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1. 发明授权

US09390068B2 Signal processing circuit and ultrasonic diagnostic apparatus 有权
标题翻译：信号处理电路及超声波诊断仪
公开(公告)号：US09390068B2
公开(公告)日：2016-07-12
申请号：US13980193
申请日：2012-01-13
申请人： Haruo Yoda
发明人： Haruo Yoda
IPC分类号： G06F17/10 , G06F17/16 , G01S7/52
CPC分类号： G06F17/16 , G01S7/52046
摘要： A signal processing circuit respectively transforms complex covariance matrices, which are consecutively inputted at a predetermined period, into upper triangular matrices. The signal processing circuit includes: a storage unit that stores at least N-number of complex covariance matrices; a reading unit that reads matrix elements of the stored complex covariance matrices; a CORDIC calculation circuit that implements a CORDIC algorithm by a pipelined circuit system; and a QR decomposition unit that controls the reading unit and the CORDIC calculation circuit unit to calculate an upper triangular matrix by iteratively using the CORDIC calculation circuit unit on a single complex covariance matrix and that calculates in parallel a transformation of N-number of complex covariance matrices into upper triangular matrices in an interleaved format.
摘要翻译：信号处理电路分别将以预定周期连续输入的复协方差矩阵变换为上三角矩阵。信号处理电路包括：存储单元，其存储至少N个复数协方差矩阵; 读取单元，读取存储的复协方差矩阵的矩阵元素; CORDIC计算电路，通过流水线电路系统实现CORDIC算法; 以及QR分解单元，其控制读取单元和CORDIC计算电路单元，通过在单个复协方差矩阵上迭代地使用CORDIC计算电路单元来计算上三角矩阵，并且并行计算N个复数协方差的变换矩阵以交错格式转换成上三角矩阵。

2. 发明授权

US08008622B2 Electron beam apparatus and method of generating an electron beam irradiation pattern 有权
标题翻译：电子束装置和产生电子束照射图案的方法
公开(公告)号：US08008622B2
公开(公告)日：2011-08-30
申请号：US12630346
申请日：2009-12-03
申请人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
发明人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
IPC分类号： H01J37/26
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31769
摘要： High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.
摘要翻译：通过使用小剂量的电子束进行高对比度曝光，以高精度在晶片上形成图案，进行高精度检查。在图案形成中，执行邻近效应校正处理。此外，基于使用电子束的曝光特性的逆特性的滤波结果来执行电子束的曝光。此外，在图案检查中，基于滤波结果照射电子束，以获得形成的图案的边缘的周边区域。

3. 发明授权

US07692166B2 Charged particle beam exposure apparatus 有权
标题翻译：带电粒子束曝光装置
公开(公告)号：US07692166B2
公开(公告)日：2010-04-06
申请号：US11762182
申请日：2007-06-13
申请人： Masato Muraki , Haruo Yoda
发明人： Masato Muraki , Haruo Yoda
IPC分类号： H01J37/304 , H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/043 , H01J2237/24507 , H01J2237/3045 , H01J2237/30455 , H01J2237/30477 , H01J2237/30483
摘要： An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the detector with the charged particle beam, and a controller which controls the deflector to scan each of a plurality of scanning ranges on the detector with the charged particle beam, and calculates, on the basis of the charged particle beam amount detected by the detector upon scanning the plurality of scanning ranges, the intensity distribution of the charged particle beam which strikes the detector.
摘要翻译：公开了一种在具有带电粒子束的基板上绘制图案的曝光装置。曝光装置包括检测带电粒子束的检测器，使带电粒子束偏转以利用带电粒子束扫描基板或检测器的偏转器，以及控制偏转器扫描多个扫描范围中的每一个的控制器在具有带电粒子束的检测器上，并且基于扫描多个扫描范围时由检测器检测到的带电粒子束量计算撞击检测器的带电粒子束的强度分布。

4. 发明授权

US07642514B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07642514B2
公开(公告)日：2010-01-05
申请号：US12005387
申请日：2007-12-27
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/21
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译：本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器，发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

