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1. 发明授权

EP3024592B1 VORRICHTUNG ZUR OBERFLÄCHENBEHANDLUNG ODER -BEARBEITUNG 有权
公开(公告)号：EP3024592B1
公开(公告)日：2018-09-05
申请号：EP14796667.5
申请日：2014-07-22
申请人： ZS-Handling GmbH
发明人： SCHILP, Michael , ZIMMERMANN, Josef , ZITZMANN, Adolf
IPC分类号： B05C5/02 , G10K15/00 , B05B13/02 , B21B45/02 , B08B5/02 , B23K26/00 , H01J37/32 , B05C19/04
CPC分类号： B23Q1/38 , B05B13/0278 , B05C5/0295 , B05C19/04 , B08B7/028 , B23K20/10 , B23K26/083 , B23K26/361 , B23K26/362 , B23K26/38 , B23K26/40 , B23K2101/16 , B23K2103/50 , G01N21/25 , G01N27/02 , G01N27/22 , G10K15/00 , H01J37/3277

2. 发明公开

EP3219176A1 BALANCED BARRIER DISCHARGE NEUTRALIZATION IN VARIABLE PRESSURE ENVIRONMENTS 有权
标题翻译：变压力环境下的平衡障碍排放中性化
公开(公告)号：EP3219176A1
公开(公告)日：2017-09-20
申请号：EP15790722.1
申请日：2015-10-13
申请人： Illinois Tool Works Inc.
发明人： GEFTER, Peter , OLDYNSKI, Edward Anthony , HEYMANN, Steven Bernard
IPC分类号： H05H1/24 , H01J37/32 , H01T23/00 , H05F3/06
CPC分类号： H05F1/00 , H01J37/32082 , H01J37/32348 , H01J37/3277 , H01J37/32935 , H01T23/00 , H05F3/06 , H05H1/2406 , H05H2001/2468
摘要： Methods and apparatus for static charge neutralization in variable pressure environments are disclosed. In particular, barrier discharge ionization apparatus may include a hollow dielectric channel disposed within a variable pressure environment and may have at least one open end, a reference emitter disposed on the outer surface of the channel, and a high voltage electrode disposed within the channel. The high voltage electrode may present a high intensity electric field to the reference emitter through the dielectric channel in response to the provision of a variable-waveform signal dictated by conditions in the variable pressure environment. This results in the generation of a plasma region with electrically balanced charge carriers within the variable pressure environment due to barrier discharge occurring at the interface of the reference emitter and the outer surface of the dielectric channel. The disclosed apparatus are compatible with either radio frequency or micro-pulse voltage power supplies.
摘要翻译：公开了用于可变压力环境中的静电荷中和的方法和设备。特别地，阻挡放电电离装置可以包括布置在可变压力环境内的中空电介质通道，并且可以具有至少一个开口端，布置在通道的外表面上的参考发射器以及布置在通道内的高压电极。响应于由可变压力环境中的条件提供的可变波形信号的提供，高压电极可以通过介电通道向参考发射器呈现高强度电场。由于在参考发射极和介电通道的外表面的界面处发生阻挡放电，这导致在可变压力环境内产生具有电平衡电荷载流子的等离子体区域。所公开的装置与射频或微脉冲电压电源兼容。

3. 发明授权

EP3054032B1 Installation for film deposition onto and/or modification of the surface of a moving substrate 有权
标题翻译：用于沉积到移动基底表面上和/或修改移动基底表面的安装
公开(公告)号：EP3054032B1
公开(公告)日：2017-08-23
申请号：EP15154257.8
申请日：2015-02-09
申请人： Coating Plasma Industrie , Vetaphone A/S
发明人： Gat, Eric , Tran, Minh Duc , Eisby, Frank
IPC分类号： C23C16/54 , C23C16/50 , C23C16/455 , B01J3/00 , H01J37/32 , C23C16/44
CPC分类号： C23C16/545 , C23C16/4401 , C23C16/45504 , C23C16/45519 , C23C16/45578 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/3277
摘要： This installation comprises a housing, a substrate support (20) received in said housing, diffusion means (42) for diffusing an inert gas, such as nitrogen, towards said substrate support and at least one head (30) defining an inner volume (V) opened opposite to said top, said head being provided with at least two electrodes (8, 8', 8") for creating an electric discharge and with injection means (7, 7', 7") for injecting a gaseous mixture towards said substrate. Said injection means comprise at least one injection tube (7, 7', 7") placed between two adjacent electrodes or between one electrode and a peripheral wall, said tube being provided with injection holes facing said substrate support, for injecting said gaseous mixture on said substrate, whereas diffusion means are provided inside said head, said injection tube being placed between said substrate support and said diffusion means so that, in use, said gaseous mixture is urged against said substrate by said inert gas.
摘要翻译：该装置包括壳体，容纳在所述壳体中的基板支撑件（20），用于朝向所述基板支撑件扩散惰性气体例如氮气的扩散装置（42），以及限定内部容积（V）的至少一个头部（30））与所述顶部相对地打开，所述头部设置有用于产生放电的至少两个电极（8,8'，8“）和用于向所述顶部喷射气体混合物的注入装置（7,7'，7”）基质。所述注入装置包括放置在两个相邻电极之间或一个电极与周壁之间的至少一个注入管（7,7'，7“），所述管设置有面向所述基底支撑件的注入孔，用于将所述气体混合物注入所述衬底，而扩散装置设置在所述头部内部，所述注入管被放置在所述衬底支撑件和所述扩散装置之间，使得在使用中，所述气态混合物被所述惰性气体推向所述衬底。

