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1. 发明授权

EP2980269B1 SPUTTERING DEVICE 有权
公开(公告)号：EP2980269B1
公开(公告)日：2018-10-24
申请号：EP14775467.5
申请日：2014-03-07
申请人： Atsumitec Co., Ltd.
发明人： UCHIYAMA, Naoki
IPC分类号： C23C14/34 , C23C14/56 , H01J37/34 , H01J37/32 , C23C14/04 , C23C14/50 , C23C14/54
CPC分类号： C23C14/548 , C23C14/042 , C23C14/3464 , C23C14/50 , C23C14/568 , H01J37/32752 , H01J37/3417 , H01J37/3447
摘要： A sputtering device 1 includes: a vacuum chamber 2; a plurality of targets 8 (8a to 8d); a shield 9 that selectively exposes, to the inside of the vacuum chamber 2, only a target 8c out of which a film is to be formed; a substrate holding unit 11 that holds a substrate 10 on which fine particles ejected from the target 8c are deposited to form a film; a first transfer unit 14 that fixedly holds and moves the substrate holding unit 11; a mask 16 disposed between the substrate 10 and the target 8c; a second transfer unit 19 that moves the mask 16; and a plurality of through-hole units 17a to 17f having patterned through holes 17 penetrating through the mask 16.

2. 发明公开

EP3385991A1 PIXEL ARRANGEMENT STRUCTURE, VAPOR DEPOSITION MASK AND PROFILED DISPLAY SCREEN 审中-公开
公开(公告)号：EP3385991A1
公开(公告)日：2018-10-10
申请号：EP17746886.5
申请日：2017-01-24
申请人： Kunshan New Flat Panel Display Technology Center Co., Ltd. , Kunshan Go-Visionox Opto-Electronics Co., Ltd.
发明人： WANG, Zhixiang , HU, Siming , ZHANG, Tingting , ZHU, Hui
IPC分类号： H01L27/32 , C23C14/04 , H01L51/56
CPC分类号： C23C14/04 , C23C14/042 , H01L27/3246 , H01L27/326 , H01L51/56
摘要： The present invention provides a pixel arrangement structure, a vapor deposition mask and an irregular-shaped display screen. The pixel arrangement structure is used for irregular-shaped display of an irregular-shaped display screen, the pixel arrangement structure is provided with several rows and/or several columns of pixel display units, wherein neighboring rows and/or neighboring columns of the pixel display units are arranged in parallel within an irregular-shaped display region (105). By arranging the pixel display units within the irregular-shaped display region (105) in such a way that the neighboring rows and/or neighboring columns of the pixel display units are parallel rows or columns, a confusion phenomenon at the interface between an irregular-shaped display region (105) and a non-display region (107) on an edge of the irregular-shaped display region (105) can be eliminated.

3. 发明授权

EP2755617B1 METHOD FOR FABRICATION BIOCOMPATIBLE ELECTRODE COMPONENT 有权
公开(公告)号：EP2755617B1
公开(公告)日：2018-07-04
申请号：EP12832234.4
申请日：2012-09-11
申请人： HEAR IP PTY LTD
发明人： MERGEN, Silvana , NEWBOLD, Carrie
IPC分类号： A61N1/05
CPC分类号： A61N1/0541 , A61N1/05 , C23C14/042 , C23C14/34 , H01J1/00
摘要： The present invention provides methods for fabricating an electrode device component, the method comprising the steps of: (i) providing a biocompatible carrier material, and (ii) performing an ablative method on the biocompatible carrier material to form a recess, the recess capable of receiving a biocompatible electrode material. The components so fabricated are useful as carriers for biological electrodes, such as cochlear electrodes and nerve cuff electrodes.

4. 发明公开

EP3337387A1 FLEXIBLE ELECTRODE FOR CARDIAC SENSING AND METHOD FOR MAKING 审中-公开
公开(公告)号：EP3337387A1
公开(公告)日：2018-06-27
申请号：EP16758020.8
申请日：2016-08-17
申请人： Boston Scientific Scimed Inc.
发明人： SALLEE, Gregory , GUNTER, Kenneth L. , FRANKSON, Danielle , MERRIAM, Patrick A. , MAIERHOFER, Edward J. , JONES, Matthew P.
IPC分类号： A61B5/00 , A61B5/042
CPC分类号： A61B5/0422 , A61B5/6858 , A61B2562/0209 , A61B2562/125 , A61L29/02 , B05D1/60 , B05D3/06 , C23C14/042 , C23C14/165 , C23C14/5813 , C25D11/26
摘要： An electrode for cardiac signal sensing includes an intermediate layer, an iridium-containing layer, an iridium oxide layer, an insulating polymer layer, and a conductive layer formed on a flexible polymer substrate. The intermediate metal layer has a first portion and a second portion, and is formed on the conductive layer. The iridium-containing layer includes at least 50 wt. % iridium and has a first portion and a second portion, and is formed on the first portion of the intermediate metal layer. The iridium oxide layer is formed on the first portion of the iridium-containing layer. The insulating polymer layer is formed on the second portion of the intermediate metal layer and the second portion of the iridium-containing layer. The iridium-containing layer is not formed on the second portion of the intermediate metal layer; and the iridium oxide layer is not formed on the second portion of the iridium-containing layer.

