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1. 发明授权

US5502306A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5502306A
公开(公告)日：1996-03-26
申请号：US214377
申请日：1994-03-17
申请人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
发明人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/307 , G03F1/08 , G03F1/16 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/26
CPC分类号： H01J37/28 , G01R31/307 , H01J2237/063 , H01J2237/184 , H01J2237/204 , H01J2237/24495 , H01J2237/30438
摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
摘要翻译：公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。衬底也在其表面上经受电场以加速次级颗粒。该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

2. 发明授权

US09285991B2 System, method and program product to schedule transfer of data 有权
标题翻译：系统，方法和程序产品来安排数据传输
公开(公告)号：US09285991B2
公开(公告)日：2016-03-15
申请号：US13097555
申请日：2011-04-29
申请人： Gabriel Alatorre , Laura Richardson , Aameek Singh , Barry Becker , James Olson
发明人： Gabriel Alatorre , Laura Richardson , Aameek Singh , Barry Becker , James Olson
IPC分类号： G06F9/50 , G06F3/06
CPC分类号： G06F3/0617 , G06F3/0604 , G06F3/0605 , G06F3/0647 , G06F3/0659 , G06F3/067 , G06F3/0685 , G06F9/505 , G06F2209/5019
摘要： Scheduling a proposed additional data transfer from one or more source storage devices to one or more target storage devices. A computer receives a request for the proposed additional data transfer, and in response, determines a measure of the proposed additional data transfer. The computer determines a measure of recent actual data transfers. The recent actual data transfers involve one or more of the source storage devices and one or more of the target storage devices. In response to the request for the proposed additional data transfer, the computer estimates performance of one or more of the source storage devices and one or more of the target storage devices that would occur during the proposed additional data transfer based on the measure of recent actual data transfers combined with the measure of the proposed additional data transfer. The computer compares the estimated performance to a corresponding performance threshold, and if less, the computer postpones execution of the proposed additional data transfer.
摘要翻译：将建议的附加数据传输从一个或多个源存储设备调度到一个或多个目标存储设备。计算机接收对所提出的附加数据传输的请求，作为响应，确定所提出的附加数据传输的度量。计算机确定最近实际数据传输的度量。最近的实际数据传输涉及一个或多个源存储设备和一个或多个目标存储设备。响应于对所提出的附加数据传送的请求，计算机估计在所提出的附加数据传输期间将发生的一个或多个源存储设备和一个或多个目标存储设备的性能，基于最近实际的测量数据传输与拟议的附加数据传输的量度相结合。计算机将估计性能与相应的性能阈值进行比较，如果较少，则计算机推迟执行拟议的附加数据传输。

3. 发明授权

US06283428B1 Swing arm mount system 有权
标题翻译：摆臂安装系统
公开(公告)号：US06283428B1
公开(公告)日：2001-09-04
申请号：US09443560
申请日：1999-11-19
申请人： Elbert R. Maples , Barry Becker
发明人： Elbert R. Maples , Barry Becker
IPC分类号： E04G300
CPC分类号： F41A27/22 , F41A23/34
摘要： A mount for securing a firearm to a motorized platform. The mount includes first and second mounting brackets and first and second support arms having opposing ends. The first mounting bracket is adapted to be secured to the motorized platform. The end of the first arm is rotatably connected to the first bracket to form a first rotation point. The first and second support arms are also connected at the respective ends to form a second rotation point. A third rotation point is further formed by rotatably connecting the second mounting bracket to an end of the second support arm. The rotation points allow the firearm to be moved into a plurality of firing positions.
摘要翻译：用于将枪支固定在电动平台上的支架。安装座包括第一和第二安装支架以及具有相对端部的第一和第二支撑臂。第一安装支架适于固定在电动平台上。第一臂的端部可旋转地连接到第一支架以形成第一旋转点。第一和第二支撑臂也在相应的端部处连接以形成第二旋转点。第三旋转点通过将第二安装支架可旋转地连接到第二支撑臂的端部而进一步形成。旋转点允许枪支移动到多个击发位置。

4. 发明授权

US08135204B1 Computer-implemented methods, carrier media, and systems for creating a defect sample for use in selecting one or more parameters of an inspection recipe 有权
标题翻译：计算机实现的方法，载体介质和用于创建用于选择检验配方的一个或多个参数的缺陷样品的系统
公开(公告)号：US08135204B1
公开(公告)日：2012-03-13
申请号：US11859342
申请日：2007-09-21
申请人： Chien-Huei (Adam) Chen , Barry Becker , Hong Chen , Michael Van Riet , Chris Maher , Stephanie Chen , Suryanarayana Tummala , Yong Zhang
发明人： Chien-Huei (Adam) Chen , Barry Becker , Hong Chen , Michael Van Riet , Chris Maher , Stephanie Chen , Suryanarayana Tummala , Yong Zhang
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/95676
摘要： Computer-implemented methods, carrier media, and systems for creating a defect sample for use in selecting one or more parameters of an inspection recipe are provided. One method includes separating defects into bins based on regions in which the defects are located, defect types, and values of the defects for parameter(s) of a detection algorithm. The method also includes determining a number of the defects to be selected from each bin by distributing a user-specified target number of defects across the bins. In addition, the method includes selecting defects from the bins based on the determined numbers thereby creating a defect sample for use in selecting values of parameter(s) of the detection algorithm for use in the inspection recipe.
摘要翻译：提供了计算机实现的方法，载体介质和用于创建用于选择检查配方的一个或多个参数的缺陷样本的系统。一种方法包括基于缺陷所在的区域，缺陷类型和检测算法的参数缺陷值将缺陷分离成箱体。该方法还包括通过在用户区间分配用户指定的目标数量的缺陷来确定要从每个仓库中选择的缺陷的数量。此外，该方法包括基于确定的数量从箱中选择缺陷，从而创建用于选择用于检查配方的检测算法的参数的值的缺陷样本。

5. 发明授权

US08000922B2 Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm 有权
标题翻译：用于生成用于选择检测算法的一个或多个参数的值的信息的方法和系统
公开(公告)号：US08000922B2
公开(公告)日：2011-08-16
申请号：US12128979
申请日：2008-05-29
申请人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
发明人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
IPC分类号： H01L21/66
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/8854
摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
摘要翻译：提供了用于生成用于选择检测算法的参数值的信息的方法和系统。一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

6. 发明申请

US20090299681A1 METHODS AND SYSTEMS FOR GENERATING INFORMATION TO BE USED FOR SELECTING VALUES FOR ONE OR MORE PARAMETERS OF A DETECTION ALGORITHM 有权
标题翻译：用于生成用于选择检测算法的一个或多个参数的值的信息的方法和系统
公开(公告)号：US20090299681A1
公开(公告)日：2009-12-03
申请号：US12128979
申请日：2008-05-29
申请人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
发明人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/8854
摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
摘要翻译：提供了用于生成用于选择检测算法的参数值的信息的方法和系统。一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

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