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41. 发明授权

EP1662543B1 Ion beam irradiation system for ion implantation 有权
标题翻译：用于离子注入的离子照射装置
公开(公告)号：EP1662543B1
公开(公告)日：2012-03-14
申请号：EP05255331.0
申请日：2005-08-31
申请人： SEN Corporation, an SHI and Axcelis Company
发明人： Kabasawa, Mitsuaki , Tsukihara, Mitsukuni , Sogabe, Hiroshi
IPC分类号： H01J37/05 , H01J37/09
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/023 , H01J37/05 , H01J37/09 , H01J37/1474 , H01J37/1478 , H01J37/15 , H01J37/3007 , H01J2237/0213 , H01J2237/022 , H01J2237/0458 , H01J2237/047 , H01J2237/0492 , H01J2237/061 , H01J2237/0835 , H01J2237/1536 , H01J2237/24405 , H01J2237/24507 , H01J2237/30477 , H01J2237/31705

42. 发明公开

EP2175472A4 ELECTRON SOURCE 有权
标题翻译：电子源
公开(公告)号：EP2175472A4
公开(公告)日：2012-01-04
申请号：EP08777394
申请日：2008-06-19
申请人： DENKI KAGAKU KOGYO KK
发明人： NONOGAKI RYOZO , TERUI YOSHINORI
IPC分类号： H01J37/073 , H01J1/15 , H01J1/304 , H01J37/06 , H01J37/065 , H01J37/28
CPC分类号： H01J37/28 , H01J1/15 , H01J37/06 , H01J37/065 , H01J37/073 , H01J2237/061 , H01J2237/06316

43. 发明公开

EP2301056A1 ION SOURCES, SYSTEMS AND METHODS 有权
标题翻译：离子源，系统和方法
公开(公告)号：EP2301056A1
公开(公告)日：2011-03-30
申请号：EP08771626.2
申请日：2008-06-20
申请人： Carl Zeiss NTS, LLC.
发明人： WARD, Billy, W. , SANFORD, Colin A. , NOTTE IV, John A. , GHOHOLSKI, Alexander , DIMANNA, Mark
IPC分类号： H01J27/26 , H01J37/08 , F25D19/00
CPC分类号： H01J27/26 , F25D19/006 , H01J37/067 , H01J37/08 , H01J37/265 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/061 , H01J2237/0805 , H01J2237/0807 , H01J2237/244 , H01J2237/2487 , H01J2237/2826
摘要： Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).

44. 发明公开

EP2128886A1 Charged particle source with integrated energy filter 有权
标题翻译：带集成能量过滤器的带电粒子源
公开(公告)号：EP2128886A1
公开(公告)日：2009-12-02
申请号：EP09160973.5
申请日：2009-05-25
申请人： FEI Company
发明人： Henstra, Alexander
IPC分类号： H01J37/05 , H01J37/09 , H01J37/147 , H01J37/153 , H01J37/04
CPC分类号： H01J37/05 , H01J3/027 , H01J3/04 , H01J37/063 , H01J2237/045 , H01J2237/057 , H01J2237/061 , H01J2237/08 , H01J2237/15 , H01J2237/1534
摘要： The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.
The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.
摘要翻译：本发明描述了发生能量选择的粒子源。能量选择通过透过透镜107偏心地发送一束带电粒子103来发生。其结果是，能量分散将发生在由透镜形成的图像中。通过将该图像投影到能量选择膜片108中的狭缝109上，可以仅允许能量谱的有限部分中的粒子通过。结果，通过的光束113将具有降低的能量分布。偏转单元112将光束偏转到光轴101.也可以选择将穿过透镜中间的光束105朝向光轴偏转并且具有例如更大的电流。能量色散斑点由偏转器111在狭缝上成像。当将能量色散斑点定位在狭缝上时，中心光束105从轴偏转到被能量选择光阑停止的程度。因此避免了在隔膜之后的区域中由该射束引起的反射和污染。还避免了来自中心束的电子与偏转器112的区域中的能量滤波束相互作用所导致的电子 - 电子相互作用。

