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1. 发明申请

WO2016128560A2 VACUUM PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
标题翻译：真空处理系统及其方法
公开(公告)号：WO2016128560A2
公开(公告)日：2016-08-18
申请号：PCT/EP2016/053060
申请日：2016-02-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
CPC分类号： C23C14/562 , C23C16/345 , C23C16/401 , C23C16/45589 , C23C16/511 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate is provided. The vacuum processing system (100) includes a first chamber (110) adapted for housing a supply roll (111) for providing the flexible substrate; a second chamber (120) adapted for housing a take-up roll (121) for storing the flexible substrate (160) after processing; a substrate transport arrangement including one or more guide rollers (104) for guiding the flexible substrate from the first chamber (110) to the second chamber (120); a maintenance zone (130) between the first chamber (110) and the second chamber (120) wherein the maintenance zone (130) allows for maintenance access to or of at least one of the first chamber (110) and the second chamber (120); and a first process chamber (140) for processing the flexible substrate (10).
摘要翻译：提供了一种用于柔性基板的真空处理系统（100）。真空处理系统（100）包括适于容纳供应辊（111）以提供柔性基板的第一腔室（110）第二室（120），其适于容纳用于在处理之后存储柔性衬底（160）的卷取辊（121）; 基板传送装置，其包括用于将所述柔性基板从所述第一腔室（110）引导到所述第二腔室（120）的一个或多个引导辊（104）; 在第一室（110）和第二室（120）之间的维护区（130），其中维护区（130）允许维护进入第一室（110）和第二室（120）中的至少一个或从第一室）; 和用于处理柔性衬底（10）的第一处理室（140）。

2. 发明申请

WO2014118062A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：通用沉积平台，加工站及其操作方法
公开(公告)号：WO2014118062A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051259
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C16/455 , C23C16/54 , H01J37/32 , H05H1/24
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source includes: an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support, a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, and at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at one of opposing sides of the surface of the electrode such that the processing gas inlet and/or the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括一个基板支架，该基板支撑件具有外表面，用于通过第一真空处理区域和至少一个第二真空处理区域沿基板支撑件的表面引导基板，对应于第一处理区域的第一沉积源和至少一个第二沉积源对应于所述至少一个第二真空处理区域，其中至少所述第一沉积源包括：具有表面的电极，其中所述电极的表面与所述基板支撑件的表面相对，处理气体入口和处理气体出口，其中处理气体入口和处理气体出口布置在电极表面的相对侧，以及至少一个具有一个或多个分离气体入口的分离气体入口，其中一个或多个分离气体入口至少设置在电极的表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在一个或多个分离气体入口与电极表面之间。该装置还包括一个或多个真空凸缘，其在第一沉积源和至少一个第二沉积源之间提供至少另外的气体出口。

3. 发明申请

WO2014118063A1 GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
标题翻译：通过可调隔离壁进行气体分离
公开(公告)号：WO2014118063A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051261
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
发明人： LOTZ, Hans-Georg , MORRISON, Neil , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , STOLLEY, Tobias , HEIN, Stefan , RIES, Florian , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/458 , C23C14/562 , C23C16/45519 , C23C16/545 , H01J37/32449 , H01J37/32513 , H01J37/32761 , H01J37/3277 , Y10T29/49826
摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.
摘要翻译：描述了在柔性基板上涂覆薄膜的装置。该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通气体分离单元的位置。

4. 发明申请

WO2014118177A1 DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE 审中-公开
标题翻译：具有可调节电极的沉积源
公开(公告)号：WO2014118177A1
公开(公告)日：2014-08-07
申请号：PCT/EP2014/051632
申请日：2014-01-28
申请人： APPLIED MATERIALS INC. , BUSCHBECK, Wolfgang , RIES, Florian , STOLLEY, Tobias
发明人： BUSCHBECK, Wolfgang , RIES, Florian , STOLLEY, Tobias
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C16/52 , C23C14/562 , H01J37/32568 , H01J37/3277
摘要： An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.
摘要翻译：描述了一种在衬底上沉积薄膜的装置。该装置包括具有用于引导基板通过真空处理区域的外表面的基板支撑件，用于在真空处理区域中将薄膜沉积在基板上的等离子体沉积源，其中等离子体沉积源包括电极和致动器被配置为调节电极和外表面之间的距离。

5. 发明申请

WO2019007515A1 APPARATUS AND METHOD FOR HOLDING A SUBSTRATE 审中-公开
公开(公告)号：WO2019007515A1
公开(公告)日：2019-01-10
申请号：PCT/EP2017/066979
申请日：2017-07-06
申请人： APPLIED MATERIALS, INC. , SCHULTHEIS, Michael Rainer , LOPP, Andreas , BUSCHBECK, Wolfgang , HENRICH, Jürgen , BANGERT, Stefan
发明人： SCHULTHEIS, Michael Rainer , LOPP, Andreas , BUSCHBECK, Wolfgang , HENRICH, Jürgen , BANGERT, Stefan
IPC分类号： C23C14/04 , H01L21/683
摘要： The present disclosure provides an apparatus (100) for holding a substrate (10) or a mask in a vacuum deposition process. The apparatus (100) includes one or more first electrodes and one or more second electrodes connectable to a first power assembly (230) and one or more third electrodes arranged between the one or more first electrodes and the one or more second electrodes and connectable to a second power assembly (240).

