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1. 发明公开

EP4362055A2 ELECTRON MICROSCOPE, MULTIPOLE ELEMENT FOR USE THEREIN, AND CONTROL METHOD FOR SUCH ELECTRON MICROSCOPE 审中-公开
公开(公告)号：EP4362055A2
公开(公告)日：2024-05-01
申请号：EP23197630.9
申请日：2023-09-15
申请人： Jeol Ltd.
发明人： MORISHITA, Shigeyuki , JIMBO, Yu
IPC分类号： H01J37/141 , H01J37/153 , H01J37/28
CPC分类号： H01J37/153 , H01J2237/153420130101 , H01J2237/15320130101 , H01J37/141 , H01J37/28
摘要： There is provided an electron microscope capable of reducing variations of aberrations due to thermal variations. The electron microscope (100) includes an electron optical system (2) having a built-in aberration corrector (26) equipped with multipole elements (260) each for producing a multipolar field. Each multipole element (260) includes a plurality of magnetic polepieces (4). Each polepiece (4) includes a magnetic core (6), a first coil (8a) wound around the core (6), and a second coil (8b) wound around the core (6). The first coil (8a) and the second coil (8b) produce a first multipolar field and a second multipolar field, respectively, when energized. The first and second multipolar fields are identical in terms of symmetry.

2. 发明公开

EP4254467A1 ELECTRON MICROSCOPE AND ABERRATION MEASUREMENT METHOD 审中-公开
公开(公告)号：EP4254467A1
公开(公告)日：2023-10-04
申请号：EP23163038.5
申请日：2023-03-21
申请人： Jeol Ltd.
发明人： SAWADA, Hidetaka , KANEKO, Takeshi , MORISHITA, Shigeyuki , KOHNO, Yuji
IPC分类号： H01J37/153 , H01J37/244 , H01J37/28
摘要： An electron microscope includes an irradiation optical system that focuses electron beams and scans a specimen with the focused electron beams; a deflector that deflects the electron beams transmitted through the specimen; a detector that detects the electron beams transmitted through the specimen; and a control unit that controls the irradiation optical system and the deflector, the control unit causing the irradiation optical system to scan the specimen with the electron beams so that the electron beams have a plurality of irradiation positions on the specimen, the control unit causing the deflector to repeatedly deflect the electron beams transmitted through each of the irradiation positions, so that a plurality of electron beams which have the same irradiation position and different incident angle ranges with respect to the specimen are caused to sequentially enter the detector.

3. 发明公开

EP4068332A3 METHOD TO CORRECT FIRST ORDER ASTIGMATISM AND FIRST ORDER DISTORTION IN MULTI-BEAM SCANNING ELECTRON MICROSCOPES 审中-实审
公开(公告)号：EP4068332A3
公开(公告)日：2023-02-01
申请号：EP22163969.3
申请日：2022-03-24
申请人： FEI Company
发明人： Stopka, Jan , Sed'a, Bohuslav
IPC分类号： H01J37/153 , H01J37/28
摘要： An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

4. 发明公开

EP4086934A1 ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY ELECTRONS ONTO A SAMPLE 无效
公开(公告)号：EP4086934A1
公开(公告)日：2022-11-09
申请号：EP21171996.8
申请日：2021-05-04
申请人： ASML Netherlands B.V.
发明人： OSTERBERG, Mans, Johan, Bertil , KANAI, Kenichi
IPC分类号： H01J37/28 , H01J37/147 , H01J37/153 , H01J37/05
摘要： Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample (238) are disclosed. In one arrangement, a beam separator (222) diverts away from the primary beam path a beam of secondary electrons emitted from the sample along the primary beam path. A dispersion device (311) is upbeam from the beam separator. The dispersion device compensates for dispersion induced in the primary beam by the beam separator. One or more common power supplies (1004) drive both the beam separator and the dispersion device.

5. 发明公开

EP4030462A1 METHOD OF MEASURING ABERRATION AND ELECTRON MICROSCOPE 审中-公开
公开(公告)号：EP4030462A1
公开(公告)日：2022-07-20
申请号：EP21213088.4
申请日：2021-12-08
申请人： Jeol Ltd.
发明人： MORISHITA, Shigeyuki , SAGAWA, Ryusuke , UEMATSU, Fuminori , NAKAMICHI, Tomohiro , AIBARA, Keito
IPC分类号： H01J37/26 , H01J37/153
摘要： A method of measuring an aberration in an electron microscope (100) includes: acquiring an image for measuring an aberration in the electron microscope (100); and measuring an aberration by using the image, and in measuring an aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system (20) of the electron microscope (100) and an optical condition of the optical system (20).

6. 发明公开

EP4020565A1 DETECTOR SUBSTRATE, AN INSPECTION APPARATUS AND METHOD OF SAMPLE ASSESSMENT 审中-公开
公开(公告)号：EP4020565A1
公开(公告)日：2022-06-29
申请号：EP20217152.6
申请日：2020-12-23
申请人： ASML Netherlands B.V.
发明人： WIELAND, Marco, Jan-Jaco , NIHTIANOV, Stoyan , VEENSTRA, Roy, Ramon , JIANG, Hui
IPC分类号： H01L27/144 , H01L27/146 , H01L31/115 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28 , H01J37/317
摘要： There is provided a detector substrate for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.

