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1. 发明授权

EP2718956B1 ION SOURCE, NANOFABRICATION APPARATUS COMPRISING SUCH SOURCE, AND A METHOD FOR EMITTING IONS 有权
标题翻译：离子源中，随着对离子发射此类源和方法纳米制造装置
公开(公告)号：EP2718956B1
公开(公告)日：2015-08-05
申请号：EP12725462.1
申请日：2012-06-05
申请人： Centre National de la Recherche Scientifique (CNRS) , Université Claude Bernard Lyon 1
发明人： GIERAK, Jacques , ALLEMANDOU, Nicolas , HASSELBACH, Klaus , LEGGERI, Jean-Paul , DONNIER-VALENTIN, Guillaume , PURCELL, Stephen , GAVAND, Pauline
IPC分类号： H01J27/02 , H01J27/22 , H01J37/317 , H01J37/08
CPC分类号： H01J37/08 , H01J3/18 , H01J3/26 , H01J27/022 , H01J27/024 , H01J27/22 , H01J37/05 , H01J37/317 , H01J37/3174 , H01J2237/0807 , H01J2237/0815 , H01J2237/0827

2. 发明公开

EP2610888A3 Cooled charged particle systems and methods 有权
标题翻译：冷却带电粒子的系统和方法
公开(公告)号：EP2610888A3
公开(公告)日：2014-12-17
申请号：EP13001553.0
申请日：2010-06-14
申请人： Carl Zeiss Microscopy, LLC
发明人： McVey, Shawn , Dimanna, Mark , Bassett, Brian , Comunale, Richard , Barriss, Louise , Sanford, A. Colin , Notte, A. John , Groholski, Alexander
IPC分类号： H01J37/08 , H01J37/02 , F25D3/12 , H01J37/28
CPC分类号： F17C13/02 , F25D3/12 , F25D19/006 , H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/0807 , H01J2237/2001
摘要： Cooled charged particle sources and methods are disclosed. In some embodiments, a charged particle source is thermally coupled to a solid cryogen, such as solid nitrogen. The thermal coupling can be design to provide good thermal conductivity to maintain the charged particle source at a desirably low temperature.

3. 发明公开

EP2546862A4 PARTICLE SOURCE AND APPARATUS USING PARTICLE SOURCE 有权
标题翻译：粒子源与设备中使用的粒子源
公开(公告)号：EP2546862A4
公开(公告)日：2013-07-10
申请号：EP12721400
申请日：2012-05-04
申请人： 38TH RES INST CHINA ELECTRONICS TECHNOLOGY GROUP CORP
发明人： LIU HUARONG , CHEN PING
IPC分类号： H01J9/02 , H01J37/073
CPC分类号： H01J37/073 , H01J1/3044 , H01J9/025 , H01J35/065 , H01J37/08 , H01J2237/0807
摘要： The present disclosure provides a particle source comprising a base having a gently-shaped top, and a tip formed as a tiny protrusion on the top of the base.

4. 发明公开

EP2575158A4 PARTICLE SOURCE AND MANUFACTURING METHOD THEREFOR 有权
标题翻译：粒子源及其制造方法
公开(公告)号：EP2575158A4
公开(公告)日：2013-06-26
申请号：EP12798587
申请日：2012-06-13
申请人： 38TH RES INST CHINA ELECTRONICS TECHNOLOGY GROUP CORP
发明人： LIU HUARONG
IPC分类号： H01J9/02 , H01J1/304
CPC分类号： C23F4/02 , B82Y99/00 , H01J1/00 , H01J1/3044 , H01J9/025 , H01J27/26 , H01J37/04 , H01J37/06 , H01J37/073 , H01J37/08 , H01J2201/30415 , H01J2237/0807

5. 发明公开

EP2416343A3 Ion sources, systems and methods 失效转让
标题翻译：离子源，系统和方法
公开(公告)号：EP2416343A3
公开(公告)日：2013-06-05
申请号：EP11182566.7
申请日：2006-11-15
申请人： Alis Corporation
发明人： Mantz, Ulrich , Steigerwald, Michael , Ward, Billy W. , Notte, John A. , Farkas, Louis , Percival, Randall , Hill, Raymond
IPC分类号： H01J37/28 , H01J9/02 , H01J37/08 , H01J37/252 , H01J37/305 , H01J37/317 , B81B1/00 , H01J27/26 , B82Y10/00 , H01J37/20
CPC分类号： H01J9/02 , H01J37/08 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/024 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/20264 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/30477 , H01J2237/31737 , H01J2237/3174 , H01J2237/31755
摘要： The present invention refers to a system, comprising a scanning electron microscope capable of providing an electron beam and a gas field ion source (120) capable of interacting with a gas (182) to generate an ion beam (192). The scanning electron microscope and the gas field ion microscope (100) are positioned so that, during use, both the electron beam and the ion beam can be used to investigate a sample (180). A system according to the present invention also comprises a focused ion beam instrument.
The figure published with the abstract only shows the gas field ion microscope (100).
摘要翻译：本发明涉及一种系统，其包括能够提供电子束的扫描电子显微镜和能够与气体（182）相互作用以产生离子束（192）的气体场离子源（120）。扫描电子显微镜和气体场离子显微镜（100）的位置使得在使用过程中，电子束和离子束都可用于研究样品（180）。根据本发明的系统还包括聚焦离子束仪器。与摘要一起公布的数字仅显示气田离子显微镜（100）。

