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1. 发明申请

WO2012134625A3 ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION 审中-公开
标题翻译：照亮计量或检验样本
公开(公告)号：WO2012134625A3
公开(公告)日：2013-03-14
申请号：PCT/US2012023205
申请日：2012-01-30
申请人： KLA TENCOR CORP , CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG , FIELDEN JOHN
发明人： CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG , FIELDEN JOHN
IPC分类号： G01N21/88 , G01N21/01
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。

2. 发明申请

WO2010037106A2 ILLUMINATION SUBSYSTEMS OF A METROLOGY SYSTEM, METROLOGY SYSTEMS, AND METHODS FOR ILLUMINATING A SPECIMEN FOR METROLOGY MEASUREMENTS 审中-公开
标题翻译：计量系统的照明子系统，计量系统，以及照亮计量学测量样本的方法
公开(公告)号：WO2010037106A2
公开(公告)日：2010-04-01
申请号：PCT/US2009058819
申请日：2009-09-29
申请人： KLA TENCOR CORP , CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG
发明人： CHUANG YUNG-HO ALEX , LEVINSKI VLADIMIR , LIU XUEFENG
IPC分类号： G01N21/00 , G01B11/00 , G01N21/47
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements are provided.
摘要翻译：提供了计量系统的照明子系统，计量系统以及用于照射用于计量测量的样本的方法。

3. 发明申请

WO2011028807A3 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统与方法
公开(公告)号：WO2011028807A3
公开(公告)日：2011-06-16
申请号：PCT/US2010047539
申请日：2010-09-01
申请人： KLA TENCOR CORP , KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

4. 发明申请

WO2012018673A3 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 审中-公开
标题翻译：多层叠加计量目标和综合覆盖度量度测量系统
公开(公告)号：WO2012018673A3
公开(公告)日：2012-05-18
申请号：PCT/US2011045778
申请日：2011-07-28
申请人： KLA TENCOR CORP , KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.
摘要翻译：公开了一种用于基于成像的计量学的多层覆盖目标。覆盖目标包括包括三个或更多个目标结构的多个目标结构，每个目标结构包括一组两个或多个模式元素，其中目标结构被配置为在目标结构对准时共享公共对称中心，每个目标结构目标结构相对于公共对称中心不变为N度旋转，其中N等于或大于180度，其中两个或更多个图案元素中的每一个具有单独的对称中心，其中两个或更多个图案每个目标结构的元素对于单个对称中心的M度旋转是不变的，其中M等于或大于180度。

5. 发明申请

WO2011159725A3 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A3
公开(公告)日：2012-04-26
申请号：PCT/US2011040389
申请日：2011-06-14
申请人： KLA TENCOR CORP , HILL ANDREW V , MANASSEN AMNON , KANDEL DANIEL , LEVINSKI VLADIMIR , SELIGSON JOEL , SVIZHER ALEXANDER , WANG DAVID Y , ROTTER LAWRENCE D , DE VEER JOHANNES D
发明人： HILL ANDREW V , MANASSEN AMNON , KANDEL DANIEL , LEVINSKI VLADIMIR , SELIGSON JOEL , SVIZHER ALEXANDER , WANG DAVID Y , ROTTER LAWRENCE D , DE VEER JOHANNES D
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.
摘要翻译：提供了离散极化散射法的系统和方法。一个实施例涉及一种散射仪的光学子系统。光学子系统包括被配置为产生具有不同偏振的光的一个或多个光源。光学子系统还包括偏振分束器，其被配置为将光分离成具有正交和相互排斥的极化的两个不同光束。光学子系统还包括一个或多个第二光学元件，其被配置为在测量期间控制两个不同光束中的哪一个照射晶片。光学子系统还包括被配置为分别检测由晶片的照明产生的两个不同散射光束的检测子系统。两个不同的散射光束具有正交和相互排斥的偏振。用于测量的光学子系统的所有光学表面在测量期间是静止的。

6. 发明申请

WO2007143056A2 ORDER SELECTED OVERLAY METROLOGY 审中-公开
标题翻译：订单选择重叠度量
公开(公告)号：WO2007143056A2
公开(公告)日：2007-12-13
申请号：PCT/US2007012875
申请日：2007-05-31
申请人： KLA TENCOR TECH CORP , KANDEL DANIEL , LEVINSKI VLADIMIR , ADEL MICHAEL E , SELIGSON JOEL L
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , ADEL MICHAEL E , SELIGSON JOEL L
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Disclosed are apparatus and methods for measuring a characteristic, such as overlay, of a semiconductor target. In general, order-selected imaging and/or illumination is performed while collecting an image from a target using a metrology system. In one implementation, tunable spatial modulation is provided only in the imaging path of the system. In other implementations, tunable spatial modulation is provided in both the illumination and imaging paths of the system. In a specific implementation, tunable spatial modulation is used to image side-by-side gratings with diffraction orders ±n. The side-by-side gratings may be in different layers or the same layer of a semiconductor wafer. The overlay between the structures is typically found by measuring the distance between centers symmetry of the gratings. In this embodiment, only orders ±n for a given choice of n (where n is an integer and not equal to zero) are selected, and the gratings are only imaged with these diffraction orders.
摘要翻译：公开了用于测量半导体靶的特性（例如覆盖）的装置和方法。通常，在使用度量系统从目标物收集图像的同时执行顺序选择的成像和/或照明。在一个实现中，仅在系统的成像路径中提供可调谐空间调制。在其他实施方式中，在系统的照明和成像路径中提供可调谐的空间调制。在具体实现中，可调谐空间调制用于以衍射级±n对并行光栅进行成像。并排光栅可以在不同的层或相同的半导体晶片层中。通常通过测量光栅的中心对称性之间的距离来发现结构之间的覆盖。在本实施例中，对于给定的n（其中n是整数且不等于零）的选择，仅选择±n，并且光栅仅以这些衍射级成像。

