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1. 发明授权

US06674086B2 Electron beam lithography system, electron beam lithography apparatus, and method of lithography 失效
标题翻译：电子束光刻系统，电子束光刻设备和光刻方法
公开(公告)号：US06674086B2
公开(公告)日：2004-01-06
申请号：US09265181
申请日：1999-03-09
申请人： Masato Kamada , Haruo Yoda , Minoru Wakita , Hajime Kawano
发明人： Masato Kamada , Haruo Yoda , Minoru Wakita , Hajime Kawano
IPC分类号： H01J37302
CPC分类号： H01J37/3026 , H01J2237/3175
摘要： The subject that should be solved in the present invention is to improve throughput of electron beam lithography apparatus or electron beam lithography system and lithography method used therefor. The electron beam lithography apparatus by the present invention comprises a lithography data generation part, an exposure map implementation part, and plurality of lithography data generation parts, thereby several exposure maps which are different in condition and type, are implemented in parallel. Moreover, the electron beam lithography apparatus by present invention has a construction to compare outputs from the lithography data generation parts. Moreover, the electron beam lithography system by present invention has a construction to use lithography data formed with the lithography data generation parts of one of the electron beam lithography apparatuses with other of the electron beam lithography apparatuses.
摘要翻译：本发明中要解决的课题是提高电子束光刻装置或电子束光刻系统的生产率和用于其的光刻方法。本发明的电子束光刻设备包括光刻数据生成部分，曝光图实现部分和多个光刻数据生成部分，从而并行地实现条件和类型不同的几个曝光图。此外，本发明的电子束光刻装置具有比较光刻数据生成部的输出的结构。此外，本发明的电子束光刻系统具有使用与电子束光刻设备中的其中一个电子束光刻设备的光刻数据生成部分形成的光刻数据的结构。

2. 发明授权

US06831283B2 Charged particle beam drawing apparatus and pattern forming method 失效
标题翻译：带电粒子束绘图装置和图案形成方法
公开(公告)号：US06831283B2
公开(公告)日：2004-12-14
申请号：US10364424
申请日：2003-02-12
申请人： Haruo Yoda , Hajime Kawano
发明人： Haruo Yoda , Hajime Kawano
IPC分类号： G03F720
CPC分类号： H01J37/3026
摘要： A charged particle beam drawing apparatus and a pattern forming method capable of drawing fine patterns while minimizing the proximity effect, thus overcoming the drawbacks of the conventional exposure area density correcting method and supplementary exposure method. The inventive method comprises the steps of performing supplementary exposure by irradiating a drawing area on a specimen with a charged particle beam, and performing main exposure by irradiating with the charged particle beam a region made up of the drawing pattern inside the drawing area on the specimen. The supplementary exposure step includes the steps of: dividing the drawing area into a plurality of smaller regions of an equal area each while calculating an area value of the drawing pattern in each smaller region; correcting the area value of each smaller region by use of a weighted sum of the area values calculated for proximate smaller regions surrounding the smaller region in question; generating supplementary exposure geometries for the drawing area; and computing doses of exposure for the generated supplementary exposure geometries by referring to the corrected area values.
摘要翻译：一种带电粒子束描绘装置和图案形成方法，其能够在最小化邻近效应的同时绘制精细图案，从而克服了常规曝光区域密度校正方法和补充曝光方法的缺点。本发明的方法包括以下步骤：通过用带电粒子束照射样本上的绘图区域来进行辅助曝光，并且通过用带电粒子束照射由样本上的绘图区域内的绘图图案组成的区域来进行主曝光。辅助曝光步骤包括以下步骤：在每个较小区域中计算绘制图案的面积值的同时将绘图区域划分成多个相等面积的较小区域; 通过使用针对所讨论的较小区域周围的较小区域计算的面积值的加权和来校正每个较小区域的面积值; 为绘图区域生成补充曝光几何; 以及通过参考校正的面积值计算所产生的辅助曝光几何的曝光的剂量。

