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1. 发明授权

EP3084804B1 A RIBBON BEAM ION SOURCE OF ARBITRARY LENGTH 有权
标题翻译：任意长度的带状光束离子源
公开(公告)号：EP3084804B1
公开(公告)日：2018-03-14
申请号：EP14871361.3
申请日：2014-11-26
申请人： White, Nicholas R.
发明人： White, Nicholas R.
IPC分类号： H01J37/08 , H01J27/14 , H01J37/317
CPC分类号： H01J27/14 , H01J37/08 , H01J37/3171 , H01J2237/061 , H01J2237/082
摘要： The invention is a unique and substantive improvement in ion source assemblies which is able to produce a ribbon-shaped ion beam having an arbitrarily chosen breadth dimension which is at least ten times greater [and often more than thirty times greater] than its thickness dimension, the breadth and thickness dimensions of the beam being normal (i.e., perpendicular) to the Z-axis direction of travel for the ion beam. In all its embodiments, the improved ion source will comprise not less than two discrete component parts: (i) A closed, solid wall, prism-shaped arc discharge chamber having limited width and depth dimensions, and which concurrently has an arbitrarily chosen and predetermined length dimension which can be as small as 80 millimeters and alternatively exceed 3,000 millimeters in size; and (ii) A primary electron trap assembly which comprises at least an adjacently located magnetic field generating yoke subassembly able to provide a discernible quadrupole magnetic field internally within a confined cavity volume existing within the measurable dimensions of the arc discharge chamber walls.

2. 发明公开

EP3084804A1 A RIBBON BEAM ION SOURCE OF ARBITRARY LENGTH 有权
标题翻译：与随机长度BAND束离子源
公开(公告)号：EP3084804A1
公开(公告)日：2016-10-26
申请号：EP14871361.3
申请日：2014-11-26
申请人： White, Nicholas R.
发明人： White, Nicholas R.
IPC分类号： H01J49/40
CPC分类号： H01J27/14 , H01J37/08 , H01J37/3171 , H01J2237/061 , H01J2237/082
摘要： The invention is a unique and substantive improvement in ion source assemblies which is able to produce a ribbon-shaped ion beam having an arbitrarily chosen breadth dimension which is at least ten times greater [and often more than thirty times greater] than its thickness dimension, the breadth and thickness dimensions of the beam being normal (i.e., perpendicular) to the Z-axis direction of travel for the ion beam. In all its embodiments, the improved ion source will comprise not less than two discrete component parts: (i) A closed, solid wall, prism-shaped arc discharge chamber having limited width and depth dimensions, and which concurrently has an arbitrarily chosen and predetermined length dimension which can be as small as 80 millimeters and alternatively exceed 3,000 millimeters in size; and (ii) A primary electron trap assembly which comprises at least an adjacently located magnetic field generating yoke subassembly able to provide a discernible quadrupole magnetic field internally within a confined cavity volume existing within the measurable dimensions of the arc discharge chamber walls.

3. 发明公开

EP2862196A1 PLASMA SOURCE APPARATUS AND METHODS FOR GENERATING CHARGED PARTICLE BEAMS 有权
标题翻译：等离子体源装置及其制造方法带电粒子束
公开(公告)号：EP2862196A1
公开(公告)日：2015-04-22
申请号：EP13723940.6
申请日：2013-05-20
申请人： The Welding Institute
发明人： RIBTON, Colin , SANDERSON, Allan
IPC分类号： H01J27/16 , H01J37/077
CPC分类号： H01J37/077 , H01J27/18 , H01J37/3002 , H01J2237/061 , H01J2237/063 , H01J2237/0817 , H01J2237/083 , H01J2237/31 , H01J2237/3104
摘要： A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the plasma chamber;a radio frequency (RF) plasma generation unit for generating a plasma inside the plasma chamber, the radio frequency plasma generation unit comprising first and second resonant circuits each tuned to resonate at substantially the same resonant frequency, the first resonant circuit comprising a first antenna and a first, RF power source adapted to drive the first resonant circuit at substantially its resonant frequency, and the second resonant circuit comprising a second antenna, whereby in use an RF signal is induced in the second antenna by the first resonant circuit due to resonant coupling, the second resonant circuit being configured to apply the induced RF signal to the plasma chamber to generate a plasma therein; and a particle accelerating unit for extracting charged particles from the plasma and accelerating the charged particles to form a beam, the particle accelerating unit comprising a second power source configured to apply potential between the plasma chamber and an accelerating electrode, the region between the plasma chamber and the accelerating electrode constituting an acceleration column. The second power source is adapted to output a high voltage relative to that output by the first, RF power source.

