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1. 发明授权

US5502306A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5502306A
公开(公告)日：1996-03-26
申请号：US214377
申请日：1994-03-17
申请人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
发明人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/307 , G03F1/08 , G03F1/16 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/26
CPC分类号： H01J37/28 , G01R31/307 , H01J2237/063 , H01J2237/184 , H01J2237/204 , H01J2237/24495 , H01J2237/30438
摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
摘要翻译：公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。衬底也在其表面上经受电场以加速次级颗粒。该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

2. 发明授权

US5578821A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5578821A
公开(公告)日：1996-11-26
申请号：US371458
申请日：1995-01-11
申请人： Dan Meisberger , Alan D. Brodie , Anil A. Desai , Dennis G. Emge , Zhong-Wei Chen , Richard Simmons , Dave E. A. Smith , April Dutta , J. Kirkwood H. Rough , Leslie A. Honfi , Henry Pearce-Percy , John McMurtry , Eric Munro
发明人： Dan Meisberger , Alan D. Brodie , Anil A. Desai , Dennis G. Emge , Zhong-Wei Chen , Richard Simmons , Dave E. A. Smith , April Dutta , J. Kirkwood H. Rough , Leslie A. Honfi , Henry Pearce-Percy , John McMurtry , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/28 , G01R31/302 , G03F1/08 , G03F1/16 , H01J37/28 , H01J37/30 , H01L21/027 , H01L21/66 , H01J37/00
CPC分类号： H01J37/28 , H01J37/3005 , H01J2237/2817
摘要： A method and apparatus for a charged particle scanning system and an automatic inspection system, including wafers and masks used in microcircuit fabrication. A charged particle beam is directed at the surface of a substrate for scanning that substrate and a selection of detectors are included to detect at least one of the secondary charged particles, back-scattered charged particles and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary charged particles. The system facilitates inspection at low beam energies on charge sensitive insulating substrates and has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment system for initially aligning the substrate beneath the charged particle beam. To function most efficiently there is also a vacuum system for evacuating and repressurizing a chamber containing the substrate. The vacuum system can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum system can simultaneously evacuate a plurality of substrates prior to inspection and repressurize the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison system for comparing the pattern on the substrate with a second pattern.
摘要翻译：一种带电粒子扫描系统和自动检查系统的方法和装置，包括微电路制造中使用的晶片和掩模。带电粒子束被引导到用于扫描该衬底的衬底的表面，并且包括选择的检测器以检测来自衬底的次级带电粒子，反向散射带电粒子和透射带电粒子中的至少一个。衬底被安装在x-y平台上以在通过带电粒子束扫描衬底的同时提供至少一个自由度。衬底也在其表面上经受电场以加速次级带电粒子。该系统便于对电荷敏感绝缘基板上的近光束能量进行检查，并且能够准确地测量基板相对于带电粒子束的位置。另外，存在用于使带电粒子束下面的衬底最初对准的光学对准系统。为了最有效地起作用，还有一个真空系统用于对含有基底的腔室进行抽空和再加压。真空系统可用于将一个基板保持在真空状态，而第二个基板正在装载/卸载，抽真空或重新加压。或者，真空系统可以在检查之前同时抽空多个基板，并且在检查之后重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较系统。

3. 发明申请

US20070145269A1 ELECTRON ANTI-FOGGING BAFFLE USED AS A DETECTOR 失效
标题翻译：作为检测器使用的电子防雾剂
公开(公告)号：US20070145269A1
公开(公告)日：2007-06-28
申请号：US11537062
申请日：2006-09-29
申请人： BENYAMIN BULLER , William Devore , Juergen Frosien , Richard Lozes , Henry Pearce-Percy , Dieter Winkler
发明人： BENYAMIN BULLER , William Devore , Juergen Frosien , Richard Lozes , Henry Pearce-Percy , Dieter Winkler
IPC分类号： G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/244 , H01J2237/004 , H01J2237/0213 , H01J2237/0262 , H01J2237/2448 , H01J2237/24571
摘要： Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.
摘要翻译：提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。对于一些实施例，通过将引线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读出为电流信号。因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