5. 发明授权

US07067830B2 Multi-electron beam exposure method and apparatus 有权
标题翻译：多电子束曝光方法及装置
公开(公告)号：US07067830B2
公开(公告)日：2006-06-27
申请号：US10629623
申请日：2003-07-30
申请人： Haruo Yoda , Yasunari Souda , Hiroya Ohta , Yoshikiyo Yui , Shinichi Hashimoto
发明人： Haruo Yoda , Yasunari Souda , Hiroya Ohta , Yoshikiyo Yui , Shinichi Hashimoto
IPC分类号： H01J37/08
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/31764 , H01J2237/31767
摘要： The dimension of the main field as a unit region for exposure is set to an integral submultiple of the arrangement pitch of the LSI to be exposed, by the control computer 62, and the exposure data stored in the form associated with electron beams from a data generation circuit 64 is limited to one-chip data alone in units of a stripe. This data is repeatedly read out to write the stripe. Further, a storage circuit 66 is provided to store the exposure data by means of a double buffer memory unit for each electron beam. While LSI is written according to one of the buffers, the next exposure stripe data is prepared on the other buffer, thereby bringing about a substantial reduction in the required speed of the exposure data generation circuit.
摘要翻译：通过控制计算机62将作为曝光的单位区域的主场的尺寸设定为要暴露的LSI的排列间距的整数倍，并且以与来自数据的电子束相关联的形式存储的曝光数据发生电路64仅以条形为单位限于单芯片数据。该数据被重复读出以写入条带。此外，存储电路66用于通过用于每个电子束的双缓冲存储器单元来存储曝光数据。当根据缓冲器中的一个写入LSI时，在另一个缓冲器上准备下一个曝光条带数据，从而显着降低曝光数据产生电路的所需速度。

6. 发明授权

US06946665B2 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus 有权
标题翻译：带电粒子束曝光方法及装置及装置的制造方法
公开(公告)号：US06946665B2
公开(公告)日：2005-09-20
申请号：US10909300
申请日：2004-08-03
申请人： Masato Muraki , Yoshinori Nakayama , Hiroya Ohta , Haruo Yoda , Norio Saitou
发明人： Masato Muraki , Yoshinori Nakayama , Hiroya Ohta , Haruo Yoda , Norio Saitou
IPC分类号： G03F7/20 , H01J37/04 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027 , H01J3/07 , H01J3/14
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317
摘要： A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams includes a first measurement member for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams. A second measurement member makes the plurality of charged particle beams come incident and multiplies electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.
摘要翻译：使用多个带电粒子束曝光基板的带电粒子束曝光装置包括用于使多个带电粒子束入射的第一测量部件，并测量带电粒子束的总电流值。第二测量构件使多个带电粒子束入射并乘以每个入射带电粒子束的电子，从而测量每个带电粒子束的电流的相对值。

7. 发明授权

US06674086B2 Electron beam lithography system, electron beam lithography apparatus, and method of lithography 失效
标题翻译：电子束光刻系统，电子束光刻设备和光刻方法
公开(公告)号：US06674086B2
公开(公告)日：2004-01-06
申请号：US09265181
申请日：1999-03-09
申请人： Masato Kamada , Haruo Yoda , Minoru Wakita , Hajime Kawano
发明人： Masato Kamada , Haruo Yoda , Minoru Wakita , Hajime Kawano
IPC分类号： H01J37302
CPC分类号： H01J37/3026 , H01J2237/3175
摘要： The subject that should be solved in the present invention is to improve throughput of electron beam lithography apparatus or electron beam lithography system and lithography method used therefor. The electron beam lithography apparatus by the present invention comprises a lithography data generation part, an exposure map implementation part, and plurality of lithography data generation parts, thereby several exposure maps which are different in condition and type, are implemented in parallel. Moreover, the electron beam lithography apparatus by present invention has a construction to compare outputs from the lithography data generation parts. Moreover, the electron beam lithography system by present invention has a construction to use lithography data formed with the lithography data generation parts of one of the electron beam lithography apparatuses with other of the electron beam lithography apparatuses.
摘要翻译：本发明中要解决的课题是提高电子束光刻装置或电子束光刻系统的生产率和用于其的光刻方法。本发明的电子束光刻设备包括光刻数据生成部分，曝光图实现部分和多个光刻数据生成部分，从而并行地实现条件和类型不同的几个曝光图。此外，本发明的电子束光刻装置具有比较光刻数据生成部的输出的结构。此外，本发明的电子束光刻系统具有使用与电子束光刻设备中的其中一个电子束光刻设备的光刻数据生成部分形成的光刻数据的结构。

8. 发明授权

US06653633B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US06653633B2
公开(公告)日：2003-11-25
申请号：US10356498
申请日：2003-02-03
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J3726
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译：本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器，发射的带电粒子束，以及用于根据所述带电粒子束聚焦的信号来构成表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

9. 发明授权

US06538249B1 Image-formation apparatus using charged particle beams under various focus conditions 有权
标题翻译：在各种聚焦条件下使用带电粒子束的图像形成装置
公开(公告)号：US06538249B1
公开(公告)日：2003-03-25
申请号：US09612302
申请日：2000-07-07
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J3726
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译：本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器，发射的带电粒子束，以及用于根据所述带电粒子束聚焦的信号来组合表面部分的二维图像的装置，所述信号是从带电粒子检测器输出的信号。

10. 发明授权

US06172363B2 Method and apparatus for inspecting integrated circuit pattern 失效
公开(公告)号：US06172363B2
公开(公告)日：2001-01-09
申请号：US08811511
申请日：1997-03-04
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： H01J37244
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

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