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1. 发明申请

WO2010011560A2 IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 审中-公开
标题翻译：通过使用饲料进料前进和测量细胞再利用改进的方法
公开(公告)号：WO2010011560A2
公开(公告)日：2010-01-28
申请号：PCT/US2009050834
申请日：2009-07-16
申请人： KLA TENCOR CORP , ADEL MICHAEL E , POSLAVSKY LEONID , FIELDEN JOHN , MADSEN JONATHAN MICHAEL , PETERS ROBERT
发明人： ADEL MICHAEL E , POSLAVSKY LEONID , FIELDEN JOHN , MADSEN JONATHAN MICHAEL , PETERS ROBERT
IPC分类号： H01L21/66
CPC分类号： H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
摘要： Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
摘要翻译：可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。

2. 发明申请

WO2010104799A3 SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF A SPECIMEN USING RADIATION IN THE TERAHERTZ RANGE 审中-公开
标题翻译：用于确定在TERAHERTZ范围内使用辐射的样本的一个或多个特征的系统和方法
公开(公告)号：WO2010104799A3
公开(公告)日：2011-01-27
申请号：PCT/US2010026557
申请日：2010-03-08
申请人： KLA TENCOR CORP , LEVY ADY , NGAI SAMUEL , BEVIS CHRISTOPHER F , CONCINA STEFANO , FIELDEN JOHN , MIEHER WALTER , MUELLER DIETER , RICHARDSON NEIL , WACK DAN , WAGNER LARRY
发明人： LEVY ADY , NGAI SAMUEL , BEVIS CHRISTOPHER F , CONCINA STEFANO , FIELDEN JOHN , MIEHER WALTER , MUELLER DIETER , RICHARDSON NEIL , WACK DAN , WAGNER LARRY
IPC分类号： H01L21/66
CPC分类号： G01N21/9505 , G01N21/3581 , H01L22/12
摘要： Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.
摘要翻译：提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。一个系统包括被配置为用辐射照射样本的照明子系统。该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。检测到的辐射包括太赫兹范围内的辐射。另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

3. 发明申请

WO0146684A9 IN-SITU METALIZATION MONITORING USING EDDY CURRENT MEASUREMENTS AND OPTICAL MEASUREMENTS 审中-公开
标题翻译：使用EDDY电流测量和光学测量的现场金属化监测
公开(公告)号：WO0146684A9
公开(公告)日：2002-05-23
申请号：PCT/US0035358
申请日：2000-12-22
申请人： KLA TENCOR CORP , LEHMAN KURT R , LEE SHING M , JOHNSON WALT , FIELDEN JOHN , ZHAO GUOHENG , NIKOONAHAD MEHRDAD
发明人： LEHMAN KURT R , LEE SHING M , JOHNSON WALT , FIELDEN JOHN , ZHAO GUOHENG , NIKOONAHAD MEHRDAD
IPC分类号： G01B7/06 , B24B37/013 , B24B49/10 , G01B7/00 , G01B11/06 , G01N27/72
CPC分类号： B24B37/013 , B24B49/105 , G01N27/72
摘要： Disclosed is a method of obtaining information in-situ regarding a film of a sample using an eddy probe during a process for removing the film. The eddy probe has at least one sensing coil. An AC voltage is applied to the sensing coil(s) of the eddy probe. One or more first signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate the film of the sample. One or more second signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate to a reference material having a fixed composition and/or distance from the sensing coil. The first signals are calibrated based on the second signals so that undesired gain and/or phase changes within the first signals are corrected. A property value of the film is determined based on the calibrated first signals. An apparatus for performing the above described method is also disclosed. Additionally, a chemical mechanical polishing (CMP) system for polishing a sample with a polishing agent and monitoring the sample is disclosed. The CMP system includes a polishing table, a sample carrier arranged to hold the sample over the polishing table, and an eddy probe.
摘要翻译：公开了一种在除去膜的过程中使用涡流探针在原位获取样品的膜的方法。涡流探头具有至少一个感测线圈。交流电压被施加到涡流探头的感测线圈上。当感测线圈靠近样品的膜定位时，在涡流探针的感测线圈中测量一个或多个第一信号。当感测线圈靠近具有与感测线圈的固定成分和/或距离的参考材料定位时，在涡流探针的感测线圈中测量一个或多个第二信号。第一信号基于第二信号进行校准，从而校正第一信号内的不期望的增益和/或相位变化。基于校准的第一信号确定胶片的属性值。还公开了一种用于执行上述方法的装置。此外，公开了一种用抛光剂抛光样品并监测样品的化学机械抛光（CMP）系统。 CMP系统包括抛光台，布置成将样品保持在抛光台上的样品载体和涡流探针。