6. 发明申请

WO2017140384A1 METHOD OF EXAMINING A GAS SEPARATION QUALITY OF A GAS SEPARATION PASSAGE IN A VACUUM CHAMBER, AND VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空室内气体分离通道的气体分离质量检测方法及真空处理装置
公开(公告)号：WO2017140384A1
公开(公告)日：2017-08-24
申请号：PCT/EP2016/053606
申请日：2016-02-19
申请人： APPLIED MATERIALS, INC. , BUSCHBECK, Wolfgang , HENRICH, Jürgen , GEBELE, Thomas
发明人： BUSCHBECK, Wolfgang , HENRICH, Jürgen , GEBELE, Thomas
IPC分类号： C23C14/56 , C23C16/44 , C23C16/54
CPC分类号： C23C14/562 , C23C14/564 , C23C14/568 , C23C16/4401 , C23C16/54 , C23C16/545
摘要： According to one aspect of the present disclosure, a method of examining a gas separation quality of a gas separation passage (20) extending between a first vacuum processing region (10) and at least one second vacuum processing region (12) in a vacuum chamber (2) is provided, wherein the gas separation passage (20) is configured as a passageway for a substrate while reducing a gas flow from the first vacuum processing region (10) into the at least one second vacuum processing region (12). The method comprises: introducing a test gas (31) into the first vacuum processing region (10); and measuring a first content (33) of the test gas in a background gas in the at least one second vacuum processing region (12). According to a second aspect, a vacuum processing apparatus (1) and a vacuum deposition apparatus (100, 500) for performing the method are provided.
摘要翻译：根据本公开的一个方面，一种检查在第一真空处理区域（10）与至少一个第二真空处理区域（10）之间延伸的气体分离通路（20）的气体分离质量的方法，其中，所述气体分离通路（20）构成为用于基板的通路，同时减少从所述第一真空处理区域（10）流入所述至少一个第二真空处理区域真空处理区域（12）。该方法包括：将测试气体（31）引入到第一真空处理区域（10）中; 以及测量所述至少一个第二真空处理区域（12）中的背景气体中的测试气体的第一含量（33）。根据第二方面，提供了一种用于执行该方法的真空处理设备（1）和真空沉积设备（100,500）。

7. 发明申请

WO2016034250A1 MULTIPLE USE CRYO COOLER IN VACUUM PROCESSING SYSTEMS 审中-公开
标题翻译：在真空加工系统中多用CRYO冷却器
公开(公告)号：WO2016034250A1
公开(公告)日：2016-03-10
申请号：PCT/EP2014/068978
申请日：2014-09-05
申请人： APPLIED MATERIALS, INC. , BUSCHBECK, Wolfgang , HENRICH, Jürgen
发明人： BUSCHBECK, Wolfgang , HENRICH, Jürgen
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C14/564 , F04B37/08 , H01J37/32522 , H01J37/3277
摘要： A processing apparatus for processing a substrate is described. The processing apparatus includes a processing chamber for depositing a material on a flexible substrate, a winding chamber for guiding the flexible substrate into and out of the processing chamber, a cryo chiller and a cryo surface connected to the cryo chiller, wherein the cryo surface comprises a first active pumping surface in the processing chamber and a second active pumping surface in the winding chamber. Moreover, the processing chamber and the winding chamber are provided in a vacuum housing, and wherein a roller arrangement for guiding the flexible substrate is insertable in and withdrawable out of the vacuum housing, particularly wherein the roller arrangement provided separates the processing chamber from the winding chamber. Furthermore, the first active pumping surface and the second active pumping surface are connected to the cryo chiller in series.
摘要翻译：描述了一种用于处理衬底的处理设备。处理装置包括用于将材料沉积在柔性基板上的处理室，用于将柔性基板引导进出处理室的卷绕室，连接到冷冻冷冻机的低温冷却器和冷冻表面，其中冷冻表面包括处理室中的第一主动泵送表面和卷绕室中的第二主动泵送表面。此外，处理室和卷绕室设置在真空壳体中，并且其中用于引导柔性基板的辊装置可插入和抽出真空壳体，特别是其中所提供的辊布置将处理室与绕组分离室。此外，第一主动泵送表面和第二主动泵送表面串联连接到冷冻机组。