4. 发明公开

EP2739764A2 ION SOURCE 审中-公开
标题翻译：离子源
公开(公告)号：EP2739764A2
公开(公告)日：2014-06-11
申请号：EP12819519.5
申请日：2012-08-03
申请人： Institute Of Geological And Nuclear Sciences Limited
发明人： FUTTER, Richard John , MARKWITZ, Andreas
IPC分类号： C23C14/48 , C23C14/00 , H01J1/88
CPC分类号： H01J37/08 , C23C14/046 , C23C14/48 , C23C14/562 , H01J3/04 , H01J27/14 , H01J37/3171 , H01J2237/002 , H01J2237/061
摘要： The invention provides an ion source comprising first and second cathode pole pieces spaced apart from one another to form a cavity therebetween, an edge of the first cathode pole piece being spaced apart from an edge of the second cathode pole piece to define an elongate cathode gap between the respective edges of the pole pieces, the elongate cathode gap having a longitudinal axis; at least one magnet arranged for magnetising the first and second cathode pole pieces with opposite magnetic polarities; an elongate anode located in the cavity, the anode being spaced apart from the first and second cathode pole pieces and having a longitudinal axis, the longitudinal axis of the elongate anode and the longitudinal axis of the elongate cathode gap substantially coplanar; a first electrical connection which extends from outside the cavity to the anode; and a gas feed conduit which extends from outside the cavity to inside the cavity for introducing a gas into the cavity.

5. 发明公开

EP2266127A1 ION SOURCE WITH ADJUSTABLE APERTURE 审中-公开
标题翻译：具有可调整开口离子源
公开(公告)号：EP2266127A1
公开(公告)日：2010-12-29
申请号：EP09734349.5
申请日：2009-04-23
申请人： Axcelis Technologies, Inc.
发明人： TIEGER, Daniel , DIVERGILIO, William , EISNER, Edward , GRAF, Michael
IPC分类号： H01J37/09 , H01J37/317 , H01J27/00 , H01J27/08
CPC分类号： H01J37/08 , H01J27/024 , H01J37/09 , H01J37/3171 , H01J2237/0455 , H01J2237/061 , H01J2237/0835
摘要： An ion implanter system including an ion source for use in creating a stream or beam of ions. The ion source has an ion source chamber housing that at least partially bounds an ionization region for creating a high density concentration of ions within the chamber housing. An ion extraction aperture (340, 342) of desired characteristics covers an ionization region of the arc chamber. In one embodiment, a movable ion extraction aperture plate (310) is moved with respect to the housing for modifying an ion beam profile. One embodiment includes an aperture plate having at least elongated apertures (340, 342) and is moved between at least first and second positions that define different ion beam profiles. A drive or actuator coupled to the aperture plate moves the aperture plate between the first and second positions. An alternate embodiment has two moving plate portions that bound an adjustable aperture.

6. 发明公开

EP1662543A3 Ion beam irradiation system for ion implantation 有权
标题翻译：用于离子注入的离子照射装置
公开(公告)号：EP1662543A3
公开(公告)日：2009-11-04
申请号：EP05255331.0
申请日：2005-08-31
申请人： SEN Corporation, an SHI and Axcelis Company
发明人： Kabasawa, Mitsuaki , Tsukihara, Mitsukuni , Sogabe, Hiroshi
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/023 , H01J37/05 , H01J37/09 , H01J37/1474 , H01J37/1478 , H01J37/15 , H01J37/3007 , H01J2237/0213 , H01J2237/022 , H01J2237/0458 , H01J2237/047 , H01J2237/0492 , H01J2237/061 , H01J2237/0835 , H01J2237/1536 , H01J2237/24405 , H01J2237/24507 , H01J2237/30477 , H01J2237/31705
摘要： Irradiation system that comprises a beam generation source (1), a mass analysis device (3), a beam transformer, a deflector (7) for scanning which swings the beam reciprocally, a beam parallelizing device (10,29), an acceleration/deceleration device (11,12), and an energy filtering device (18), and a hybrid angular energy filter (18) generating both electric and magnetic fields to ajust trajectories is provided as the energy filtering device, along with a pair of multi-surface energy slit units (19,19') each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.

