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1. 发明申请

WO2009075747A1 WAFER CARRIER WITH HUB 审中-公开
标题翻译：带框架的拖车
公开(公告)号：WO2009075747A1
公开(公告)日：2009-06-18
申请号：PCT/US2008/013295
申请日：2008-12-01
申请人： VEECO INSTRUMENTS INC. , BOGUSLAVSKIY, Vadim , GURARY, Alexander, I. , MOY, Keng , ARMOUR, Eric, A.
发明人： BOGUSLAVSKIY, Vadim , GURARY, Alexander, I. , MOY, Keng , ARMOUR, Eric, A.
IPC分类号： H01L21/205 , H01L21/677
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier (30) for a rotating disc CVD reactor includes a unitary plate (32) of a ceramic such as silicon carbide defining wafer-holding features such as pockets (38) on its upstream surface (34) and also includes a hub (40) removably mounted to the plate (32) in a central region (44) of the plate (32). The hub (40) provides a secure connection to the spindle (16) of the reactor without imposing concentrated stresses on the ceramic plate (32). The hub (40) can be removed during cleaning of the plate (32). The wafer carrier (30) also preferably includes a gas flow facilitating element (348, 448) on the upstream surface (34) of the plate (32) in the central region (44) of the plate (32). The gas flow facilitating element (348, 448) helps redirect the flow of incident gases along the upstream surface (34) and away from a flow discontinuity in the central region (44).
摘要翻译：用于旋转盘CVD反应器的晶片载体（30）包括诸如碳化硅的陶瓷的整体板（32），其限定晶片保持特征，例如在其上游表面（34）上的凹穴（38），并且还包括毂 40）可移除地安装在板（32）的中心区域（44）中的板（32）上。轮毂（40）提供与反应器的主轴（16）的牢固连接，而不会在陶瓷板（32）上施加集中的应力。在清洁板（32）期间可以移除轮毂（40）。晶片载体（30）还优选地包括位于板（32）的中心区域（44）中的板（32）的上游表面（34）上的气流促进元件（348,448）。气体促进元件（348,448）有助于重新引导沿着上游表面（34）的入射气体流并远离中心区域（44）中的流动不连续。

2. 发明申请

WO2013142030A1 KEYED WAFER CARRIER 审中-公开
标题翻译：键盘拖车
公开(公告)号：WO2013142030A1
公开(公告)日：2013-09-26
申请号：PCT/US2013/028572
申请日：2013-03-01
申请人： VEECO INSTRUMENTS INC.
发明人： KRISHNAN, Sandeep , MOY, Keng , GURARY, Alexander, I. , KING, Matthew , BOGUSLAVSKIY, Vadim , KROMMENHOEK, Steven
IPC分类号： H01L21/683 , H01L21/205 , C23C16/458
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure (10) for a chemical vapor deposition reactor desirably includes a reaction chamber (12) having an interior (26), a spindle (30) mounted in the reaction chamber, and a wafer carrier (40) releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft (36) extending along a vertical rotational axis (32) and a key (80) projecting outwardly from the shaft. The wafer carrier (40) preferably has a body (40a) defining top and bottom surfaces (41, 44) and at least one wafer-holding feature (43) configured to hold a wafer (50). The wafer carrier (40) desirably further has a recess (47) extending into the body from the bottom surface (44) and a keyway (48) projecting outwardly from a periphery (104) of the recess along a transverse axis (106). The shaft 36 preferably is engaged in the recess (47) and the.key (80) preferably is engaged into the keyway (48).
摘要翻译：用于化学气相沉积反应器的结构（10）理想地包括具有内部（26），安装在反应室中的心轴（30）的反应室（12）和可释放地安装在心轴上的晶片载体（40）与其旋转。主轴期望具有沿竖直旋转轴线（32）延伸的轴（36）和从轴向外突出的键（80）。晶片载体（40）优选地具有限定顶部和底部表面（41,44）的主体（40a）和被配置为保持晶片（50）的至少一个晶片保持特征（43）。晶片载体（40）理想地还具有从底表面（44）延伸到主体中的凹部（47）和沿着横向轴线（106）从凹部的周边（104）向外突出的键槽（48）。轴36优选地接合在凹部（47）中，并且键（80）优选地接合到键槽（48）中。

3. 发明申请

WO2010065695A2 CHEMICAL VAPOR DEPOSITION FLOW INLET ELEMENTS AND METHODS 审中-公开
标题翻译：化学气相沉积流入元件和方法
公开(公告)号：WO2010065695A2
公开(公告)日：2010-06-10
申请号：PCT/US2009/066502
申请日：2009-12-03
申请人： VEECO INSTRUMENTS INC. , BELOUSOV, Mikhail , MITROVIC, Bojan , MOY, Keng
发明人： BELOUSOV, Mikhail , MITROVIC, Bojan , MOY, Keng
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： C30B25/14 , C23C16/45574 , C23C16/45578 , C23C16/4584
摘要： A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65)_ extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.
摘要翻译：用于化学气相沉积反应器（10）的流入口元件（22）由多个细长管状元件（64,65）形成，所述细长管状元件（64,65）在横向于上游到下游方向的平面中彼此并排延伸的反应器。管状元件具有用于沿下游方向喷射气体的入口。晶片载体（14）围绕上游到下游轴线旋转。气体分布元件可以提供相对于延伸穿过轴线的中间平面（108）不对称的气体分布图案。

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