8. 发明申请

WO2019101319A1 SUBSTRATE CARRIER FOR SUPPORTING A SUBSTRATE, MASK CHUCKING APPARATUS, VACUUM PROCESSING SYSTEM, AND METHOD OF OPERATING A SUBSTRATE CARRIER 审中-公开
公开(公告)号：WO2019101319A1
公开(公告)日：2019-05-31
申请号：PCT/EP2017/080238
申请日：2017-11-23
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , SCHULTHEIS, Michael Rainer , BUSCHBECK, Wolfgang , LOPP, Andreas , HEYMANNS, Matthias , ZANG, Sebastian Gunther
发明人： SAUER, Andreas , SCHULTHEIS, Michael Rainer , BUSCHBECK, Wolfgang , LOPP, Andreas , HEYMANNS, Matthias , ZANG, Sebastian Gunther
IPC分类号： H01L21/677
摘要： The present disclosure provides a substrate carrier for supporting a substrate in a vacuum chamber, a mask chucking apparatus, a vacuum processing system and a method for operating an electropermanent magnet element according to the independent claims are provided. According to an aspect of the present disclosure, a substrate carrier for supporting a substrate in a vacuum chamber is provided. The substrate carrier comprises an electropermanent magnet element, wherein the electropermanent magnet element is configured for applying a magnetic holding force to a mask. According to another aspect of the present disclosure, a vacuum processing system is provided. The vacuum processing system comprises a vacuum processing chamber having at least a substrate carrier or a mask chucking apparatus according to other aspects of the present disclosure. According to a further aspect of the present disclosure, a method for operating an electropermanent magnet element in a system including the electropermanent magnet element is provided. The method includes providing a mask carrier over a surface of a substrate being supported by the substrate carrier, switching the electropermanent magnet element from a non-magnetized state to a magnetized state by applying an electrical current of an electromagnet, and removing the electrical current.

9. 发明申请

WO2017207053A1 GUIDING DEVICES AND WEB COATING PROCESS 审中-公开
标题翻译：指导设备和网涂工艺
公开(公告)号：WO2017207053A1
公开(公告)日：2017-12-07
申请号：PCT/EP2016/062539
申请日：2016-06-02
申请人： APPLIED MATERIALS, INC. , METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
发明人： METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , B65H23/00
CPC分类号： C23C14/562 , B65H20/14 , B65H2406/361 , B65H2801/87
摘要： A roller device (100) for guiding a web (200) and for controlling the temperature of the web (200) in contact with the roller device in a web coating process under vacuum conditions is described. The roller device includes a curved surface (101) of the roller device (100) for contacting the web (200), wherein the curved surface (101) includes a web guiding region (103). The roller device further includes a group of gas outlets (104) in the curved surface (101) and a gas distribution system (105) for selectively providing the gas flow to a first subgroup of gas outlets (104) and for selectively preventing the gas from flowing to a second subgroup of the gas outlets (104). The roller device further includes a driving unit (110) for rotating the curved surface (101), wherein the curved surface (101) is adapted for inducing a movement of the web (200) upon rotation of the curved surface.
摘要翻译：描述了用于在真空条件下在幅材涂布工艺中引导幅材（200）并且用于控制幅材（200）与辊子设备接触的温度的辊子装置（100）。滚轮装置包括用于接触腹板（200）的滚轮装置（100）的弯曲表面（101），其中弯曲表面（101）包括腹板引导区域（103）。该滚轮装置还包括在弯曲表面（101）中的一组气体出口（104）和用于选择性地将气流提供给第一组气体出口（104）并用于选择性地防止气体从流动到气体出口（104）的第二子组。所述滚轮装置还包括用于旋转所述弯曲表面（101）的驱动单元（110），其中所述弯曲表面（101）适于在所述弯曲表面旋转时引起所述腹板（200）的移动。

10. 发明申请

WO2022089737A1 DEPOSITION SOURCE, DEPOSITION APPARATUS FOR DEPOSITING EVAPORATED MATERIAL, AND METHODS THEREFOR 审中-公开
公开(公告)号：WO2022089737A1
公开(公告)日：2022-05-05
申请号：PCT/EP2020/080294
申请日：2020-10-28
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , WOLFF, Susanne , BUSCHBECK, Wolfgang
发明人： SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , WOLFF, Susanne , BUSCHBECK, Wolfgang
IPC分类号： C23C14/24 , C23C14/56 , H01L51/00
摘要： According to aspects of the present disclosure, a deposition source, a deposition apparatus, and methods for depositing a layer of evaporated material on a substrate are provided. The deposition source (100) includes a crucible (104) for providing evaporated material, a first nozzle zone (110) extending in a first direction and having a first plurality of nozzles (101) in communication with the crucible (104), and a second nozzle zone (120) extending in the first direction from an end of the first nozzle zone (110), the second nozzle zone (120) having a second plurality of nozzles (102) in communication with the crucible (104), wherein each neighbouring nozzle of the second plurality of nozzles (102) is tilted in a direction towards the first nozzle zone. The deposition apparatus (200) includes a vacuum chamber (201), a deposition source (100) according to aspects of the present disclosure, and a substrate transport for transporting the substrate S past the deposition source (100), or a source transport for transporting the deposition source (100) past the substrate S.

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