专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2396803A4 IONIZATION PROBE ASSEMBLIES 审中-公开
标题翻译： IONISATIONSSONDENANORDNUNGEN
公开(公告)号：EP2396803A4
公开(公告)日：2016-10-26
申请号：EP10741818
申请日：2010-02-12
申请人： IBIS BIOSCIENCES INC
发明人： HOFSTADLER STEVEN A , GUTIERREZ JOSE R , HANNIS JAMES C , DRADER JARED J , BARE REX O , SMITH JEFFREY C , GLEASON PAUL J , NATHANSON JARED
IPC分类号： H01J49/16 , H01J49/04
CPC分类号： H01J49/165 , C12Q1/6872 , G01N23/00 , G01R31/2812 , G01R31/2848 , G01R31/2853 , H01J27/02 , H01J49/0422 , H01J49/0431 , H01J49/0468

2. 发明公开

EP2003225A4 ION GUN SYSTEM, VAPOR DEPOSITION APPARATUS AND PROCESS FOR PRODUCING LENS 有权
标题翻译： IONWAFFENSYSTEM，FOR地制造透镜蒸汽存储设备与方法
公开(公告)号：EP2003225A4
公开(公告)日：2011-03-16
申请号：EP07740157
申请日：2007-03-28
申请人： HOYA CORP
发明人： TAKAHASHI YUKIHIRO , HAMAMOTO TERUFUMI , SHINDE KENICHI
IPC分类号： C23C14/22 , C23C14/48 , G02B1/11 , G02B1/111 , G02B1/18
CPC分类号： C23C14/32 , C23C14/0031 , C23C14/0042 , C23C14/221 , C23C14/54 , C23C14/564 , C23C16/30 , G02B1/11 , H01J27/02 , H01J37/08 , H01J37/302 , H01J37/317 , H01J37/3178 , H01J2237/006 , H01J2237/022

3. 发明公开

EP2003225A9 ION GUN SYSTEM, VAPOR DEPOSITION APPARATUS AND PROCESS FOR PRODUCING LENS 有权
标题翻译： IONWAFFENSYSTEM，FOR地制造透镜蒸汽存储设备与方法
公开(公告)号：EP2003225A9
公开(公告)日：2009-05-06
申请号：EP07740157.8
申请日：2007-03-28
申请人： HOYA CORPORATION
发明人： TAKAHASHI, Yukihiro , HAMAMOTO, Terufumi , SHINDE, Kenichi
IPC分类号： C23C14/22 , G02B1/11
CPC分类号： C23C14/32 , C23C14/0031 , C23C14/0042 , C23C14/221 , C23C14/54 , C23C14/564 , C23C16/30 , G02B1/11 , H01J27/02 , H01J37/08 , H01J37/302 , H01J37/317 , H01J37/3178 , H01J2237/006 , H01J2237/022
摘要： An ion gun system 60 includes an ion gun 14 for irradiating an ion beam; an electric power supply unit 61 for supplying electric power to the ion gun; two mass flow regulators 64, 65 for introducing each of two types of gas in the ion gun; a control unit 12 connected to the electric power supply unit for working as ion gun control means for controlling electric power supplied to the ion gun from the electric power supply unit; and a control unit 12 connected to the mass flow regulators for working as mass flow control means for controlling the flow rate of gas introduced from the mass flow regulators in the ion gun. The control unit 12 as mass flow control means is provided with a function of changing the set value for the flow rate of each of the two types of gas to another set value by changing it stepwise within a range where the ion gun is working stably. Accordingly, shortening of film formation time can be attained.

