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1. 发明授权

EP2881974B1 Method and device for controlling reactive sputtering deposition 失效
公开(公告)号：EP2881974B1
公开(公告)日：2018-07-18
申请号：EP13197009.7
申请日：2013-12-12
申请人： Institute of Solid State Physics, University of Latvia
发明人： Purans, Juris
IPC分类号： H01J37/32 , C23C14/52 , G01N23/223 , H05H1/00 , H01J37/34
CPC分类号： H01J37/32972 , C23C14/52 , G01N23/223 , G01N2223/638 , H01J37/32981 , H01J37/3405 , H05H1/005
摘要： The present invention relates to the methods and devices for controlling a reactive sputtering deposition of a selected material. The proposed device comprises: a vacuum chamber; a means for supplying of an inert and reactive gas into the vacuum chamber; a means adapted for providing a command to the means for supplying of an inert and/or reactive gas into the vacuum chamber; a source adapted for generating plasma and/or creating a flux of sputtered particles of material; a means adapted for holding or placing on it a substrate to be subjected to sputtering of a film of a selected material; an X-ray source adapted to expose a sputtering target by an X-ray beam; an X-ray fluorescence polycapillary confocal probe adapted to be placed inside of the vacuum chamber and comprising an X-ray optic, where the probe is adapted to collect the X-ray fluorescence signals from a part of the sputtering target and direct them to a signal detecting unit; an X-ray energy sensitive detector being optically connected with the polycapillary confocal probe such as to enable the X-ray optic to direct X-ray fluorescence beam towards the detector from the optic's input end facing the surface of the sputtering target; where the X-ray energy sensitive detector being connected at least with the means for processing the detected signals or interpreting the signals received on the state of oxidation of the target.

2. 发明公开

EP2881974A1 Method and device for controlling reactive sputtering deposition 失效
标题翻译： Verfahren und Vorrichtung zur Steuerung reaktiver Sputterabscheidung
公开(公告)号：EP2881974A1
公开(公告)日：2015-06-10
申请号：EP13197009.7
申请日：2013-12-12
申请人： Institute of Solid State Physics, University of Latvia
发明人： Purans, Juris
IPC分类号： H01J37/32 , C23C14/52 , G01N23/223 , H05H1/00 , H01J37/34
CPC分类号： H01J37/32972 , C23C14/52 , G01N23/223 , G01N2223/638 , H01J37/32981 , H01J37/3405 , H05H1/005
摘要： The present invention relates to the methods and devices for controlling a reactive sputtering deposition of a selected material. The proposed device comprises: a vacuum chamber; a means for supplying of an inert and reactive gas into the vacuum chamber; a means adapted for providing a command to the means for supplying of an inert and/or reactive gas into the vacuum chamber; a source adapted for generating plasma and/or creating a flux of sputtered particles of material; a means adapted for holding or placing on it a substrate to be subjected to sputtering of a film of a selected material; an X-ray source adapted to expose a sputtering target by an X-ray beam; an X-ray fluorescence polycapillary confocal probe adapted to be placed inside of the vacuum chamber and comprising an X-ray optic, where the probe is adapted to collect the X-ray fluorescence signals from a part of the sputtering target and direct them to a signal detecting unit; an X-ray energy sensitive detector being optically connected with the polycapillary confocal probe such as to enable the X-ray optic to direct X-ray fluorescence beam towards the detector from the optic's input end facing the surface of the sputtering target; where the X-ray energy sensitive detector being connected at least with the means for processing the detected signals or interpreting the signals received on the state of oxidation of the target.
摘要翻译：本发明涉及用于控制所选材料的反应溅射沉积的方法和装置。所提出的装置包括：真空室; 用于将惰性和反应性气体供应到真空室中的装置; 适于向惰性和/或反应性气体供应到真空室中的装置提供指令的装置; 适于产生等离子体和/或产生溅射的材料颗粒的流量的源; 适于将其放置在要被溅射所选材料的薄膜的基底上的装置; 适于通过X射线束曝光溅射靶的X射线源; X射线荧光多毛细共聚焦探针，其适于放置在真空室的内部并且包括X射线光学元件，其中探针适于从溅射靶的一部分收集X射线荧光信号并将其引导到信号检测单元; X射线能量敏感检测器与多毛细共聚焦探针光学连接，以使X射线光学器件可以从面向溅射靶表面的光学器件输入端向检测器引导X射线荧光束; 其中X射线能量敏感检测器至少与用于处理检测到的信号的装置相连，或解释在目标氧化状态下接收的信号。