4. 发明申请

WO2013015940A3 LASER WITH HIGH QUALITY, STABLE OUTPUT BEAM, AND LONG LIFE HIGH CONVERSION EFFICIENCY NON-LINEAR CRYSTAL 审中-公开
标题翻译：激光器具有高品质，稳定的输出光束和长寿命高转换效率的非线性晶体
公开(公告)号：WO2013015940A3
公开(公告)日：2013-05-10
申请号：PCT/US2012044661
申请日：2012-06-28
申请人： KLA TENCOR CORP , DRIBINSKI VLADIMIR , CHUANG YUNG-HO ALEX , ARMSTRONG JOSEPH J , FIELDEN JOHN
发明人： DRIBINSKI VLADIMIR , CHUANG YUNG-HO ALEX , ARMSTRONG JOSEPH J , FIELDEN JOHN
IPC分类号： H01S3/098 , H01S3/109
CPC分类号： H01S5/0092 , C03B33/02 , C30B1/02 , C30B29/10 , C30B29/14 , C30B29/22 , C30B29/30 , C30B33/02 , G01N21/88 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2201/06113 , G01N2201/0637 , G01N2201/068 , G02F1/353 , G02F1/3551 , G02F1/3553 , G02F1/37 , G02F2001/3505 , G02F2001/3507 , G02F2001/354 , G02F2202/20 , H01S3/0092 , H01S3/10 , H01S3/10038 , H01S3/10046 , H01S3/11
摘要： A mode-locked laser system operable at low temperature can include an annealed, frequency-conversion crystal and a housing to maintain an annealed condition of the crystal during standard operation at the low temperature. In one embodiment, the crystal can have an increased length. First beam shaping optics can be configured to focus a beam from a light source to an elliptical cross section at a beam waist located in or proximate to the crystal. A harmonic separation block can divide an output from the crystal into beams of different frequencies separated in space. In one embodiment, the mode-locked laser system can further include second beam shaping optics configured to convert an elliptical cross section of the desired frequency beam into a beam with a desired aspect ratio, such as a circular cross section.
摘要翻译：可在低温下操作的锁模激光器系统可包括退火的频率转换晶体和壳体，以在低温下的标准操作期间保持晶体的退火状态。在一个实施例中，晶体可以具有增加的长度。第一光束成形光学器件可以被配置为将来自光源的光束聚焦到位于晶体中或附近的光束腰处的椭圆形横截面。谐波分离块可以将晶体的输出分成不同频率的空间分离的波束。在一个实施例中，锁模激光系统可以进一步包括第二光束成形光学器件，其被配置为将期望频率光束的椭圆截面转换为具有期望长宽比例如圆形截面的光束。