45. 发明公开

EP1662543A2 Ion beam irradiation system for ion implantation 有权
标题翻译： IonenbestrahlungsgerätfürIonenimplantation
公开(公告)号：EP1662543A2
公开(公告)日：2006-05-31
申请号：EP05255331.0
申请日：2005-08-31
申请人： SUMITOMO EATON NOVA CORPORATION
发明人： Kabasawa, Mitsuaki , Tsukihara, Mitsukuni , Sogabe, Hiroshi
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/023 , H01J37/05 , H01J37/09 , H01J37/1474 , H01J37/1478 , H01J37/15 , H01J37/3007 , H01J2237/0213 , H01J2237/022 , H01J2237/0458 , H01J2237/047 , H01J2237/0492 , H01J2237/061 , H01J2237/0835 , H01J2237/1536 , H01J2237/24405 , H01J2237/24507 , H01J2237/30477 , H01J2237/31705
摘要： Irradiation system that comprises a beam generation source (1), a mass analysis device (3), a beam transformer, a deflector (7) for scanning which swings the beam reciprocally, a beam parallelizing device (10,29), an acceleration/deceleration device (11,12), and an energy filtering device (18), and a hybrid angular energy filter (18) generating both electric and magnetic fields to ajust trajectories is provided as the energy filtering device, along with a pair of multi-surface energy slit units (19,19') each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.
摘要翻译：辐射系统，包括光束发生源（1），质量分析装置（3），光束变换器，用于使光束往复摆动的扫描的偏转器（7），光束并行化装置（10,29），加速度/ 减速装置（11,12）和能量过滤装置（18），以及产生电场和磁场的混合角能量滤波器（18），用于调节轨迹，作为能量过滤装置，在混合角能量滤波器的下游侧还进一步设置具有能够在其间切换的多个能量狭缝的表面能量狭缝单元（19,19'）。在诸如中性粒子，不同种类的掺杂剂，具有不同能量的离子，金属和灰尘颗粒的污染物的量非常小的条件下，可以从具有低能量到高能量的大电流束选择性地照射目标晶片。

46. 发明公开

EP1448769A4 SOFT IONIZATION DEVICE AND APPLICATIONS THEREOF 审中-公开
标题翻译： DEVICE FOR软电离及其用途
公开(公告)号：EP1448769A4
公开(公告)日：2006-02-01
申请号：EP02744678
申请日：2002-06-25
申请人： IONFINITY LLC
发明人： HARTLEY FRANK T
IPC分类号： G01N27/62 , C12M1/00 , C12M1/42 , C12N15/09 , G01N1/28 , G01N33/483 , G01N33/50 , H01J27/00 , H01J27/02 , H01J27/08 , H01J37/08 , H01J49/04 , H01J49/10 , H01J49/16 , H01J49/40 , C12N13/00 , G01N24/00 , H01J7/24
CPC分类号： H01J49/168 , G01N2223/612 , H01J3/027 , H01J3/04 , H01J27/02 , H01J27/26 , H01J37/08 , H01J49/0018 , H01J49/0427 , H01J2237/061 , H01J2237/0815 , H01J2237/317
摘要： A soft ionization device is disclosed that comprises a series of electrodes (120, 122) having spacing less than the means free path of the molecules to be ionized. In some embodiments, the soft ionization device (99) is used in various applications that require ion or electron sources such as biological or chemical reactors, ion milling, and numerous replacements for conventional hot cathode systems. In another embodiment, a valence spectrometer is disclosed that is configured to variably ionize molecules (301) by their valiancy. In other embodiments, the ionization device is coupled to a spectrometer for the characterization of biological matter. Also disclosed is a preconditioner for preparing biological matter to be ionized.