5. 发明公开

EP3292433A4 THREE-DIMENSIONAL (3D) PHOTONIC CHIP-TO-FIBER INTERPOSER 有权
公开(公告)号：EP3292433A4
公开(公告)日：2018-04-04
申请号：EP16789237
申请日：2016-04-06
申请人： HUAWEI TECH CO LTD
发明人： JIANG JIA
IPC分类号： G02B6/26 , C23C14/04 , C23C14/18 , C23C14/48 , C23C14/54 , C23C14/58 , G02B6/12 , G02B6/122 , G02B6/134 , G02B6/30
CPC分类号： G02B6/305 , C23C14/042 , C23C14/18 , C23C14/48 , C23C14/541 , C23C14/542 , C23C14/584 , C23C14/5873 , G02B6/12004 , G02B6/1228 , G02B6/1342 , G02B6/26 , G02B6/36 , G02B6/423
摘要： A method of fabricating an optical coupling device, comprising forming a waveguide mask layer on a substrate platform, wherein the waveguide mask layer comprises an array of openings comprising a first end and a second end opposite to the first end, immersing the substrate platform into a salt melt comprising ions to form an array of waveguides in the substrate platform through an ion diffusion process, and controlling a rate of immersion such that a diffusion depth of the ions varies as a function of a distance in a direction from the first end to the second end, wherein the array of waveguides extends in the direction from the first end to the second end.

6. 发明公开

EP3272901A1 DEPOSITION ARRANGEMENT AND METHOD FOR DEPOSITING 审中-公开
标题翻译：沉积装置和沉积方法
公开(公告)号：EP3272901A1
公开(公告)日：2018-01-24
申请号：EP16179871.5
申请日：2016-07-18
申请人： Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
发明人： LIFKA, Herbert
IPC分类号： C23C14/56 , C23C14/04 , C23C16/455
CPC分类号： C23C14/562 , C23C14/042 , C23C14/044 , C23C16/45565
摘要： A deposition arrangement (1) is provided for depositing a substance (SB) on a substrate surface (ST1) of a substrate (ST). The deposition arrangement comprises a deposition source (20) and a deposition mask (30) that is arranged between the deposition source (20) and the deposition surface. The deposition mask (30) has a first mask surface (38) facing the deposition source and a second mask surface (39) facing the substrate surface (ST1). The deposition mask (30) is provided with a spatial pattern defined by at least one closed area (34) and at least one perforated area (36) defined by a plurality of through holes (37) and wherein a substrate carrier (10) is provided to carry the substrate with its substrate surface (ST1) at distance (D) from the second mask surface (39).
摘要翻译：提供用于在基板（ST）的基板表面（ST1）上沉积物质（SB）的沉积装置（1）。沉积装置包括沉积源（20）和布置在沉积源（20）和沉积表面之间的沉积掩模（30）。沉积掩模（30）具有面向沉积源的第一掩模表面（38）和面向基底表面（ST1）的第二掩模表面（39）。沉积掩模（30）设置有由至少一个封闭区域（34）和由多个通孔（37）限定的至少一个穿孔区域（36）限定的空间图案，并且其中衬底载体（10）是（距离第二掩模表面（39））的距离（D）处提供基板表面（ST1）。

