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1. 发明申请

WO2012092127A8 METHODS AND SYSTEMS FOR IN-SITU PYROMETER CALIBRATION 审中-公开
公开(公告)号：WO2012092127A8
公开(公告)日：2012-07-05
申请号：PCT/US2011/066831
申请日：2011-12-22
申请人： VEECO INSTRUMENTS INC. , GURARY, Alexander, I. , BOGUSLAVSKIY, Vadim , KRISHNAN, Sandeep , KING, Matthew
发明人： GURARY, Alexander, I. , BOGUSLAVSKIY, Vadim , KRISHNAN, Sandeep , KING, Matthew
IPC分类号： G01J5/00
摘要： A method of in-situ pyrometer calibration for a wafer treatment reactor such as a CVD reactor 12 desirably includes the steps of positioning a calibrating pyrometer 80 at a first calibrating position A and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating a support element 40 about a rotational axis 42, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer 71 installed at a first operating position 1R, and obtaining first calibrating temperature measurements from the calibrating pyrometer 80. Both the calibrating pyrometer 80 and the first operating pyrometer 71 desirably are adapted to receive radiation from a first portion of the wafer support element 40 at a first radial distance D1 from the rotational axis 42 of the wafer support element.

2. 发明申请

WO2006088448A1 WAFER CARRIER FOR GROWING GAN WAFERS 审中-公开
标题翻译：用于生长甘薯的波浪载体
公开(公告)号：WO2006088448A1
公开(公告)日：2006-08-24
申请号：PCT/US2005/004806
申请日：2005-02-16
申请人： VEECO INSTRUMENTS INC. , BOGUSLAVSKIY, Vadim , GURARY, Alex , STALL, Richard, A.
发明人： BOGUSLAVSKIY, Vadim , GURARY, Alex , STALL, Richard, A.
IPC分类号： C23C16/00 , H01L21/027 , B65G65/04 , B25B11/00
CPC分类号： C23C16/4584 , C30B25/12 , H01L21/6838 , H01L21/68764 , H01L21/68771
摘要： A wafer carrier (224) for growing wafers includes a plate (225) having a first surface (226) and a second surface (228), a plurality of openings (230) extending from the first surface (26) to the second surface (228) of the plate (225), and a porous element (236) disposed in each of the plurality of openings (230), each porous element (236) being adapted to support one or more wafers. The wafer carrier (224) also has a blind central opening (244) extending from the second surface (228) toward the first surface (226) of the plate (225), and a plurality of shafts (242) extending outwardly from the blind central opening (244). Each shaft (242) has a first end in communication with the blind central opening (244) and a second end in communication with one of the porous elements (236) for providing fluid communication between the blind central opening and one of the porous elements. Suction is formed at a surface of each porous element (236) by drawing vacuum through the blind central opening (244) and the shafts (242).
摘要翻译：用于生长晶片的晶片载体（224）包括具有第一表面（226）和第二表面（228）的板（225），从第一表面（26）延伸到第二表面（多个）的多个开口（225）的多个孔（228）和设置在多个开口（230）中的每一个中的多孔元件（236），每个多孔元件（236）适于支撑一个或多个晶片。晶片载体（224）还具有从第二表面（228）朝向板（225）的第一表面（226）延伸的盲中心开口（244）和从盲板向外延伸的多个轴（242）中心开口（244）。每个轴（242）具有与盲中心开口（244）连通的第一端和与多孔元件（236）中的一个连通的第二端，用于在盲中心开口和一个多孔元件之间提供流体连通。通过将盲中心开口244和轴242抽真空，在每个多孔元件236的表面上形成抽吸。