3. 发明授权

US06828573B1 Electron beam lithography system 失效
标题翻译：电子束光刻系统
公开(公告)号：US06828573B1
公开(公告)日：2004-12-07
申请号：US09315988
申请日：1999-05-21
申请人： Hajime Kawano , Minoru Wakita , Masato Kamada , Haruo Yoda
发明人： Hajime Kawano , Minoru Wakita , Masato Kamada , Haruo Yoda
IPC分类号： G21G500
CPC分类号： H01J37/3023 , H01J2237/31761 , H01J2237/31769
摘要： An object of this invention is to provide an electron beam lithography system capable of rapidly creating an accurate exposure map for proximity effect correction. The inventive system creates the map by dividing shot figures by mesh and adding up the divided area values for each mesh. The system comprises: (1) a function for judging and dividing boundaries of shots to be rendered based on mesh positions as well as shot positions and figures in the map, and (2) a function for calculating divided shot area values and adding the values simultaneously to adjacent addresses in cumulative fashion in a plurality of memories furnished downstream of the system.
摘要翻译：本发明的目的是提供一种电子束光刻系统，其能够快速创建用于邻近效应校正的精确曝光图。本发明的系统通过用网格划分射击图并且将每个网格的分割区域值相加来创建地图。该系统包括：（1）用于根据网格位置以及拍摄位置和图形来判断和分割要渲染的边界的功能，以及（2）用于计算分割的拍摄区域值并将值相加的功能在系统下游的多个存储器中以累积的方式同时到达相邻地址。

4. 发明授权

US06541784B1 Electron beam exposure system and exposing method using an electron beam 有权
标题翻译：电子束曝光系统和使用电子束的曝光方法
公开(公告)号：US06541784B1
公开(公告)日：2003-04-01
申请号：US09567001
申请日：2000-05-09
申请人： Hajime Kawano , Haruo Yoda
发明人： Hajime Kawano , Haruo Yoda
IPC分类号： H01J37244
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31769
摘要： It is an object of the present invention to provide an electron beam drawing apparatus and a drawing method using an electron beam capable of reducing a correction error of proximity effect correction without adding a special circuit or a memory and capable of preventing thinning or thickening of a pattern arranged at a vicinity of an edge of a pattern having a high density from being caused. In order to resolve the above-described object, an embodiment according to the present invention is provided with a constitution constituted by the steps of dividing a specimen into virtual meshes having a predetermined dimension, calculating an area density of a drawing pattern for each mesh, calculating an area density map of a total of a drawing region and storing the area density map in a memory, calculating a modified area density by executing a correction for the area density in consideration of back-scattering energy and forward-scattering energy in a resist of the specimen caused by the electron beam, calculating a modified area density map of the total of the drawing region and storing the modified area density map in the memory, and repeating these steps to thereby determine an exposure dose.
摘要翻译：本发明的目的是提供一种使用能够减少邻近效应校正的校正误差的电子束的电子束描绘装置和绘图方法，而不添加专门的电路或存储器，并且能够防止变薄或增厚为了解决上述目的，根据本发明的实施例具有以下步骤：将样本分成以下步骤构成的结构：计算每个网格的绘制图形的面积密度，计算绘图区域的总和的面积密度图并将该区域密度图存储在存储器中，通过执行校正来计算修改的面积密度考虑到由ele引起的样品的抗蚀剂中的背散射能量和前向散射能量的面积密度计算绘图区域的总和的修改面积密度图并将修改的面积密度图存储在存储器中，并重复这些步骤，从而确定曝光剂量。

