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1. 发明授权

EP1896359B1 FLUID STORAGE AND DISPENSING SYSTEMS AND PROCESSES 有权转让
标题翻译： FLUIDSPEICHER - UND ABGABESYSTEME UND-PERFAHREN
公开(公告)号：EP1896359B1
公开(公告)日：2017-01-11
申请号：EP06772070.6
申请日：2006-06-05
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： KINGERY, John, R. , BRESTOVANSKY, Dennis , O'DOUGHERTY, Kevin, T. , TOM, Glenn, M. , MIKKELSEN, Kirk , SMITH, Matthew , WARE, Donald, D. , NELSON, Greg , HAAPALA, Robert , OBERG, Russell , HOYT, Tim , GEROLD, Jason , NESDAHL, Kevin , JANCSEK, John
IPC分类号： B67D7/02 , B67D7/34
CPC分类号： B67D7/0288 , B67D7/0261 , B67D7/32 , B67D7/3227 , B67D7/3281 , B67D7/34 , B67D7/344 , F16K35/00 , F16K35/025 , F16L37/08 , Y10T29/49826 , Y10T29/53
摘要： Fluid storage and dispensing systems and processes involving various devices, structures and arrangements, as well as techniques and methods, for fluid storage and dispensing, including, without limitation, pre-connect verification couplings that are usefully employed in application to fluid storage and dispensing packages, to ensure proper coupling and avoid fluid contamination issues, empty detect systems that are usefully employed for fluid storage and dispensing packages incorporating liners that are pressure-compressed in the fluid dispensing operation, ergonomically enhanced structures for facilitating removal of a dispense connector from a capped vessel, cap integrity assurance systems for preventing misuse of vessel caps, and keycoding systems for ensuring coupling of proper dispense assemblies and vessels. Fluid storage and dispensing systems are described, which achieve zero or near-zero headspace character, and prevent or ameliorate solubilization effects in liquid dispensing from liners in overpack vessels.
摘要翻译：流体存储和分配系统以及涉及流体存储和分配的各种装置，结构和布置以及技术和方法的流体存储和分配系统和过程，包括但不限于预先连接的验证联接器，其有效地用于流体存储和分配包装，以确保正确耦合并避免流体污染问题，空气检测系统有效地用于流体储存和分配包装，包含在流体分配操作中被压缩的衬垫，符合人体工程学的增强结构，便于将分配连接器从封盖船舶，船帽完整性保证系统，以防止船只盖的误用，以及用于确保适当分配组件和船只联结的键盘系统。描述了流体存储和分配系统，其实现零或接近零的顶空特征，并且防止或改善在外包装容器中的衬里中的液体分配中的增溶作用。

2. 发明公开

EP2997122A1 COMPOSITIONS AND METHODS FOR REMOVING CERIA PARTICLES FROM A SURFACE 无效转让
标题翻译：从表面去除龋齿颗粒的组合物和方法
公开(公告)号：EP2997122A1
公开(公告)日：2016-03-23
申请号：EP14797546.0
申请日：2014-05-15
申请人： Advanced Technology Materials, Inc.
发明人： LIU, Jun , SUN, Laisheng
IPC分类号： C11D3/26 , C11D3/00 , C11D1/00 , C09K3/14
CPC分类号： C11D11/0047 , C11D1/008 , C11D3/0042 , C11D3/2072 , C11D3/2086 , C11D3/2096 , C11D3/30 , C11D3/33 , H01L21/02057 , H01L21/02065
摘要： A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one surfactant. The composition achieves highly efficacious removal of the ceria particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, or tungsten-containing materials.
摘要翻译：用于清洁来自其上具有所述颗粒和污染物的微电子装置的化学机械抛光（CMP）污染物和二氧化铈颗粒的去除组合物和方法。去除组合物包含至少一种表面活性剂。该组合物实现了从微电子器件表面高效除去二氧化铈颗粒和CMP污染物材料，而不损害低k电介质，氮化硅或含钨材料。

3. 发明公开

EP2989231A1 COPPER CLEANING AND PROTECTION FORMULATIONS 审中-公开
标题翻译：铜清洁和保护配方
公开(公告)号：EP2989231A1
公开(公告)日：2016-03-02
申请号：EP14787602.3
申请日：2014-04-22
申请人： Advanced Technology Materials, Inc.
发明人： LIU, Jun , SUN, Laisheng , MEDD, Steven , BARNES, Jeffrey, A. , WRSCHKA, Peter , THOMAS, Elizabeth
IPC分类号： C23G1/00 , C23G1/18
CPC分类号： C11D3/0073 , C11D3/0042 , C11D3/30 , C11D11/0041 , C11D11/0047 , C23G1/18 , C23G1/20 , H01L21/02068 , H01L21/02074
摘要： A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include corrosion inhibitor(s) and surfactant(s). The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
摘要翻译：一种清洁组合物和方法，用于清洁来自其上具有所述残留物和污染物的微电子装置的化学机械抛光（CMP）残渣和污染物。清洁组合物包括腐蚀抑制剂和表面活性剂。该组合物实现了对微电子器件表面上的CMP后残留物和污染物质的高效清洁，而不损害低k介电材料或铜互连材料。