7. 发明公开

EP4002421A1 OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OPTICAL SYSTEM ARRAY, METHOD OF FOCUSING 审中-公开
公开(公告)号：EP4002421A1
公开(公告)日：2022-05-25
申请号：EP20207178.3
申请日：2020-11-12
申请人： ASML Netherlands B.V.
发明人： WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/28 , H01J37/12 , H01J37/153
摘要： Objective lens array assemblies and associated methods are disclosed. In one arrangement, the objective lens array assembly focuses a multi-beam of sub-beams on a sample. Planar elements define a plurality of apertures aligned along sub-beam paths. An objective lens array projects the multi-beam towards a sample. Apertures of one or more of the planar elements compensate for off-axis aberrations in the multi-beam.

8. 发明公开

EP3953959A1 MEMS IMAGE FORMING ELEMENT WITH BUILT-IN VOLTAGE GENERATOR 审中-实审
公开(公告)号：EP3953959A1
公开(公告)日：2022-02-16
申请号：EP20714574.9
申请日：2020-03-25
申请人： ASML Netherlands B.V.
发明人： WANG, Yongxin , LAI, Rui-Ling , ZHANG, Qian
IPC分类号： H01J37/12 , H01J37/147 , H01J37/153 , H01J37/28

9. 发明公开

EP3863040A1 CHARGED PARTICLE MANIPULATOR DEVICE 审中-公开
公开(公告)号：EP3863040A1
公开(公告)日：2021-08-11
申请号：EP20156253.5
申请日：2020-02-07
申请人： ASML Netherlands B.V.
发明人： BRANDT, Pieter, Lucas , WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/153
摘要： A multi-beam manipulator device operates on sub-beams of a multi-beam to deflect the sub-beam paths. The device comprises: an electrode as pairs of parallel surfaces. Each pair of parallel surfaces comprises a first surface that is arranged along a side of a corresponding line of sub-beams and a second surface that is arranged parallel to the first surface and along an opposite side of the corresponding line of sub-beam paths. A first pair of parallel surfaces is configured to electro-statically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying a deflection amount to the paths of sub-beams in a first direction. A second pair of parallel surfaces is configured to electro-statically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying another deflection amount to the paths of sub-beams in a second direction.

10. 发明公开

EP3780064A1 TEILCHENOPTISCHER KORREKTOR FREI VON AXIALEN FEHLERN SECHSTER ORDNUNG UND ELEKTRONENMIKROSKOP MIT KORREKTOR 有权
公开(公告)号：EP3780064A1
公开(公告)日：2021-02-17
申请号：EP20186011.1
申请日：2020-07-15
申请人： Ceos Corrected Electron Optical Systems GmbH
发明人： Uhlemann, Dr., Stephan
IPC分类号： H01J37/153
摘要： Die Erfindung betrifft einen teilchenoptischen Korrektor (5) zum Korrigieren von Abbildungsfehlern, wobei der Korrektor (5) ein zentrales Multipolelement (2) der Länge L zur Erzeugung eines Hexapolfeldes ( Ψ HP2 ) in der Symmetrieebene (6) des Korrektors (5) sowie zwei äußere identische Multipolelemente (1, 3) der Länge L 'zur Erzeugung gleich starker Hexapolfelder (ψ HP1 , ψ HP3 ) und zwei Rundlinsendupletts (7 und 8) mit Rundlinsen (7', 7", 8', 8") aufweist.
Bei einem derartigen Korrektor wird der Dreilappfehler sechster Ordnung (D 6 ) dadurch vermieden, daß die Stärke des zentralen Hexapolfeldes ( Ψ HP2 ) zu den Stärken der beiden gleich starken äußeren Hexapolfelder ( Ψ HP1,3 ) derart gewählt ist, daß der dreizählige axiale Astigmatismus (A 2 ) verschwindet und die Stärken ( Ψ HP1,3 ) letzterer so gewählt sind, daß der Korrektor (5) insgesamt keinen sechszähligen axialen Astigmatismus (A 5 ) hat, daß der Abstand der Multipolelemente (1 und 3) von den der Symmetrieebene (6) weiter entfernten Rundlinsen (7", 8"), deren Brennweite ( f ') zuzüglich eines weiteren Abstands ( Δz ) entspricht, der so gewählt ist, daß für die gegebenen Längen L und L' der axiale Dreilappfehler vierter Ordnung (D 4 ) verschwindet, und daß die Länge ( L ) des zentralen Multipolelements (2) im Verhältnis zu den Längen ( L ') der Multipolelemente (1 und 3) derart gewählt ist, daß der axiale Dreilappfehler sechster Ordnung (D 6 ) - für das vorgegebene Verhältnis (M = f / f' ) der Brennweite ( f ') der zur Symmetrieebene (6) näheren Rundlinsen (7', 8') zu der Brennweite ( f ') der zur Symmetrieebene (6) weiter entfernten Rundlinsen (7", 8") - verschwindet.

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