4. 发明公开

EP3178962A1 ROLL-TO-ROLL SPUTTERING PROCESS WITH HYBRID TARGET AND PRODUCT THEREOF 审中-公开
标题翻译：具有混合目标的卷对卷溅射过程及其产品
公开(公告)号：EP3178962A1
公开(公告)日：2017-06-14
申请号：EP16202656.1
申请日：2016-12-07
申请人： STK Corporation
发明人： CHANG, Ching-Yu , LIAO, Chien-Fa
IPC分类号： C23C14/04 , A61B5/00 , C23C14/20 , C23C14/34 , C23C14/56 , G01N27/327 , H01J37/34
CPC分类号： C23C14/205 , A61B5/00 , C12Q1/005 , C12Q1/006 , C23C14/042 , C23C14/3407 , C23C14/562 , G01N27/3272 , G01N33/492 , H01J37/3277 , H01J37/34 , H01J37/3429
摘要： The present invention provides a roll-to roll sputtering process with a hybrid target comprising: unwinding a flexible polymer substrate from an unwinding axis; sputtering a hybrid target to the flexible polymer substrate for forming a first metal film, and a second metal film; and rewinding the flexible polymer substrate to a rewinding axis, and further comprising the following steps of: using laser to form a first electrode section and a second electrode section on the first metal film and the second metal film; and disposing a detecting substance layer on the second electrode section. Moreover, a product made by the roll-to-roll sputtering process is provided. Compared to the prior art, the hybrid target of the present invention is formed by multiple metals and can be sputtered to the substrate for forming multiple metal thin films. The present invention has an advantage of shortening the processing time and saving cost.
摘要翻译：本发明提供了一种使用混合靶材的卷对卷溅射工艺，包括：从退绕轴线展开柔性聚合物基材; 将混合靶溅射到用于形成第一金属膜的柔性聚合物基板和第二金属膜; 以及将所述柔性聚合物基板重绕到重绕轴，并且还包括以下步骤：使用激光在所述第一金属膜和所述第二金属膜上形成第一电极部分和第二电极部分; 以及在第二电极部分上设置检测物质层。此外，提供了通过卷对卷溅射工艺制成的产品。与现有技术相比，本发明的混合靶材由多种金属形成，并且可以溅射到衬底上以形成多个金属薄膜。本发明具有缩短处理时间和节约成本的优点。