4. 发明授权

US07227155B2 Electrostatic deflection system with impedance matching for high positioning accuracy 失效
标题翻译：静电偏转系统具有阻抗匹配，定位精度高
公开(公告)号：US07227155B2
公开(公告)日：2007-06-05
申请号：US11241789
申请日：2005-09-30
申请人： Benyamin Buller , William J. Devore , Juergen Frosien , Eugene Mirro, Jr. , Henry Pearce-Percy , Dieter Winkler
发明人： Benyamin Buller , William J. Devore , Juergen Frosien , Eugene Mirro, Jr. , Henry Pearce-Percy , Dieter Winkler
IPC分类号： H01J37/147
CPC分类号： H01J37/147 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/24 , H01J37/3174 , H01J2237/0432 , H01J2237/1504 , H01J2237/28
摘要： An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
摘要翻译：一种高精度高通量偏转电子束的装置和方法。偏转电容器的至少一个电极通过同轴电缆连接到信号源。终端电阻器还连接到同轴电缆和在同轴电缆和电极的接头处的电极。终端电阻器具有与同轴电缆的阻抗匹配的电阻，并且电极具有与同轴电缆的阻抗的一半相匹配的阻抗。本发明的偏转电容器由于涡电流而具有最小的精度损失。与现有技术的系统相比，偏转电容器中的电极间距减小约2倍。

5. 发明申请

US20070085033A1 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US20070085033A1
公开(公告)日：2007-04-19
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
发明人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
IPC分类号： G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

6. 发明授权

US07514682B2 Electron anti-fogging baffle used as a detector 失效
标题翻译：电子防雾挡板用作检测器
公开(公告)号：US07514682B2
公开(公告)日：2009-04-07
申请号：US11537062
申请日：2006-09-29
申请人： Benyamin Buller , William J. Devore , Juergen Frosien , Richard L. Lozes , Henry Pearce-Percy , Dieter Winkler
发明人： Benyamin Buller , William J. Devore , Juergen Frosien , Richard L. Lozes , Henry Pearce-Percy , Dieter Winkler
IPC分类号： H01J37/09 , G01N23/00 , G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/244 , H01J2237/004 , H01J2237/0213 , H01J2237/0262 , H01J2237/2448 , H01J2237/24571
摘要： Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.
摘要翻译：提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。对于一些实施例，通过将导线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读取为电流信号。因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

7. 发明申请

US20070075262A1 Electrostatic deflection system with low aberrations and vertical beam incidence 有权
标题翻译：具有低像差和垂直光束入射的静电偏转系统
公开(公告)号：US20070075262A1
公开(公告)日：2007-04-05
申请号：US11241880
申请日：2005-09-30
申请人： Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William Devore
发明人： Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William Devore
IPC分类号： H01J37/147
CPC分类号： H01J37/1477 , H01J2237/1518 , H01J2237/28 , H01J2237/3175
摘要： Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.
摘要翻译：本发明的实施例可用于改善电子束偏转。一个实施例提供一种静电偏转系统，其具有最小化像差并且同时实现垂直入射的电极。通过对偏转方向使用至少两个偏转级，本发明允许偏转的电子束通过物镜的后焦平面，而偏转电容器不跨过后焦平面设置。结果，偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射，以避免目标或焦点变化的高度变化引起的变形或放大变化。

8. 发明授权

US07315029B2 Electrostatic deflection system with low aberrations and vertical beam incidence 有权
标题翻译：具有低像差和垂直光束入射的静电偏转系统
公开(公告)号：US07315029B2
公开(公告)日：2008-01-01
申请号：US11241880
申请日：2005-09-30
申请人： Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William J. Devore
发明人： Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William J. Devore
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： H01J37/1477 , H01J2237/1518 , H01J2237/28 , H01J2237/3175
摘要： Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.
摘要翻译：本发明的实施例可用于改善电子束偏转。一个实施例提供一种静电偏转系统，其具有最小化像差并且同时实现垂直入射的电极。通过对偏转方向使用至少两个偏转级，本发明允许偏转的电子束通过物镜的后焦平面，而偏转电容器不跨过后焦平面设置。结果，偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射，以避免目标或焦点变化的高度变化引起的变形或放大变化。

9. 发明申请

US20070075256A1 Electrostatic deflection system with impedance matching for high positioning accuracy 失效
公开(公告)号：US20070075256A1
公开(公告)日：2007-04-05
申请号：US11241789
申请日：2005-09-30
申请人： Benyamin Buller , William Devore , Juergen Frosien , Eugene Mirro , Henry Pearce-Percy , Dieter Winkler
发明人： Benyamin Buller , William Devore , Juergen Frosien , Eugene Mirro , Henry Pearce-Percy , Dieter Winkler
IPC分类号： H01J37/147
CPC分类号： H01J37/147 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/24 , H01J37/3174 , H01J2237/0432 , H01J2237/1504 , H01J2237/28
摘要： An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

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