5. 发明申请

WO2013043831A3 PROCESS AWARE METROLOGY 审中-公开
标题翻译：过程技巧
公开(公告)号：WO2013043831A3
公开(公告)日：2013-05-23
申请号：PCT/US2012056272
申请日：2012-09-20
申请人： KLA TENCOR CORP , LIU XUEFENG , CHUANG YUNG-HO ALEX , FIELDEN JOHN , TSAI BIN-MING BENJAMIN , ZHANG JINGJING
发明人： LIU XUEFENG , CHUANG YUNG-HO ALEX , FIELDEN JOHN , TSAI BIN-MING BENJAMIN , ZHANG JINGJING
IPC分类号： H01L21/66
CPC分类号： G06F17/5018 , G03F7/70625 , G06F17/10 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06F2217/16 , H01L22/12 , H01L22/20
摘要： System and methods for process aware metrology are provided. The method compries the steps of selecting nominal values and one or more different values of process parameters for one or more process steps used to form the structure on the wafer, simulating one or more characteristics of the structure that would be formed on the wafer using the nominal values, generating an initial model of the structure based on results of the simulating step, simulating the one or more characteristic of the structure that would be formed on the wafer using the one or more different values as input to the initial model, translating results of both of the simulating steps into the optical model of the structure, and determining parameterization of the optical model based on how the one or more characteristics of the structure vary between at least two of the nominal values and the one or more different values.
摘要翻译：提供过程感知度量的系统和方法。该方法包括为用于在晶片上形成结构的一个或多个工艺步骤选择标称值和一个或多个不同值的工艺参数的步骤，模拟将在晶片上形成的结构的一个或多个特性，使用标称值，基于模拟步骤的结果生成结构的初始模型，使用一个或多个不同值作为初始模型的输入来模拟将在晶片上形成的结构的一个或多个特性，翻译结果两个模拟步骤进入结构的光学模型，以及基于结构的一个或多个特性如何在至少两个标称值和一个或多个不同值之间变化来确定光学模型的参数化。

6. 发明申请

WO2012134625A3 ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION 审中-公开
标题翻译：照亮计量或检验样本
公开(公告)号：WO2012134625A3
公开(公告)日：2013-03-14
申请号：PCT/US2012023205
申请日：2012-01-30
申请人： KLA TENCOR CORP , CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG , FIELDEN JOHN
发明人： CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG , FIELDEN JOHN
IPC分类号： G01N21/88 , G01N21/01
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。

7. 发明申请

WO2011106227A3 CELL FOR LIGHT SOURCE 审中-公开
标题翻译：细胞为光源
公开(公告)号：WO2011106227A3
公开(公告)日：2011-12-08
申请号：PCT/US2011025198
申请日：2011-02-17
申请人： KLA TENCOR CORP , GROSS KENNETH P , CHUANG YUNG-HO , FIELDEN JOHN
发明人： GROSS KENNETH P , CHUANG YUNG-HO , FIELDEN JOHN
IPC分类号： H01J65/00 , H01J61/16 , H01J61/30
CPC分类号： H01J61/302 , H01J61/025 , H01J61/16 , H01J61/54 , H01J61/86 , H01J65/04 , H01J65/042 , H01J65/06
摘要： A cell for a vacuum ultraviolet plasma light source, the cell having a closed sapphire tube containing at least one noble gas. Such a cell does not have a metal housing, metal-to-metal seals, or any other metal flanges or components, except for the electrodes (in some embodiments). In this manner, the cell is kept to a relatively small size, and exhibits a more uniform heating of the gas and cell than can be readily achieved with a hybridized metal/window cell design. These designs generally result in higher plasma temperatures (a brighter light source), shorter wavelength output, and lower optical noise due to fewer gas convection currents created between the hotter plasma regions and surrounding colder gases. These cells provide a greater amount of output with wavelengths in the vacuum ultraviolet range than do quartz or fused silica cells. These cells also produce continuous spectral emission well into the infrared range, making them a broadband light source.
摘要翻译：一种用于真空紫外等离子体光源的电池，该电池具有包含至少一种惰性气体的封闭的蓝宝石管。除了电极（在一些实施例中）之外，这种电池不具有金属外壳，金属对金属密封件或任何其他金属凸缘或部件。以这种方式，电池保持相对较小的尺寸，并且比用杂交金属/窗口电池设计容易实现的气体和电池表现出更均匀的加热。这些设计通常导致较高的等离子体温度（较亮的光源），较短的波长输出以及较低的光学噪声，这是由于在较热的等离子体区域和周围较冷的气体之间产生较少的气体对流电流。与石英或熔融石英单元相比，这些单元在真空紫外线范围内提供更多的输出波长。这些电池还可以在红外范围内产生连续的光谱发射，使其成为宽带光源。

