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    • 2. 发明申请
    • SYSTEM AND METHOD FOR REDUCING PARTICLES IN EPITAXIAL REACTORS
    • 用于减少外源反应器中的颗粒的系统和方法
    • WO00003056A1
    • 2000-01-20
    • PCT/US1999/015070
    • 1999-06-30
    • C23C16/44C30B25/08C30B29/14H01L21/205H01L21/677C23C16/00C30B23/06
    • C30B29/14C23C16/4401C23C16/4408C30B25/08Y10S414/139
    • An apparatus and method for reducing particles in reactors. The apparatus (10) includes an enclosure for processing the semiconductor wafers. The enclosure has a wafer handling chamber (16) connected by an isolation gate valve (18) to a processing chamber (20). Additionally, the apparatus includes: pipes (24, 26) for delivering a purge gas into the wafer handling chamber (16); a pilot operated back pressure regulator (40) for regulating the delivery and removal of the purge gas from the enclosure for reducing disturbances from the purge gas entering into the enclosure; a flow regulated Bernoulli wand (36) for lifting and holding a single wafer; ionizers (21a-21d) in the purge gas lines entering the wafer handling chamber and load locks for ionizing the purged gas molecules, the ionized gas discharges all the static inside the semiconductor equipment and prevents the wafer from attracting charged particles; and means for reducing gas flow turbulence when switching valves within the reactor.
    • 用于还原反应器中的颗粒的装置和方法。 装置(10)包括用于处理半导体晶片的外壳。 外壳具有通过隔离闸阀(18)连接到处理室(20)的晶片处理室(16)。 另外,该装置包括:用于将净化气体输送到晶片处理室(16)中的管道(24,26)。 一个先导操作的背压调节器(40),用于调节来自外壳的吹扫气体的传送和移除,以减少进入外壳的吹扫气体的干扰; 用于提升和保持单个晶片的流动调节伯努利棒(36) 进入晶片处理室的净化气体管线中的电离器(21a-21d)和用于电离被清除气体分子的负载锁定器,离子化气体将半导体设备内的所有静电放出,并防止晶片吸引带电粒子; 以及当在反应器内切换阀时减少气流湍流的装置。
    • 3. 发明申请
    • FABRICATION OF AN INVERTEDLY POLED DOMAIN STRUCTURE FROM A FERROELECTRIC CRYSTAL
    • 来自电磁晶体的反相结构域结构的制造
    • WO98036109A1
    • 1998-08-20
    • PCT/IL1998/000054
    • 1998-02-04
    • C30B30/00C30B30/02G02F1/355C30B29/24C30B29/30
    • G02F1/3558C30B29/14C30B29/30C30B30/00C30B30/02
    • A method of fabricating an invertedly poled domain structure having alternating sections of opposited electric polarities, from a ferroelectric crystal wafer (1) having two opposite polar surfaces, comprises patterning at least one of the two polar surfaces of the wafer to comprise a plurality of alternating discrete regions, of which first regions are adapted for and second regions are protected from the direct application thereto of an electric contact; applying to both polar surfaces of the wafer electrically conducting electrodes (10 and 11) so that the first regions are in direct contact with the electrodes and the second regions are protected from such a contact; and applying to the electrodes an electrical field (20) of the intensity E. The electrical field is applied to the wafer at a working temperature by heater/cooler (15).
    • 从具有两个相反极性表面的铁电晶体晶片(1)制造具有相对电极性交替部分的反极化畴结构的方法包括使晶片的两个极性表面中的至少一个构图包括多个交替 离开区域,其第一区域适于和第二区域被保护免受电接触的直接应用; 施加到晶片导电电极(10和11)的两个极性表面,使得第一区域与电极直接接触,并且第二区域被保护免受这种接触; 并向电极施加强度为E的电场(20)。电场通过加热器/冷却器(15)在工作温度下施加到晶片。
    • 4. 发明申请
    • METHOD FOR GROWING MONOCRYSTALS OF KTiOPO4
    • 用于生长KTiOPO4单晶的方法
    • WO1993015242A1
    • 1993-08-05
    • PCT/RU1992000012
    • 1992-01-23
    • MOSKOVSKOE GOSUDARSTVENNO-KOOPERATIVNOE ...TSYGANKOV, Sergei Viktorovich
    • MOSKOVSKOE GOSUDARSTVENNO-KOOPERATIVNOE ...