7. 发明申请

WO2006094021A3 TARGET ACQUISITION AND OVERLAY METROLOGY BASED ON IMAGING BY TWO DIFFRACTED ORDERS 审中-公开
标题翻译：基于两个差异订单成像的目标获取和覆盖度量
公开(公告)号：WO2006094021A3
公开(公告)日：2007-01-11
申请号：PCT/US2006007195
申请日：2006-02-28
申请人： KLA TENCOR TECH CORP , FROMMER AVIV , LEVINSKI VLADIMIR , SMITH MARK D , BYERS JEFFREY , MACK CHRIS A , ADEL MICHAEL E
发明人： FROMMER AVIV , LEVINSKI VLADIMIR , SMITH MARK D , BYERS JEFFREY , MACK CHRIS A , ADEL MICHAEL E
IPC分类号： G01B11/00
CPC分类号： G03F9/7049 , G03F7/70633 , G03F9/7088
摘要： A system for imaging an acquisition target or an overlay or alignment semiconductor target (404) is disclosed. The system includes a beam generator for directing at least one incident beam (402) having a wavelength lamda towards a periodic target (404) having structures with a specific pitch p. A plurality of output beams (406) are scattered from the periodic target (404) in response to the at least one incident beam (402). The system further includes an imaging lens system (410) for passing only a first and second output beam (412a, 412b) from the target (404). The imaging system is adapted such that the angular separation between the captured beams, lamda, and the pitch are selected to cause the first and second output beams (412a, 412b) to form a sinusoidal image (414). The system also includes a sensor for imaging the sinusoidal image or images (414), and a controller for causing the beam generator to direct the at least one incident beam (402) towards the periodic target or targets (404), and for analyzing the sinusoidal image or images (414).
摘要翻译：公开了一种用于对采集目标或覆盖或对准半导体目标进行成像的系统（404）。该系统包括用于将具有波长兰达的至少一个入射光束（402）朝向具有特定间距p的结构的周期性靶（404）引导的光束发生器。响应于至少一个入射光束（402），多个输出光束（406）从周期性靶标（404）散射。该系统还包括用于仅使来自目标物（404）的第一和第二输出光束（412a，412b）通过的成像透镜系统（410）。成像系统被适配成使得捕获的光束，兰达和间距之间的角度间隔被选择以使得第一和第二输出光束（412a，412b）形成正弦图像（414）。该系统还包括用于对正弦图像或图像进行成像的传感器（414），以及控制器，用于使光束发生器将至少一个入射光束（402）引向周期性目标（404），并且用于分析正弦图像或图像（414）。

8. 发明申请

WO2007053376A2 METHODS AND APPARATUS FOR DESIGNING AND USING MICRO-TARGETS IN OVERLAY METROLOGY 审中-公开
标题翻译：用于设计和使用覆盖层计量中的微目标的方法和装置
公开(公告)号：WO2007053376A2
公开(公告)日：2007-05-10
申请号：PCT/US2006041514
申请日：2006-10-23
申请人： KLA TENCOR TECH CORP , LEVINSKI VLADIMIR , ADEL MICHAEL E , FROMMER AVIV , KANDEL DANIEL
发明人： LEVINSKI VLADIMIR , ADEL MICHAEL E , FROMMER AVIV , KANDEL DANIEL
IPC分类号： H01L23/58 , H01L21/66
CPC分类号： H01L23/544 , G03F7/70633 , H01L22/12 , H01L2223/54453 , H01L2223/5448 , H01L2924/0002 , H01L2924/00
摘要： Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.
摘要翻译：用于制造包括几个目标结构的半导体管芯的方法和装置。形成第一层，其包括在第一方向上延伸的一个或多个线或沟槽结构。形成第二层，其包括在垂直于第一结构的第二方向上延伸的一个或多个线或沟槽结构，使得目标结构沿着第一方向的突起独立于第二方向和投影沿着第二方向的目标结构与第一方向无关。还描述了用于产生校准曲线的目标结构和方法。

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