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1. 发明授权

EP3054032B1 Installation for film deposition onto and/or modification of the surface of a moving substrate 有权
标题翻译：用于沉积到移动基底表面上和/或修改移动基底表面的安装
公开(公告)号：EP3054032B1
公开(公告)日：2017-08-23
申请号：EP15154257.8
申请日：2015-02-09
申请人： Coating Plasma Industrie , Vetaphone A/S
发明人： Gat, Eric , Tran, Minh Duc , Eisby, Frank
IPC分类号： C23C16/54 , C23C16/50 , C23C16/455 , B01J3/00 , H01J37/32 , C23C16/44
CPC分类号： C23C16/545 , C23C16/4401 , C23C16/45504 , C23C16/45519 , C23C16/45578 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/3277
摘要： This installation comprises a housing, a substrate support (20) received in said housing, diffusion means (42) for diffusing an inert gas, such as nitrogen, towards said substrate support and at least one head (30) defining an inner volume (V) opened opposite to said top, said head being provided with at least two electrodes (8, 8', 8") for creating an electric discharge and with injection means (7, 7', 7") for injecting a gaseous mixture towards said substrate. Said injection means comprise at least one injection tube (7, 7', 7") placed between two adjacent electrodes or between one electrode and a peripheral wall, said tube being provided with injection holes facing said substrate support, for injecting said gaseous mixture on said substrate, whereas diffusion means are provided inside said head, said injection tube being placed between said substrate support and said diffusion means so that, in use, said gaseous mixture is urged against said substrate by said inert gas.
摘要翻译：该装置包括壳体，容纳在所述壳体中的基板支撑件（20），用于朝向所述基板支撑件扩散惰性气体例如氮气的扩散装置（42），以及限定内部容积（V）的至少一个头部（30））与所述顶部相对地打开，所述头部设置有用于产生放电的至少两个电极（8,8'，8“）和用于向所述顶部喷射气体混合物的注入装置（7,7'，7”）基质。所述注入装置包括放置在两个相邻电极之间或一个电极与周壁之间的至少一个注入管（7,7'，7“），所述管设置有面向所述基底支撑件的注入孔，用于将所述气体混合物注入所述衬底，而扩散装置设置在所述头部内部，所述注入管被放置在所述衬底支撑件和所述扩散装置之间，使得在使用中，所述气态混合物被所述惰性气体推向所述衬底。

2. 发明公开

EP3054032A1 Installation for film deposition onto and/or modification of the surface of a moving substrate 有权
标题翻译：安装用于在和/或修改移动基板的表面成膜
公开(公告)号：EP3054032A1
公开(公告)日：2016-08-10
申请号：EP15154257.8
申请日：2015-02-09
申请人： Coating Plasma Industrie , Vetaphone A/S
发明人： Gat, Eric , Tran, Minh Duc , Eisby, Frank
IPC分类号： C23C16/54 , C23C16/50 , C23C16/455 , B01J3/00 , H01J37/32 , C23C16/44
CPC分类号： C23C16/545 , C23C16/4401 , C23C16/45504 , C23C16/45519 , C23C16/45578 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/3277
摘要： This installation comprises a housing, a substrate support (20) received in said housing, diffusion means (42) for diffusing an inert gas, such as nitrogen, towards said substrate support and at least one head (30) defining an inner volume (V) opened opposite to said top, said head being provided with at least two electrodes (8, 8', 8") for creating an electric discharge and with injection means (7, 7', 7") for injecting a gaseous mixture towards said substrate.
Said injection means comprise at least one injection tube (7, 7', 7") placed between two adjacent electrodes or between one electrode and a peripheral wall, said tube being provided with injection holes facing said substrate support, for injecting said gaseous mixture on said substrate, whereas diffusion means are provided inside said head, said injection tube being placed between said substrate support and said diffusion means so that, in use, said gaseous mixture is urged against said substrate by said inert gas.
摘要翻译：这个装置包括一个外壳（20），在所述壳体内接收到的衬底支撑件，扩散装置（42），用于气体扩散惰性,:如氮，朝向所述衬底支撑件和至少一个头部（30）在内部容积定义（V ）打开相对所述顶部，被用于向所述注射的气体混合物提供，所述头部具有至少两个电极（8,8”，8“），用于创建关于放电，并用喷射装置（7，7' ，7" ）基板。所述注射装置包括两个相邻电极之间或一个电极和一外周壁之间放置至少一个喷射管（7,7”，7“），所述管设置有面向所述基板支撑，用于喷射孔喷射所述气体混合物上所述底物，而被所述头部内设置扩散装置，所述喷射管是所述之间放置的衬底支撑并扩散的所述装置使得在使用中，所述气体混合物通过所述惰性气体对所说基片施力。

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