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1. 发明申请

WO2016128560A2 VACUUM PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
标题翻译：真空处理系统及其方法
公开(公告)号：WO2016128560A2
公开(公告)日：2016-08-18
申请号：PCT/EP2016/053060
申请日：2016-02-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
CPC分类号： C23C14/562 , C23C16/345 , C23C16/401 , C23C16/45589 , C23C16/511 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate is provided. The vacuum processing system (100) includes a first chamber (110) adapted for housing a supply roll (111) for providing the flexible substrate; a second chamber (120) adapted for housing a take-up roll (121) for storing the flexible substrate (160) after processing; a substrate transport arrangement including one or more guide rollers (104) for guiding the flexible substrate from the first chamber (110) to the second chamber (120); a maintenance zone (130) between the first chamber (110) and the second chamber (120) wherein the maintenance zone (130) allows for maintenance access to or of at least one of the first chamber (110) and the second chamber (120); and a first process chamber (140) for processing the flexible substrate (10).
摘要翻译：提供了一种用于柔性基板的真空处理系统（100）。真空处理系统（100）包括适于容纳供应辊（111）以提供柔性基板的第一腔室（110）第二室（120），其适于容纳用于在处理之后存储柔性衬底（160）的卷取辊（121）; 基板传送装置，其包括用于将所述柔性基板从所述第一腔室（110）引导到所述第二腔室（120）的一个或多个引导辊（104）; 在第一室（110）和第二室（120）之间的维护区（130），其中维护区（130）允许维护进入第一室（110）和第二室（120）中的至少一个或从第一室）; 和用于处理柔性衬底（10）的第一处理室（140）。

2. 发明申请

WO2015149869A1 APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR CLEANING A PROCESSING CHAMBER THEREOF 审中-公开
标题翻译：用于处理柔性基板的装置及其处理室的清洁方法
公开(公告)号：WO2015149869A1
公开(公告)日：2015-10-08
申请号：PCT/EP2014/056826
申请日：2014-04-04
申请人： APPLIED MATERIALS, INC. , RIES, Florian , SAUER, Andreas , MORRISON, Neil , STOLLEY, Tobias
发明人： RIES, Florian , SAUER, Andreas , MORRISON, Neil , STOLLEY, Tobias
IPC分类号： C23C16/54 , C23C14/56 , C23C16/44
CPC分类号： C23C16/545 , C23C14/562 , C23C14/564 , C23C16/4405
摘要： According to the present disclosure, an apparatus for processing a flexible substrate is provided. The apparatus includes a processing chamber, a coating drum (110) in the processing chamber and configured to support the flexible substrate, one or more deposition sources arranged in the processing chamber, and a shutter device(200) provided within the processing chamber and configured to move a shielding foil (300) between the coating drum and the one or more deposition sources.
摘要翻译：根据本公开，提供了一种用于处理柔性基板的装置。该设备包括处理室，处理室中的涂覆滚筒（110）并且被配置为支撑柔性基板，布置在处理室中的一个或多个沉积源和设置在处理室内的快门装置（200）以在涂布滚筒和一个或多个沉积源之间移动屏蔽箔（300）。

