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1. 发明授权

US5502306A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5502306A
公开(公告)日：1996-03-26
申请号：US214377
申请日：1994-03-17
申请人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
发明人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/307 , G03F1/08 , G03F1/16 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/26
CPC分类号： H01J37/28 , G01R31/307 , H01J2237/063 , H01J2237/184 , H01J2237/204 , H01J2237/24495 , H01J2237/30438
摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
摘要翻译：公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。衬底也在其表面上经受电场以加速次级颗粒。该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

2. 发明申请

US20110075145A1 ALIGNMENT SYSTEM FOR OPTICAL LITHOGRAPHY 有权
标题翻译：光学平移对准系统
公开(公告)号：US20110075145A1
公开(公告)日：2011-03-31
申请号：US12962241
申请日：2010-12-07
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G01B11/00
CPC分类号： H05K3/0082 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K2203/1572
摘要： An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.
摘要翻译：用于光学光刻的对准系统使用固定到可移动台和光刻单元的照相机来观察用于位置参考的工件表面（例如金属或陶瓷微晶颗粒）固有的独特的微观非均匀性。舞台摄像机通过舞台上的窗户在工件上形成两个站点，以建立原始位置模板。在工件重新定位之后，例如反向上下翻转，再次观察相同的两个位置，并且模板匹配建立工件的变换坐标，例如，通过光刻单元相机，舞台移动到近似位置位置。两个角落相机可以作为粗略的定位机制。对准系统对印刷电路板光刻中的背面对准特别有用。

3. 发明授权

US08482732B2 Alignment system for various materials and material flows 失效
标题翻译：各种材料和材料流动的校准系统
公开(公告)号：US08482732B2
公开(公告)日：2013-07-09
申请号：US13041622
申请日：2011-03-07
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G01B11/00
CPC分类号： G03F7/70791 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K3/0082
摘要： A method and system for alignment of a tool to a workpiece in a continuous or discontinuous material flow are disclosed. The workpiece may be a portion of a web of material. An imaging system captures first and second images of the workpiece at first and second occasions respectively. Microscopic native features of the workpiece are selected, detected, tracked and/or compared in the first and second images. Based on the correspondence between, tracking or relative displacement of features as captured in the first and second images, an alignment to the workpiece is controlled. In embodiments, the workpiece and a tool, a projected image or a pattern to be imparted to the workpiece by a lithography or photolithography apparatus are aligned based upon positioning information determined from an analysis of correlated features or texture in the images. Positioning information may include a positioning error or a distortion indication.
摘要翻译：公开了一种用于在连续或不连续的材料流中将工具对准工件的方法和系统。工件可以是材料网的一部分。成像系统分别在第一和第二场合捕获工件的第一和第二图像。在第一和第二图像中选择，检测，跟踪和/或比较工件的微观本征特征。基于在第一和第二图像中捕获的特征之间的对应关系，跟踪或相对位移，控制与工件的对准。在实施例中，基于通过图像中的相关特征或纹理的分析确定的定位信息来对准通过光刻或光刻设备赋予工件的工件，工件，投影图像或图案。定位信息可以包括定位误差或失真指示。

4. 发明申请

US20090086207A1 ALIGNMENT SYSTEM FOR OPTICAL LITHOGRAPHY 有权
标题翻译：光学平移对准系统
公开(公告)号：US20090086207A1
公开(公告)日：2009-04-02
申请号：US12240781
申请日：2008-09-29
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G01B11/00
CPC分类号： H05K3/0082 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K2203/1572
摘要： An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.
摘要翻译：用于光学光刻的对准系统使用固定到可移动台和光刻单元的照相机来观察用于位置参考的工件表面（例如金属或陶瓷微晶颗粒）固有的独特的微观非均匀性。舞台摄像机通过舞台上的窗户在工件上形成两个站点，以建立原始位置模板。在工件重新定位之后，例如反向上下翻转，再次观察相同的两个位置，并且模板匹配建立工件的变换坐标，例如，通过光刻单元相机，舞台移动到近似位置位置。两个角落相机可以作为粗略的定位机制。对准系统对印刷电路板光刻中的背面对准特别有用。

