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71. 发明授权

US06559663B2 Method and apparatus for inspecting integrated circuit pattern 有权
标题翻译：检查集成电路图案的方法和装置
公开(公告)号：US06559663B2
公开(公告)日：2003-05-06
申请号：US09983703
申请日：2001-10-25
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： G01R31305
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with: the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
摘要翻译：一种电路图案检查方法及其装置，其中待检查样品的待检查部分的整个部分被制成处于预定的充电状态，被检查的部分用图像形成高分辨率照射，在扫描电子束的同时，在从照射电子束的时刻起经过规定时间后，照射电子束的部位检测到二次带电粒子，根据这样检测出形成图像通过使用如此形成的图像来检查次级带电粒子信号和待检查的部分。

72. 发明授权

US06541784B1 Electron beam exposure system and exposing method using an electron beam 有权
标题翻译：电子束曝光系统和使用电子束的曝光方法
公开(公告)号：US06541784B1
公开(公告)日：2003-04-01
申请号：US09567001
申请日：2000-05-09
申请人： Hajime Kawano , Haruo Yoda
发明人： Hajime Kawano , Haruo Yoda
IPC分类号： H01J37244
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31769
摘要： It is an object of the present invention to provide an electron beam drawing apparatus and a drawing method using an electron beam capable of reducing a correction error of proximity effect correction without adding a special circuit or a memory and capable of preventing thinning or thickening of a pattern arranged at a vicinity of an edge of a pattern having a high density from being caused. In order to resolve the above-described object, an embodiment according to the present invention is provided with a constitution constituted by the steps of dividing a specimen into virtual meshes having a predetermined dimension, calculating an area density of a drawing pattern for each mesh, calculating an area density map of a total of a drawing region and storing the area density map in a memory, calculating a modified area density by executing a correction for the area density in consideration of back-scattering energy and forward-scattering energy in a resist of the specimen caused by the electron beam, calculating a modified area density map of the total of the drawing region and storing the modified area density map in the memory, and repeating these steps to thereby determine an exposure dose.
摘要翻译：本发明的目的是提供一种使用能够减少邻近效应校正的校正误差的电子束的电子束描绘装置和绘图方法，而不添加专门的电路或存储器，并且能够防止变薄或增厚为了解决上述目的，根据本发明的实施例具有以下步骤：将样本分成以下步骤构成的结构：计算每个网格的绘制图形的面积密度，计算绘图区域的总和的面积密度图并将该区域密度图存储在存储器中，通过执行校正来计算修改的面积密度考虑到由ele引起的样品的抗蚀剂中的背散射能量和前向散射能量的面积密度计算绘图区域的总和的修改面积密度图并将修改的面积密度图存储在存储器中，并重复这些步骤，从而确定曝光剂量。

73. 发明授权

US06376854B2 Method of inspecting a pattern on a substrate 有权
标题翻译：检查基板上的图案的方法
公开(公告)号：US06376854B2
公开(公告)日：2002-04-23
申请号：US09848422
申请日：2001-05-04
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N2188
CPC分类号： G01N21/95607
摘要： A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.
摘要翻译：一种用于检查形成在基板上的图案的方法，包括以下步骤：沿着安装有待检查的基板的第一方向移动工作台，通过沿第二方向扫描会聚的电子束将会聚的电子束照射在基板上其垂直于第一方向; 通过会聚电子束的照射来检测从基板辐射的电子，其中台的移动和会聚电子束的扫描同步; 从检测到的电子形成衬底的数字图像; 通过过滤数字图像来提高数字图像的质量; 以及通过使用改进的质量数字图像来检测在基板上形成的图案的缺陷。