7. 发明公开

EP3257965A1 VERFAHREN UND VORRICHTUNG ZUM BESCHICHTEN VON KUNSTSTOFFAUSGIESSERN 有权
标题翻译：用于涂覆塑料压铸机的方法和装置
公开(公告)号：EP3257965A1
公开(公告)日：2017-12-20
申请号：EP17174218.2
申请日：2017-06-02
申请人： Waldorf Technik GmbH , Cavonic GmbH
发明人： CZIZEGG, Wolfgang
IPC分类号： C23C14/04 , C23C14/50 , C23C16/04 , C23C16/458 , B65D33/16 , B65D75/58
CPC分类号： C23C14/046 , B65D33/16 , B65D75/5861 , B65D75/5883 , C23C14/042 , C23C14/50 , C23C16/042 , C23C16/045 , C23C16/458
摘要： Die Erfindung betrifft ein Verfahren zum Beschichten von, insbesondere durch Spritzgießen hergestellten, Kunststoffausgießern (3) (Spouts) für Packgut-Verpackungen, insbesondere für Standbeutelverpackungen, umfassend einen eine Siegelfläche (8) zum Festlegen einer Verpackungsbehälterhülle, insbesondere einer Standbeutelfolie, durch, bevorzugt thermisches, Siegeln aufweisenden Fixierabschnitt (7) und einen sich in einer Axialrichtung erstreckenden, den Fixierabschnitt (7) durchsetzenden, vorzugsweise den Fixierabschnitt (7) axial überragenden, Ausgießkanal (4), mit einer, insbesondere SiO x umfassenden, Barriereschicht im Vakuum zum Erhöhen der Durchtrittssperrwirkung gegen mindestens eine chemische Verbindung und/oder mindestens ein chemisches Element auf einer Innenoberfläche des Ausgießkanals (4), wobei gleichzeitig eine Mehrzahl von Kunststoffausgießern (3) in einer Vakuumbeschichtungskammer mit der Barriereschicht im Vakuum, vorzugsweise durch ein ALD-Verfahren, ein CVD-Verfahren oder ein PVD-Verfahren, beschichtet werden, dadurch gekennzeichnet, dass die Kunststoffausgießer (3) vor dem Beschichten mit der Barriereschicht derart auf einen Träger (1) aufgesetzt werden, dass die Kunststoffausgießer (3) während der Beschichtung mit ihrer jeweiligen Siegelfläche (8) dem Träger (1) zur Maskierung gegen eine Beschichtung mit der Barriereschicht zugewandt sind.
摘要翻译：本发明涉及一种用于涂布的方法，通过注射成型，Kunststoffausgießern（3）（喷口），用于包装物品的包装，特别生产的，特别是用于直立袋的包装，包括一个密封表面（8），用于通过优选热设定的包装容器壳体，特别是站立的袋膜中，具有固定部的密封件（7）和在轴向方向上延伸的部分，通过固定部通过（7），优选所述固定部（7）伸出的轴向伸出，浇注通道（4）具有在在真空中特定的SiOx全面阻挡层用于提高通道阻断作用对灌注通道（4），其中，同时多个Kunststoffausgießern的（3）在真空涂覆室，具有在真空中的阻挡层，优选通过ALD法，CVD的内表面上的至少一种化学化合物和/或至少一种化学元素法或PVD工艺，被涂覆，其特征在于，Kunststoffausgießer（3）在涂覆之前，可以以这样的方式放置在阻挡层上的支撑件（1），所述Kunststoffausgießer（3）在涂布过程中（其各自的密封表面 8）面向载体（1），用于遮蔽具有阻挡层的涂层。

8. 发明公开

EP3254307A1 RADIALLY OUTWARD PAD DESIGN FOR ELECTROSTATIC CHUCK SURFACE 有权
标题翻译：静电卡盘表面的径向外侧垫设计
公开(公告)号：EP3254307A1
公开(公告)日：2017-12-13
申请号：EP16746928.7
申请日：2016-01-06
申请人： Applied Materials, Inc.
发明人： RAJ, Govinda , HIRAHARA, Robert T.
IPC分类号： H01L21/683
CPC分类号： C23C14/50 , C23C14/042 , H01L21/67109 , H01L21/6831 , H01L21/6875 , H01L21/68757 , H02N13/00
摘要： An electrostatic chuck assembly and processing chamber having the same are disclosed herein. In one embodiment, an electrostatic chuck assembly is provided that includes a body having an outer edge connecting a frontside surface and a backside surface. The body has chucking electrodes disposed therein. A wafer spacing mask is formed on the frontside surface of the body. The wafer spacing mask has a plurality of elongated features. The elongated features have long axes that are radial aligned from the center to the outer edge. The wafer spacing mask has a plurality of radially aligned gas passages defined between the elongated features.

9. 发明公开

EP3133183A4 MAGNETIC DEVICE, EVAPORATION DEVICE AND EVAPORATION METHOD 审中-公开
公开(公告)号：EP3133183A4
公开(公告)日：2017-12-06
申请号：EP14861135
申请日：2014-08-28
申请人： BOE TECHNOLOGY GROUP CO LTD
发明人： ZHAO DEJIANG , GAO HAORAN , YU JIANWEI , YIN JIE
IPC分类号： C23C14/04 , C23C14/54
CPC分类号： C23C14/042 , C23C14/12 , C23C14/54
摘要： The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.

10. 发明公开

EP3246432A1 METHOD FOR TREATING PARTS 审中-公开
标题翻译：处理零件的方法
公开(公告)号：EP3246432A1
公开(公告)日：2017-11-22
申请号：EP16737111.1
申请日：2016-01-13
申请人： Zanini Auto Grup, S.A.
发明人： MAYER PUJADAS, Augusto , SANAHUJA CLOT, José
IPC分类号： C25D5/12 , C25D5/56 , C25D5/48 , B23K26/36 , B44C1/22
CPC分类号： C23F1/02 , B23K26/36 , B23K26/362 , B44C1/22 , C23C14/025 , C23C14/042 , C23C14/14 , C23C28/023 , C23F17/00 , C25D3/04 , C25D5/14 , C25D5/48 , C25D5/56
摘要： The method for treatment of parts, characterized in that it comprises the stages of applying an electrolytic chromium plating layer on a part; applying a coating over the entire outer surface of the part; selective stripping of the coating in order to leave the part with at least one coated portion and at least one uncoated portion; carrying out a selective etching on the layer in at least one part of the uncoated portion; metallization of the entire surface of the part; and removal of the coating.
摘要翻译：处理部件的方法，其特征在于包括在部件上施加电镀铬层的步骤; 在部件的整个外表面上涂覆涂层; 选择性剥离涂层以便留下具有至少一个涂覆部分和至少一个未涂覆部分的部分; 在所述未涂覆部分的至少一部分上对所述层进行选择性蚀刻; 部件整个表面的金属化; 并去除涂层。

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