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1. 发明公开

EP3528276A2 MICROSCOPY IMAGING METHOD 审中-公开
公开(公告)号：EP3528276A2
公开(公告)日：2019-08-21
申请号：EP18211266.4
申请日：2012-05-14
申请人： Fibics Incorporated
发明人： Phaneuf, Michael, William , Lagarec, Ken, Guillaume
IPC分类号： H01J37/28 , H01J37/22
CPC分类号： H01J37/26 , G06T2207/10061 , H01J37/222 , H01J37/28 , H01J37/3005 , H01J37/304 , H01J37/3045 , H01J37/3056 , H01J2237/226 , H01J2237/2811 , H01J2237/3174 , H01J2237/31749
摘要： Generally, the present disclosure provides a method and system for improving imaging efficiency for CPB systems while maintaining or improving imaging accuracy over prior CPB systems. A large field of view image of a sample is acquired at a low resolution and thus, at high speed. The low resolution level is selected to be sufficient for an operator to visually identify structures or areas of interest on the low resolution image. The operator can select one or more small areas of arbitrary shape and size on the low resolution image, referred to as an exact region of interest (XROI). The outline of the XROI is mapped to an x-y coordinate system of the image, and the CPB system is then controlled to acquire a high resolution image of only the XROI identified on the low resolution image. For 3D imaging, once the XROI is identified, each section of the sample can be iteratively imaged in the previously described manner, with the operator having the option to redefine the XROI later.

2. 发明公开

EP3396696A1 COMPACT DEFLECTING MAGNET 无效
公开(公告)号：EP3396696A1
公开(公告)日：2018-10-31
申请号：EP18168953.0
申请日：2018-04-24
申请人： Imatrex, Inc.
发明人： RAND, Roy E. , ZISKIN, Vitaliy
IPC分类号： H01J29/64 , H01J29/76 , H01J35/14 , H01J29/66 , H01J37/147 , H01J37/14
CPC分类号： H01J37/1475 , H01J29/66 , H01J29/76 , H01J35/14 , H01J37/08 , H01J37/14 , H01J37/153 , H01J37/266 , H01J37/3174 , H01J2237/1526 , H01J2237/2806 , H01J2237/31749
摘要： A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

3. 发明授权

EP2612342B1 NAVIGATION AND SAMPLE PROCESSING USING AN ION SOURCE CONTAINING BOTH LOW-MASS AND HIGH-MASS SPECIES 有权
公开(公告)号：EP2612342B1
公开(公告)日：2018-08-22
申请号：EP11822623.2
申请日：2011-08-31
申请人： FEI Company
发明人： RUE, Chad
IPC分类号： H01J37/20 , H01J37/08 , H01J37/304 , H01J37/305
CPC分类号： H01J37/317 , H01J37/3005 , H01J37/304 , H01J37/3056 , H01J2237/0805 , H01J2237/0825 , H01J2237/30466 , H01J2237/30472 , H01J2237/31749
摘要： An improved method and apparatus for imaging and milling a substrate using a FIB system. Preferred embodiments of the present invention use a mixture of light and heavy ions, focused to the same focal point by the same beam optics, to simultaneously mill the sample surface (primarily with the heavy ions) while the light ions penetrate deeper into the sample to allow the generation of images of subsurface features. Among other uses, preferred embodiments of the present invention provide improved methods of navigation and sample processing that can be used for various circuit edit applications, such as backside circuit edit.

4. 发明公开

EP3226279A1 SAMPLE HOLDER AND FOCUSED ION BEAM APPARATUS 有权
标题翻译：样品支架和聚焦离子束装置
公开(公告)号：EP3226279A1
公开(公告)日：2017-10-04
申请号：EP17163154.2
申请日：2017-03-27
申请人： Hitachi High-Tech Science Corporation
发明人： IWAHORI, Toshiyuki , OONISHI, Tsuyoshi
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J37/26 , H01J2237/08 , H01J2237/206 , H01J2237/31745 , H01J2237/31749
摘要： Shaft members (26A, 26B) which respectively protrude toward at least one beam member (23A, 23B) and the other beam member (23B, 23A) in a z-axis direction are formed in a mesh support member (24). A through hole (43) for penetrating a space between a shaft end surface and an opening portion in the z-axis direction and introducing a focused ion beam toward a fine sample piece is formed in at least one shaft member.
摘要翻译：在网状支承部件24上形成有分别沿z轴方向朝向至少一个梁部件23A，23B和另一个梁部件23B，23A突出的轴部件26A，26B。在至少一个轴构件上形成有贯通孔（43），该贯通孔（43）在z轴方向贯通轴端面与开口部之间的空间，并朝向微小试料片导入聚焦离子束。

5. 发明公开

EP2400524A3 Method of processing of an object 审中-公开
标题翻译：对象的处理方法
公开(公告)号：EP2400524A3
公开(公告)日：2017-06-28
申请号：EP11005111.7
申请日：2011-06-22
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Paluszynski, Jaroslaw , Dönitz, Dietmar , Mathée, Hans , Steigerwald, Michael
IPC分类号： H01J37/30 , H01J37/305 , H01J37/304 , H01J37/317 , G01B15/08
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning (103,105); determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons (107); determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations (113).
摘要翻译：一种处理物体的方法包括扫描物体表面上的粒子束并检测由于扫描而从物体出现的电子（103,105）; 基于检测到的电子，确定物体表面上的多个位置中的每一个位置处的物体的表面与预定表面之间的高度差（107）; 基于所确定的高度差确定对象的表面上的多个位置中的每一个的处理强度; 以及基于所确定的处理强度将粒子束引导至所述多个位置，以便从所述多个位置（113）处的物体上去除材料或将材料沉积在所述物体上。

