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31. 发明公开

EP2881974A1 Method and device for controlling reactive sputtering deposition 失效
标题翻译： Verfahren und Vorrichtung zur Steuerung reaktiver Sputterabscheidung
公开(公告)号：EP2881974A1
公开(公告)日：2015-06-10
申请号：EP13197009.7
申请日：2013-12-12
申请人： Institute of Solid State Physics, University of Latvia
发明人： Purans, Juris
IPC分类号： H01J37/32 , C23C14/52 , G01N23/223 , H05H1/00 , H01J37/34
CPC分类号： H01J37/32972 , C23C14/52 , G01N23/223 , G01N2223/638 , H01J37/32981 , H01J37/3405 , H05H1/005
摘要： The present invention relates to the methods and devices for controlling a reactive sputtering deposition of a selected material. The proposed device comprises: a vacuum chamber; a means for supplying of an inert and reactive gas into the vacuum chamber; a means adapted for providing a command to the means for supplying of an inert and/or reactive gas into the vacuum chamber; a source adapted for generating plasma and/or creating a flux of sputtered particles of material; a means adapted for holding or placing on it a substrate to be subjected to sputtering of a film of a selected material; an X-ray source adapted to expose a sputtering target by an X-ray beam; an X-ray fluorescence polycapillary confocal probe adapted to be placed inside of the vacuum chamber and comprising an X-ray optic, where the probe is adapted to collect the X-ray fluorescence signals from a part of the sputtering target and direct them to a signal detecting unit; an X-ray energy sensitive detector being optically connected with the polycapillary confocal probe such as to enable the X-ray optic to direct X-ray fluorescence beam towards the detector from the optic's input end facing the surface of the sputtering target; where the X-ray energy sensitive detector being connected at least with the means for processing the detected signals or interpreting the signals received on the state of oxidation of the target.
摘要翻译：本发明涉及用于控制所选材料的反应溅射沉积的方法和装置。所提出的装置包括：真空室; 用于将惰性和反应性气体供应到真空室中的装置; 适于向惰性和/或反应性气体供应到真空室中的装置提供指令的装置; 适于产生等离子体和/或产生溅射的材料颗粒的流量的源; 适于将其放置在要被溅射所选材料的薄膜的基底上的装置; 适于通过X射线束曝光溅射靶的X射线源; X射线荧光多毛细共聚焦探针，其适于放置在真空室的内部并且包括X射线光学元件，其中探针适于从溅射靶的一部分收集X射线荧光信号并将其引导到信号检测单元; X射线能量敏感检测器与多毛细共聚焦探针光学连接，以使X射线光学器件可以从面向溅射靶表面的光学器件输入端向检测器引导X射线荧光束; 其中X射线能量敏感检测器至少与用于处理检测到的信号的装置相连，或解释在目标氧化状态下接收的信号。

32. 发明公开

EP2859575A1 ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS 审中-公开
标题翻译：安排用在真空处理过程
公开(公告)号：EP2859575A1
公开(公告)日：2015-04-15
申请号：EP13716833.2
申请日：2013-02-04
申请人： UAB Nova Fabrica
发明人： AUDRONIS, Martynas
IPC分类号： H01J37/32
CPC分类号： H01J49/0013 , C23C14/35 , C23C14/52 , C23C14/54 , H01J37/32981 , H01J37/3476 , H01J2237/2002 , H01J2237/332
摘要： An assembly for use in a vacuum treatment process, the assembly including a process changer 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis

33. 发明公开

EP2494581A4 ION IMPLANTATION SYSTEM AND METHOD 有权转让
标题翻译：离子注入系统和方法
公开(公告)号：EP2494581A4
公开(公告)日：2015-03-18
申请号：EP10828832
申请日：2010-10-25
申请人： ADVANCED TECH MATERIALS
发明人： JONES EDWARD E , YEDAVE SHARAD N , TANG YING , CHAMBERS BARRY LEWIS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , ZOU PENG
IPC分类号： H01J37/317 , H01J37/08 , H01L21/265
CPC分类号： H01L21/265 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/3171 , H01J37/32055 , H01J37/32412 , H01J37/32449 , H01J2237/006 , H01J2237/022