47. 发明授权

EP2724595B1 ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH HIGH VOLTAGE ISOLATION PROVIDED BY FLUID 有权
公开(公告)号：EP2724595B1
公开(公告)日：2018-07-25
申请号：EP12803226.5
申请日：2012-06-21
申请人： FEI Company
发明人： KELLOGG, Sean , GRAUPERA, Anthony , PARKER, N. William , UTLAUT, Mark W. , WELLS, Andrew B. , MCGINN, James B.
IPC分类号： H01J27/16 , H01J37/08 , H01J37/32 , H05H1/28 , H05H1/30 , H05H1/46
CPC分类号： H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/28 , H05H1/30 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.

48. 发明公开

EP3084804A4 A RIBBON BEAM ION SOURCE OF ARBITRARY LENGTH 有权
标题翻译： BANDSTRAHLIONENQUELLE MITWILLKÜRLICHERLÄNGE
公开(公告)号：EP3084804A4
公开(公告)日：2017-06-07
申请号：EP14871361
申请日：2014-11-26
申请人： WHITE NICHOLAS R
发明人： WHITE NICHOLAS R
IPC分类号： H01J37/08 , H01J27/14 , H01J37/317
CPC分类号： H01J27/14 , H01J37/08 , H01J37/3171 , H01J2237/061 , H01J2237/082
摘要： The invention is a unique and substantive improvement in ion source assemblies which is able to produce a ribbon-shaped ion beam having an arbitrarily chosen breadth dimension which is at least ten times greater [and often more than thirty times greater] than its thickness dimension, the breadth and thickness dimensions of the beam being normal (i.e., perpendicular) to the Z-axis direction of travel for the ion beam. In all its embodiments, the improved ion source will comprise not less than two discrete component parts: (i) A closed, solid wall, prism-shaped arc discharge chamber having limited width and depth dimensions, and which concurrently has an arbitrarily chosen and predetermined length dimension which can be as small as 80 millimeters and alternatively exceed 3,000 millimeters in size; and (ii) A primary electron trap assembly which comprises at least an adjacently located magnetic field generating yoke subassembly able to provide a discernible quadrupole magnetic field internally within a confined cavity volume existing within the measurable dimensions of the arc discharge chamber walls.
摘要翻译：本发明是离子源组件中的独特且实质性的改进，其能够产生具有任意选择的宽度尺寸的带状离子束，该宽度尺寸比其厚度尺寸大至少十倍[并且经常多于三十倍] 梁的宽度和厚度尺寸与离子束的Z轴行进方向垂直（即垂直）。在所有其实施例中，改进的离子源将包括不少于两个离散的组成部分：（i）具有有限的宽度和深度尺寸并且同时具有任意选择和预定的闭合的实心壁棱柱形电弧放电室长度尺寸可以小到80毫米，或者可以超过3000毫米; （ii）主要电子陷阱组件，其包括至少一个相邻定位的产生磁场的磁轭子组件，其能够在存在于电弧放电室壁的可测量尺寸内的受限腔体内提供可辨别的四极磁场。

49. 发明公开

EP2508903A3 Inspection device using secondary charged particle detection 有权
标题翻译：测试仪，基于所述检测充电二次粒子的
公开(公告)号：EP2508903A3
公开(公告)日：2015-01-21
申请号：EP12001774.4
申请日：2012-03-15
申请人： EBARA CORPORATION
发明人： Hatakeyama, Masahiro , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Naito, Yoshihiko , Toma, Yasushi , Karimata, Tsutomu , Hayashi, Takehide , Tsukamoto, Kiwamu , Kohama, Tatsuya , Kobayashi, Noboru
IPC分类号： G01R31/305 , G01R31/308 , H01J37/244 , H01J37/252 , H01J37/304 , H01J37/26
CPC分类号： H01J37/09 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).

50. 发明公开

EP2724595A4 ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH FLUID HIGH VOLTAGE ISOLATION 有权
标题翻译：铅的固体培养基使用与高电压绝缘液体连接包胶
公开(公告)号：EP2724595A4
公开(公告)日：2015-01-07
申请号：EP12803226
申请日：2012-06-21
申请人： FEI CO
发明人： KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
IPC分类号： H05H1/00 , H01J27/16 , H01J37/08 , H01J37/32 , H05H1/46
CPC分类号： H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/28 , H05H1/30 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.

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