3. 发明申请

WO2014154692A1 DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：用于柔性基板的沉积平台及其操作方法
公开(公告)号：WO2014154692A1
公开(公告)日：2014-10-02
申请号：PCT/EP2014/055967
申请日：2014-03-25
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , MORRISON, Neil
发明人： DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , MORRISON, Neil
IPC分类号： C23C16/54 , C23C14/56 , C23C16/509 , C23C16/455
CPC分类号： C23C16/545 , C23C14/562 , C23C16/44 , C23C16/4409 , C23C16/45519 , C23C16/509
摘要： An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate having the thin film deposited thereon, wherein the unwinding shaft and the winding shaft are arranged in the first chamber portion, at least one gap sluice for separating the first chamber portion from the second chamber portion, wherein the gap sluice is configured such that the flexible substrate can move there through and the gap sluice can be opened and closed for providing a vacuum seal, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion for providing a vacuum connection. Further, the third chamber portion has a convex shaped chamber wall portion, wherein the third chamber portion has at least two openings provided therein, particularly wherein the at least two openings are essentially parallel to the convex shaped chamber wall portion; and wherein the first processing station and the at least one second processing station are configured to be received in the at least two openings, wherein the flange portions of the first processing station and the second processing station provide a vacuum tight connection with the third chamber.
摘要翻译：描述了一种用于处理柔性基板的装置。该装置包括具有第一室部分，第二室部分和第三室部分的真空室，用于支撑要处理的柔性基板的退绕轴和支撑其上沉积有薄膜的柔性基板的卷绕轴，其中，退绕轴和卷绕轴布置在第一室部分中，至少一个间隙闸道用于将第一室部分与第二室部分分离，其中间隙闸门构造成使得柔性基板可以在那里移动并且间隙闸门可以打开和关闭以提供真空密封，具有旋转轴线和弯曲外表面的涂布滚筒，用于通过第一真空处理区域和至少一个第二真空处理区域沿着弯曲的外表面引导基板，其中第一涂布滚筒的一部分设置在第二室部分中，涂布滚筒的其余部分是pr 在第三室部分中排出第一处理站，对应于第一处理区域的第一处理站和对应于至少一个第二真空处理区域的至少一个第二处理站，其中第一处理站和第二处理站各自包括凸缘部分用于提供真空连接。此外，第三室部分具有凸形室壁部分，其中第三室部分具有设置在其中的至少两个开口，特别是其中至少两个开口基本上平行于凸形室壁部分; 并且其中所述第一处理站和所述至少一个第二处理站被配置为被接收在所述至少两个开口中，其中所述第一处理站和所述第二处理站的所述凸缘部分与所述第三室提供真空密封连接。

4. 发明申请

WO2014118062A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：通用沉积平台，加工站及其操作方法
公开(公告)号：WO2014118062A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051259
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C16/455 , C23C16/54 , H01J37/32 , H05H1/24
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括一个基板支架，该基板支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿基板支撑件的表面引导基板，对应于第一处理区域的第一沉积源和至少一个第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理气体出口，其中处理气体入口和处理气体出口布置在电极表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口至少设置在电极的表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极表面之间。该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

5. 发明申请

WO2015007858A1 CLEANING METHOD FOR THIN-FILM PROCESSING APPLICATIONS AND APPARATUS FOR USE THEREIN 审中-公开
标题翻译：薄膜加工应用的清洗方法及其使用的装置
公开(公告)号：WO2015007858A1
公开(公告)日：2015-01-22
申请号：PCT/EP2014/065424
申请日：2014-07-17
申请人： APPLIED MATERIALS, INC. , RIES, Florian , HEIN, Stefan , LORENZ, Stefan , MORRISON, Neil , STOLLEY, Tobias
发明人： RIES, Florian , HEIN, Stefan , LORENZ, Stefan , MORRISON, Neil , STOLLEY, Tobias
IPC分类号： H01J37/32
CPC分类号： C23C16/4405 , H01J37/3277 , H01J37/32862 , Y10T428/18 , Y10T428/192
摘要： According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding the sacrificial foil out of the processing chamber.
摘要翻译：根据本公开，提供了一种用于清洁柔性基板处理设备的处理室而不破坏处理室中的真空的方法。用于清洁处理室的方法包括将牺牲箔引导到处理室中; 在处理室中启动第一泵过程; 等离子体清洁处理室，同时牺牲箔设置在处理室中; 在处理室中启动第二泵过程; 并将牺牲箔引导出处理室。

6. 发明申请

WO2014118063A1 GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
标题翻译：通过可调隔离壁进行气体分离
公开(公告)号：WO2014118063A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051261
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/458 , C23C14/562 , C23C16/45519 , C23C16/545 , H01J37/32449 , H01J37/32513 , H01J37/32761 , H01J37/3277 , Y10T29/49826
摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.
摘要翻译：描述了在柔性基板上涂覆薄膜的装置。该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通气体分离单元的位置。

