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1. 发明申请

WO2008076601A1 DETERMINING PHYSICAL PROPERTY OF SUBSTRATE 审中-公开
标题翻译：确定基材的物理性质
公开(公告)号：WO2008076601A1
公开(公告)日：2008-06-26
申请号：PCT/US2007/085810
申请日：2007-11-28
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham , SWEDEK, Boguslaw A. , DAVID, Jeffrey Drue , QIAN, Jun , CARLSSON, Ingemar , BENVEGNU, Dominic J. , LEE, Harry Q. , KARUPPIAH, Lakshmanan
发明人： RAVID, Abraham , SWEDEK, Boguslaw A. , DAVID, Jeffrey Drue , QIAN, Jun , CARLSSON, Ingemar , BENVEGNU, Dominic J. , LEE, Harry Q. , KARUPPIAH, Lakshmanan
IPC分类号： G01B11/06
CPC分类号： G01B11/0683 , G01B11/0625 , Y10S707/99936
摘要： A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
摘要翻译：确定衬底的物理性质的方法包括记录从衬底获得的第一光谱，第一光谱是在改变衬底的物理性能的抛光工艺期间获得的。该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。数据库中的每个光谱具有与之相关联的物理属性值。该方法包括产生指示物理属性的第一值与第一频谱相关联的信号，第一值使用与数据库中识别的先前记录的频谱相关联的物理属性值来确定。用于确定基板的物理性质的系统包括抛光机，端点确定模块和数据库。

2. 发明申请

WO2009131892A2 METHODS AND APPARATUS FOR MEASURING SUBSTRATE EDGE THICKNESS DURING POLISHING 审中-公开
标题翻译：用于在抛光期间测量衬底边缘厚度的方法和装置
公开(公告)号：WO2009131892A2
公开(公告)日：2009-10-29
申请号：PCT/US2009/040833
申请日：2009-04-16
申请人： APPLIED MATERIALS, INC. , BENVEGNU, Dominic, J. , SWEDEK, Boguslaw, A. , KO, Sen-hou , RAVID, Abraham , MILLER, Paul, V.
发明人： BENVEGNU, Dominic, J. , SWEDEK, Boguslaw, A. , KO, Sen-hou , RAVID, Abraham , MILLER, Paul, V.
IPC分类号： G01B11/06 , B24B37/04 , H01L21/304
CPC分类号： G01B11/0683 , B24B37/013 , B24B49/12 , G01B11/0625 , G01N21/55 , H01L22/12 , H01L22/26
摘要： Systems, methods and apparatus are provided for determining a substrate polishing endpoint. The invention includes a light source adapted to transmit light to an edge of a substrate; one or more detectors adapted to detect an arrangement of light reflected from the substrate edge; and a controller adapted to determine a polishing endpoint for the substrate edge based on the arrangement of reflected light. Numerous other aspects are provided.
摘要翻译：提供了用于确定衬底抛光终点的系统，方法和装置。本发明包括适于将光透射到衬底的边缘的光源; 一个或多个检测器，适于检测从衬底边缘反射的光的布置; 以及控制器，其适于基于反射光的布置确定衬底边缘的抛光端点。提供了许多其他方面。

3. 发明申请

WO2012148906A3 METHODS AND APPARATUS TO DETERMINE PARAMETERS IN METAL-CONTAINING FILMS 审中-公开
公开(公告)号：WO2012148906A3
公开(公告)日：2012-11-01
申请号：PCT/US2012/034784
申请日：2012-04-24
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham
发明人： RAVID, Abraham
IPC分类号： G01N27/72 , G01N25/58
摘要： A method and apparatus to determine a parameter of a metal-containing film are provided herein. In some embodiments, a method of determining a parameter of a metal-containing film may include generating a first magnetic field by flowing an alternating current through a coil disposed adjacent to and spaced apart from the metal-containing film, wherein the first magnetic field induces a second magnetic field proximate the metal-containing film; heating the metal-containing film from a first temperature to a second temperature; measuring a response of the first magnetic field to the second magnetic field as the metal-containing film is heated from the first temperature to the second temperature; and correlating the response with a rate of temperature change of the metal-containing film as the metal-containing film is heated from the first temperature to the second temperature to determine a parameter of the metal-containing film.