3. 发明申请

WO2012166770A2 HEATED WAFER CARRIER PROFILING 审中-公开
标题翻译：加热滚筒轮廓图
公开(公告)号：WO2012166770A2
公开(公告)日：2012-12-06
申请号：PCT/US2012/039947
申请日：2012-05-30
申请人： VEECO INSTRUMENTS INC. , BOGUSLAVSKIY, Vadim , MANGUM, Joshua , KING, Matthew , MARCELO, Earl , ARMOUR, Eric, A. , GURARY, Alexander, I. , QUINN, William, E. , TAS, Guray
发明人： BOGUSLAVSKIY, Vadim , MANGUM, Joshua , KING, Matthew , MARCELO, Earl , ARMOUR, Eric, A. , GURARY, Alexander, I. , QUINN, William, E. , TAS, Guray
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： H01L21/68764 , C23C16/4584 , C23C16/46 , C23C16/52 , G01N21/71 , G01N21/75 , G01N23/20033 , G01N2021/1731 , G01N2021/745 , H01L21/67109 , H01L21/68771
摘要： An apparatus provides a carrier (80) rotatable about an axis of rotation (22) where the carrier has a top surface (88) adapted to hold at least one semiconductor wafer (140) and a surface characterization tool (120) which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation A method using the apparatus is also included.
摘要翻译：一种装置提供一种能够围绕旋转轴线（22）旋转的载体（80），其中载体具有适于保持至少一个半导体晶片（140）的表面（88）和表面表征工具（120）在相对于载体的顶表面和/或横向于旋转轴线的晶片的多个位置上移动也包括使用该装置的方法。

4. 发明申请

WO2013142030A1 KEYED WAFER CARRIER 审中-公开
标题翻译：键盘拖车
公开(公告)号：WO2013142030A1
公开(公告)日：2013-09-26
申请号：PCT/US2013/028572
申请日：2013-03-01
申请人： VEECO INSTRUMENTS INC.
发明人： KRISHNAN, Sandeep , MOY, Keng , GURARY, Alexander, I. , KING, Matthew , BOGUSLAVSKIY, Vadim , KROMMENHOEK, Steven
IPC分类号： H01L21/683 , H01L21/205 , C23C16/458
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure (10) for a chemical vapor deposition reactor desirably includes a reaction chamber (12) having an interior (26), a spindle (30) mounted in the reaction chamber, and a wafer carrier (40) releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft (36) extending along a vertical rotational axis (32) and a key (80) projecting outwardly from the shaft. The wafer carrier (40) preferably has a body (40a) defining top and bottom surfaces (41, 44) and at least one wafer-holding feature (43) configured to hold a wafer (50). The wafer carrier (40) desirably further has a recess (47) extending into the body from the bottom surface (44) and a keyway (48) projecting outwardly from a periphery (104) of the recess along a transverse axis (106). The shaft 36 preferably is engaged in the recess (47) and the.key (80) preferably is engaged into the keyway (48).
摘要翻译：用于化学气相沉积反应器的结构（10）理想地包括具有内部（26），安装在反应室中的心轴（30）的反应室（12）和可释放地安装在心轴上的晶片载体（40）与其旋转。主轴期望具有沿竖直旋转轴线（32）延伸的轴（36）和从轴向外突出的键（80）。晶片载体（40）优选地具有限定顶部和底部表面（41,44）的主体（40a）和被配置为保持晶片（50）的至少一个晶片保持特征（43）。晶片载体（40）理想地还具有从底表面（44）延伸到主体中的凹部（47）和沿着横向轴线（106）从凹部的周边（104）向外突出的键槽（48）。轴36优选地接合在凹部（47）中，并且键（80）优选地接合到键槽（48）中。

5. 发明申请

WO2011106064A1 PROCESSING METHODS AND APPARATUS WITH TEMPERATURE DISTRIBUTION CONTROL 审中-公开
标题翻译：具有温度分布控制的加工方法和装置
公开(公告)号：WO2011106064A1
公开(公告)日：2011-09-01
申请号：PCT/US2010/060258
申请日：2010-12-14
申请人： VEECO INSTRUMENTS INC. , GURARY, Alex , BELOUSOV, Mikhail , BOGUSLAVSKIY, Vadim , MITROVIC, Bojan
发明人： GURARY, Alex , BELOUSOV, Mikhail , BOGUSLAVSKIY, Vadim , MITROVIC, Bojan
IPC分类号： H01L21/00 , H01L21/687
CPC分类号： H01L22/26 , C23C16/45521 , C23C16/4584 , C23C16/52 , H01L21/0254 , H01L21/0262 , H01L21/67109 , H01L21/68785 , H01L21/68792
摘要： Wafer treatment process and apparatus is provided with a wafer carrier (80) arranged to hold wafers (124) and to inject a fill gas into gaps (130) between the wafers and the wafer carrier. The apparatus is arranged to vary the composition, flow rate, or both of the fill gas so as to counteract undesired patterns of temperature non-uniformity of the wafers.
摘要翻译：晶片处理工艺和设备设置有晶片载体（80），其布置成保持晶片（124）并将填充气体注入到晶片和晶片载体之间的间隙（130）中。该装置被布置成改变填充气体的组成，流速或两者，以便抵消晶片的不期望的温度不均匀图案。