8. 发明申请

WO2015147963A3 ANTI-REFLECTION LAYER FOR BACK-ILLUMINATED SENSOR 审中-公开
标题翻译：背照射传感器的防反射层
公开(公告)号：WO2015147963A3
公开(公告)日：2015-11-19
申请号：PCT/US2015010672
申请日：2015-01-08
申请人： KLA TENCOR CORP
发明人： MURAMATSU MASAHARU , SUZUKI HISANORI , YONETA YASUHITO , OTSUKA SHINYA , CHERN JEHN-HUAR HOWARD , BROWN DAVID L , CHUANG YUNG-HO ALEX , FIELDEN JOHN , IYER VENKATRAMAN
IPC分类号： H01L27/146 , H01L21/205
CPC分类号： H01L27/1462 , H01L27/1464 , H01L27/14685 , H01L27/14687
摘要： An image sensor for short-wavelength light includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane. An anti-reflection or protective layer is formed on top of the pure boron layer. This image sensor has high efficiency and good stability even under continuous use at high flux for multiple years. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor.
摘要翻译：用于短波长光的图像传感器包括半导体膜，形成在半导体膜的一个表面上的电路元件和在半导体膜的另一个表面上的纯硼层。在纯硼层的顶部形成防反射层或保护层。该图像传感器具有高效率和良好的稳定性，即使在高通量下连续使用多年。图像传感器可以使用CCD（电荷耦合器件）或CMOS（互补金属氧化物半导体）技术来制造。图像传感器可以是二维区域传感器或一维阵列传感器。

9. 发明申请

WO2006069255A2 METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATTERNED FEATURES ACROSS A WAFER 审中-公开
标题翻译：用于控制WAFER中图案特征尺寸变化的方法和系统
公开(公告)号：WO2006069255A2
公开(公告)日：2006-06-29
申请号：PCT/US2005046636
申请日：2005-12-20
申请人： KLA TENCOR TECH CORP , LEVY ADY , HANNA MICHAEL , WACK DAN , FIELDEN JOHN , BEVIS CHRISTOPHER F , WAGNER LARRY
发明人： LEVY ADY , HANNA MICHAEL , WACK DAN , FIELDEN JOHN , BEVIS CHRISTOPHER F , WAGNER LARRY
IPC分类号： G06F17/50 , G01C25/00 , G03C5/00 , H01L21/66
CPC分类号： G03F7/70675 , G03F7/38 , G03F7/40 , G03F7/70425 , G03F7/70625
摘要： Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer during a lithography process. The method also includes altering a parameter of the lithography process in response to the characteristic to reduce variation in dimensions of patterned features formed across the wafer by the lithography process. Altering the parameter compensates for non-time varying spatial variation in a temperature to which the wafer is exposed during a post exposure bake step of the lithography process and an additional variation in the post exposure bake step.
摘要翻译：提供了用于控制跨晶片的图案化特征的尺寸变化的方法和系统。一种方法包括在光刻过程期间测量跨越晶片的多于一个位置处的抗蚀剂中形成的潜像的特性。该方法还包括响应于特性来改变光刻工艺的参数，以减小通过光刻工艺在晶片上形成的图案化特征的尺寸变化。改变参数补偿在光刻工艺的后曝光烘烤步骤期间晶片曝光的温度中的非时间变化的空间变化和后曝光烘烤步骤的附加变化。

10. 发明申请

WO2005114148B1 Systems and methods for measurement or analysis ofa specimen 审中-公开
标题翻译：样品测量或分析的系统和方法
公开(公告)号：WO2005114148B1
公开(公告)日：2006-06-22
申请号：PCT/US2005016843
申请日：2005-05-13
申请人： KLA TENCOR TECH CORP , FIELDEN JOHN , JANIK GARY , LEE SHING , ZHAO QIANG , KAACK TORSTEN , YOO SUNGCHUL , TAN ZHENGQUAN
发明人： FIELDEN JOHN , JANIK GARY , LEE SHING , ZHAO QIANG , KAACK TORSTEN , YOO SUNGCHUL , TAN ZHENGQUAN
IPC分类号： G01J4/00 , G01J3/10 , G01J3/36 , G01N21/00 , G01N21/21 , G01N21/33 , G01N21/41 , G01N21/55 , G01N21/95
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N2021/213 , G01N2021/335
摘要： Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment (224). The purged environment (224) may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量或分析样品的各种系统。一个系统包括设置在净化环境（224）内的第一光学子系统。净化环境（224）可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

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