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1. 发明授权

EP1121475B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：设备，电力RAY PVD涂层
公开(公告)号：EP1121475B1
公开(公告)日：2009-04-08
申请号：EP00950977.9
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, SR. , MARICOCCHI, Antonio, Frank , WILLEN, William, Seth , WORTMAN, David, John , VIGUIE, Rudolfo , RIGNEY, David, Vincent
IPC分类号： C23C14/30 , C23C14/56 , C23C14/24
CPC分类号： C23C14/30 , C23C14/246 , C23C14/56 , C23C14/564

2. 发明授权

EP1131474B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS WITH INGOT MAGAZINE 有权
标题翻译： ELEKTRONENSTRAHLBEDAMPFUNGSANLAGE WITH斯特布·马格齐恩
公开(公告)号：EP1131474B1
公开(公告)日：2004-11-17
申请号：EP00950976.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , WILLEN, William, Seth
IPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a rotatable magazine (102) that supports multiple ingots (26) of the coating material (26) beneath the coating chamber (12). The magazine (102) is indexed to individually align multiple stacks of one or more ingots (26) with an aperture (56) to the coating chamber (12) for sequentially feeding the ingots (26) into the coating chamber (12) without interrupting deposition of the coating material (26).

3. 发明公开

EP1144710A2 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR 审中-公开
标题翻译：电子束物理气相沉积装置及其控制板
公开(公告)号：EP1144710A2
公开(公告)日：2001-10-17
申请号：EP00975181.9
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank
IPC分类号： C23C14/00
CPC分类号： C23C14/30 , C23C14/566
摘要： An electron beam physical vapor deposition apparatus (10) for producing a coating on an article (20). The apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gum (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. The operation of the EBPVD apparatus (10) is enhanced by a control panel (118) with which components of the apparatus (10) can be monitored and controlled. The control panel (118) includes a schematic of the apparatus (10) and its components, with indicia (120) of the components, visual indicators associated with the indicia (120) for indicating the operating status of the components, and controls (124) associated with the indicia (120) and adjacent the visual indicators for changing the operation of the corresponding component of the EBPVD apparatus (10).
摘要翻译：一种用于在物品（20）上产生涂层的电子束物理气相沉积设备（10）。设备（10）通常包括可在高温和低于大气压下操作的涂覆室（12）。电子束胶（30）将电子束（28）投射到涂覆室（12）中并且投射到室（12）内的涂层材料（26）上，使涂层材料（26）熔化并蒸发。 EBPVD设备（10）的操作由控制面板（118）增强，利用该控制面板（118）可以监视和控制设备（10）的部件。控制面板（118）包括装置（10）及其部件的示意图，带有部件的标记（120），与标记（120）相关联的用于指示部件的操作状态的可视指示器，以及控制器）与标记（120）相关联并与视觉指示器相邻，用于改变EBPVD设备（10）的相应部件的操作。

4. 发明公开

EP1198608A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND VIEWPORT THEREFOR 审中-公开
标题翻译：电子PVD设备和WINDOW THEREOF
公开(公告)号：EP1198608A1
公开(公告)日：2002-04-24
申请号：EP00952447.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank
IPC分类号： C23C14/30
CPC分类号： H01J37/3053 , C23C14/30 , C23C14/52 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a viewport (48) for viewing the coating process performed within the apparatus (10).

5. 发明公开

EP1121476A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：电动RAY PVD设备
公开(公告)号：EP1121476A1
公开(公告)日：2001-08-08
申请号：EP00950949.8
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , EBERHARDT, Helmut , RICK, Alfred , BAEHR, Martin , REITH, Wolfgang, Erhardt
IPC分类号： C23C14/46
CPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) for producing a coating (e.g., a ceramic thermal barrier coating) on a article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) through an aperture (68) in a wall of the coating chamber (12) and onto a coating material (26) within a coating region defined within the chamber (12), causing the coating material (26) to melt and evaporate. The operation of the EBPVD apparatus (10) is enhanced by the inclusion within the coating chamber (12) of a second chamber (64) that encloses the aperture (68) so as to separate the aperture (68) from the coating region. Also provided is means (66) for maintaining the second chamber (64) at a pressure lower than the coating region. As a result, coating pressures of greater than 0.010 mbar can be practiced inside the coating region with minimal or no adverse effect on the operation and reliability of the electron beam gun (30).

6. 发明授权

EP1117853B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：电动RAY PVD设备
公开(公告)号：EP1117853B1
公开(公告)日：2002-11-06
申请号：EP00953799.4
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , BETSCHER, Keith, H. , MARICOCCHI, Antonio, Frank , WORTMAN, David, John , BOWLIN, William, Allen , DILLON, Harold, Phillips, II
IPC分类号： C23C14/56 , C23C14/46
CPC分类号： C23C14/30 , C23C14/566
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) that includes loading, preheat and coating chambers (16, 18, 14, 12) which must operate at elevated temperatures and subatmospheric pressures. The apparatus (10) further includes a movable platform system (24) that facilitates the relative positioning of the loading and preheat chambers (16, 18, 14) of the apparatus (10). The platform system (24) supports at least one loading chamber (16, 18), and is movable relative to the preheat chamber (14) so as to bring the loading chamber (16, 18) into and out of alignment with the preheat chamber (14). The platform system (24) has an extremely low elevational profile, preferably not more than 2.5 cm, so as to essentially eliminate any risk to the operators of the EBPVD apparatus (10) during repositioning of the loading chamber (16, 18).