6. 发明申请

WO2006001818A3 SYSTEM AND METHOD FOR INCREASING THE EMISSIVITY OF A MATERIAL 审中-公开
公开(公告)号：WO2006001818A3
公开(公告)日：2006-01-05
申请号：PCT/US2004/034524
申请日：2004-10-19
申请人： VEECO INSTRUMENTS INC.
发明人： BOGUSLAVSKIY, Vadim , GURARY, Alexander
IPC分类号： B44C1/22 , C23C16/00 , H05B3/00
摘要： A system and method is disclosed for increasing the emissivity of solid materials, wherein first the surface of the material is mechanically worked to create micro-level defects, and then etched to create a deep micro-rough surface morphology. In this manner, higher efficiencies and lower energy consumption can be obtained when these modified materials are used for heating elements. Heating elements made in accordance with this process thus operate at lower temperatures with longer lifetimes, when the improved heating elements are used with various heating devices.

7. 发明申请

WO2014023414A1 HEATING ELEMENT FOR A PLANAR HEATER OF A MOCVD REACTOR 审中-公开
标题翻译：用于MOCVD反应器的平面加热器的加热元件
公开(公告)号：WO2014023414A1
公开(公告)日：2014-02-13
申请号：PCT/EP2013/002337
申请日：2013-08-05
申请人： PLANSEE SE , VEECO INSTRUMENTS INC.
发明人： MARTINZ, Hans-Peter , SULIK, Manfred , BOGUSLAVSKIY, Vadim
IPC分类号： C23C16/46 , H05B3/14 , H05B3/24
CPC分类号： C23C16/46 , B22F5/006 , B22F7/004 , H05B3/12 , H05B3/143 , H05B3/22
摘要： The invention is related to a heating element (10) comprising a heating body (20) which is directly covered at least partly with a porous sintered coating (30), wherein the heating body (20) the porous sintered coating (30) each comprises at least 90 % by weight of tungsten.
摘要翻译：本发明涉及一种加热元件（10），该加热元件（10）包括至少部分地用多孔烧结涂层（30）直接覆盖的加热体（20），其中多孔烧结涂层（30）的加热体（20）各自包括至少90重量％的钨。

8. 发明申请

WO2014023413A1 TERMINAL FOR MECHANICAL SUPPORT OF A HEATING ELEMENT 审中-公开
标题翻译：加热元件的机械支撑终端
公开(公告)号：WO2014023413A1
公开(公告)日：2014-02-13
申请号：PCT/EP2013/002336
申请日：2013-08-05
申请人： PLANSEE SE , VEECO INSTRUMENTS INC.
发明人： PLANKENSTEINER, Arno , FEIST, Christian , BOGUSLAVSKIY, Vadim , GURARY, Alexander I. , CHANG, Chenghung Paul
IPC分类号： C23C16/458 , C23C16/46 , H01L21/67
CPC分类号： H05B1/00 , C23C16/4585 , C23C16/46 , H01L21/67115
摘要： The invention relates to Terminal (10) for mechanical support of a heating element (100), comprising a base device (30), a mounting device (20), the mounting device (20) adapted to support the heating element (100), and a support device (40) connecting the base device (30) to the mounting device (20), the support device (40) allowing displacement of the heating element (100) about a radial axis and less than about 10% displacement of the heating element (100) about a tangential and/or axial axis.
摘要翻译：本发明涉及一种用于加热元件（100）的机械支撑的端子（10），包括基座装置（30），安装装置（20），适于支撑加热元件（100）的安装装置（20）以及将所述基座装置（30）连接到所述安装装置（20）的支撑装置（40），所述支撑装置（40）允许所述加热元件（100）围绕径向轴线移位，并且小于所述加热元件加热元件（100）围绕切向和/或轴向轴线。

