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1. 发明授权

EP4133118B1 METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESS 有权
公开(公告)号：EP4133118B1
公开(公告)日：2024-08-07
申请号：EP21716868.1
申请日：2021-03-29
IPC分类号： H01J37/34 , C23C14/34 , C23C14/35 , C23C14/54
CPC分类号： C23C14/35 , C23C14/345 , C23C14/54 , C23C14/543 , H01J37/3467

2. 发明公开

EP3368705A1 VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN ÜBERLANGER FLÄCHENHAFTER SUBSTRATE, INSBESONDERE GLASSCHEIBEN, IN EINER VAKUUM-BESCHICHTUNGSANLAGE 有权
公开(公告)号：EP3368705A1
公开(公告)日：2018-09-05
申请号：EP16797448.4
申请日：2016-10-20
申请人： Grenzebach Maschinenbau GmbH
发明人： GAWER, Olaf , RICHERT, Holger , ELLRICH, Jens
IPC分类号： C23C14/56
CPC分类号： C23C14/562 , C23C14/54 , C23C14/566 , C23C14/568
摘要： The invention relates to a device and a method for coating extra-long sheet-type substrates, in particular glass panes, in a vacuum coating system, said system having the following features: a) a series connection of chambers, through which each substrate sheet (9) passes and which are arranged on the entry side, namely a load lock chamber (1), a buffer chamber (2) and a transfer chamber (3), the entry side of each of said chambers being vacuum-sealable by a check valve (8, 11, 15), wherein an area of process chambers (4) follows the transfer chamber (3) and an exit-side series connection of a transfer chamber (5), buffer chamber (7) and load lock chamber (8) follows the process chambers (4); b) a conveyor device (10) constructed on rollers; c) a single high-power vacuum pump (13) with an adapter flange (14) in the region of the buffer chamber (2); d) at least two flow baffles (12) in the region of the buffer chamber (2); e) a system (16) for the longitudinal displacement of the flow baffles (12) and a system (17) for adjusting the height of the flow baffles (12); f) an assembly for controlling the dynamic processes.

3. 发明公开

EP3330579A4 PISTON RING AND MANUFACTURING METHOD THEREOF 有权
公开(公告)号：EP3330579A4
公开(公告)日：2018-07-18
申请号：EP16832939
申请日：2016-07-29
申请人： NIPPON PISTON RING CO LTD
发明人： OZAKI TAKUYA , SUGIURA HIROYUKI
IPC分类号： F16J9/26 , C23C14/06 , C23C14/32 , C23C14/54 , F02F5/00
CPC分类号： F16J9/26 , C23C14/0605 , C23C14/325 , C23C14/54 , F02F5/00
摘要： To provide a piston ring comprising a hard carbon film that is easy to form and exhibits excellent adhesion and wear resistance, and a manufacturing method therefor. The above-described problem is solved by means of a piston ring comprising a hard carbon film 50 formed on at least an outer peripheral sliding surface 11 of a piston ring base material 1, wherein the hard carbon film 50 is a laminated film comprising a plurality of layers, including an upper layer 5 with a lamination pitch within a range of 3 nm to 50 nm inclusive, a middle layer 4 with a lamination pitch less than that of the upper layer 5, and a lower layer 3 with a lamination pitch within the same range as that of the upper layer 5 and greater than that of the middle layer 4. This hard carbon film 50 may be configured to have an sp 2 component ratio within a range of 35% to 80% inclusive, measured in a TEM-EELS spectrum formed by combining electron energy loss spectroscopy (EELS) with a transmission electron microscope (TEM), and a hydrogen content within a range of 0.1 atom% to 5 atom% inclusive.

4. 发明授权

EP1818505B2 Verfahren zum Herstellen einer Beschichtungsprobe 有权转让
标题翻译：生产涂层样品的方法
公开(公告)号：EP1818505B2
公开(公告)日：2017-12-13
申请号：EP06002582.2
申请日：2006-02-08
申请人： Siemens Aktiengesellschaft
发明人： Berndt, Thomas , Ladru, Francis-Jurjen, Dr. , Mensing, Marcus , Reymann, Helge , Wanigasinghe, Mahinda
IPC分类号： F01D5/28 , C23C30/00 , G01N1/00
CPC分类号： F01D5/288 , C23C4/01 , C23C4/12 , C23C14/54 , C23C28/3215 , C23C28/345 , C23C28/3455 , F05D2230/232 , G01N2203/0246 , G01N2203/0664 , Y02T50/67