4. 发明公开

EP1448769A1 SOFT IONIZATION DEVICE AND APPLICATIONS THEREOF 审中-公开
标题翻译： DEVICE FOR软电离及其用途
公开(公告)号：EP1448769A1
公开(公告)日：2004-08-25
申请号：EP02744678.0
申请日：2002-06-25
申请人： Ionfinity LLC
发明人： HARTLEY, Frank, T.
IPC分类号： C12N13/00 , G01N24/00 , H01J7/24
CPC分类号： H01J49/168 , G01N2223/612 , H01J3/027 , H01J3/04 , H01J27/02 , H01J27/26 , H01J37/08 , H01J49/0018 , H01J49/0427 , H01J2237/061 , H01J2237/0815 , H01J2237/317
摘要： A soft ionization device is disclosed that comprises a series of electrodes (120, 122) having spacing less than the means free path of the molecules to be ionized. In some embodiments, the soft ionization device (99) is used in various applications that require ion or electron sources such as biological or chemical reactors, ion milling, and numerous replacements for conventional hot cathode systems. In another embodiment, a valence spectrometer is disclosed that is configured to variably ionize molecules (301) by their valiancy. In other embodiments, the ionization device is coupled to a spectrometer for the characterization of biological matter. Also disclosed is a preconditioner for preparing biological matter to be ionized.

5. 发明公开

EP1348228A1 ION SOURCE 审中-公开
标题翻译：离子源
公开(公告)号：EP1348228A1
公开(公告)日：2003-10-01
申请号：EP01998988.8
申请日：2001-11-29
申请人： Saintech Pty. Ltd
发明人： SAINTY, Wayne, G.
IPC分类号： H01J37/317 , H01J37/08 , H01J27/02 , C23C14/54
CPC分类号： H01J27/02 , C23C14/221 , C23C14/54 , H01J27/146 , H01J37/08
摘要： An ion source (10) for use in ion assisted deposition of films, has an ionisation region (13), a gas supply (22), supplying ionisable gas to the ionisation region, a gas excitation system (11, 12) causing ionisation of the gas, ion influencing means forming the ions into a current directed at a target, and an ion source controller controlling the ion source so as to intermittently produce the current.

6. 发明公开

EP0304525A1 Pulsed microfocused ion beams 失效
标题翻译： Gepulste mikrofokussierte Ionenstrahlen。
公开(公告)号：EP0304525A1
公开(公告)日：1989-03-01
申请号：EP87307672.3
申请日：1987-08-28
申请人： FISONS plc
发明人： Waugh, Allen Robert
IPC分类号： H01J27/02 , H01J49/10 , H01J49/40
CPC分类号： H01J49/061 , H01J27/02 , H01J49/40
摘要： An ion gun (42) for producing a pulsed microfocused beam of ions comprises an ion source (1) arranged to produce a continuous ion beam along a z-axis toward a collector (13) having an aperture (14) on the axis. A deflector (7) is arranged to maintain the beam substantially stationary and incident on the aperture for a pulse time, to deflect the beam away from the aperture to the collector and subsequently to return the beam to be incident at the aperture. A focussing lens (15) focusses the beam from the deflection point (at 7) to a final image point, and a condensing lens (2) focusses the beam at the deflection point. A mass filter (6) selects a single ion species, and a second deflector (10) deflects the beam orthogonally to the deflector (7) so that the returning path of the beam on the collector (13) does not cross the aperture (14). A stigmator (60,61) and a beam scanner (19) are also provided.
摘要翻译：用于产生脉冲的聚焦离子束的离子枪（42）包括离子源（1），该离子源（1）被布置成沿z轴朝向在轴上具有孔（14）的收集器（13）产生连续的离子束。偏转器（7）被布置成保持光束基本静止并入射到孔上一段脉冲时间，以使光束远离光圈偏转到收集器，并且随后使光束返回到入射到光圈处。聚焦透镜（15）将来自偏转点（在7处）的光束聚焦到最终图像点，并且聚光透镜（2）将光束聚焦在偏转点处。质量过滤器（6）选择单个离子种类，而第二偏转器（10）将光束垂直偏转到偏转器（7），使得收集器（13）上的光束的返回路径不穿过光圈（14））。还提供了一个标示器（60,61）和一个光束扫描器（19）。