4. 发明申请

WO2011102938A2 A METHOD FOR IMAGING WORKPIECE SURFACES AT HIGH ROBOT TRANSFER SPEEDS WITH REDUCTION OR PREVENTION OF MOTION-INDUCED DISTORTION 审中-公开
标题翻译：一种降低或防止运动诱导失真的高机器人传输速度下成像工作面的方法
公开(公告)号：WO2011102938A2
公开(公告)日：2011-08-25
申请号：PCT/US2011/022031
申请日：2011-01-21
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham , EGAN, Todd , LINGEL, Karen
发明人： RAVID, Abraham , EGAN, Todd , LINGEL, Karen
IPC分类号： H01L21/68 , H01L21/677 , G01B11/04 , B25J13/08
CPC分类号： H01L21/681 , H01L21/67253 , H01L21/67288
摘要： Α method is provided for imaging a workpiece by capturing successive frames of an elongate stationary field of view transverse to a workpiece transit path of a robot, while the workpiece is transported by the robot. The robot transit path is illuminated with an elongate illumination pattern transverse to the transit path to obtain a workpiece image of successive frames. Motion-induced image distortion is prevented or reduced adjusting the camera frame rate in real time in proportion to changes in robot velocity profile of the workpiece along the transit path.
摘要翻译：？提供了一种用于通过捕获横跨机器人的工件运输路径的细长静止视场的连续框架来对工件成像的方法，同时工件由机器人运送。机器人运输路径用横向于运输路径的细长照明图案照亮以获得连续帧的工件图像。运动引起的图像失真被防止或减少，与传送路径上的工件的机器人速度分布的变化成比例地实时地调整相机帧速率。

5. 发明申请

WO2014144533A1 POSITION AND TEMPERATURE MONITORING OF ALD PLATEN SUSCEPTOR 审中-公开
标题翻译： ALD PLATES SUSCEPTOR的位置和温度监测
公开(公告)号：WO2014144533A1
公开(公告)日：2014-09-18
申请号：PCT/US2014/028988
申请日：2014-03-14
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham , GRIFFIN, Kevin , YUDOVSKY, Joseph , GANGAKHEDKAR, Kaushal , DZILNO, Dmitry A. , MINKOVICH, Alex
发明人： RAVID, Abraham , GRIFFIN, Kevin , YUDOVSKY, Joseph , GANGAKHEDKAR, Kaushal , DZILNO, Dmitry A. , MINKOVICH, Alex
IPC分类号： H01L21/683 , H01L21/66 , H01L21/205
CPC分类号： H01L21/67259 , C23C16/45544 , C23C16/4584 , C23C16/52 , H01L21/67248 , H01L21/68764 , H01L21/68771
摘要： Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.
摘要翻译：描述了测量和控制基座组件和气体分配组件之间的间隙的装置和方法。还描述了用于晶片转印目的的位置控制和温度控制的装置和方法。

6. 发明申请

WO2011115697A2 A METHOD FOR IMAGING WORKPIECE SURFACES AT HIGH ROBOT TRANSFER SPEEDS WITH CORRECTION OF MOTION-INDUCED DISTORTION 审中-公开
标题翻译：一种用高机器人移动速度对工件表面进行成像并校正运动引起的畸变的方法
公开(公告)号：WO2011115697A2
公开(公告)日：2011-09-22
申请号：PCT/US2011/022023
申请日：2011-01-21
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham , EGAN, Todd , LINGEL, Karen
发明人： RAVID, Abraham , EGAN, Todd , LINGEL, Karen
IPC分类号： H01L21/68
CPC分类号： G06K9/3275 , G06T5/006 , G06T2207/30148
摘要： A method is provided for imaging a workpiece by capturing successive frames of an elongate stationary field of view transverse to a workpiece transit path of a robot, while the workpiece is transported by the robot. The robot transit path is illuminated with an elongate illumination pattern transverse to the transit path to obtain a workpiece image of successive frames. Motion- induced image distortion is corrected by computing respective correct locations of respective ones of the frames along the transit path.
摘要翻译：提供了一种方法，用于在工件由机器人运输的同时通过捕获横向于机器人的工件运行路径的细长静止视场的连续帧来对工件进行成像。机器人运输路径被横向于运输路径的细长照明图案照亮以获得连续帧的工件图像。运动引起的图像失真通过计算沿运输路径的相应帧的相应正确位置来校正。