5. 发明授权

US08284399B2 Alignment system for optical lithography 有权
标题翻译：光刻对准系统
公开(公告)号：US08284399B2
公开(公告)日：2012-10-09
申请号：US12962241
申请日：2010-12-07
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G01B11/00
CPC分类号： H05K3/0082 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K2203/1572
摘要： An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.
摘要翻译：用于光学光刻的对准系统使用固定到可移动台和光刻单元的照相机来观察用于位置参考的工件表面（例如金属或陶瓷微晶颗粒）固有的独特的微观非均匀性。舞台摄像机通过舞台上的窗户在工件上形成两个站点，以建立原始位置模板。在工件重新定位之后，例如反向上下翻转，再次观察相同的两个位置，并且模板匹配建立工件的变换坐标，例如，通过光刻单元相机，舞台移动到近似位置位置。两个角落相机可以作为粗略的定位机制。对准系统对印刷电路板光刻中的背面对准特别有用。

6. 发明申请

US20110157577A1 ALIGNMENT SYSTEM FOR VARIOUS MATERIALS AND MATERIAL FLOWS 失效
标题翻译：各种材料和材料流动的对准系统
公开(公告)号：US20110157577A1
公开(公告)日：2011-06-30
申请号：US13041622
申请日：2011-03-07
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G03B27/58 , G06K9/00
CPC分类号： G03F7/70791 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K3/0082
摘要： A method and system for alignment of a tool to a workpiece in a continuous or discontinuous material flow are disclosed. The workpiece may be a portion of a web of material. An imaging system captures first and second images of the workpiece at first and second occasions respectively. Microscopic native features of the workpiece are selected, detected, tracked and/or compared in the first and second images. Based on the correspondence between, tracking or relative displacement of features as captured in the first and second images, an alignment to the workpiece is controlled. In embodiments, the workpiece and a tool, a projected image or a pattern to be imparted to the workpiece by a lithography or photolithography apparatus are aligned based upon positioning information determined from an analysis of correlated features or texture in the images. Positioning information may include a positioning error or a distortion indication.
摘要翻译：公开了一种用于在连续或不连续的材料流中将工具对准工件的方法和系统。工件可以是材料网的一部分。成像系统分别在第一和第二场合捕获工件的第一和第二图像。在第一和第二图像中选择，检测，跟踪和/或比较工件的微观本征特征。基于在第一和第二图像中捕获的特征之间的对应关系，跟踪或相对位移，控制与工件的对准。在实施例中，基于通过图像中的相关特征或纹理的分析确定的定位信息来对准通过光刻或光刻设备赋予工件的工件，工件，投影图像或图案。定位信息可以包括定位误差或失真指示。

7. 发明授权

US07847938B2 Alignment system for optical lithography 有权
标题翻译：光刻对准系统
公开(公告)号：US07847938B2
公开(公告)日：2010-12-07
申请号：US12240781
申请日：2008-09-29
申请人： Hans Dohse
发明人： Hans Dohse
IPC分类号： G01B11/00
CPC分类号： H05K3/0082 , G03F9/00 , G03F9/7088 , H05K3/0008 , H05K2203/1572
摘要： An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.
摘要翻译：用于光学光刻的对准系统使用固定到可移动台和光刻单元的照相机来观察用于位置参考的工件表面（例如金属或陶瓷微晶颗粒）固有的独特的微观非均匀性。舞台摄像机通过舞台上的窗户在工件上形成两个站点，以建立原始位置模板。在工件重新定位之后，例如反向上下翻转，再次观察相同的两个位置，并且模板匹配建立工件的变换坐标，例如，通过光刻单元相机，舞台移动到近似位置位置。两个角落相机可以作为粗略的定位机制。对准系统对印刷电路板光刻中的背面对准特别有用。

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