7. 发明公开

EP1144710A3 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR 审中-公开
标题翻译：电子PVD装置及其控制面板
公开(公告)号：EP1144710A3
公开(公告)日：2001-12-05
申请号：EP00975181.9
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank
IPC分类号： C23C14/30
CPC分类号： C23C14/30 , C23C14/566
摘要： An electron beam physical vapor deposition apparatus (10) for producing a coating on an article (20). The apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gum (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. The operation of the EBPVD apparatus (10) is enhanced by a control panel (118) with which components of the apparatus (10) can be monitored and controlled. The control panel (118) includes a schematic of the apparatus (10) and its components, with indicia (120) of the components, visual indicators associated with the indicia (120) for indicating the operating status of the components, and controls (124) associated with the indicia (120) and adjacent the visual indicators for changing the operation of the corresponding component of the EBPVD apparatus (10).

8. 发明公开

EP1131474A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS WITH INGOT MAGAZINE 有权
标题翻译：带有INGOT杂志的电子束物理气相沉积设备
公开(公告)号：EP1131474A1
公开(公告)日：2001-09-12
申请号：EP00950976.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , WILLEN, William, Seth
IPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a rotatable magazine (102) that supports multiple ingots (26) of the coating material (26) beneath the coating chamber (12). The magazine (102) is indexed to individually align multiple stacks of one or more ingots (26) with an aperture (56) to the coating chamber (12) for sequentially feeding the ingots (26) into the coating chamber (12) without interrupting deposition of the coating material (26).
摘要翻译：电子束物理气相沉积（EBPVD）装置（10）和使用该装置（10）在物品（20）上产生涂层（例如陶瓷热障涂层）的方法。 EBPVD设备（10）通常包括可在高温和低于大气压下操作的涂覆室（12）。电子束枪（30）将电子束（28）投射到涂覆室（12）中并且投射到室（12）内的涂层材料（26）上，使涂层材料（26）熔化并蒸发。物品（20）被支撑在涂布室（12）内，使得涂料（26）的蒸气沉积在物品（20）上。 EBPVD设备（10）的操作通过包括支撑涂覆室（12）下面的涂覆材料（26）的多个锭（26）的可旋转仓库（102）而得到增强。将料盒（102）转位以单独地将具有孔（56）的一个或多个锭块（26）的多个堆叠排列到涂覆室（12），以顺序地将锭块（26）供给到涂覆室（12）中而不中断沉积涂层材料（26）。

9. 发明授权

EP1121476B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：电动RAY PVD设备
公开(公告)号：EP1121476B1
公开(公告)日：2005-11-16
申请号：EP00950949.8
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , EBERHARDT, Helmut , RICK, Alfred , BAEHR, Martin , REITH, Wolfgang, Erhardt
IPC分类号： C23C14/46
CPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) for producing a coating (e.g., a ceramic thermal barrier coating) on a article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) through an aperture (68) in a wall of the coating chamber (12) and onto a coating material (26) within a coating region defined within the chamber (12), causing the coating material (26) to melt and evaporate. The operation of the EBPVD apparatus (10) is enhanced by the inclusion within the coating chamber (12) of a second chamber (64) that encloses the aperture (68) so as to separate the aperture (68) from the coating region. Also provided is means (66) for maintaining the second chamber (64) at a pressure lower than the coating region. As a result, coating pressures of greater than 0.010 mbar can be practiced inside the coating region with minimal or no adverse effect on the operation and reliability of the electron beam gun (30).

10. 发明授权

EP1123422B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD 有权
标题翻译：电子束物理气相沉积设备和方法
公开(公告)号：EP1123422B1
公开(公告)日：2002-11-06
申请号：EP00950945.6
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , MARICOCCHI, Antonio, Frank , EVANS, John, Douglas, Sr. , BETSCHER, Keith, Humphries , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , LAGEMANN, Christopher, Lee , WILLEN, William, Seth
IPC分类号： C23C14/54 , C23C14/46 , H01J37/317 , H01J37/305 , H01J37/30
CPC分类号： C23C14/246 , C23C14/30 , C23C14/52 , C23C14/541 , C23C14/56 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus (10) at coating pressures above 0.010 mbar.
摘要翻译：电子束物理气相沉积（EBPVD）装置（10）和使用该装置（10）在物品（20）上产生涂层（例如陶瓷热障涂层）的方法。 EBPVD设备（10）通常包括可在高温和低于大气压下操作的涂覆室（12）。电子束枪（30）将电子束（28）投射到涂覆室（12）中并且投射到室（12）内的涂层材料（26）上，使涂层材料（26）熔化并蒸发。物品（20）被支撑在涂布室（12）内，使得涂料（26）的蒸气沉积在物品（20）上。 EBPVD设备（10）的操作通过包括或适应一种或多种机械和/或工艺改进（包括在涂覆压力高于0.010毫巴时操作设备（10）时必需或有益的那些）来增强。

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