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1. 发明授权

EP2771901B1 VERFAHREN ZUR BEREITSTELLUNG SEQUENZIELLER LEISTUNGSPULSE 有权转让
公开(公告)号：EP2771901B1
公开(公告)日：2018-12-12
申请号：EP12784435.5
申请日：2012-10-08
申请人： Oerlikon Surface Solutions AG, Pfäffikon
发明人： KRASSNITZER, Siegfried , LENDI, Daniel , LECHTHALER, Markus
IPC分类号： C23C14/35 , H01J37/34 , C23C14/34
CPC分类号： H03K3/012 , C23C14/3485 , C23C14/352 , C23C14/54 , H01J37/3467

2. 发明公开

EP3347777A1 DEPOSITION SYSTEM 有权转让
公开(公告)号：EP3347777A1
公开(公告)日：2018-07-18
申请号：EP16770349.5
申请日：2016-08-17
申请人： Flisom AG , Ruehle, Ulfert
发明人： WEPFER, Marc , BUQAEI, Hamzeh
IPC分类号： G05B19/402 , G05B19/404 , C23C14/00 , C23C16/00 , C23C14/56 , C23C16/54 , B65H23/032
CPC分类号： G05B19/402 , B65H23/0326 , B65H23/0328 , B65H2301/3613 , B65H2301/51145 , B65H2511/23 , B65H2553/212 , B65H2553/412 , B65H2701/1315 , B65H2801/87 , C23C14/54 , C23C14/562 , G05B19/404 , B65H2220/01
摘要： A deposition system for guiding a flexible substrate along a path is provided. The deposition system includes a first frame having a first sidewall and a second sidewall separated from each other in a first direction, a payout hub coupled to the first sidewall and the second sidewall, and having a rotational axis extending in the first direction, a first roller positioned apart from the payout hub in a second direction, where a length of the substrate extends in the second direction from the payout hub to the first roller during processing, a first sensor located a first distance in the second direction from the payout hub, a second sensor located a second distance in the second direction from the payout hub, and a first actuator, coupled to the payout hub, the first actuator operable to adjust a position of the payout hub in the first direction.

3. 发明授权

EP2597172B1 Ion bombardment apparatus and method for cleaning of surface of base material using the same 有权
标题翻译：离子轰击装置和使用其的基体材料表面清洁的方法
公开(公告)号：EP2597172B1
公开(公告)日：2018-03-07
申请号：EP12191192.9
申请日：2012-11-05
申请人： KABUSHIKI KAISHA KOBE SEIKO SHO
发明人： Hirota, Satoshi , Goto, Naoyuki , Nomura, Homare , Cremer, Rainer
IPC分类号： C23C14/02 , C23C14/56 , H01J37/32 , C23C14/32 , C23C14/54
CPC分类号： H01J37/32018 , C23C14/022 , C23C14/325 , C23C14/54 , C23C14/564 , H01J37/32403 , H01J37/32862
摘要： In an ion bombardment apparatus of the present invention, a heating type thermal electron emission electrode formed by a filament is placed on one inner surface of a vacuum chamber, an anode for receiving a thermal electron from the thermal electron emission electrode is placed on another inner surface of the vacuum chamber, and a base material is placed between the thermal electron emission electrode and the anode. Further, the ion bombardment apparatus has a discharge power supply for generating a glow discharge upon application of a potential difference between the thermal electron emission electrode and the anode, a heating power supply for heating the thermal electron emission electrode so as to emit the thermal electron, and a bias power supply for applying negative pulse-shaped bias potential with respect to the vacuum chamber to the base material.

4. 发明授权

EP1464723B1 Thermal barrier coating having nano scale features 有权
标题翻译：具有纳米级特征的热障涂层
公开(公告)号：EP1464723B1
公开(公告)日：2018-02-21
申请号：EP04075992.0
申请日：2004-04-02
申请人： Siemens Energy, Inc.
发明人： Burns, Andrew Jeramiah , Subramanian, Ramesh
IPC分类号： C23C28/00 , C23C14/02 , C23C14/08 , C23C14/54
CPC分类号： C23C14/024 , C23C14/08 , C23C14/083 , C23C14/54 , C23C28/3215 , C23C28/324 , C23C28/345 , C23C28/3455 , G06F19/704 , Y10T428/24975 , Y10T428/25 , Y10T428/252
摘要： A ceramic thermal barrier coating material (10) containing nano-sized features is predicted to exhibit improved high temperature performance than a comparable material containing fewer of such features. In a coating deposited by an APS process, the nano-sized features may be intersplat columns (32). In a coating deposited by an EB-PVD process, the nano-sized features may be a mixed oxide layer (22) formed of nano-sized mixed oxide particles, or nano-sized alumina projections (24) extending across the interface from the mixed oxide layer into the insulating material layer (20). Alternatively, the nano-sized features may be secondary columnar grains (36) extending laterally from primary columnar grains (34) in a columnar-grained ceramic material.