5. 外观设计

USD663333S1 Autonomous mobile robot 有权
标题翻译：自主移动机器人
公开(公告)号：USD663333S1
公开(公告)日：2012-07-10
申请号：US29413899
申请日：2012-02-22
申请人： Yukihiko Kitano , Shoichi Kobayashi , Mizuho Sakakibara , Hajime Kawano , Tatsuo Sakai , Hiroyuki Uematsu , Shintaro Kinoshita , Ryosuke Murai
设计人： Yukihiko Kitano , Shoichi Kobayashi , Mizuho Sakakibara , Hajime Kawano , Tatsuo Sakai , Hiroyuki Uematsu , Shintaro Kinoshita , Ryosuke Murai

6. 发明授权

US07778776B2 Obstacle avoidance method and obstacle-avoidable mobile apparatus 有权
标题翻译：障碍物回避方法和障碍物避免移动设备
公开(公告)号：US07778776B2
公开(公告)日：2010-08-17
申请号：US11882943
申请日：2007-08-07
申请人： Takanori Goto , Hajime Kawano
发明人： Takanori Goto , Hajime Kawano
IPC分类号： G08G1/16
CPC分类号： G05D1/024 , B60G2800/242 , B60W30/08 , G05D1/0255 , G05D1/0272
摘要： An obstacle avoidance method for mobile apparatus includes the steps of acquiring, by a mobile apparatus, information as to relative movement of an obstacle with respect to the mobile apparatus, calculating a travel path and a travel direction of the obstacle based on the information during its relative movement, setting a non-intrusion area having a configuration which is longer in the travel direction of the obstacle than in a direction perpendicular to the travel direction, and performing such travel control on the mobile apparatus as to avoid the non-intrusion area, by which obstacle avoidance operation is fulfilled. Thus, an obstacle avoidance method as well as an obstacle-avoidable mobile apparatus are provided which are capable of not only reducing collisions against obstacles and repetitions of avoidance operation, but also preventing impartment of uneasiness and oppression to persons in the obstacle avoidance operation for mobile apparatuses such as robots.
摘要翻译：移动装置的障碍物回避方法包括以下步骤：通过移动装置获取关于障碍物相对于移动装置的相对移动的信息，根据其中的信息计算障碍物的行进路径和行进方向相对移动，设置具有比行进方向垂直的方向在障碍物的行进方向上更长的构造的非入侵区域，并且对移动装置进行这样的行驶控制以避免非入侵区域，通过这种方式实现了避障操作。因此，提供了一种障碍物回避方法以及可避免障碍的移动装置，其不仅能够减少对障碍的碰撞和重复的回避操作，而且还可以防止对移动的避障操作中的人的不安和压迫装置如机器人。

7. 发明授权

US06853281B1 Magnet apparatus and mri apparatus 失效
标题翻译：磁铁设备和仪器
公开(公告)号：US06853281B1
公开(公告)日：2005-02-08
申请号：US09554155
申请日：1998-12-01
申请人： Shigeru Kakugawa , Shouji Kitamura , Nobuhiro Hara , Akiyoshi Komura , Noriaki Hino , Hajime Kawano , Takao Honmei , Hirotaka Takeshima , Takeshi Yatsuo , Hiroshi Tazaki
发明人： Shigeru Kakugawa , Shouji Kitamura , Nobuhiro Hara , Akiyoshi Komura , Noriaki Hino , Hajime Kawano , Takao Honmei , Hirotaka Takeshima , Takeshi Yatsuo , Hiroshi Tazaki
IPC分类号： G01R33/38 , G01R33/381 , G01R33/3815 , G01V3/00
CPC分类号： G01R33/3806 , G01R33/381 , G01R33/3815
摘要： A magnet device includes two sets of static magnetic field generation sources spaced from each other in the vertical direction such that the uniform magnetic field region (patient space) is between then. Each set has concentric current carrying coils to generate a uniform magnetic field in a first direction (the vertical direction). Several such coils are used in each set, disposed such that when a first axis which is parallel to the first (vertical) direction and passes substantially through the centers of the current carrying coils crosses, at a first point, a second axis which is orthogonal to the first axis and is at substantially equal distance from the respective static magnetic field generation sources, the current carrying coils are disposed in such a manner that when geometrical centers of cross sections of the current carrying coils are projected on a first straight line that is in a first plane containing the first axis, the second axis and the first point and passing through the first point, the directions of the currents of the carrying coils at the respective corresponding projections align alternatively in positive and negative directions on the first straight line.
摘要翻译：磁体装置包括在垂直方向彼此间隔开的两组静态磁场产生源，使得均匀的磁场区域（患者空间）在之间。每组具有同心的载流线圈，以在第一方向（垂直方向）上产生均匀的磁场。在每组中使用若干这样的线圈，这样设置成使得当第一轴线平行于第一（垂直）方向并且基本上穿过载流线圈的中心穿过时，在第一点处与正交的第二轴线交叉到第一轴线并且距离相应的静态磁场产生源基本上相等的距离，载流线圈以这样的方式设置，使得当载流线圈的横截面的几何中心投影在第一直线上时在包含第一轴线，第二轴线和第一点并穿过第一点的第一平面中，各个相应突起处的输送线圈的电流方向在第一直线上在正向和负向上交替排列。