4. 发明公开

EP2964725A1 COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE 有权转让
标题翻译：选择性蚀刻氮化钛的组合物和方法
公开(公告)号：EP2964725A1
公开(公告)日：2016-01-13
申请号：EP14759688.6
申请日：2014-03-04
申请人： Advanced Technology Materials, Inc. , Atmi Taiwan Co., Ltd.
发明人： CHEN, Li-Min , COOPER, Emanuel, I. , LIPPY, Steven , SONG, Lingyan , HSU, Chia-Jung , TU, Sheng-Hung , WANG, Chieh, Ju
IPC分类号： C09K13/00 , C09K13/04 , C09K13/08 , G03F7/42
CPC分类号： C09K13/00 , C09K13/08 , C09K13/10 , C23F1/14 , C23F1/26 , C23G1/02 , G03F7/423 , H01L21/32134
摘要： Semi-aqueous compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten and copper, and insulating materials from a microelectronic device having same thereon. The semi-aqueous compositions contain at least one oxidant, at least one etchant, and at least one organic solvent, may contain various corrosion inhibitors to ensure selectivity.
摘要翻译：用于相对于金属导电（例如钨和铜）选择性去除氮化钛和/或光刻胶蚀刻残留物材料的半水性组合物，以及来自其上具有相同金属的绝缘材料的半导体组合物。半含水组合物含有至少一种氧化剂，至少一种蚀刻剂和至少一种有机溶剂，可含有各种腐蚀抑制剂以确保选择性。

5. 发明授权

EP2376346B3 Storage system with rigid liner and method of delivering a fluid 有权
标题翻译：存储系统具有刚性内衬和分配流体的方法
公开(公告)号：EP2376346B3
公开(公告)日：2016-01-13
申请号：EP10785311.1
申请日：2010-07-09
申请人： Advanced Technology Materials, Inc.
发明人： TOM, Glenn , BAUM, Tom , KUSZ, Matt , MENNING, Joseph , NELSON, Greg , LEE, Dongyun , LIU, Wei , KIM, Kanghyun , BOGGS, Karl , CHISM, Richard
IPC分类号： B65D77/04 , B65D25/14 , B65D85/84 , B67D7/58 , H01L21/02 , B67D7/02 , B65D83/00
CPC分类号： B65D83/0055 , B05B7/241 , B05B11/0043 , B05B11/30 , B29C49/04 , B29C49/06 , B29L2023/006 , B65D35/02 , B65D77/06 , B65D77/065 , B65D83/60 , B65D83/62 , B65D2231/001 , B65D2231/004 , B65D2231/008

6. 发明公开

EP2850651A2 AQUEOUS CLEAN SOLUTION WITH LOW COPPER ETCH RATE FOR ORGANIC RESIDUE REMOVAL IMPROVEMENT 审中-公开
标题翻译：具有低铜蚀刻纯净水溶液用于改进的有机碎屑移除
公开(公告)号：EP2850651A2
公开(公告)日：2015-03-25
申请号：EP13791242.4
申请日：2013-05-17
申请人： Advanced Technology Materials, Inc. , ATMI Taiwan Co., Ltd.
发明人： JENQ, Shrane, Ning , BOGGS, Karl, E. , LIU, Jun , THOMAS, Nicole
IPC分类号： H01L21/302
CPC分类号： C11D11/0047 , C11D3/0073 , C11D7/08 , C11D7/267 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3281 , C25D5/48 , H01L21/02074
摘要： A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include at least one quaternary base, at least one amine, at least one corrosion inhibitor, and at least one solvent. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device while being compatible with barrier layers.

7. 发明公开

EP2817555A1 FLUID DELIVERY SYSTEM AND METHOD 有权转让
标题翻译：系统和方法来分布液体的
公开(公告)号：EP2817555A1
公开(公告)日：2014-12-31
申请号：EP13751797.5
申请日：2013-02-22
申请人： Advanced Technology Materials, Inc.
发明人： HODGES, Jordan , CHISM, Richard, D , MCFERON, Mitchell, W. , WARE, Donald, D. , TOM, Glenn, M.
IPC分类号： F17C9/00 , B67D7/00 , F17C7/00 , H01L21/02
CPC分类号： F17C9/00 , B67D7/00 , B67D7/02 , B67D7/025 , B67D7/0272 , B67D7/0283 , F17C7/00
摘要： A fluid supply system adapted for vacuum and pressure cycling of fluid, including a transfer vessel adapted to supply a process canister with fluid drawn from a bulk canister under a vacuum, wherein delivery of fluid from the transfer vessel to the process canister is accomplished with positive pressure. A method is also disclosed of delivering fluid, including drawing fluid under vacuum from a bulk canister and pressurizing the transfer vessel to effect dispensing of the fluid into a process canister for delivery to a location of use.