6. 发明授权

EP2238606B1 SCANNING CHARGED PARTICLE BEAMS 有权转让
标题翻译：扫描带电粒子束
公开(公告)号：EP2238606B1
公开(公告)日：2011-08-24
申请号：EP08862809.4
申请日：2008-12-12
申请人： Carl Zeiss NTS GmbH
发明人： PREIKSZAS, Dirk , STEIGERWALD, Michael , ACKERMANN, Jörg
IPC分类号： H01J37/28 , H01J37/302 , H01J37/02 , H01J37/317
CPC分类号： H01J37/026 , H01J37/28 , H01J37/3026 , H01J2237/004 , H01J2237/022 , H01J2237/0807 , H01J2237/30488
摘要： Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size
f at the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least
d in the first direction, and a ratio
d/f being 2 or more.
摘要翻译：公开了一些方法，其包括将样品表面的一部分直接连续暴露于带电粒子束，样品表面的一部分在第一方向上形成一排，带电粒子束具有平均点尺寸f 在样品的表面处，每个部分与其相邻部分在第一方向上间隔至少d的距离，并且比率d / f等于或大于2。

7. 发明授权

EP2110843B1 Stable emission gas ion source and method of operation thereof 有权
标题翻译：与稳定的发射及其操作方法的气体离子源
公开(公告)号：EP2110843B1
公开(公告)日：2011-08-24
申请号：EP08154576.6
申请日：2008-04-15
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Winkler, Dieter , Weigel, Udo , Grimm, Stefan
IPC分类号： H01J37/08 , H01J27/26
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/022 , H01J2237/0807 , H01J2237/28

8. 发明公开

EP2301056A1 ION SOURCES, SYSTEMS AND METHODS 有权
标题翻译：离子源，系统和方法
公开(公告)号：EP2301056A1
公开(公告)日：2011-03-30
申请号：EP08771626.2
申请日：2008-06-20
申请人： Carl Zeiss NTS, LLC.
发明人： WARD, Billy, W. , SANFORD, Colin A. , NOTTE IV, John A. , GHOHOLSKI, Alexander , DIMANNA, Mark
IPC分类号： H01J27/26 , H01J37/08 , F25D19/00
CPC分类号： H01J27/26 , F25D19/006 , H01J37/067 , H01J37/08 , H01J37/265 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/061 , H01J2237/0805 , H01J2237/0807 , H01J2237/244 , H01J2237/2487 , H01J2237/2826
摘要： Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).

9. 发明公开

EP2288905A2 ELECTRON DETECTION SYSTEMS AND METHODS 审中-公开
标题翻译：电子检测系统及方法
公开(公告)号：EP2288905A2
公开(公告)日：2011-03-02
申请号：EP09759042.6
申请日：2009-05-26
申请人： Carl Zeiss NTS, LLC.
发明人： HILL, Raymond , NOTTE IV, John, A.
IPC分类号： G01N23/225 , H01J37/26
CPC分类号： G01N23/2255 , H01J37/244 , H01J37/28 , H01J2237/0807 , H01J2237/2448 , H01J2237/2449
摘要： Systems and methods to detect electrons from one or more samples are disclosed. In some embodiments, the systems and methods involve one or more magnetic field sources, for deflecting secondary electrons emitted from the surface of the samples.

10. 发明公开

EP2110843A1 Stable emission gas ion source and method of operation thereof 有权
标题翻译： Gasionenquelle mit stabilizationer Emission und Betriebsverfahrendafür
公开(公告)号：EP2110843A1
公开(公告)日：2009-10-21
申请号：EP08154576.6
申请日：2008-04-15
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Winkler, Dieter , Weigel, Udo , Grimm, Stefan
IPC分类号： H01J37/08 , H01J27/26
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/022 , H01J2237/0807 , H01J2237/28
摘要： A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.
摘要翻译：一种操作聚焦离子束装置的方法，用于在操作期间发射包括以第一分压产生的气体的离子的聚焦离子束，包括清洁位于聚焦离子束装置的发射极尖端区域中的发射极尖端，所述清洁包括将气体引入发射极尖端区域，使得气体具有至少两倍于第一压力的第二分压。此外，提供了一种聚焦离子束装置，其包括发射极尖端区域中的气体发射极尖端（13），其发射包括气体离子的离子束，用于供应不同压力的气体的气体入口（110），气体出口（120），用于测量发射极尖端区域中的压力的压力测量装置和用于控制操作模式和清洁模式之间的切换的控制单元（130），进一步控制发射极尖端区域中的压力并连接到压力测量装置。

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