    • C30B09/06
    • C30B15/00C30B29/14
    • A method for growing a monocrystal of KTiOPO4 from a melt solution consists in heating the system K2O-TiO2-P2O5 up to a temperature of 900 - 1100 DEG C. The ratio of said components in mole per cent is the following: 40 - 50 : 19 - 33.5 : 26.5 - 33.5, respectively. The temperature on the surface of this solution is maintained 5-8 DEG lower than that at the depth of 2-2.5 cm and the solution is cooled down to saturation on the surface. Then at the depth of 1 mm of the solution a seed crystal is introduced, oriented by one of its axes at right angles to the surface of the solution. After that the solution is further cooled down by 10 - 30 DEG C at the rate of 5 DEG C per hour with subsequent raising of the crystal from the solution at the speed of 1-5 mm every 24 hours while maintaining the said rate of cooling of the solution.
    • 从熔体溶液中生长KTiOPO4的单晶的方法包括将系统K 2 O-TiO 2 -P 2 O 5加热至900-111℃的温度。所述组分的摩尔百分比如下:40-50: 分别为19 - 33.5:26.5 - 33.5。 该溶液表面的温度比深度为2-2.5cm的温度低5-8℃,溶液冷却至表面饱和。 然后在溶液的1mm的深度处引入晶种,其一个轴线与溶液表面成直角定向。 之后,溶液以5℃/小时的速度进一步冷却10-30℃,随后每24小时以1-5mm的速度从溶液中升高晶体,同时保持所述冷却速率 的解决方案。
    • 6. 发明申请
    • DEVICE FOR ISOLATION OF SEED CRYSTALS DURING PROCESSING OF SOLUTION
    • 在溶液加工过程中分离种子晶体的装置
    • WO99009236A1
    • 1999-02-25
    • PCT/US1998/017005
    • 1998-08-18
    • C30B7/00C30B9/00C30B29/14
    • C30B29/14C30B7/08Y10T117/1024
    • A device for isolation of seed crystals during processing of solutions. The device enables a seed crystal to be introduced into the solution without exposing the solution to contaminants or to sources of drying and cooling. The device constitutes a seed protector which allows the seed to be present in the growth solution during filtration and overheating operations while at the same time preventing the seed from being dissolved by the under saturated solution. When the solution processing has been completed and the solution cooled to near the saturation point, the seed protector is opened, exposing the seed to the solution and allowing growth to begin.
    • 用于在处理溶液期间分离晶种的装置。 该装置能够将晶种引入溶液中而不将溶液暴露于污染物或干燥和冷却来源。 该装置构成种子保护器,其允许种子在过滤和过热操作期间存在于生长溶液中,同时防止种子被饱和溶液溶解。 当溶液处理完成并且溶液冷却到接近饱和点时,种子保护剂打开,将种子暴露于溶液中并允许生长开始。
    • 10. 发明申请
    • DEVICE FOR CRYSTAL GROWTH AT INTERMEDIATE TEMPERATURES USING CONTROLLED SEMI-ACTIVE COOLING
    • 使用受控半主动冷却的中间温度下晶体生长的装置
    • WO2011092599A1
    • 2011-08-04
    • PCT/IB2011/000385
    • 2011-01-29
    • KRAUTTER, Michael
    • KRAUTTER, Michael
    • C30B7/08B01F7/00C30B35/00
    • C30B7/08B01F13/0827B01F13/0872C30B29/14C30B35/00Y10T117/1008
    • A crystal growing cell which has computerized temperature control and agitation means to inhibit crystal nucleation. The temperature is controlled semi-actively, i.e., by monitoring the temperature with a thermistor and balancing ambient heat loss with heat added to the system by heating resistors or heating elements. When the chemical is completely dissolved by heating the mixture to a temperature above the saturation temperature, the temperature is lowered. At the saturation temperature the temperature is initially reduced slowly to avoid crystal nucleation. The saturation temperature of the initial solution is selected to be at an intermediate temperature which is high enough that the amount of dissolved material is large enough to produce a large crystal or large crystal clusters, yet not so high that the solubility curve has a large slope and therefore requires a high degree of temperature control to avoid crystal nucleation in the solution. Use of the cell with a variety of chemical solutions, each having the same saturation temperature, facilitates optimization while maintaining a simple, low cost design.
    • 具有计算机化的温度控制和搅拌的晶体生长池意味着抑制晶体成核。 半主动地控制温度,即通过用热敏电阻监测温度,并通过加热电阻或加热元件平衡环境热损失与加入系统的热量。 当化学品通过将混合物加热至高于饱和温度的温度完全溶解时,温度降低。 在饱和温度下,温度最初缓慢降低以避免晶体成核。 初始溶液的饱和温度选择为足够高的中间温度,使得溶解的材料的量足够大以产生大的晶体或大的晶体簇,但不太高,使得溶解度曲线具有大的斜率 因此需要高度的温度控制以避免溶液中的晶体成核。 使用具有各种具有相同饱和温度的各种化学溶液的电池便于优化,同时保持简单,低成本的设计。