5. 发明授权

EP2834389B1 BESCHICHTUNGSQUELLE MIT EINEM AN EINE INDIREKTE KÜHLVORRICHTUNG ANGEPASSTEN TARGET 有权转让
标题翻译：涂层源的间接COOLER匹配的目标
公开(公告)号：EP2834389B1
公开(公告)日：2016-11-30
申请号：EP13709319.1
申请日：2013-03-05
申请人： Oerlikon Surface Solutions AG, Pfäffikon
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg
IPC分类号： C23C14/34
CPC分类号： H01J37/3497 , C09J7/22 , C23C14/34 , C23C14/3407 , C23C14/54 , H01J37/3411 , H01J37/3417 , H01J37/3435 , H01J2237/002

6. 发明公开

EP3020067A1 PROVIDING A CHIP DIE WITH ELECTRICALLY CONDUCTIVE ELEMENTS 有权
标题翻译：婴幼儿精油麻醉师ELEKTRISCHLEITFÄHIGENELEMENTEN
公开(公告)号：EP3020067A1
公开(公告)日：2016-05-18
申请号：EP14741972.5
申请日：2014-07-08
申请人： Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
发明人： THEEUWES, Johannes Adrianus Cornelis , SMELTINK, Jeroen Anthonius , BROUWER, Egbert Anne Martijn , OOSTERHUIS, Gerrit
IPC分类号： H01L21/768 , B23K26/04 , C23C14/04 , H01L21/285
CPC分类号： H01L21/76898 , B23K26/0622 , B23K26/082 , B23K26/0853 , B23K26/32 , B23K26/34 , B23K2201/40 , B23K2203/08 , B23K2203/10 , B23K2203/12 , B23K2203/18 , B23K2203/50 , B23K2203/56 , C23C14/048 , C23C14/54 , G05B19/418 , G05B2219/33198 , G05B2219/45031 , H01L21/2855 , H01L21/68 , H01L21/68785 , H01L21/76838
摘要： A method for providing position control information for controlling an impingement position of a laser beam for treatment of a chip die in a chip manufacturing process, comprises the steps of a) receiving a specification of positions (x,y) of a electrically conductive elements in the chip die, the positions having a first coordinate along a first direction (x) and a second coordinate (y) along a second direction in a plane defined by the chip die, said first and second direction being mutually transverse to each other, b) selecting a cluster of positions that is within a predetermined two- dimensional spatial range, wherein each pair of positions in the cluster at least has a first minimum difference in their first coordinates or a second minimum difference in their second coordinates and removing the next position from the ordered set, c) update the positions of the set of positions in accordance with an expected time needed to carry out the treatment for said cluster and a speed of a wafer comprising the chip die, d) repeating steps b-d until each of the positions in said set is assigned to a cluster.
摘要翻译：一种用于在芯片制造过程中提供用于控制用于处理芯片芯片的激光束的冲击位置的位置控制信息的方法，包括以下步骤：a）接收导电元件的位置（x，y）所述芯片模具具有沿着第一方向（x）具有第一坐标的位置和沿着由所述芯片模具限定的平面中的第二方向的第二坐标（y），所述第一和第二方向彼此相互横向，b ）选择位于预定二维空间范围内的位置簇，其中所述群集中的每对位置至少具有其第一坐标中的第一最小差值或其第二坐标中的第二最小差值，并移除所述下一位置从有序集合中，c）根据对所述群集进行处理所需的预期时间来更新该组位置的位置，并且晶片，d）重复步骤b-d，直到将所述组中的每个位置分配给簇。

7. 发明公开

EP2971223A1 PLASMA EMISSION MONITOR AND PROCESS GAS DELIVERY SYSTEM 有权
标题翻译： PLASMAEMISSIONSMONITOR UND PROZESSGASABGABESYSTEM
公开(公告)号：EP2971223A1
公开(公告)日：2016-01-20
申请号：EP14715163.3
申请日：2014-03-07
申请人： Cardinal CG Company
发明人： BURROWS, Keith J. , GRUBER, Christopher L. , HARTIG, Klaus H.W.
IPC分类号： C23C14/34 , C23C14/00 , C23C14/54 , H01J37/34
CPC分类号： H01J37/32449 , C23C14/0042 , C23C14/54 , C23C14/542 , C23C14/544 , H01J37/3244 , H01J37/32972 , H01J37/34
摘要： A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.
摘要翻译：用于将气体输送到溅射室的气体歧管设置有端口以容纳等离子体发射监测器以监测溅射室中的等离子体信息以提供反馈控制。等离子体发射监视器的准直器暴露于气体流动，因此监视器的涂层大大减少。