5. 发明公开

EP3006596A4 FILM FORMING DEVICE 有权
标题翻译： VORRICHTUNG ZUR FILMFORMUNG
公开(公告)号：EP3006596A4
公开(公告)日：2017-03-01
申请号：EP14804632
申请日：2014-05-08
申请人： KK KOBE SEIKO SHO (KOBE STEEL LTD )
发明人： SEGAWA TOSHIKI , OHBA NAOKI , KUROKAWA YOSHINORI
IPC分类号： C23C14/56 , C23C16/54 , H01J37/32 , H01J37/34 , H01L21/67
CPC分类号： H01J37/3277 , C23C14/562 , H01J37/32513 , H01J37/32733 , H01J37/32807 , H01J37/3288 , H01J37/32899 , H01J37/3417 , H01J37/3447 , H01J2237/162 , H01J2237/20278 , H01J2237/332 , H01L21/67132
摘要： Provided is a deposition device which can secure work space without vertical overlap of the deposition unit and the units upstream and downstream thereof. This deposition device is provided with a deposition unit (16), and upstream and downstream units (14, 18) arranged to the left and right thereof. The deposition unit (16) is provided with: a deposition roller (70); multiple guide rollers (72); a main chamber (64) having a deposition roller housing unit (74) and, thereabove, a guide roller housing unit (76); first and second process chambers (66, 68) which house multiple deposition process devices (84, 86) to the left and right of the deposition roller housing unit (74); and process chamber support units (104) for supporting the first and second process chambers (66, 68) so as to allow the first and second process chambers (66, 68) to move between a regular position for deposition and a retracted position retracted to the left or right, and between the retracted position and an exposure position separated in the front/back direction.
摘要翻译：提供了一种沉积装置，其能够确保工作空间而不沉积单元与其上游和下游单元的垂直重叠。该沉积装置设置有沉积单元（16）以及布置在其左侧和右侧的上游和下游单元（14,18）。沉积单元（16）设置有：沉积辊（70）; 多个导辊（72）; 具有沉积辊容纳单元（74）的主室（64），以及上面的导辊容纳单元（76）; 第一和第二处理室（66,68），其将多个沉积处理装置（84,86）容纳在沉积辊壳体单元（74）的左侧和右侧; 和用于支撑第一和第二处理室（66,68）的处理室支撑单元（104），以允许第一和第二处理室（66,68）在用于沉积的常规位置和被缩回到左侧或右侧，以及在缩回位置与在前/后方向上分离的曝光位置之间。

6. 发明公开

EP2985074A4 PLASMA TREATMENT METHOD, PLASTMA TREATMENT DEVICE AND LONG PLASMA-TREATED OBJECT 审中-公开
标题翻译：等离子电视，电视，电视，电视
公开(公告)号：EP2985074A4
公开(公告)日：2017-02-01
申请号：EP13881565
申请日：2013-04-08
申请人： OKINO AKITOSHI , MIYAHARA HIDEKAZU , SUNLINE CO LTD
发明人： TSUTSUMI HIDENOBU , NAKAZAKI JUNJI , OGAWA TAKASHI , SUIZU KEITA , OKINO AKITOSHI , MIYAHARA HIDEKAZU
IPC分类号： B01J19/08 , A01K91/00 , C08J7/00 , D01F6/04 , D01F6/12 , D01F6/80 , D06M10/02 , H01J37/32 , H05H1/24
CPC分类号： H01J37/3277 , D01F6/04 , D01F6/12 , D01F6/80 , D06M10/02 , D06M10/025 , H01J37/32348 , H01J37/32541 , H01J2237/327 , H01J2237/336 , H05H1/2406 , H05H2001/2462

7. 发明公开

EP3054032A1 Installation for film deposition onto and/or modification of the surface of a moving substrate 有权
标题翻译：安装用于在和/或修改移动基板的表面成膜
公开(公告)号：EP3054032A1
公开(公告)日：2016-08-10
申请号：EP15154257.8
申请日：2015-02-09
申请人： Coating Plasma Industrie , Vetaphone A/S
发明人： Gat, Eric , Tran, Minh Duc , Eisby, Frank
IPC分类号： C23C16/54 , C23C16/50 , C23C16/455 , B01J3/00 , H01J37/32 , C23C16/44
CPC分类号： C23C16/545 , C23C16/4401 , C23C16/45504 , C23C16/45519 , C23C16/45578 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/3277
摘要： This installation comprises a housing, a substrate support (20) received in said housing, diffusion means (42) for diffusing an inert gas, such as nitrogen, towards said substrate support and at least one head (30) defining an inner volume (V) opened opposite to said top, said head being provided with at least two electrodes (8, 8', 8") for creating an electric discharge and with injection means (7, 7', 7") for injecting a gaseous mixture towards said substrate.
Said injection means comprise at least one injection tube (7, 7', 7") placed between two adjacent electrodes or between one electrode and a peripheral wall, said tube being provided with injection holes facing said substrate support, for injecting said gaseous mixture on said substrate, whereas diffusion means are provided inside said head, said injection tube being placed between said substrate support and said diffusion means so that, in use, said gaseous mixture is urged against said substrate by said inert gas.
摘要翻译：这个装置包括一个外壳（20），在所述壳体内接收到的衬底支撑件，扩散装置（42），用于气体扩散惰性,:如氮，朝向所述衬底支撑件和至少一个头部（30）在内部容积定义（V ）打开相对所述顶部，被用于向所述注射的气体混合物提供，所述头部具有至少两个电极（8,8”，8“），用于创建关于放电，并用喷射装置（7，7' ，7" ）基板。所述注射装置包括两个相邻电极之间或一个电极和一外周壁之间放置至少一个喷射管（7,7”，7“），所述管设置有面向所述基板支撑，用于喷射孔喷射所述气体混合物上所述底物，而被所述头部内设置扩散装置，所述喷射管是所述之间放置的衬底支撑并扩散的所述装置使得在使用中，所述气体混合物通过所述惰性气体对所说基片施力。