74. 发明授权

US06329826B1 Method and apparatus for inspecting integrated circuit pattern 有权
标题翻译：检查集成电路图案的方法和装置
公开(公告)号：US06329826B1
公开(公告)日：2001-12-11
申请号：US09525341
申请日：2000-03-14
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： G01R31305
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
摘要翻译：一种电路图案检查方法及其装置，其中待检查样品的待检查部分的整个部分被制成处于预定的充电状态，被检查的部分用图像形成高分辨率照射，在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

75. 发明授权

US5149975A Pattern fabrication method using a charged particle beam and apparatus for realizing same 失效
标题翻译：使用带电粒子束的图案制造方法及其实现装置
公开(公告)号：US5149975A
公开(公告)日：1992-09-22
申请号：US647562
申请日：1991-01-29
申请人： Haruo Yoda , Fumio Murai
发明人： Haruo Yoda , Fumio Murai
IPC分类号： G03F7/20 , H01J37/302 , H01L21/027 , H01L21/30
CPC分类号： H01J37/3026 , H01J2237/31769
摘要： The present application relates to a method and an apparatus for forming a pattern, in which a plane on which a pattern on a sample is traced is decomposed into predetermined partial regions; the pattern density in each of the partial regions is stored in data storing means as pattern density map data; and the irradiation energy amount of a charged particle beam is corrected on the basis of the pattern density map data to correct shortage and excess in the exposure dose due to roughness and fineness of the the pattern, i.e. the proximity effect. Further, the present application relates to a method and an apparatus for forming a pattern, in which when one or a plurality of layers located under the layer on which the pattern should be formed have patterns, influences of the underlayers on the proximity effect are taken into account.
摘要翻译：本申请涉及一种用于形成图案的方法和装置，其中将跟踪样本上的图案的平面分解成预定的部分区域; 每个部分区域中的图案密度作为图案密度图数据存储在数据存储装置中; 并且基于图案密度图数据校正带电粒子束的照射能量，以校正由于图案的粗糙度和细度，即邻近效应引起的曝光剂量的不足和过剩。此外，本申请涉及用于形成图案的方法和装置，其中当位于其上应形成图案的层下面的一个或多个层具有图案时，取下底层对邻近效应的影响考虑到

76. 发明授权

US4489241A Exposure method with electron beam exposure apparatus 失效
标题翻译：电子束曝光装置曝光方法
公开(公告)号：US4489241A
公开(公告)日：1984-12-18
申请号：US386579
申请日：1982-06-09
申请人： Tadahito Matsuda , Tsuneo Okubo , Susumu Ozasa , Norio Saitou , Haruo Yoda
发明人： Tadahito Matsuda , Tsuneo Okubo , Susumu Ozasa , Norio Saitou , Haruo Yoda
IPC分类号： H01J37/304 , H01L21/027 , H01L21/30 , H01L23/544 , H01J37/317
CPC分类号： H01L23/544 , H01J37/3045 , H01L21/0277 , H01L21/30 , H01L2223/54453 , H01L2924/0002
摘要： An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate having thereon a number of chips are divided into blocks, which each contain a plurality of chips. Marks are provided on each of the blocks, the positions of the marks are detected and the writing exposure positions of the chips within each block are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.
摘要翻译：具有电子束曝光装置的曝光方法，其中电子束被发射到诸如其上涂覆有电子束敏感抗蚀剂的硅晶片的基板上，从而直接形成或书写图案。其上具有多个芯片的基板被分成块，每个块包含多个芯片。在每个块上提供标记，检测标记的位置，并且基于检测结果修改每个块内的码片的写入曝光位置。根据本发明，可以高精度地进行有效的写入曝光。