34. 发明公开

EP2593959A2 ELEKTRODE ZUR ERZEUGUNG EINES PLASMAS, PLASMAKAMMER MIT DIESER ELEKTRODE UND VERFAHREN ZUR IN SITU-ANALYSE ODER -IN SITU-BEARBEITUNG EINER SCHICHT ODER DES PLASMAS 有权
标题翻译： LEAD产生等离子体，等离子体室与电极导管和方法，原位分析或原位处理血浆或一层
公开(公告)号：EP2593959A2
公开(公告)日：2013-05-22
申请号：EP11781429.3
申请日：2011-07-07
申请人： Forschungszentrum Jülich GmbH
发明人： MUTHMANN, Stefan , GORDIJN, Aad , CARIUS, Reinhard , HÜLSBECK, Markus , HRUNSKI, Dzmitry
IPC分类号： H01J37/32 , C23C16/52
CPC分类号： H01J1/02 , C23C14/52 , C23C16/44 , C23C16/5096 , C23C16/52 , G01J3/44 , H01J37/32 , H01J37/32623 , H01J37/32972
摘要： The invention relates to an RF electrode for producing a plasma in a plasma chamber, characterized by an optical lead-through. The invention further relates to a plasma chamber, comprising an RF electrode and a counter-electrode having a substrate retainer for accommodating a substrate. For said plasma chamber, a high-frequency alternating field can be developed between the RF electrode and the counter-electrode in order to produce the plasma. The chamber is characterized by an RF electrode having an optical lead-through. The invention further relates to a method for analyzing or processing a layer or a plasma in a plasma chamber
in situ . In said method, the layer is arranged on a counter-electrode and an RF electrode is arranged on the side facing the layer. The method is characterized by the selection of an RF electrode having an optical lead-through, and by at least one step, in which electromagnetic radiation is conducted through the optical lead-through for the purpose of analyzing or processing the layer or the plasma, and by at least one further step, in which the scattered or emitted or reflected radiation is fed to an analyzing device.

35. 发明公开

EP2494581A2 ION IMPLANTATION SYSTEM AND METHOD 有权转让
标题翻译：离子注入系统和方法
公开(公告)号：EP2494581A2
公开(公告)日：2012-09-05
申请号：EP10828832.5
申请日：2010-10-25
申请人： Advanced Technology Materials, Inc.
发明人： JONES, Edward, E. , YEDAVE, Sharad, N. , TANG, Ying , CHAMBERS, Barry, Lewis , KAIM, Robert , SWEENEY, Joseph, D. , BYL, Oleg , ZOU, Peng
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01L21/265 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/3171 , H01J37/32055 , H01J37/32412 , H01J37/32449 , H01J2237/006 , H01J2237/022
摘要： An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.

36. 发明公开

EP1198608A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND VIEWPORT THEREFOR 审中-公开
标题翻译：电子PVD设备和WINDOW THEREOF
公开(公告)号：EP1198608A1
公开(公告)日：2002-04-24
申请号：EP00952447.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank
IPC分类号： C23C14/30
CPC分类号： H01J37/3053 , C23C14/30 , C23C14/52 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a viewport (48) for viewing the coating process performed within the apparatus (10).

