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1. 发明授权

US08094924B2 E-beam defect review system 有权
标题翻译：电子束缺陷检查系统
公开(公告)号：US08094924B2
公开(公告)日：2012-01-10
申请号：US12335458
申请日：2008-12-15
申请人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
发明人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
摘要翻译：一种装置包括成像单元以对待审查的晶片进行成像，其中成像单元是经修改的SORIL柱。改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统，其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制，用于调节在复查过程期间由于电子辐射引起的电荷累积，其中气体分子在洪水枪光束下而不是在主光束下方注入。改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位，缺陷采样和缺陷分类的主计算机，其中主计算机和存储单元通过高速网络链接。

2. 发明申请

US20100288923A1 DISCHAGING METHOD FOR CHARGED PARTICLE BEAM IMAGING 有权
标题翻译：用于充电颗粒光束成像的放电方法
公开(公告)号：US20100288923A1
公开(公告)日：2010-11-18
申请号：US12468026
申请日：2009-05-18
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/00 , H05B31/26
CPC分类号： H01J37/02 , H01J37/28 , H01J2237/0041 , H01J2237/0044
摘要： A layer of conductive or semi-conductive material is formed on a surface of a sample and then the sample, when being charged particle beam imaged, is electrically coupled with an object having a large charge-receiving or charge-storage capacity (e.g., capacitance). Hence, the charging on the sample surface is removed and released quickly by the layer. The layer is then removed by reacting it with a predefined agent. The reaction forms a gaseous product which does not form a physical or chemical bond to the sample surface.
摘要翻译：在样品的表面上形成导电或半导体材料层，然后当带电粒子束成像时，样品与具有大的电荷接收或电荷存储容量（例如，电容）。因此，样品表面的充电被层除去并快速释放。然后通过与预定义的试剂反应来除去该层。该反应形成气态产物，其不与样品表面形成物理或化学键。

3. 发明申请

US20090121159A1 CLUSTER E-BEAM LITHOGRAPHY SYSTEM 审中-公开
标题翻译：集群电子束光刻系统
公开(公告)号：US20090121159A1
公开(公告)日：2009-05-14
申请号：US12259280
申请日：2008-10-27
申请人： ARCHI HWANG , YI XIANG WANG , JACK JAU , CHUNG-SHIH PAN , ZHONGWEI CHEN
发明人： ARCHI HWANG , YI XIANG WANG , JACK JAU , CHUNG-SHIH PAN , ZHONGWEI CHEN
IPC分类号： A61N5/00
CPC分类号： G03F7/7045
摘要： A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where features above 32 nm, and a cluster e-beam lithography system for expose pattern area where features is sub 32 nm.
摘要翻译：公开了一种混合光刻系统，以实现32nm光刻的高通量和高分辨率。混合系统包含用于32nm以上特征的曝光图案区域的光学平版印刷机，以及用于曝光图案区域的簇电子束光刻系统，其特征在32nm以下。

4. 发明授权

US06791095B2 Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus 有权
标题翻译：在半导体晶圆检测中使用扫描电子显微镜进行Z级聚焦的方法和系统
公开(公告)号：US06791095B2
公开(公告)日：2004-09-14
申请号：US10104887
申请日：2002-03-21
申请人： Chung-Shih Pan , Yi Xiang Wang , Anil Desai
发明人： Chung-Shih Pan , Yi Xiang Wang , Anil Desai
IPC分类号： H01J3720
CPC分类号： H01J37/20 , H01J2237/20221 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292
摘要： A method for inspecting a semiconductor wafer using an SEM having a nominal focal plane and operable for guiding a beam. The SEM having a stage movable in each of an X-, Y-, and Z-direction, including moving the SEM stage in the XY-direction to a first location for inspection, optically sensing the location of the top surface of an area in relation to the focal plane of the stage, adjusting the position of the stage in the Z-direction so that the top surface of the area is substantially at the focal plane, inspecting the areas, and moving the stage in the XY-direction to the next location such that the next area is under the SEM beam for inspection. The Z-stage using a non-contact optical sensor to provide feedback to drive a plurality of piezoelectric actuator to move the wafer to the focal plane.
摘要翻译：一种使用具有标称焦平面并可用于引导光束的SEM来检查半导体晶片的方法。 SEM具有能够在X方向，Y方向和Z方向各自移动的台阶，包括将XY平台的XY方向移动到第一位置进行检查，光学地感测区域的顶面的位置与舞台的焦平面的关系，调整舞台在Z方向上的位置，使得该区域的顶面基本上处于焦平面，检查区域，并将舞台在XY方向上移动到下一个位置使得下一个区域在SEM束下进行检查。 Z级使用非接触式光学传感器提供反馈以驱动多个压电致动器将晶片移动到焦平面。

5. 发明授权

US5502306A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5502306A
公开(公告)日：1996-03-26
申请号：US214377
申请日：1994-03-17
申请人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
发明人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/307 , G03F1/08 , G03F1/16 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/26
CPC分类号： H01J37/28 , G01R31/307 , H01J2237/063 , H01J2237/184 , H01J2237/204 , H01J2237/24495 , H01J2237/30438
摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
摘要翻译：公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。衬底也在其表面上经受电场以加速次级颗粒。该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