77. 发明授权

US4057845A Group control system for visual information processing 失效
标题翻译：视觉信息处理组控系统
公开(公告)号：US4057845A
公开(公告)日：1977-11-08
申请号：US674094
申请日：1976-04-06
申请人： Masakazu Ejiri , Seiji Kashioka , Takafumi Miyatake , Haruo Yoda , Masayoshi Kameyama
发明人： Masakazu Ejiri , Seiji Kashioka , Takafumi Miyatake , Haruo Yoda , Masayoshi Kameyama
IPC分类号： H04N7/18 , B66B1/00 , B66B1/18 , G06K9/03 , G06T1/00 , G06T7/00 , G06F3/05 , G06K9/04
CPC分类号： G06K9/03 , G06T7/0006 , G06T2207/10056 , G06T2207/30148
摘要： A group control system comprises multi-combinations of image pick-up devices and an automatic assembly apparatus controlled by information from the image pick-up devices. A computer responds to demands from the image pick-up devices and the automatic assembly apparatus which independently operate with the computer. A plurality of visual information processing apparatus are provided between the interface of the computer and the image pick-up devices, for processing information therefrom, and a pulse generator is coupled to the image pick-up devices and the visual information processing apparatus, for controlling the operations thereof. The image pick-up devices are grouped into a plurality of groups each of which is coupled to each visual information processing apparatus. The plurality of visual information processing apparatuses are timed by different timing pulses from the pulse generator, whereby processing of the information from a great number of the image pick-up devices is efficiently performed by the computer.
摘要翻译：组控制系统包括图像拾取装置的多组合和由图像拾取装置的信息控制的自动装配装置。计算机响应于独立于计算机操作的图像拾取装置和自动装配装置的需求。在计算机的接口和图像拾取装置的接口之间提供多个视觉信息处理装置，用于处理信息，脉冲发生器耦合到图像拾取装置和视觉信息处理装置，用于控制其操作。图像拾取装置被分组成多个组，每个组耦合到每个视觉信息处理装置。多个视觉信息处理装置通过来自脉冲发生器的不同的定时脉冲进行定时，从而由计算机有效地执行来自大量摄像装置的信息的处理。

78. 发明授权

US09364152B2 Object information acquiring apparatus 有权
标题翻译：对象信息获取装置
公开(公告)号：US09364152B2
公开(公告)日：2016-06-14
申请号：US13982795
申请日：2012-01-31
申请人： Katsuya Oikawa , Haruo Yoda
发明人： Katsuya Oikawa , Haruo Yoda
IPC分类号： A61B5/00 , G01S15/89 , A61B5/06 , G01S7/52 , A61B8/00 , A61B8/08
CPC分类号： A61B5/0033 , A61B5/066 , A61B8/4477 , A61B8/483 , G01S7/52085 , G01S15/8918 , G01S15/8927 , G01S15/8945 , G01S15/8993 , G01S15/8997
摘要： There is used an object information acquiring apparatus including a probe for electrically scanning an object in first direction and mechanically scanning in second direction intersecting with the first direction, a first delay-and-sum unit for operating a delay-and-sum on a received signal, a memory for storing a first delay-and-sum signal for each plane in the second direction, a selecting unit for selecting signals corresponding to M sectional planes from among the stored signals, a second delay-and-sum unit for operating a delay-and-sum on the selected signals in the second direction, and a unit for acquiring image in the object from the second delay-and-sum signal, the second delay-and-sum unit switching, according to the mechanical scanning, a first case in which M signals are fixed and a delay pattern is varied and a second case in which a set of the M signals is varied and the delay pattern is fixed.
摘要翻译：使用对象信息获取装置，其包括用于在第一方向上电子扫描物体的探针和在与第一方向相交的第二方向上机械扫描的对象信息获取装置，用于在所接收的第一方向上操作延迟和和的第一延迟和和单元信号，用于存储第二方向上的每个平面的第一延迟和和信号的存储器，用于从存储的信号中选择与M个截面相对应的信号的选择单元，用于操作第二延迟和和单元对所选择的信号在第二方向上的延迟和和以及用于从第二延迟和和信号获取对象中的图像的单元，第二延迟和和单元根据机械扫描切换，其中M个信号是固定的并且延迟模式是变化的第一种情况以及一组M个信号被改变并且延迟模式是固定的第二种情况。