8. 发明公开

EP2960354A1 STAINING DEVICE 有权
标题翻译：染色设备
公开(公告)号：EP2960354A1
公开(公告)日：2015-12-30
申请号：EP14753930.8
申请日：2014-02-18
申请人： Nidek Co., Ltd.
发明人： OTA, Yasuo , INUZUKA, Minoru , YANO, Atsushi , TANAKA, Motoshi
IPC分类号： C23C14/12 , C23C14/58 , D06P5/00 , D06P5/20 , G02C7/02
CPC分类号： C23C14/24 , B29D11/00903 , B29D11/00923 , C23C14/28 , C23C14/50 , C23C14/54 , C23C14/541 , C23C14/542 , D06P5/004 , D06P5/13 , D06P5/20 , G02B1/041 , G02B1/10 , G02B1/12
摘要： A dyeing device dyes a resin body by vaporizing and depositing a sublimation dye adhered to a dyeing base to a resin body provided in an installing unit and fixing the dye to the resin body. The dyeing device lowers the pressure inside a closed chamber that closes the periphery of the resin body by a pump (S27). In the state where the adhesion surface of the dyeing base to which the dye is adhered faces the resin body without contact, by heating the dye adhered to the dyeing base inside the closed chamber of which the pressure is lowered, the dye is sublimated, vaporized, and deposited on the resin body (S28). The pressure inside the closed chamber is raised higher than the pressure at the vaporizing and depositing time (S30). By irradiating the resin body on which the dye is vaporized and deposited with electromagnetic wave, the resin body is heated and the dye is and fixed (S36).
摘要翻译：染色装置通过将粘附到染色基底上的升华染料蒸发并沉积到设置在安装单元中的树脂体并将该染料固定到树脂体上来染色树脂体。染色装置降低通过泵关闭树脂体周边的密闭室内的压力（S27）。在附着有染料的染色基质的附着面与树脂体不接触地面对着的状态下，通过加热附着在染色基质上的染料基底内的压力降低的密闭室内的染料，染料升华，气化并沉积在树脂体上（S28）。封闭室内的压力比蒸发和沉积时的压力升高（S30）。通过用电磁波照射染料蒸发和沉积的树脂体，树脂体被加热并且染料固定（S36）。

9. 发明授权

EP2695967B1 Procédé de synthèse d'un matériau composite nanostructuré et dispositif de mise en oeuvre associé. 有权
标题翻译：一个纳米结构的复合材料的合成方法，并对应其执行装置
公开(公告)号：EP2695967B1
公开(公告)日：2015-04-01
申请号：EP13179922.3
申请日：2013-08-09
申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
发明人： Sublemontier, Olivier , Kintz, Harold , Leconte, Yann
IPC分类号： C23C14/06 , C23C14/22 , C23C14/54 , B05D1/12 , B82Y40/00
CPC分类号： B05D1/12 , B82Y40/00 , C23C14/06 , C23C14/22 , C23C14/228 , C23C14/54

10. 发明公开

EP2720518A2 PLASMA-GENERATING SOURCE COMPRISING A BELT-TYPE MAGNET, AND THIN-FILM DEPOSITION SYSTEM USING SAME 有权转让
标题翻译： PLASMAERZEUGUNGSQUELLE MIT EINEMBANDFÖRMIGENMAGNETEN UNDDÜNNFILMABSCHEIDUNGSSYSTEMDAMIT
公开(公告)号：EP2720518A2
公开(公告)日：2014-04-16
申请号：EP12797155.4
申请日：2012-06-01
申请人： Korea Basic Science Institute
发明人： YOO, Suk Jae , KIM, Seong Bong
IPC分类号： H05H1/34 , H01L21/205 , C23C16/50
CPC分类号： H01J37/32669 , C23C14/354 , C23C14/357 , C23C14/54 , H01J37/32192 , H01J37/3266 , H01J37/34 , H05H2001/4607
摘要： The present invention is about plasma generation source and a thing that is in its application and it is for getting high quality thin film by generating even high density plasma in high vacuum and like this plasma generation source applying like this plasma generation source to sputtering system, neutral particle beam source, thin film deposition system combining sputtering system and neutral particle beam source,
According to the present invention, it generates plasma by using microwave through the microwave irradiating equipment and magnetic field by more than one pair of the belt type magnets and above goal can be accomplished maximizing plasma confinement effect by inducing electron returning trajectory in accordance with above continuous structure on belt type magnet.
摘要翻译：本发明涉及等离子体发生源及其应用，并且是通过在高真空中产生均匀的高密度等离子体而获得高品质的薄膜，并且像这样的等离子体发生源像溅射系统一样，中性粒子束源，组合溅射系统和中性粒子束源的薄膜沉积系统根据本发明，通过使用微波通过微波照射设备和磁场产生等离子体，通过多于一对的带式磁体及以上可以通过根据带式磁体上的连续结构诱导电子返回轨迹来实现目标的最大化等离子体约束效应。

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