3. 发明公开

EP2881973A1 Device and method for pvd process diagnostic using X-ray fluorescence local probe 无效
标题翻译：装置和方法用于PVD工艺诊断使用局部X射线荧光探针
公开(公告)号：EP2881973A1
公开(公告)日：2015-06-10
申请号：EP13195583.3
申请日：2013-12-04
申请人： Institute of Solid State Physics, University of Latvia
发明人： Purans, Juris
IPC分类号： H01J37/32 , C23C14/52 , G01N23/223 , H05H1/00
CPC分类号： H01J37/32972 , C23C14/52 , G01N23/223 , G01N2223/638 , H01J37/32981 , H01J37/3405 , H05H1/005
摘要： The invention relates to a diagnostics of plasma and flux of sputtered or evaporated particles of material inside a chamber, which is maintained at a low pressure. There is offered a device and a method for 2D or 3D X-ray fluorescence mapping analysis of plasma and/or flux of sputtered or evaporated particles of material, where the device comprises: a probe unit placed outside or inserted into a plasma and/or a flux of sputtered or evaporated particles of material and adapted to direct signals from a signal supplying unit to a signal detecting unit; a means for processing the detected signals and interpreting the signals received, wherein the device comprises a source (2) adapted for generating plasma and/or creating a flux of sputtered or evaporated particles of material; a X-ray source (11) adapted to send a collimating beam (14) through the plasma and/or the flux of sputtered or evaporated particles; a movable X-ray fluorescence polycapillary confocal probe (5) provided with at least an x- and y- axis manipulator (6), the probe (5) comprising an X-ray optic (7), being accommodated in a casing (8); where the probe (5) is adapted to collect the XRF signal from an intersect (17) the beam (14) provided by the X-ray source (11) and projection (line of sight (16)) of the probe (5); a X-ray energy sensitive detector (4) being optically connected with the probe (5) to enable the X-ray optic (7) to direct X-rays towards the detector (4) from the optic's (7) input end facing the beam (14).
摘要翻译：本发明涉及一种等离子体和在腔室内材料的溅射或蒸发的颗粒的磁通的诊断，所有这一切都被保持在低压力。有可供其中所述装置包括器件和用于等离子体和/或材料制成，溅射或蒸发的颗粒的通量的二维或三维X射线荧光作图分析方法，包括：测试单元设置在外部，或者插入到血浆和/或从供给单元于检测单元的信号的信号直接信号和材料的angepasst溅射或蒸发的粒子流; 用于处理检测到的信号和解释信号的装置接收到的，worin该装置包括一个光源（2）适于产生等离子体和/或产生材料溅射或蒸发的粒子流; 一个X射线源（11）angepasst发送通过等离子体和/或溅射或蒸发的颗粒的通量的准直光束（14）; 可移动的X射线荧光共焦多毛细管探针提供（5）与至少一个试验，以X轴和（6）中，（5）包括在X射线光学器件（7）被容纳在外壳中的y轴操纵器（8 ）; 其中样品（5）是angepasst收集从由X射线源（11）和投影在样品（视线（16线））提供在交叉（17）的光束（14）的XRF信号（5） ; 一X射线能量敏感检测器（4）被光学地与探针（5），连接到使X射线光学器件（7），以指导X射线朝向检测器（4）从所述光学部件的（7）输入端面向梁（14）。

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