8. 发明公开

EP2790845A1 APPARATUS AND METHOD FOR STRIPPING SOLDER METALS DURING THE RECYCLING OF WASTE ELECTRICAL AND ELECTRONIC EQUIPMENT 失效转让
标题翻译：设备和方法拆卸废焊料从电气和电子设备回收过程中
公开(公告)号：EP2790845A1
公开(公告)日：2014-10-22
申请号：EP12857057.9
申请日：2012-12-13
申请人： Advanced Technology Materials, Inc.
发明人： CHEN, Tianniu , KORZENSKI, Michael B. , JIANG, Ping
IPC分类号： B09B3/00 , B09B5/00 , B29B17/02 , H05K3/34
CPC分类号： B23K1/018 , B09B3/00 , B09B5/00 , B23K3/08 , B23K37/00 , C22B1/005 , C22B3/02 , C22B3/04 , C22B4/00 , C22B7/006 , C22B11/046 , C25C1/00 , H05K3/22 , H05K2203/178 , Y02P10/234 , Y02P70/613 , Y02W30/82 , Y02W30/821 , Y02W30/822
摘要： Apparatuses and processes for recycling printed wire boards, wherein electronic components, precious metals and base metals may be collected for reuse and recycling. The apparatuses generally include a mechanical solder removal module and/or a thermal module, a chemical solder removal module, and a precious metal leaching module, wherein the modules are attached for continuous passage of the e-waste from module to module.

9. 发明授权

EP2447167B1 A pressure dispense apparatus for minimizing the generation of particles in ultrapure liquids and dispensing method utilizing such an apparatus 有权
标题翻译：压力分配器在使用这种装置的高度纯化的液体和递送方法最小化颗粒的产生
公开(公告)号：EP2447167B1
公开(公告)日：2014-04-23
申请号：EP12151767.6
申请日：2003-04-28
申请人： Advanced Technology Materials, Inc.
发明人： Kelly, Wayne , Chilcote, Dennis
IPC分类号： B65B3/22 , B65B1/04 , B65B3/04
CPC分类号： B67D7/0261 , B65B3/04 , B65B3/22 , B65B31/044

10. 发明公开

EP2715781A2 REFILLABLE AMPOULE WITH PURGE CAPABILITY 有权转让
标题翻译： NACHFÜLLBAREAMPULLE MITENTLÜFTUNGSFÄHIGKEIT
公开(公告)号：EP2715781A2
公开(公告)日：2014-04-09
申请号：EP12793563.3
申请日：2012-05-24
申请人： Advanced Technology Materials, Inc.
发明人： CHISM, Richard, D. , KRELL, Andy
IPC分类号： H01L21/02
CPC分类号： F17C13/04 , C23C14/48 , C23C16/44 , C23C16/4408 , C23C16/4482 , C23C16/45561 , F17C2205/0335 , F17D1/04 , G03F7/70 , H01L21/67017 , Y10T137/0318 , Y10T137/877
摘要： A fluid delivery system adapted to isolate an ampoule and/or process line during purge, including an inlet control valve connecting a source of pressurized gas to a refillable ampoule, an outlet control valve connecting the refillable ampoule to a location of use, a process control valve connecting a process line to the refillable ampoule, a process isolation valve, and a purge supply valve, e.g., a three-way purge supply valve, arranged between the process isolation valve and the process control valve. A method of purging a fluid delivery system is also disclosed, including closing a process isolation valve, connecting a process line to a refillable ampoule, supplying a purge gas through a purge supply valve, e.g., a three-way purge supply valve, and cycling open and close at least once a process control valve coupled to the process line. A manifold for use in refilling an ampoule and purging a fluid supply system is also described.
摘要翻译：流体输送系统，其适于在净化期间隔离安瓿和/或生产线，包括将加压气体源连接到可再填充的安瓿的入口控制阀，将可再填充的安瓿连接到使用位置的出口控制阀，过程控制将过程管线连接到可再填充安瓿的阀门，过程隔离阀和布置在过程隔离阀和过程控制阀之间的净化供给阀，例如三通净化供给阀。还公开了一种清洗流体输送系统的方法，包括关闭过程隔离阀，将过程管线连接到可再填充的安瓿，通过净化供给阀（例如三通净化供给阀）和循环打开和关闭至少一次与过程管线相连的过程控制阀。还描述了用于重新灌注安瓿和清洗流体供应系统的歧管。

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