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1. 发明申请

US20070085033A1 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US20070085033A1
公开(公告)日：2007-04-19
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
发明人： Benyamin Buller , William DeVore , Juergen Frosien , Xinrong Jiang , Richard Lozes , Henry Pearce-Percy , Dieter Winkler , Steven Coyle , Helmut Banzhof
IPC分类号： G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

2. 发明授权

US07800075B2 Multi-function module for an electron beam column 有权
标题翻译：电子束柱多功能模块
公开(公告)号：US07800075B2
公开(公告)日：2010-09-21
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

3. 发明申请

US20080308751A1 MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN 有权
标题翻译：电子束柱的多功能模块
公开(公告)号：US20080308751A1
公开(公告)日：2008-12-18
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

4. 发明授权

US07427765B2 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US07427765B2
公开(公告)日：2008-09-23
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是一半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

5. 发明授权

US08461526B2 Electron beam column and methods of using same 有权
标题翻译：电子束柱及其使用方法
公开(公告)号：US08461526B2
公开(公告)日：2013-06-11
申请号：US12958174
申请日：2010-12-01
申请人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
发明人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
IPC分类号： G01N23/00
CPC分类号： H01J37/04 , H01J2237/0458 , H01J2237/0492 , H01J2237/063 , H01J2237/1035 , H01J2237/14 , H01J2237/186 , H01J2237/24535
摘要： In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.
摘要翻译：在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。发射电子的源被定位在第一真空室内。光束限制孔被配置成通过发射电子的有限角度范围。磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。可控制偏转器被配置为在衬底表面的区域上扫描束斑。还公开了其它特征和实施例。

6. 发明授权

US08362425B2 Multiple-beam system for high-speed electron-beam inspection 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US08362425B2
公开(公告)日：2013-01-29
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

7. 发明授权

US07262418B2 Method and apparatus for multiple charged particle beams 有权
标题翻译：多重带电粒子束的方法和装置
公开(公告)号：US07262418B2
公开(公告)日：2007-08-28
申请号：US10825696
申请日：2004-04-15
申请人： Chiwoei Wayne Lo , Xinrong Jiang
发明人： Chiwoei Wayne Lo , Xinrong Jiang
IPC分类号： G21K1/08 , G01J5/02
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
摘要翻译：用于半导体晶片检查或光刻的多电荷粒子束工具包括每个具有其自己的电子或离子源的电子束列阵列。各个电子束列的物镜虽然各自具有自己的极片，共享共同的单个电磁线圈，其产生围绕整个电子束列阵列的均匀磁场。这有利地改善了光束之间的间隔，同时提供了强磁性物镜的优异的光学特性。当用作检查工具时，每列还具有其自己的相关检测器，以检测来自晶片的次级和反向散射电子。在一个版本中，枪式镜头类似地具有用于每列的单独的极片并且共享公共的电磁线圈。

8. 发明授权

US08664594B1 Electron-optical system for high-speed and high-sensitivity inspections 失效
标题翻译：用于高速和高灵敏度检测的电子光学系统
公开(公告)号：US08664594B1
公开(公告)日：2014-03-04
申请号：US13095574
申请日：2011-04-27
申请人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
发明人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/28 , G01N2223/418 , G01N2223/611 , H01J2237/004 , H01J2237/2817
摘要： The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.
摘要翻译：本公开提供了一种电子束柱，其具有用于检查制造的基底的显着改善的分辨率和/或通过量。电子束柱包括电子枪，扫描仪，物镜和检测器。根据一个实施例，电子枪包括具有翻转极片构造的枪形透镜。根据另一个实施例，扫描器包括具有预扫描器和主扫描器的双扫描器，并且检测器可以配置在电子枪和预扫描器之间。根据另一实施例，电子束列包括被配置为选择束电流的连续可变孔径。其他实施例涉及使用电子束柱来自动检查制造的基板的方法。在一个实施例中，例如，在给定所选择的束电流和使用列条件域的情况下，调节孔径尺寸以实现最小斑点尺寸。

9. 发明申请

US20120241606A1 MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US20120241606A1
公开(公告)日：2012-09-27
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

10. 发明授权

US07821187B1 Immersion gun equipped electron beam column 有权
标题翻译：沉枪配电子束柱
公开(公告)号：US07821187B1
公开(公告)日：2010-10-26
申请号：US12204841
申请日：2008-09-05
申请人： Xinrong Jiang , Marian Mankos , Liqun Han
发明人： Xinrong Jiang , Marian Mankos , Liqun Han
IPC分类号： H01J27/02
CPC分类号： H01J37/063 , H01J37/145
摘要： An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.
摘要翻译：一种具有用于发射电子的电子发射器的电子枪，包括静电透镜和由极片形成的磁性透镜，该磁极具有设置在磁极片之间的绕组线圈。磁性透镜在由极片形成的间隙中形成旋转对称的磁场。磁场形成磁透镜并聚焦从发射器发射的电子。真空管将电子枪与磁性透镜分开。电子枪由真空管密封在真空中，磁性透镜在空气中被屏蔽。

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