9. 发明申请

WO2013173211A1 AUTOMATED PROCESS CHAMBER CLEANING IN MATERIAL DEPOSITION SYSTEMS 审中-公开
标题翻译：自动化过程在材料沉积系统中清洗
公开(公告)号：WO2013173211A1
公开(公告)日：2013-11-21
申请号：PCT/US2013/040718
申请日：2013-05-13
申请人： VEECO INSTRUMENTS, INC.
发明人： SHAMOUN, Bassam , GURARY, Alex , BOGUSLAVSKIY, Vadim , KING, Matthew , URBAN, Lukas
IPC分类号： H01L21/205 , H01L21/302 , H01L21/02
CPC分类号： A46B15/00 , A46B7/023 , B08B1/002 , B08B1/02 , C23C16/4407
摘要： A cleaning carrier for in-situ cleaning of a process chamber of a material deposition tool and method for in-situ cleaning using a cleaning carrier. The cleaning carrier includes a body formed symmetrically about a central axis and having a geometry generally corresponding to the geometry of the removable wafer carrier for use with the tool, and a tool interface that facilitates mounting of the cleaning carrier body on a portion of the material deposition tool that accepts the removable wafer carrier. A set of deployable and retractable brushes are operatively coupled with the cleaning carrier body via a corresponding set of deployment and retraction mechanisms, the brushes being movable between a retracted position for handling of the cleaning carrier and a deployed position for cleaning an interior surface of the process chamber.
摘要翻译：用于原位清洁材料沉积工具的处理室的清洁载体和用于使用清洁载体进行现场清洁的方法。清洁托架包括围绕中心轴对称地形成的主体，并且具有几何形状，其大致对应于可与工具一起使用的可拆卸晶片载体的几何形状，以及便于将清洁承载体安装在材料的一部分上的工具接口接收可去除的晶片载体的沉积工具。一组可展开和可缩回的刷子经由相应的一组展开和退回机构与清洁承载体可操作地联接在一起，刷子可在用于处理清洁托架的缩回位置和用于清洁清洁承载件的内表面的展开位置之间移动处理室。

10. 发明申请

WO2009075747A1 WAFER CARRIER WITH HUB 审中-公开
标题翻译：带框架的拖车
公开(公告)号：WO2009075747A1
公开(公告)日：2009-06-18
申请号：PCT/US2008/013295
申请日：2008-12-01
申请人： VEECO INSTRUMENTS INC. , BOGUSLAVSKIY, Vadim , GURARY, Alexander, I. , MOY, Keng , ARMOUR, Eric, A.
发明人： BOGUSLAVSKIY, Vadim , GURARY, Alexander, I. , MOY, Keng , ARMOUR, Eric, A.
IPC分类号： H01L21/205 , H01L21/677
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier (30) for a rotating disc CVD reactor includes a unitary plate (32) of a ceramic such as silicon carbide defining wafer-holding features such as pockets (38) on its upstream surface (34) and also includes a hub (40) removably mounted to the plate (32) in a central region (44) of the plate (32). The hub (40) provides a secure connection to the spindle (16) of the reactor without imposing concentrated stresses on the ceramic plate (32). The hub (40) can be removed during cleaning of the plate (32). The wafer carrier (30) also preferably includes a gas flow facilitating element (348, 448) on the upstream surface (34) of the plate (32) in the central region (44) of the plate (32). The gas flow facilitating element (348, 448) helps redirect the flow of incident gases along the upstream surface (34) and away from a flow discontinuity in the central region (44).
摘要翻译：用于旋转盘CVD反应器的晶片载体（30）包括诸如碳化硅的陶瓷的整体板（32），其限定晶片保持特征，例如在其上游表面（34）上的凹穴（38），并且还包括毂 40）可移除地安装在板（32）的中心区域（44）中的板（32）上。轮毂（40）提供与反应器的主轴（16）的牢固连接，而不会在陶瓷板（32）上施加集中的应力。在清洁板（32）期间可以移除轮毂（40）。晶片载体（30）还优选地包括位于板（32）的中心区域（44）中的板（32）的上游表面（34）上的气流促进元件（348,448）。气体促进元件（348,448）有助于重新引导沿着上游表面（34）的入射气体流并远离中心区域（44）中的流动不连续。

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