To provide a method and device for producing a sample for separating or separately preparing a minute sample including a desired specific region from a sample such as a semiconductor wafer and an electronic part like a device without tilting a sample stage for the purpose of minute region analysis, observation, or measurement.
SOLUTION: The method is characterized in that an objective minute sample periphery is removed by irradiating the sample with a focused ion beam at an angle of less than 90° with respect to the surface of the sample surface; next, the sample stage is turned around the vertical line to the sample surface; and the sample is irradiated while the focused ion beam irradiation angle to the sample surface is fixed; and thereby the minute sample is separated or separately prepared.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产样品的方法和装置，用于从诸如半导体晶片的样品和类似器件的电子部件分离或分别制备包括期望的特定区域的微小样品，而不倾斜样品分段，观察或测量的目的。该方法的特征在于，通过用聚焦离子束照射样品相对于样品表面的表面以小于90°的角度去除目标微小的样品周边; 接下来，样品台围绕垂直线转到样品表面; 同时照射样品，同时对样品表面的聚焦离子束照射角度是固定的; 从而分离或分开制备微量样品。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007207764A Scanning charged-particle beam microscope 审中-公开
标题翻译：扫描充电颗粒光束显微镜
公开(公告)号：JP2007207764A
公开(公告)日：2007-08-16
申请号：JP2007046082
申请日：2007-02-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , TODOKORO HIDEO , SATO MITSUGI
IPC分类号： H01J37/09 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a scanning charged-particle beam microscope capable of aiming at gaining both of improvements in resolution and that in depth of focus.
SOLUTION: In the scanning charged-particle microscope, a passage opening for limiting the passage of charged-particle beams is arranged between a charged particle beam source and a scanning deflector, and the passage opening has a member for limiting the passage of charged-particle beams at the center of the opening.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种扫描带电粒子束显微镜，其能够瞄准获得分辨率和聚焦深度方面的改善。解决方案：在扫描带电粒子显微镜中，用于限制带电粒子束通过的通道开口被布置在带电粒子束源和扫描偏转器之间，并且通道开口具有用于限制带电粒子束在开口的中心。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2008286811A Sample preparing method 有权
标题翻译：样品制备方法
公开(公告)号：JP2008286811A
公开(公告)日：2008-11-27
申请号：JP2008223448
申请日：2008-09-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/32 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample preparing method for analyzing, observing, and measuring a minute region by separating, or separating and preparing a minute sample including a desired specific region from the sample, such as an electronic component of a semiconductor wafer and a device, without inclining a sample stage, and to provide a sample preparing apparatus. SOLUTION: In the sample preparing method, focusing ion beams are applied to the sample at an irradiation angle of less than 90° at the maximum to the sample surface, the periphery of a target fine sample is removed, the sample stage is rotated with a vertical segment to the sample surface as a rotary axis, the irradiation angle of the focusing ion beams to the sample surface is fixed and the ion beams are applied to the sample, and the minute sample is separated or separated and prepared. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于分析，观察和测量微小区域的样品制备方法，其通过从样品中分离或分离和制备包含所需特定区域的微小样品，例如半导体晶片和器件，而不倾斜样品台，并提供样品制备装置。解决方案：在样品制备方法中，将聚焦离子束以与样品表面最大的最小90°的照射角度施加到样品，去除目标细样品的外围，样品台为作为旋转轴以垂直段旋转到样品表面，将聚焦离子束照射到样品表面的照射角度是固定的，并将离子束施加到样品上，并将微量样品分离或分离并制备。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2007128913A Image evaluation method and microscope 有权
标题翻译：图像评估方法和显微镜
公开(公告)号：JP2007128913A
公开(公告)日：2007-05-24
申请号：JP2007024988
申请日：2007-02-05
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHITANI TORU , SATO MITSUGI , TODOKORO HIDEO , OTAKA TADASHI , IIIZUMI TAKASHI , TAKANE ATSUSHI
IPC分类号： H01J37/28 , H01J37/22 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an image evaluation method to objectively evaluate image resolution of a microscope image.