6. 发明公开

EP3149761A1 METHOD AND APPARATUS FOR SLICE AND VIEW SAMPLE IMAGING 有权
标题翻译： VERFAHREN UND VORRICHTUNG ZUM SCHNEIDEN UND ANZEIGEN EINER PROBENABBILDUNG
公开(公告)号：EP3149761A1
公开(公告)日：2017-04-05
申请号：EP15800579.3
申请日：2015-06-11
申请人： FEI Company
发明人： BROGDEN, Valerie
IPC分类号： H01J37/26 , H01J37/08
CPC分类号： H01J37/3056 , G01N23/2208 , G01N23/2251 , G01N23/2255 , H01J37/26 , H01J37/265 , H01J37/3023 , H01J2237/2611 , H01J2237/2814 , H01J2237/31745 , H01J2237/31749
摘要： Methods, apparatuses, and systems for slice and view processing of samples with dual beam systems. The slice and view processing includes exposing a vertical wall of a trench formed in a sample surface; capturing a first image of the wall by interrogating the wall with an interrogating beam while the wall is at a first orientation relative to the beam; capturing a second image of the wall by interrogating the wall with the beam while the wall is at a second orientation relative to the beam, wherein first distances in the first image between a reference point and surface points on the wall are different than second distances in the second image between the reference point and the surface points; determining elevations of the surface points using the first distances and the second distances; and fitting a curve to topography of the wall using the elevations.
摘要翻译：具有双光束系统的样品的切片和视图处理的方法，装置和系统。切片和视图处理包括暴露在样品表面中形成的沟槽的垂直壁; 当所述壁相对于所述梁处于第一取向时，通过用询问梁询问所述壁来捕获所述壁的第一图像; 通过在所述壁相对于所述光束处于第二取向的情况下通过询问所述壁而获取所述壁的第二图像，其中所述第一图像中的参考点和所述壁上的表面点之间的第一距离不同于所述第一距离参考点和表面点之间的第二个图像; 使用第一距离和第二距离确定表面点的高度; 并使用高程将曲线拟合到墙的地形。

7. 发明公开

EP3125270A1 TEM SAMPLE MOUNTING GEOMETRY 审中-公开
标题翻译： TEM-PROBENBEFESTIGUNGSGEOMETRIE
公开(公告)号：EP3125270A1
公开(公告)日：2017-02-01
申请号：EP15178449.3
申请日：2015-07-27
申请人： FEI Company
发明人： Foord, David
IPC分类号： H01J37/20 , G01N1/32
CPC分类号： H01J37/20 , G01N1/32 , H01J2237/20214 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： A system and method for transmission electron microscopy is provided. The sample can be examined from multiple directions using an electron beam in a transmission electron microscope. The sample has at least three observation faces that are not parallel to each other with the thickness of the sample orthogonal to each of the observation faces being less than 200 nm. The sample is mounted on a needle that is needle rotatable about more than one axis so the needle can orient at least three of the observation faces to be normal to the electron beam of the electron microscope for observation.
摘要翻译：提供了一种用于透射电子显微镜的系统和方法。可以在透射电子显微镜中使用电子束从多个方向检查样品。样品具有至少三个不相互平行的观察面，其中每个观察面的样品的厚度小于200nm。将样品安装在针上，该针可以围绕多于一个轴线旋转，因此针可将至少三个观察面定向成垂直于电子显微镜的电子束观察。

8. 发明授权

EP2001038B9 Teilchenstrahlgerät und Verfahren zur Anwendung bei einem Teilchenstrahlgerät 有权转让
标题翻译：粒子束装置和方法，用于在一个粒子束的使用
公开(公告)号：EP2001038B9
公开(公告)日：2016-10-26
申请号：EP08157672.0
申请日：2008-06-05
申请人： Carl Zeiss Microscopy GmbH
发明人： Zeile, Ulrike , Schertel, Andreas
IPC分类号： H01J37/20 , H01J37/26 , H01J37/305
CPC分类号： H01J37/20 , H01J37/26 , H01J37/3056 , H01J2237/201 , H01J2237/20207 , H01J2237/206 , H01J2237/31745 , H01J2237/31749

9. 发明授权

EP2724359B1 HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED 有权
标题翻译：与未主动泵送液体电感耦合等离子体离子源的高电压隔离
公开(公告)号：EP2724359B1
公开(公告)日：2016-09-28
申请号：EP12802095.5
申请日：2012-06-21
申请人： FEI Company
发明人： KELLOGG, Sean , WELLS, Andrew, B. , MCGINN, James, B. , PARKER, N., William , UTLAUT, Mark, W.
IPC分类号： H05H1/00 , H05H1/46 , H01J37/32 , H01J27/16 , H01J37/08
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652

10. 发明授权

EP2904382B1 HIGH ASPECT RATIO STRUCTURE ANALYSIS 有权
标题翻译：结构分析宽高比HIGH
公开(公告)号：EP2904382B1
公开(公告)日：2016-08-24
申请号：EP13844339.5
申请日：2013-10-04
申请人： FEI Company
发明人： LEE, Sang Hoon , STONE, Stacey , BLACKWOOD, Jeffrey , SCHMIDT, Michael
IPC分类号： G01N23/00 , B23K15/08 , G01B15/00 , H01J37/305 , H01J37/317 , G01N1/32
CPC分类号： H01J37/3053 , C23C14/46 , G01N1/32 , H01J37/28 , H01J37/3056 , H01J37/3178 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
摘要： Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.

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