7. 发明授权

EP0945892B1 System and method for in-process cleaning of an ion source 有权
标题翻译：设备和方法，用于在工艺过程中的清洁的离子源
公开(公告)号：EP0945892B1
公开(公告)日：2006-05-03
申请号：EP99302176.5
申请日：1999-03-22
申请人： Axcelis Technologies, Inc.
发明人： Graf, Michael Anthony , Benveniste, Victor Maurice
IPC分类号： H01J27/04 , H01J27/02 , H01J37/08
CPC分类号： H01J37/3171 , H01J27/04 , H01J37/08 , H01J2237/022 , H01J2237/061

8. 发明公开

EP0945892A3 System and method for in-process cleaning of an ion source 有权
标题翻译：设备和方法，用于在工艺过程中的清洁的离子源
公开(公告)号：EP0945892A3
公开(公告)日：2001-10-10
申请号：EP99302176.5
申请日：1999-03-22
申请人： Axcelis Technologies, Inc.
发明人： Graf, Michael Anthony , Benveniste, Victor Maurice
IPC分类号： H01J27/04 , H01J27/02 , H01J37/08
CPC分类号： H01J37/3171 , H01J27/04 , H01J37/08 , H01J2237/022 , H01J2237/061
摘要： A method and system for in-process cleaning of an ion source (12) is provided. The ion source (12) comprises (i) a plasma chamber (22) formed by chamber walls (112, 114, 116) that bound an ionization zone (120); (ii) a source of ionizable dopant gas (66) and a first mechanism (68) for introducing said ionizable dopant gas into said plasma chamber; (iii) a source of cleaning gas (182) and a second mechanism (184) for introducing said cleaning gas into said plasma chamber; and (iv) an exciter (130) at least partially disposed within said chamber for imparting energy to said ionizable dopant gas and said cleaning gas to create a plasma within said plasma chamber. The plasma comprises disassociated and ionized constituents of said dopant gas and disassociated and ionized constituents of said cleaning gas. The disassociated and ionized constituents of said cleaning gas react with said disassociated and ionized constituents of said dopant gas to prevent formation of deposits of elements contained within said ionizable dopant gas on surfaces of said chamber walls. The cleaning gas may be, for example, nitrogen trifluoride (NF 3 ), and the ionizable dopant gas may be, for example, either phosphine (PH 3 ) or arsine (AsH 3 ). Mass flow controllers control the ratio of cleaning gas to ionizable dopant gas introduced into said plasma chamber, which is greater than 0:1 and preferably at least 3:1.

9. 发明公开

EP0552700A1 Mechanically stable field emission gun 失效
标题翻译： Mechanisch stabile Feldemissionsquelle。
公开(公告)号：EP0552700A1
公开(公告)日：1993-07-28
申请号：EP93100672.0
申请日：1993-01-18
申请人： Etec Systems, Inc.
发明人： Gesley, Mark A. , DeBra, Daniel B.
IPC分类号： H01J37/073 , H01J3/02
CPC分类号： H01J37/073 , H01J2237/0216 , H01J2237/061 , H01J2237/3175
摘要： An improved electron or ion gun support structure includes a hollow cylinder (43) for rigidly connecting the source assembly to the source-motion ring (42), with the source cathode and associated lens extending into the hollow portion of the cylinder. The gun is thus made very stable and less susceptible to outside vibrations.
摘要翻译：改进的电子或离子枪支撑结构包括用于将源组件刚性地连接到源运动环（42）的中空圆柱体（43），源极阴极和相关联的透镜延伸到气缸的中空部分中。因此，枪非常稳定，并且不易受到外部振动的影响。

10. 发明授权

EP2301056B1 ION SOURCES, SYSTEMS AND METHODS 有权
标题翻译：离子源，系统和方法
公开(公告)号：EP2301056B1
公开(公告)日：2018-01-17
申请号：EP08771626.2
申请日：2008-06-20
申请人： Carl Zeiss Microscopy, LLC
发明人： WARD, Billy, W. , SANFORD, Colin A. , NOTTE IV, John A. , GHOHOLSKI, Alexander , DIMANNA, Mark
IPC分类号： H01J27/26 , H01J37/08 , H01J37/067 , H01J37/26 , H01J37/28 , F25D19/00
CPC分类号： H01J27/26 , F25D19/006 , H01J37/067 , H01J37/08 , H01J37/265 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/061 , H01J2237/0805 , H01J2237/0807 , H01J2237/244 , H01J2237/2487 , H01J2237/2826
摘要： Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).

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