8. 发明授权

US06781492B2 Superconducting magnetic apparatus 失效
标题翻译：超导磁性设备
公开(公告)号：US06781492B2
公开(公告)日：2004-08-24
申请号：US10191466
申请日：2002-07-10
申请人： Hirotaka Takeshima , Takao Hommei , Hajime Kawano , Hiroshi Tazaki , Takeshi Yatsuo , Shigenori Kuroda , Hajime Tanabe
发明人： Hirotaka Takeshima , Takao Hommei , Hajime Kawano , Hiroshi Tazaki , Takeshi Yatsuo , Shigenori Kuroda , Hajime Tanabe
IPC分类号： H01F600
CPC分类号： G01R33/3806 , G01R33/3815 , G01R33/383 , G01R33/3873
摘要： A superconducting magnet apparatus. By forming one or more holes in each of platelike ferromagnetic substances forming a magnetic shield for focusing the magnetic flux generated by superconducting coils, the flow of lines of magnetic flux is adjusted. Thereby, a static magnetic field in a measurement space is corrected. By disposing coupling tubes for supporting two cooling vessels housing superconducting coils on the rear side with respect to a central axis (Z axis) of the measurement space of the vertical direction, access to the subject is facilitated. In addition, the magnetic shield has an opening portion wider than the superconducting magnet on its side face. After the magnetic shield has been assembled, the superconducting magnet can be inserted from the opening portion.
摘要翻译：超导磁体装置。通过在形成用于聚焦超导线圈产生的磁通的磁屏蔽的板状铁磁性物质的每一个中形成一个或多个孔，调节磁通线的流动。由此，校正测量空间中的静磁场。通过设置用于支撑相对于垂直方向的测量空间的中心轴线（Z轴）在后侧容纳超导线圈的两个冷却容器的联接管，便于对对象的访问。此外，磁屏蔽件的侧面具有比超导磁体宽的开口部。在组装磁屏蔽之后，可以从开口部分插入超导磁体。