7. 发明公开

EP0298577A2 Charged particle source of large current with high energy 失效
标题翻译： Quelle geladener Teilchen hohen Stromes und hoher Energie。
公开(公告)号：EP0298577A2
公开(公告)日：1989-01-11
申请号：EP88201449.1
申请日：1988-07-08
申请人： HITACHI, LTD. , Philips Electronics N.V.
发明人： Stormberg, Hans-Peter , Watanabe, Yoshio , Ochiai, Isao
IPC分类号： H05H1/24 , H01J27/02
CPC分类号： H01J27/02 , H05H1/52
摘要： A plasma ion source comprising coaxially oriented electrodes (1,2), a first rod-shaped electrode (1) and a second annular-shape electrode (2). The electrodes are positioned inside an enclosure filled with a gas with an atomic number higher than five. The current source is capable of delivering a current up to 100 KA within 1 micro sec. A focusing means (7) is positioned near the desired plasma pinch.
摘要翻译：一种等离子体离子源，包括同轴取向电极（1,2），第一棒状电极（1）和第二环形电极（2）。电极位于充满原子序数高于5的气体的外壳内。电流源能够在1微秒内传递高达100 KA的电流。聚焦装置（7）位于期望的等离子体夹持附近。

8. 发明公开

EP0077738A1 Source d'ions comprenant une chambre d'ionisation à gaz avec oscillations d'électrons 失效
标题翻译：离子源Gasionisierungsraum电子振荡。
公开(公告)号：EP0077738A1
公开(公告)日：1983-04-27
申请号：EP82401920.2
申请日：1982-10-19
申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE Etablissement de Caractère Scientifique Technique et Industriel
发明人： Boyer, Robert La Coudounière , Journoux, Jean-Pierre
IPC分类号： H01J27/02
CPC分类号： H01J27/02
摘要： L'invention concerne une source d'ions.
Cette source comprend une chambre d'ionisation (1) à gaz, une source d'électrons (SE,), des moyens pour faire osciller les électrons dans la chambre de manière à créer une zone d'ionisation (Z) du gaz. Elle est caractérisée en ce que les moyens pour faire osciller les électrons comprennent deux lentilles électroniques (L 1 , L 2 ) identiques dont les axes coïncident avec la direction d'oscillation, deux miroirs sphériques (M 1 , M 2 ) concaves tournés l'un vers l'autre et situés respectivement de part et d'autre des deux lentilles (L 1 , L 2 ) et dont leurs centres coïncident respectivement avec les foyers (F 1 , F 2 ) des lentilles, la source (SE 1 ) d'électrons étant située au foyer (F,) de l'une des deux lentilles (L 1 , L 2 ).
Application à l'analyse des gaz par spectrométrie de masse.

9. 发明公开

EP2311060A2 ION SOURCE WITH DEVICE FOR OXIDISING OR HALOGENATING A SAMPLE 有权
标题翻译：使用设备离子源氧化或卤化A示例
公开(公告)号：EP2311060A2
公开(公告)日：2011-04-20
申请号：EP09784708.1
申请日：2009-07-16
申请人： Micromass UK Limited
发明人： BATEMAN, Robert, Harold
IPC分类号： H01J27/02 , H01J49/14 , G01N31/12
CPC分类号： H01J49/147 , H01J27/02 , H01J49/0077
摘要： An ion source is disclosed wherein a sample is introduced into the sample chamber (1) of the ion source in the gas phase via a sample introduction capillary tube (2). The sample is directed onto a heated surface (6) coated with an oxidising reagent such as copper oxide. Carbon in the sample is oxidised to form carbon dioxide. The resulting carbon dioxide molecules are then ionised by electron impact ionisation with an electron beam (3) and the resulting ions are passed to a mass analyser for mass analysis.

10. 发明公开

EP1348228A4 ION SOURCE 审中-公开
标题翻译：离子源
公开(公告)号：EP1348228A4
公开(公告)日：2010-08-04
申请号：EP01998988
申请日：2001-11-29
申请人： SAINTECH PTY LTD
发明人： SAINTY WAYNE G
IPC分类号： H05H1/24 , C23C14/22 , C23C14/32 , C23C14/54 , H01J27/08 , H01J37/04 , H01J37/08 , H01J37/317 , H01J27/02
CPC分类号： H01J27/02 , C23C14/221 , C23C14/54 , H01J27/146 , H01J37/08

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式