79. 发明授权

US09247923B2 Received data processing apparatus of photoacoustic tomography 有权
标题翻译：光声层析成像的接收数据处理装置
公开(公告)号：US09247923B2
公开(公告)日：2016-02-02
申请号：US13055632
申请日：2009-09-03
申请人： Yoshitaka Baba , Haruo Yoda , Kazuhiko Fukutani
发明人： Yoshitaka Baba , Haruo Yoda , Kazuhiko Fukutani
IPC分类号： A61B13/00 , A61B8/13 , A61B5/00 , A61B8/08
CPC分类号： A61B5/0095 , A61B5/0073 , A61B5/7225 , A61B5/7278 , A61B8/13 , A61B8/483
摘要： There is provided a received data processing apparatus of photoacoustic tomography including a minimum constitution unit data composition unit that sequentially reads receiving digital signals from first storage units and composes minimum constitution unit data of the acoustic wave of the minimum constitution units by performing a delay-and-sum processing. A second storage unit stores the minimum constitution unit data of the entire region of the specimen, and an image construction unit constructs an image of the specimen based on the minimum constitution unit data stored in the second storage unit. A control unit sequentially stores the minimum constitution unit data calculated by the minimum constitution unit data composition unit in the second storage unit and reads the stored minimum constitution unit data of the entire region of the specimen to transmit the minimum constitution unit data to the image construction unit.
摘要翻译：提供了一种光声层析成像的接收数据处理装置，包括：最小构成单元数据合成单元，其顺序地从第一存储单元读取接收数字信号，并通过执行延迟来构成最小构成单元的声波的最小构成单位数据; -sum处理。第二存储单元存储样本的整个区域的最小构成单位数据，图像构造单元基于存储在第二存储单元中的最小构成单位数据构建样本的图像。控制单元将由最小构成单位数据构成单元计算出的最小构成单位数据顺序地存储在第二存储单元中，并读取所存储的样本的整个区域的最小构成单位数据，将最小构成单位数据发送到图像构造单元。

80. 发明授权

US09165552B2 Ultrasonic imaging apparatus and method of controlling delay 有权
标题翻译：超声波成像装置及延迟控制方法
公开(公告)号：US09165552B2
公开(公告)日：2015-10-20
申请号：US13520410
申请日：2011-02-22
申请人： Katsuya Oikawa , Haruo Yoda
发明人： Katsuya Oikawa , Haruo Yoda
IPC分类号： G06K9/00 , G10K11/34 , G01S7/52
CPC分类号： G10K11/346 , G01S7/52034 , G01S7/52049
摘要： The present invention enables ultrasonic propagation time values after correction of refraction to be calculated in parallel for each receive channel, by using a recurrence relation in the depth direction. Moreover, accumulation of errors can be avoided by using an accurate propagation time value obtained in advance at a reference depth to correct the propagation time value each time the reference depth is reached. For this error correction, the recurrence relation to calculate the propagation time value can be an approximate expression. For example, the propagation time value can be calculated using the inclination of reference propagation time values between reference depths. In an actual circuit, received signals are sequentially stored in a memory, and a receive beam is formed by calculating an address position corresponding to the propagation time value of the ultrasonic wave, and adding the received signals stored in the calculated addresses.
摘要翻译：本发明通过使用深度方向上的递推关系，能够对每个接收通道平行计算校正折射后的超声波传播时间值。此外，通过使用在参考深度预先获得的准确的传播时间值，可以在每次达到参考深度时校正传播时间值，可以避免错误的累积。对于该纠错，计算传播时间值的递归关系可以是近似表达式。例如，可以使用参考深度之间的参考传播时间值的倾斜度来计算传播时间值。在实际电路中，接收信号被顺序地存储在存储器中，并且通过计算与超声波的传播时间值相对应的地址位置，并将存储在所计算的地址中的接收信号相加来形成接收波束。

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