9. 发明授权

US06580346B1 Magnetic resonance imaging apparatus 失效
标题翻译：磁共振成像装置
公开(公告)号：US06580346B1
公开(公告)日：2003-06-17
申请号：US08895269
申请日：1997-07-16
申请人： Hirotaka Takeshima , Hajime Kawano , Shigeru Kakugawa , Noriaki Hino
发明人： Hirotaka Takeshima , Hajime Kawano , Shigeru Kakugawa , Noriaki Hino
IPC分类号： G01V300
CPC分类号： G01R33/3875 , G01R33/3806 , G01R33/3815 , G01R33/421
摘要： The present invention relates to techniques for enlarging an opening, which accommodates a subject, in a superconducting magnet apparatus for use in MRI system, so as to prevent the subject from feeling claustrophobic, and for realizing low magnetic field leakage therefrom, and for reducing the weight thereof, and for realizing a large high magnetic field strength uniform magnetic field region. Static magnetic field generating sources of the superconducting magnet apparatus are constituted by two sets of superconducting coils, the respective sets of which are placed in such a manner as to face each other across a uniform magnetic field generating region. Each of the sets of superconducting coils consists of a main coil for feeding electric current in a specific direction, a bucking coil for feeding electric current in a direction opposite to the direction of the electric current flow passing through the main coil, and a coil for correcting magnetic homogeneity. The diameter of the aforementioned main coil is set as being nearly equal to that of the aforesaid bucking coil. Further, the diameter of the coil for correcting the magnetic homogeneity is set as being less than that of the main coil. Moreover, an amount of electric current flowing through the coil for correcting the magnetic homogeneity is set as being less than that of electric current passing through the main coil. Furthermore, the distance between the two main coils facing each other is set as being shorter than that between the two bucking coils.
摘要翻译：本发明涉及在用于MRI系统的超导磁体装置中扩大容纳对象的开口的技术，以防止受试者感到幽闭恐怖，并且为了实现低磁场泄漏，并且为了减少并且用于实现大的高磁场强度均匀的磁场区域。超导磁体装置的静磁场发生源由两组超导线圈构成，其中各组以如下方式放置：面对彼此跨越均匀的磁场产生区域。每组超导线圈由用于沿特定方向馈送电流的主线圈，用于沿与通过主线圈的电流流动方向相反的方向馈送电流的降压线圈和用于矫正磁同质性。上述主线圈的直径设定为与前述的搭扣线圈大致相等。此外，用于校正磁性均匀性的线圈的直径被设定为小于主线圈的直径。此外，流过用于校正磁性均匀性的线圈的电流量被设定为小于通过主线圈的电流的电流量。此外，彼此面对的两个主线圈之间的距离被设定为短于两个降压线圈之间的距离。

10. 发明授权

US06437672B1 Superconducting magnetic device 失效
标题翻译：超导磁性装置
公开(公告)号：US06437672B1
公开(公告)日：2002-08-20
申请号：US09101048
申请日：1998-06-29
申请人： Hirotaka Takeshima , Takao Hommei , Hajime Kawano , Hiroshi Tazaki , Takeshi Yatsuo , Shigenori Kuroda , Hajime Tanabe
发明人： Hirotaka Takeshima , Takao Hommei , Hajime Kawano , Hiroshi Tazaki , Takeshi Yatsuo , Shigenori Kuroda , Hajime Tanabe
IPC分类号： H01F600
CPC分类号： G01R33/3806 , G01R33/3815 , G01R33/383 , G01R33/3873
摘要： A superconducting magnet apparatus. By forming one or more holes in each of platelike ferromagnetic substances forming a magnetic shield for focusing the magnetic flux generated by superconducting coils, the flow of lines of magnetic flux is adjusted. Thereby, a static magnetic field in a measurement space is corrected. By disposing coupling tubes for supporting two cooling vessels housing superconducting coils on the rear side with respect to a central axis (Z axis) of the measurement space of the vertical direction, access to the subject is facilitated. In addition, the magnetic shield has an opening portion wider than the superconducting magnet on its side face. After the magnetic shield has been assembled, the superconducting magnet can be inserted from the opening portion.
摘要翻译：超导磁体装置。通过在形成用于聚焦超导线圈产生的磁通的磁屏蔽的板状铁磁性物质的每一个中形成一个或多个孔，调节磁通线的流动。由此，校正测量空间中的静磁场。通过设置用于支撑相对于垂直方向的测量空间的中心轴线（Z轴）在后侧容纳超导线圈的两个冷却容器的联接管，便于对对象的访问。此外，磁屏蔽件的侧面具有比超导磁体宽的开口部。在组装磁屏蔽之后，可以从开口部分插入超导磁体。

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