SOLUTION: The image evaluation method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image and averaged over the entire area of the image or the portion of the image, and that average is to be a resolution evaluation value of the entire area of the image or the portion of the image. With this structure, this method eliminates subjective impressions of an evaluator in evaluation of microscope image resolution, so that image resolution evaluation values of high accuracy and good repeatability can be obtained.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种客观评价显微镜图像的图像分辨率的图像评价方法。解决方案：图像评估方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，并在图像的整个区域或图像的一部分上进行平均并且该平均值是图像的整个区域或图像的部分的分辨率评估值。通过这种结构，该方法消除了评估者在显微镜图像分辨率评估中的主观印象，从而可以获得高精度和良好重复性的图像分辨率评估值。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2009224788A Probe device 有权
标题翻译：探测器
公开(公告)号：JP2009224788A
公开(公告)日：2009-10-01
申请号：JP2009108190
申请日：2009-04-27
申请人： Hitachi Ltd , Hitachi Ulsi Systems Co Ltd , 株式会社日立製作所 , 株式会社日立超エル・エス・アイ・システムズ
发明人： TOMIMATSU SATOSHI , KOIKE HIDEMI , AZUMA JUNZO , ISHITANI TORU , SUGIMOTO ARITOSHI , HAMAMURA YUICHI , SEKIHARA TAKESHI , SHIMASE AKIRA
IPC分类号： H01L21/66 , G01N1/28 , G01N1/32 , G01R31/302
摘要： PROBLEM TO BE SOLVED: To provide a method of causing a probe to contact a surface of a sample in a safe and efficient manner after monitoring the height of the probe. SOLUTION: A probe device includes: an ion beam optical system 1 for irradiating a sample 4 with an ion beam 3; a secondary electron detector 10 for detecting a secondary electron emitted from the sample 4 which is irradiated with the ion beam 3; a display 12 for displaying information detected by the secondary detector 10 as an image; a probe 7 which is caused to contact a surface of the sample 4; a probe control device 9 for controlling the drive of the probe 7; and a probe's reference coordinate recording device for previously causing the probe 7 to contact the sample 4 and recording obtained coordinate of the probe's front end, wherein the probe control device 9 controls the drive distance and speed of the probe 7 based on the coordinate recorded by the probe's reference coordinate recording device and the coordinate on the sample 4 which the probe 7 is caused to contact. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在监测探头的高度之后使探针以安全和有效的方式接触样品表面的方法。解决方案：探针装置包括：离子束光学系统1，用于用离子束3照射样品4; 用于检测从离子束3照射的样品4发射的二次电子的二次电子检测器10; 用于显示由二次检测器10检测的信息作为图像的显示器12; 与样品4的表面接触的探针7; 用于控制探针7的驱动的探针控制装置9; 以及探头的参考坐标记录装置，用于预先使探针7接触样本4并记录获得的探头前端的坐标，其中探针控制装置9基于由所述探针7的记录的坐标来控制探针7的驱动距离和速度探针的参考坐标记录装置和探针7所接触的样品4上的坐标。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2003022776A Sample production apparatus and sample production method 有权
标题翻译：样品生产设备和样品生产方法
公开(公告)号：JP2003022776A
公开(公告)日：2003-01-24
申请号：JP2001204768
申请日：2001-07-05
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOMIMATSU SATOSHI , KOIKE HIDEMI , ISHITANI TORU , SHICHI HIROYASU , KASHIMA HIDEO , FUKUDA MUNEYUKI
IPC分类号： G01N1/28 , H01J37/30 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a sample production apparatus and a sample producing method, in which cross-sectional processing at an arbitrary angle is possible, in the ion beam processing in a non-inclining sample stand.
SOLUTION: The sample production apparatus is constituted so that a sample section may be formed by ion beam processing in the sample 1 held to the sample stand 2 using an ion beam optical system 5 which converges, scans, and deflects the ion beam 4 emitted from the ion source 9. It is constituted so that the angle, which is made by an ion beam optical axis of the ion beam optical system 5 and the sample stand 2 surface, may be fixed, and formation of the sample section may be controlled by rotation within the sample stand surface of the sample stand 2. With the apparatus arrangement by the non- inclining sample stand effective in reduction of apparatus manufacturing cost, the ion beam irradiation processing at arbitrary angles is attained, and an accurate section can be formed.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供在非倾斜样品台中的离子束处理中可以以任意角度进行横截面处理的样品制造装置和样品制造方法。解决方案：样品制备装置被构造成使得可以使用离子束光学系统5使样品1中保持的样品1中的离子束处理形成样品部分，该离子束光学系统5会聚，扫描和偏转从离子源9.它被构造成使得由离子束光学系统5的离子束光轴和样品台2的表面形成的角度可以被固定，并且样品部分的形成可以由在样品台2的样品台表面内的旋转。通过非倾斜样品台的设备布置有效地降低了设备制造成本，实现了任意角度的离子束照射处理，并且可以形成精确的部分。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式