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1. 发明申请

US20070085033A1 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US20070085033A1
公开(公告)日：2007-04-19
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
发明人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
IPC分类号： G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

2. 发明授权

US07800075B2 Multi-function module for an electron beam column 有权
标题翻译：电子束柱多功能模块
公开(公告)号：US07800075B2
公开(公告)日：2010-09-21
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

3. 发明申请

US20080308751A1 MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN 有权
标题翻译：电子束柱的多功能模块
公开(公告)号：US20080308751A1
公开(公告)日：2008-12-18
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

4. 发明授权

US07427765B2 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US07427765B2
公开(公告)日：2008-09-23
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是一半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

5. 发明授权

US08735847B2 High resolution gas field ion column with reduced sample load 有权
标题翻译：高分辨率气田离子柱，样品负荷降低
公开(公告)号：US08735847B2
公开(公告)日：2014-05-27
申请号：US12277818
申请日：2008-11-25
申请人： Helmut Banzhof , Juergen Frosien , Dieter Winkler
发明人： Helmut Banzhof , Juergen Frosien , Dieter Winkler
IPC分类号： G21K1/08
CPC分类号： H01J37/04 , H01J37/28 , H01J2237/0473 , H01J2237/0475 , H01J2237/0492 , H01J2237/08 , H01J2237/0807
摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.
摘要翻译：描述了具有气体场离子源的聚焦离子束装置的操作方法。根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

6. 发明授权

US08049180B2 Achromatic mass separator 有权
标题翻译：消色差分离器
公开(公告)号：US08049180B2
公开(公告)日：2011-11-01
申请号：US11925598
申请日：2007-10-26
申请人： Juergen Frosien , Helmut Banzhof
发明人： Juergen Frosien , Helmut Banzhof
IPC分类号： B01D59/44
CPC分类号： H01J49/288 , H01J37/05 , H01J37/08 , H01J37/28 , H01J2237/057 , H01J2237/0805 , H01J2237/3174 , H01J2237/31749
摘要： An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.
摘要翻译：描述了离子束装置。离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元，预定质量的偏转角。无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为相对于第一轴倾斜。

7. 发明授权

US07838830B2 Charged particle beam apparatus and method for operating a charged particle beam apparatus 有权
标题翻译：带电粒子束装置和操作带电粒子束装置的方法
公开(公告)号：US07838830B2
公开(公告)日：2010-11-23
申请号：US11923407
申请日：2007-10-24
申请人： Juergen Frosien , Helmut Banzhof , Jacob Levin , Dror Shemesh
发明人： Juergen Frosien , Helmut Banzhof , Jacob Levin , Dror Shemesh
IPC分类号： G01N23/00
CPC分类号： H01J37/1478 , H01J37/244 , H01J37/28 , H01J2237/1506 , H01J2237/2448 , H01J2237/26 , H01J2237/2806 , H01J2237/31745 , H01J2237/31749
摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.
摘要翻译：提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

8. 发明授权

US09153413B2 Multi-beam scanning electron beam device and methods of using the same 有权
标题翻译：多光束扫描电子束装置及其使用方法
公开(公告)号：US09153413B2
公开(公告)日：2015-10-06
申请号：US12528307
申请日：2008-02-22
申请人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
发明人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
IPC分类号： G21K7/00 , H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置（100）。具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130）用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

9. 发明申请

US20110163229A1 HIGH THROUGHPUT SEM TOOL 审中-公开
标题翻译：高通量扫描仪刀具
公开(公告)号：US20110163229A1
公开(公告)日：2011-07-07
申请号：US12528306
申请日：2008-02-22
申请人： Juergen Frosien , Helmut Banzhof , Pavel Adamec
发明人： Juergen Frosien , Helmut Banzhof , Pavel Adamec
IPC分类号： G01N23/225 , G01N23/227 , G01N23/22 , G01N23/203 , H01J1/50
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A scanning charged particle beam device (100) is described. The scanning charged particle beam device includes a beam emitter (102) for emitting a primary electron beam, a first scan stage for scanning the beam over a specimen, an achromatic beam separator (130) adapted for separating a signal electron beam from the primary electron beam, and a detection unit (172,174,178) for detecting signal electrons.
摘要翻译：描述扫描带电粒子束装置（100）。扫描带电粒子束装置包括用于发射一次电子束的射束发射器（102），用于扫描试样上的束的第一扫描级，适于从一次电子分离信号电子束的消色束分离器（130）以及用于检测信号电子的检测单元（172,174,178）。

10. 发明申请

US20080258060A1 CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置和操作充电颗粒光束装置的方法
公开(公告)号：US20080258060A1
公开(公告)日：2008-10-23
申请号：US11923407
申请日：2007-10-24
申请人： JUERGEN FROSIEN , Helmut Banzhof , Jacob Levin , Dror Shemesh
发明人： JUERGEN FROSIEN , Helmut Banzhof , Jacob Levin , Dror Shemesh
IPC分类号： G01N23/00
CPC分类号： H01J37/1478 , H01J37/244 , H01J37/28 , H01J2237/1506 , H01J2237/2448 , H01J2237/26 , H01J2237/2806 , H01J2237/31745 , H01J2237/31749
摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.
摘要翻译：提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

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