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1. 发明公开

EP4451833A1 METAL PLATE AND DEPOSITION MASK FOR OLED PIXEL DEPOSITION INCLUDING SAME 失效
公开(公告)号：EP4451833A1
公开(公告)日：2024-10-23
申请号：EP22907760.7
申请日：2022-11-25
申请人： LG Innotek Co., Ltd.
发明人： CHANG, Woo Young
IPC分类号： H10K99/00 , H10K71/00 , C23C14/04
CPC分类号： C23C14/04 , H10K99/00 , H10K71/00
摘要： A metal plate used to manufacture a deposition mask for OLED pixel deposition, the metal plate comprises a first region; and a second region intersecting the first region, wherein the metal plate includes an invar containing iron and nickel, a first residual stress of the first region and a second residual stress of the second region are 5 mm or less, a ratio of the first residual stress and the second residual stress is 1:0.2 to 0.7, the first residual stress is a residual stress of an arbitrary first sample metal plate of a size of X mm*Y mm (horizontal*vertical) in which the first region is a horizontal region, the second residual stress is a residual stress of an arbitrary second sample metal plate of a size of Y mm*X mm (horizontal*vertical) in which the second region is a horizontal region, the X is 200 mm to 220 mm, and the Y is 140 mm to 160 mm, and the residual stress is defined by Equation 1 below when a thickness of a region after 5% to 10% of a length of a long width region from one end of each of the first sample metal plate and the second sample metal plate is etched to be 30% to 70% of a thickness of the metal plate and etched sample metal plates are mounted on a horizontal table. residualstress=H/L (H is a maximum height (mm) at which an etched region of a sample metal plate is bent up from an upper surface of the horizontal table, and L is a length (mm) of a first region in which an etched region is formed in a sample metal plate)

2. 发明公开

EP4444065A1 METAL ELECTRODE PATTERNING METHOD USING PATTERN FORMATION CONTROL MATERIAL, AND SUBSTRATE, ELECTRONIC DEVICE, AND DISPLAY HAVING METAL ELECTRODE PATTERN 审中-实审
公开(公告)号：EP4444065A1
公开(公告)日：2024-10-09
申请号：EP22901902.1
申请日：2022-12-05
申请人： Seoul National R&BD Foundation
发明人： HONG, Yong Taek , JEONG, Su Jin
IPC分类号： H10K71/00 , H01L21/285 , H01L21/027 , H10K99/00 , H10K50/80 , H10K50/00 , C23C14/04 , C23C14/14 , C23C14/56
CPC分类号： H01L21/027 , H01L21/285 , H10K50/00 , H10K50/80 , H10K71/00 , H10K99/00 , C23C14/04 , C23C14/14 , C23C14/56 , H10K59/80515 , H10K71/621 , H10K71/60
摘要： The metal electrode patterning method using a pattern formation control material according to one example of the present invention may comprise printing a pattern formation control material on a substrate in an engraved pattern; heat-treating the printed pattern formation control material; and forming a conductive metal electrode pattern in a region other than the engraved pattern-printed region, and the region in which the pattern formation control material is printed may have light transmittance.

3. 发明授权

EP4200876B1 IN-SITU METAL DEPOSITION IN A TOKAMAK 有权
公开(公告)号：EP4200876B1
公开(公告)日：2024-08-14
申请号：EP21823861.6
申请日：2021-12-01
IPC分类号： G21B1/13 , G21B1/25 , B22F7/06 , B22F10/25 , B22F10/362 , B23P6/00 , B33Y10/00 , C22C1/04 , C23C4/02 , C23C4/06 , C23C4/08 , C23C4/12 , C23C4/131 , C23C4/137 , C23C4/18 , C23C14/04 , C23C14/14 , C23C16/04 , C23C16/14 , C23C16/16
CPC分类号： G21B1/13 , G21B1/25 , B33Y10/00 , B22F10/25 , B23P6/00 , B22F7/062 , C22C1/045 , B22F10/362 , C23C14/04 , C23C16/04 , C23C14/14 , C23C16/14 , C23C4/12 , C23C4/131 , C23C4/137 , C23C4/02 , C23C4/18 , C23C4/06 , C23C4/08 , Y02P10/25 , Y02E30/10

4. 发明公开

EP4411018A1 MASK, MASK ASSEMBLY INCLUDING THE SAME, DISPLAY PANEL MANUFACTURING APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME 审中-公开
公开(公告)号：EP4411018A1
公开(公告)日：2024-08-07
申请号：EP24154978.1
申请日：2024-01-31
申请人： Samsung Display Co., Ltd.
发明人： KIM, Sang Hoon , LEE, Seung Jin , KANG, Yeon Ju , LEE, Sang Shin
IPC分类号： C23C14/04 , H10K71/16 , C23C14/12 , C23C14/24
CPC分类号： C23C14/042 , C23C14/12 , C23C14/24 , H10K71/166
摘要： A mask including a sensor area including at least one half-etched area, a first deposition area disposed external to the sensor area, and a second deposition area disposed in the sensor area. The mask, a mask assembly including the mask, a display panel manufacturing apparatus including the mask assembly, and a method of manufacturing a display panel using the display panel manufacturing apparatus in accordance with embodiments of the disclosure may improve deposition quality.