37. 发明公开

EP1005639A1 APPARATUS AND METHOD FOR IN-SITU THICKNESS AND STOICHIOMETRY MEASUREMENT OF THIN FILMS 有权
标题翻译：装置和方法用于原位厚度和STÖCHIOMETRIEMESSUNG薄膜
公开(公告)号：EP1005639A1
公开(公告)日：2000-06-07
申请号：EP98940010.6
申请日：1998-08-19
申请人： THE UNIVERSITY OF ALBERTA, SIMON FRASER UNIVERSITY, THE UNIV. OF VICTORIA,THE UNIV. OF BRITISH COLUMBIA, carrying on as TRIUMF
发明人： KELSON, Itzhak , LEVY, Yuval
IPC分类号： G01N23/06 , G01N23/221 , G01B15/02 , C23C14/52
CPC分类号： G01N23/06 , C23C14/52 , C30B23/02 , G01B15/025 , Y10S436/804
摘要： An apparatus and method for using α-particle energy loss to measure the thickness and stoichiometry of films grown by molecular beam epitaxy and other methods. The apparatus for measuring the thickness of films grown on a substrate in a growth chamber, comprises a protective housing having an aperture opening into the growth chamber, a solid state detector disposed in the protective housing, a shutter for opening and closing the aperture, a shield disposed in the housing between the aperture and the solid state detector for shielding the detector, and a calibration source disposed between the shield and the detector for calibrating the measurements made by the detector. A second calibration source disposed between the shutter and the shield, for measuring deposition on the shield.

38. 发明公开

EP4423325A1 METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE 审中-实审
公开(公告)号：EP4423325A1
公开(公告)日：2024-09-04
申请号：EP21962285.9
申请日：2021-10-27
申请人： Silanna UV Technologies Pte Ltd
发明人： ATANACKOVIC, Petar
IPC分类号： C30B23/06 , C23C14/26 , H01L21/02 , H01L21/67 , H05B3/00
CPC分类号： H01J37/32724 , C30B29/16 , C30B23/063 , C30B23/025 , G01J5/48 , G01J5/026 , G01J5/12 , G01J5/0007 , G01J5/0875 , G01J5/0859 , H05B3/141 , C23C14/541 , C23C14/08 , H01L21/67248 , C23C14/50 , C23C14/52 , H01L21/67103 , H01L21/67115

39. 发明公开

EP4359583A1 OPTICAL ELEMENT AND REACTION CHAMBER 审中-实审
公开(公告)号：EP4359583A1
公开(公告)日：2024-05-01
申请号：EP21758363.2
申请日：2021-08-06
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
发明人： BRAUN, Wolfgang
IPC分类号： C23C14/28 , B01J3/03 , B23K26/064 , B23K26/12 , B23K26/352 , B23K26/362 , C23C14/52 , C23C14/54 , G02B7/00 , C21D8/06
CPC分类号： C23C14/52 , C23C14/542 , C23C14/28 , G02B7/1815 , G02B7/182

40. 发明公开

EP3412385A1 METHOD AND DEVICE FOR CLEANING AND/OR REPLACEMENT OF A LASER WINDOW OF A PROCESS CHAMBER 有权
公开(公告)号：EP3412385A1
公开(公告)日：2018-12-12
申请号：EP18176383.0
申请日：2018-06-06
申请人： LayerWise N.V.
发明人： VAN VAERENBERGH, Jonas , VALKENBORGS, Brawley
IPC分类号： B22F3/105 , B23K26/12 , B23K26/14 , B23K26/16 , B33Y30/00 , B33Y10/00 , C23C14/52 , C23C14/56 , C23C16/44
CPC分类号： B22F3/1055 , B08B15/02 , B22F2003/1056 , B22F2003/1059 , B23K26/1224 , B23K26/123 , B23K26/127 , B23K26/706 , B33Y10/00 , B33Y30/00 , B33Y40/00 , C23C14/52 , C23C14/564 , C23C16/4409
摘要： Method for cleaning and/or replacement of a laser window (1) of a process chamber (3), in particular a process chamber (3) for layered construction of a 3D object by means of a laser, and device with a laser window (1) and where this laser window (1) provided to the process chamber (3), having at least an opening (4) featuring the laser window (1), where the laser window (1) is movable with respect to the opening (4)wherein a sealing plate (6) is provided extending in the process chamber (3) and movable between an open position and a closed position, where in the closed position of the sealing plate (6) a lock chamber (8) is created around the opening (4) and an inlet (11) and an outlet (10) extend into the lock chamber (8) for supply of the modified atmosphere in this lock chamber (8).

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