5. 发明授权

EP2206138B8 METHOD FOR MANUFACTURING A TREATED SURFACE AND VACUUM PLASMA SOURCES 有权转让
标题翻译：制造经处理的表面和真空等离子体源的方法
公开(公告)号：EP2206138B8
公开(公告)日：2017-07-12
申请号：EP07822148.8
申请日：2007-11-01
申请人： Oerlikon Surface Solutions Ltd., Pfäffikon
发明人： RAMM, Juergen , WIDRIG, Beno , KURAPOV, Denis
IPC分类号： H01J37/32 , C23C14/00 , C23C14/22 , C23C14/35 , C23C14/54
CPC分类号： C23C14/54 , C23C14/0036 , C23C14/228 , C23C14/35 , C23C14/351 , H01J37/32009 , H01J37/32055 , H01J37/32477 , H01J37/32541

6. 发明公开

EP2539480A4 PLASMA SPUTTERING PROCESS FOR PRODUCING PARTICLES 有权转让
标题翻译：等离子溅射颗粒制造
公开(公告)号：EP2539480A4
公开(公告)日：2017-04-05
申请号：EP11747794
申请日：2011-02-22
申请人： PLASMADVANCE AB
发明人： HELMERSSON ULF , BRENNING NILS , SÖDERSTRÖM DANIEL
IPC分类号： C23C14/22 , B22F9/12 , C23C14/34 , H01J37/34
CPC分类号： C23C14/223 , B22F9/12 , B22F2999/00 , C23C14/3485 , C23C14/54 , C23C14/544 , H01J37/34 , B22F2202/13 , B22F1/025
摘要： A high production rate plasma sputtering process for producing particles having a size of 10 μm or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.

7. 发明公开

EP3143177A1 METHOD TO FILTER MACRO PARTICLES IN A CATHODIC ARC PHYSICAL VAPOR DEPOSITION (PVD), IN VACUUM 有权
标题翻译：方法，其通过阴极电弧真空过滤大粒子在物理气相沉积（PVD）
公开(公告)号：EP3143177A1
公开(公告)日：2017-03-22
申请号：EP14732390.1
申请日：2014-05-13
申请人： Argor Aljba SA
发明人： UKHANOV, Sergey
IPC分类号： C23C14/32
CPC分类号： H01J37/32871 , C23C14/325 , C23C14/54 , H01J37/32055 , H01J37/32064 , H01J37/32541 , H01J37/34
摘要： A method to filter macro particles in a cathodic arc physical vapor deposition (PVD) in vacuum is described, said method comprising the step of evaporating a material from a solid source (1) by means of application of the arc on the source, forming a plasma comprising electrons, micro particles (vapor) and ions of evaporated material, together with macro particles larger in size than the micro particles and ions. The arc is moved on the source at a speed Vcs (superficial speed) at which the electrons, the micro particles and the ions of material evaporated at a point P2 deviate, from a path towards a substrate (2) to be coated facing the source, the macro particles formed at a point P1 previously passed over by the arc, so as to self-clean the plasma of the macro particles and allow condensation of only the cleaned plasma on the substrate.
摘要翻译：的方法，来筛选宏颗粒在真空阴极电弧物理气相沉积（PVD）中描述，所述方法包括由所述源上的弧的应用的手段从固体源（1）蒸发的材料的步骤，形成了与宏颗粒尺寸比微颗粒和较大的离子包括等离子体电子，微颗粒（蒸气）并蒸发材料的离子，在一起。电弧在在其中电子，微颗粒和在点P2偏离蒸发的材料的离子，从一个路径向一个基片（2）面向所述源被涂覆速度CS（浅表速度）移动的源上，在点P1形成的宏观颗粒之前经过由电弧以自清洁宏粒子的等离子体，并且仅允许在基板的清洁等离子体的冷凝。