8. 发明授权

EP2653586B1 PLASMA CVD APPARATUS 有权
标题翻译：等离子体CVD装置
公开(公告)号：EP2653586B1
公开(公告)日：2016-03-02
申请号：EP11848774.3
申请日：2011-11-25
申请人： Kabushiki Kaisha Kobe Seiko Sho
发明人： TAMAGAKI, Hiroshi , OKIMOTO, Tadao
IPC分类号： C23C16/503 , C23C16/54 , H05H1/46 , H01J37/32
CPC分类号： C23C16/50 , C23C16/4588 , C23C16/503 , C23C16/54 , H01J37/32018 , H01J37/32568 , H01J37/32669 , H01J37/32752 , H01J37/32761 , H01J37/3277 , H01J2237/3321 , H05H1/46 , H05H2245/123

9. 发明公开

EP2906739A1 APPARATUS AND METHOD FOR APPLYING SURFACE COATINGS 有权转让
标题翻译：设备和方法施加表面涂层
公开(公告)号：EP2906739A1
公开(公告)日：2015-08-19
申请号：EP13776455.1
申请日：2013-10-09
申请人： Europlasma nv
发明人： ROGGE, Eva , LEGEIN, Filip
IPC分类号： C23C16/54 , H01J37/32 , B01D69/12 , C08F2/52
CPC分类号： H01J37/3277 , B01D2239/0478 , B05D1/62 , C08F2/52 , C23C16/509 , C23C16/545 , H01J37/32082 , H01J37/32091 , H01J37/32403 , H01J37/32532 , H01J37/32568 , H01J37/32724 , H01J37/32752 , H01J37/32761 , H01J2237/202 , H01J2237/332
摘要： The present invention provides a method for applying a surface coating on, for example, a sheet of fabric and further provides a plasma chamber (10) for coating a sheet of fabric, e.g. a textile material, with a polymer layer, the plasma chamber (10) comprising a plurality of electrode layers (RF, M) arranged successively within the plasma chamber, wherein at least two adjacent electrode layers are radiofrequency electrode layers (RF) or ground electrode layers (M), thereby providing a surface coating on both sides of a fabric sheet.

10. 发明公开

EP2754730A1 CARBON FILM FORMING APPARATUS 有权
标题翻译：器具，用于产生碳膜
公开(公告)号：EP2754730A1
公开(公告)日：2014-07-16
申请号：EP12830845.9
申请日：2012-08-31
申请人： Nanotec Co.
发明人： NAKAMORI Hideki , HIRATSUKA Masanori , YUKIMURA Ken
IPC分类号： C23C14/34 , C01B31/02 , C23C14/06
CPC分类号： C23C14/345 , C01B32/05 , C23C14/0605 , C23C14/3485 , C23C14/3492 , C23C14/562 , H01J37/3277 , H01J37/3467 , H01J37/3473
摘要： An excellent and high-grade carbon film is formed on a surface of a material to be processed at a high speed.
A film forming vacuum chamber includes: a substrate to which a predetermined voltage is applied by substrate voltage applying means in a vacuum chamber that can be depressurized to a predetermined degree of vacuum; and a plasma generating source that has at least one carbon raw material substrate that is arranged to face the substrate, forms plasma from an atmosphere for discharge generation introduced into the vacuum chamber based on adjustment electric power output to the carbon raw material substrate by a pulse power supply on the carbon raw material substrate, and discharges electricity together with a carbon raw material from the carbon raw material substrate toward the material to be processed that is held on the substrate, a carbon film is processed and formed on a surface of the material to be processed by a sputtering method, the pulse power supply and the substrate voltage applying means are connected to an oscillation apparatus for a gate signal by a mechanism that adjusts an initial voltage, and each of the pulse power supply and the substrate power supply has an adjustment circuit that controls each of a pulse width, delay timing from application of a voltage to a target to application of a substrate voltage, a frequency, and a voltage in a predetermined range.

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