5. 发明公开

EP4400625A1 DEPOSITION APPARATUS, METHOD FOR DEPOSITING, METHOD FOR PACKAGING A DIE IN A CHIP PACKAGE 审中-公开
公开(公告)号：EP4400625A1
公开(公告)日：2024-07-17
申请号：EP23151545.3
申请日：2023-01-13
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
发明人： Bruning, Fabien Jacques , Hendriks, Rob Jacob
IPC分类号： C23C14/04 , C23C14/54 , C23C14/26 , C23C14/28 , C23C14/16 , C23C14/08 , B33Y10/00 , B33Y30/00 , B29C64/00 , H05K3/04 , H01L21/26 , H01L23/00 , B23K26/00 , H05K1/09 , H05K3/40
CPC分类号： B33Y30/00 , B33Y10/00 , H05K3/046 , H05K2203/052820130101 , H05K2203/110520130101 , H05K2203/033820130101 , H05K2203/06620130101 , H05K3/403 , H05K1/097 , H01L24/00 , B23K26/00 , H01L33/0095 , B29C64/141 , B29C64/268
摘要： A deposition apparatus (1) for depositing materials (Ma, Mb, ..., Mn) on a target (T) is provided herein. The apparatus is configured to initiate ejection of a material portion from an ejection position of a donor plate (2) at a point in time that a spatial vector defined between the deposition position (ps) and the ejection position (pe) corresponds to a movement of the donor plate (2) relative to the target (T). Also a corresponding deposition method is provided.

6. 发明公开

EP4394078A1 MASK AND METHOD FOR MANUFACTURING THE SAME 审中-公开
公开(公告)号：EP4394078A1
公开(公告)日：2024-07-03
申请号：EP23216873.2
申请日：2023-12-14
申请人： Samsung Display Co., Ltd. , Olum Material Corporation
发明人： AHN, Hong-Kyun , LEE, Byoung-Il , JANG, Taekyong , KO, Jungwoo , LEE, Seungjin
IPC分类号： C23C14/04
CPC分类号： C23C14/042 , H10K71/166
摘要： A mask includes a mask frame having an opening, an open mask disposed on the mask frame, the open mask having a first opening, the first opening disposed in the opening in the case that it is viewed in a plan view, and a cell mask disposed on the open mask and having a second opening, the second opening being smaller than the first opening.

7. 发明公开

EP4350438A1 PROCÉDÉ DE FABRICATION D'UN MOULE POUR FORMER UNE PIÈCE MÉTALLIQUE PAR CROISSANCE MÉTALLIQUE 审中-公开
公开(公告)号：EP4350438A1
公开(公告)日：2024-04-10
申请号：EP23202044.6
申请日：2023-10-06
申请人： Richemont International S.A.
发明人： CHABART, Mickaël
IPC分类号： G03F7/00 , G03F7/40 , C25D5/02 , C23C14/04
摘要： L'invention propose un procédé de fabrication d'un moule pour former au moins une pièce métallique (41) par galvanoplastie et/ou croissance métallique, comprenant les étapes consistant à :
a- se munir d'un substrat (10) présentant une surface de base et de préférence une surface conductrice de base,
b- déposer au moins une couche de résine photosensible (21) sur la surface de base du substrat (10),
c- irradier la couche de résine photosensible (21) au travers d'un masque (31),
d- développer la couche de résine photosensible (21) de sorte à creuser des cavités (50) dans la couche de résine photosensible (21) pour définir une empreinte de moulage,
caractérisé en ce que le procédé comprend, après l'étape d-, une étape consistant à amorcer le fond des cavités (50) pour la fabrication de la pièce métallique (41) par galvanoplastie et/ou croissance métallique.

8. 发明公开

EP4350025A1 COATINGS FOR CURVED SURFACES 审中-公开
公开(公告)号：EP4350025A1
公开(公告)日：2024-04-10
申请号：EP23197691.1
申请日：2023-09-15
申请人： Apple Inc.
发明人： VEERASAMY, Vijayen S
IPC分类号： C23C14/00 , C23C14/04 , C23C14/34 , C23C14/35 , C23C14/54 , H01J37/34 , C03C17/36
摘要： A transparent structure may have multiple layers, such as an inner layer and an outer layer, which may be formed from glass. The transparent structure may have a large, curved surface with compound curvature and high geometric strain and may include one or more layers. To apply a physical vapor deposition coating with uniform thickness on a curved surface, cathode power may be modulated during the deposition, a mask having an opening with a curvature matching the curved surface may be used, a cathode shape may be varied, the cathodes may sputter the coating outwardly toward the curved surface, a magnetic field may modulate the flux produced by the cathodes, and/or the pressure and/or flow of gas may be adjusted. By modifying the physical vapor deposition coater in one or more of these ways, the coating may have a uniform thickness, and therefore a uniform color, across the curved surface.

9. 发明授权

EP3643806B1 DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME 有权
公开(公告)号：EP3643806B1
公开(公告)日：2024-04-10
申请号：EP19204696.9
申请日：2019-10-22
发明人： KIM, Daeyong , YOU, Sukbeom , KANG, Sunwoo , CHO, Youngmi , KWAG, Jinoh
IPC分类号： C23C14/32 , C23C14/04

10. 发明公开

EP4343017A2 MASK STAGE AND MASK MANUFACTURING APPARATUS HAVING THE SAME 审中-实审
公开(公告)号：EP4343017A2
公开(公告)日：2024-03-27
申请号：EP23195095.7
申请日：2023-09-04
申请人： Samsung Display Co., Ltd.
发明人： HONG, Kyongho , KIM, Myungkyu , PARK, Sungho , PARK, Chang-Kon , YOU, Sukbeom , LEE, Dongjae
IPC分类号： C23C14/04 , H01L21/027 , H01L21/308 , H10K71/16
摘要： A mask stage includes a stage inclined with respect to a vertical direction perpendicular to a plane defined by a first direction and a second direction intersecting each other, a plurality of first support units disposed between the stage and a mask frame disposed above the stage, and a plurality of second support units disposed on the stage and being adjacent toa lower side of the mask frame. The lower side of the mask frame extends in a first direction, and the second support units are respectively disposed under end portions of the lower side of the mask frame, which are opposite to each other in the first direction.

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