8. 发明公开

EP3133183A1 MAGNETIC DEVICE, EVAPORATION DEVICE AND EVAPORATION METHOD 有权
标题翻译： MAGNETISCHE VORRICHTUNG，VERDAMPFUNGSVORRICHTUNG UND VERDAMPFUNGSVERFAHREN
公开(公告)号：EP3133183A1
公开(公告)日：2017-02-22
申请号：EP14861135.3
申请日：2014-08-28
申请人： BOE Technology Group Co., Ltd.
发明人： ZHAO, Dejiang , GAO, Haoran , YU, Jianwei , YIN, Jie
IPC分类号： C23C14/04 , C23C14/54
CPC分类号： C23C14/042 , C23C14/12 , C23C14/54
摘要： The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.
摘要翻译：本公开提供了一种磁性装置和气相沉积装置。磁性装置构造成在气相沉积装置中吸附金属掩模，包括：金属板; 包括多个电磁体的电磁体阵列; 每个电磁体插入金属板中; 配置为提供电流的电源模块; 控制模块，被配置为当在气相沉积工艺期间吸附所述金属掩模时控制所述电源模块以向所述多个电磁体中的所有或部分电磁体提供直流电流并通过发送所述直流电流来控制所述直流电的方向和尺寸第一控制信号到电源模块。

9. 发明公开

EP3110985A1 SYSTEM AND METHOD FOR DEPOSITION OF INTEGRATED COMPUTATIONAL ELEMENTS (ICE) USING A TRANSLATION STAGE 审中-实审
标题翻译：系统和方法综合计算元件中的配有翻译级分离
公开(公告)号：EP3110985A1
公开(公告)日：2017-01-04
申请号：EP14896778.9
申请日：2014-06-30
申请人： Halliburton Energy Services, Inc.
发明人： PERKINS, David L. , FREESE, Robert Paul , JONES, Christopher Michael , GARDNER, Richard Neal
IPC分类号： C23C14/24 , C23C14/54
CPC分类号： C23C14/547 , C23C14/22 , C23C14/221 , C23C14/24 , C23C14/26 , C23C14/505 , C23C14/54 , C23C14/541 , C23C16/042 , C23C16/4588 , G01N21/31
摘要： The disclosed embodiments include a system and method for manufacturing an integrated computational element (ICE) core. In one embodiment, the method comprises thermally evaporating a material to deposit the material on a substrate, wherein the material is deposited to establish a shape of the ICE core. The shape of the ICE core defines transmission, reflection, and absorptive electromagnetic intensity as a function of wavelength of the ICE core. In one embodiment, the method includes varying e-beam or ion-beam intensities and strengths to control the shape of the ICE core.
摘要翻译：盘游离缺失实施例包括用于制造集成的计算元件（ICE）芯的系统和方法。在一个中，该方法实施例包括热蒸发的材料沉积在基板上的材料，所述worin材料被沉积以建立核心ICE的形状。芯ICE的形状定义为ICE芯的波长的函数的透射，反射，和吸收电磁强度。在一个中，该方法包括改变实施方式电子束或离子束的强度和强度，以控制芯ICE的形状。

10. 发明公开

EP2960354A4 STAINING DEVICE 有权
标题翻译： DYE DEVICE
公开(公告)号：EP2960354A4
公开(公告)日：2016-11-16
申请号：EP14753930
申请日：2014-02-18
申请人： NIDEK KK
发明人： OTA YASUO , INUZUKA MINORU , YANO ATSUSHI , TANAKA MOTOSHI
IPC分类号： D06P5/20 , B29D11/00 , C23C14/24 , C23C14/54 , D06P5/13 , D06P5/28
CPC分类号： C23C14/24 , B29D11/00903 , C23C14/54 , C23C14/541 , C23C14/542 , D06P5/004 , D06P5/13 , D06P5/20
摘要： A dyeing device dyes a resin body by vaporizing and depositing a sublimation dye adhered to a dyeing base to a resin body provided in an installing unit and fixing the dye to the resin body. The dyeing device lowers the pressure inside a closed chamber that closes the periphery of the resin body by a pump (S27). In the state where the adhesion surface of the dyeing base to which the dye is adhered faces the resin body without contact, by heating the dye adhered to the dyeing base inside the closed chamber of which the pressure is lowered, the dye is sublimated, vaporized, and deposited on the resin body (S28). The pressure inside the closed chamber is raised higher than the pressure at the vaporizing and depositing time (S30). By irradiating the resin body on which the dye is vaporized and deposited with electromagnetic wave, the resin body is heated and the dye is and fixed (S36).

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