6. 发明授权

US08575573B2 Structure for discharging extreme ultraviolet mask 有权
标题翻译：用于放电极紫外线屏蔽的结构
公开(公告)号：US08575573B2
公开(公告)日：2013-11-05
申请号：US13112536
申请日：2011-05-20
申请人： You-Jin Wang , Chiyan Kuan , Chung-Shih Pan
发明人： You-Jin Wang , Chiyan Kuan , Chung-Shih Pan
IPC分类号： A61N5/00
CPC分类号： H05F3/02 , G01N23/2251 , H01J37/026 , H01J37/20 , H01J2237/0041 , H01J2237/0044 , H01J2237/2008 , H01J2237/2811
摘要： A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.
摘要翻译：提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。

7. 发明申请

US20100150429A1 E-BEAM DEFECT REVIEW SYSTEM 有权
标题翻译：电子束缺陷评估系统
公开(公告)号：US20100150429A1
公开(公告)日：2010-06-17
申请号：US12335458
申请日：2008-12-15
申请人： Jack JAU , Zhongwei CHEN , Yi Xiang WANG , Chung-Shih PAN , Joe WANG , Xuedong LIU , Weiming REN , Wei FANG
发明人： Jack JAU , Zhongwei CHEN , Yi Xiang WANG , Chung-Shih PAN , Joe WANG , Xuedong LIU , Weiming REN , Wei FANG
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： The present invention relates to a defect review system, and/or particularly, to an apparatus and method of defect review sampling, review method and classification on a semiconductor wafer or a pattern lithography reticle during integrated circuit fabrication. These objects are achieved in comparing a reviewed image with a reference image pick-up through a smart sampling filter. A clustering computer system base on high speed network will provide data cache and save operation time and memory. A smart review sampling filter automatically relocate abnormal pattern or defects and classify the device location extracted from design database and/or from golden die image on the same substrate. The column of the present defect review system is comprised of the modified SORIL type objective lens. This column provides solution of improving throughput during sample review, material identification better image quality, and topography image of defect. One embodiment of the present invent adopts an optical auto focusing system to compromise micro height variation due wafer surface topography. And another embodiment adopts surface charge control system to regulate the charge accumulation due to electron irradiation during the review process.
摘要翻译：本发明涉及一种缺陷评估系统，和/或特别涉及在集成电路制造期间对半导体晶片或图案光刻掩模版进行缺陷评估抽样，评估方法和分类的装置和方法。通过智能采样滤波器将经检查的图像与参考图像拾取进行比较，实现了这些目的。基于高速网络的集群计算机系统将提供数据缓存，节省操作时间和内存。智能检查采样过滤器自动重新定位异常模式或缺陷，并将从设计数据库中提取的设备位置和/或从相同基板上的金色模具图像分类。本缺陷检查系统的列由改进的SORIL型物镜组成。该栏提供了在样本审查期间提高吞吐量，材料识别更好的图像质量和缺陷的地形图像的解决方案。本发明的一个实施例采用光学自动聚焦系统来破坏由晶片表面形貌引起的微高度变化。另一个实施例采用表面电荷控制系统来调节在检查过程中由电子辐射引起的电荷累积。

8. 发明申请

US20100084554A1 METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING INSPECTED BY A CHARGED PARTICLE BEAM IMAGING SYSTEM 有权
标题翻译：通过充电颗粒光束成像系统检测的波形样品控制颗粒吸收的方法
公开(公告)号：US20100084554A1
公开(公告)日：2010-04-08
申请号：US12247536
申请日：2008-10-08
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/00
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

9. 发明授权

US08110818B2 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system 有权
标题翻译：控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
公开(公告)号：US08110818B2
公开(公告)日：2012-02-07
申请号：US12247536
申请日：2008-10-08
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/04 , H01J37/26
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

10. 发明申请

US20110101222A1 Z-STAGE CONFIGURATION AND APPLICATION THEREOF 有权
标题翻译： Z级配置及其应用
公开(公告)号：US20110101222A1
公开(公告)日：2011-05-05
申请号：US12609262
申请日：2009-10-30
申请人： YOU-JIN WANG , CHUNG-SHIH PAN
发明人： YOU-JIN WANG , CHUNG-SHIH PAN
IPC分类号： G01N23/00 , G21K5/08 , G01B11/02
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/0216 , H01J2237/20235
摘要： A stage configuration is provided, wherein a ceramic plate is used as the z-stage body to decrease the use of the metal plates in the conventional configuration, so that the compact structure of the z-stage may decrease the vibrational movements of the z-stage. Further, two Laser interferometer are used to detect a movement of different points along a vertical line of the z-stage sidewall to calculate a movement of the specimen surface, so that a horizontal movement of the specimen surface can be detected more accurately
摘要翻译：提供了一种台架结构，其中使用陶瓷板作为z阶段本体以减少常规构造中金属板的使用，使得z阶段的紧凑结构可以减小z阶段的振动运动，阶段。此外，使用两个激光干涉仪来检测沿z级侧壁的垂直线的不同点的移动，以计算样品表面的移动，从而可以更精确地检测样品表面的水平移动

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