7. 发明申请

WO2013091694A1 SYSTEM AND METHODS FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：用于处理基板的系统和方法
公开(公告)号：WO2013091694A1
公开(公告)日：2013-06-27
申请号：PCT/EP2011/073634
申请日：2011-12-21
申请人： APPLIED MATERIALS, INC. , HERMANNS, Uwe , MORRISON, Neil , STOLLEY, Tobias , HACKER, Volker
发明人： HERMANNS, Uwe , MORRISON, Neil , STOLLEY, Tobias , HACKER, Volker
IPC分类号： C23C14/54 , C23C14/56 , C23C16/44 , C23C16/52 , C23C16/54
CPC分类号： C23C16/503 , C23C14/54 , C23C14/562 , C23C14/564 , C23C16/4401 , C23C16/52 , C23C16/545
摘要： According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.
摘要翻译：根据本公开，一种用于处理包括真空室的柔性基板的基板处理装置，所述真空室被构造成被抽真空并且被配置为具有设置在其中的处理气体;处理模块，其适于处理柔性基板，其中提供处理模块并且设置有用于产生带电粒子流以排出柔性基板的排出组件。放电组件被配置为产生用于电离处理气体的电场。

8. 发明申请

WO2020078556A1 RADIATION DEVICE, DEPOSITION APPARATUS FOR DEPOSITING A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2020078556A1
公开(公告)日：2020-04-23
申请号：PCT/EP2018/078596
申请日：2018-10-18
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , PIERALISI, Fabio , BRAUNGER, Steffen , MORRISON, Neil , STOLLEY, Tobias , ALT, Horst , STEINIGER, Gerhard
发明人： DIEGUEZ-CAMPO, Jose Manuel , PIERALISI, Fabio , BRAUNGER, Steffen , MORRISON, Neil , STOLLEY, Tobias , ALT, Horst , STEINIGER, Gerhard
IPC分类号： H01L21/67
摘要： A radiation device (200) including a hollow body and a cooling device (246) arranged within the hollow body (250) is provided.

9. 发明申请

WO2018130300A1 LAYER SYSTEM ADAPTED FOR USE IN AN ELECTRO-OPTICAL DEVICE AND METHOD FOR MANUFACTURING A LAYER SYSTEM IN A CONTINUOUS ROLL-TO-ROLL PROCESS 审中-公开
公开(公告)号：WO2018130300A1
公开(公告)日：2018-07-19
申请号：PCT/EP2017/050692
申请日：2017-01-13
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , HEIN, Stefan , STOLLEY, Tobias
IPC分类号： C23C16/02 , C23C16/40 , C23C16/54 , C23C28/04 , G06F3/044 , H01L51/50
摘要： A layer system (100) adapted for use in an electro-optical device is described. The layer system includes a flexible substrate (101), a planarization layer (110) provided on the flexible substrate (101), and a transparent conductive oxide layer (120) provided on the planarization layer (110), wherein the planarization layer (110) is configured to encapsulate defects on the flexible substrate (101), and wherein the planarization layer is configured to covalently bind to the surface of the flexible substrate.

10. 发明申请

WO2015172847A1 BARRIER LAYER STACK, METHOD FOR MANUFACTURING A BARRIER LAYER STACK, AND ULTRA-HIGH BARRIER LAYER AND ANTIREFLECTION SYSTEM 审中-公开
标题翻译：障碍层堆叠，制造障碍层堆叠的方法和超高阻隔层和抗反射系统
公开(公告)号：WO2015172847A1
公开(公告)日：2015-11-19
申请号：PCT/EP2014/060134
申请日：2014-05-16
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , STOLLEY, Tobias
发明人： LOTZ, Hans-Georg , MORRISON, Neil , STOLLEY, Tobias
IPC分类号： H01L51/52
CPC分类号： H01L51/5256
摘要： A barrier layer stack is provided. The barrier layer stack (10, 20, 30, 40) includes a first layer (11), a second layer (12), a third layer (13) and a fourth layer (14) arranged in this order. The first layer (11) and the third layer (13) have a refractive index of at least 1.9, and the second layer (12) and the fourth layer (14) have a refractive index of less than 1.7. Each of the layers (11-14) has a thickness of at least 70 nm.
摘要翻译：提供了阻挡层堆叠。阻挡层叠层（10,20,30,40）包括依次布置的第一层（11），第二层（12），第三层（13）和第四层（14）。第一层（11）和第三层（13）的折射率至少为1.9，第二层（12）和第四层（14）的折射率小于1.7。层（11-14）中的每一个具有至少70nm的厚度。

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