7. 发明申请

WO2011115696A2 METROLOGY SYSTEM FOR IMAGING WORKPIECE SURFACES AT HIGH ROBOT TRANSFER SPEEDS 审中-公开
标题翻译：用于在高机器人传输速度下成像工作表面的计量系统
公开(公告)号：WO2011115696A2
公开(公告)日：2011-09-22
申请号：PCT/US2011/022016
申请日：2011-01-21
申请人： APPLIED MATERIALS, INC. , RAVID, Abraham , EGAN, Todd , LINGEL, Karen , DISANTO, Mitchell , AMBAL, Hari, Kishore , BUDIARTO, Edward
发明人： RAVID, Abraham , EGAN, Todd , LINGEL, Karen , DISANTO, Mitchell , AMBAL, Hari, Kishore , BUDIARTO, Edward
IPC分类号： H01L21/677 , H01L21/68 , B25J13/08 , G01B11/00
CPC分类号： H04N7/18 , G05B19/4189 , G05B2219/31447 , G05B2219/40216 , G05B2219/45031 , Y02P90/28 , Y10S901/47
摘要： A metrology system has an elongate stationary camera pixel array facing a workpiece transit path of a robot with an field of view corresponding to a workpiece diameter and extending transverse to the transit path portion, and a stationary elongate light emitting array generally parallel to the pixel array. An image control processor causes the camera to capture successive image frames while the robot is moving the workpiece through the transit path.
摘要翻译：计量系统具有面向机器人的工件传送路径的细长固定相机像素阵列，其视场对应于工件直径并横向于传输路径部分延伸，并且大致平行于像素阵列的固定细长发光阵列。当机器人将工件移动通过传送路径时，图像控制处理器使得相机捕获连续的图像帧。

8. 发明申请

WO2017205391A1 PARTICLE DETECTION FOR SUBSTRATE PROCESSING 审中-公开
标题翻译：基板处理的粒子检测
公开(公告)号：WO2017205391A1
公开(公告)日：2017-11-30
申请号：PCT/US2017/034028
申请日：2017-05-23
申请人： APPLIED MATERIALS, INC.
发明人： EGAN, Todd , VAEZ-IRAVANI, Mehdi , BANNA, Samer , TANTIWONG, Kyle , KIRK, Gregory , RAVID, Abraham , SHEN, Yaoming
IPC分类号： H01L21/66 , H01L21/683 , H01L21/67
CPC分类号： G01N21/9501 , G01N15/0211 , G01N15/1425 , G01N21/94 , G01N2015/1486 , H01L21/67253 , H01L21/67288
摘要： A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.
摘要翻译：提供了一种用于处理基板的系统。该系统包括：处理室，其包括包围处理区域的一个或多个侧壁; 和衬底支撑件。该系统还包括连接到处理室的通道; 以及设置在沿着通道的第一位置处的第一颗粒检测器。第一粒子检测器包括配置成发射第一束的能量源; 一个或多个光学装置，其被配置为沿着一个或多个路径引导第一梁，其中一个或多个路径延伸穿过至少一部分通道。第一粒子检测器还包括设置在除一个或多个路径之外的位置处的第一能量检测器。该系统还包括控制器，该控制器被配置为与第一粒子检测器通信，其中控制器被配置为基于从第一粒子检测器接收的信号来识别故障。

9. 发明申请

WO2017014818A1 APPARATUS AND METHOD FOR OPTICAL CALIBRATION OF WAFER PLACEMENT BY A ROBOT 审中-公开
标题翻译：用机器人进行水平放置的光学校准的装置和方法
公开(公告)号：WO2017014818A1
公开(公告)日：2017-01-26
申请号：PCT/US2016/028232
申请日：2016-04-19
申请人： APPLIED MATERIALS, INC.
发明人： RAVID, Abraham , EGAN, Todd, J. , WEISS, Eran , RICE, Michael, R. , KREMERMAN, Lzya
IPC分类号： H01L21/677 , H01L21/68
CPC分类号： G05B19/402 , G05B2219/39157 , G05B2219/40572
摘要： An optical calibration method and apparatus for calibration of wafer positioning within a reactor chamber under process conditions employs an array of cameras in a lid of the chamber using images of the wafer edge to locate the wafer relative to the reference feature.
摘要翻译：用于在处理条件下校准在反应器室内的晶片定位的光学校准方法和装置使用晶片边缘的图像的相机的阵列中的相机相对于参考特征定位晶片。

10. 发明申请

WO2019191607A1 POWDER TRANSER SYSTEM FOR ADDITIVE MANUFACTURING 审中-公开
公开(公告)号：WO2019191607A1
公开(公告)日：2019-10-03
申请号：PCT/US2019/024872
申请日：2019-03-29
申请人： APPLIED MATERIALS, INC.
发明人： ISHIKAWA, David Masayuki , RAVID, Abraham , KUMAR, Ashavani
IPC分类号： B29C64/236 , B29C64/245 , B29C64/205 , B29C64/329 , B29C64/393 , B22F3/105 , B28B1/00 , B33Y30/00 , B33Y50/02
摘要： An additive manufacturing apparatus for forming an object includes a platen to support the object being formed, a dispensing system to deliver a plurality of layers of a powder to the platen, a housing to enclose the platen and dispensing system in a sealed chamber, a powder transfer system to deliver powder to the dispensing system, and an energy source to apply energy to the powder dispensed on the top surface of the platen to form a fused portion of the powder. The powder transfer system includes a mechanical interface to engage a canister positioned exterior to the housing. The dispensing system includes a hopper to hold powder, and the powder transfer system includes a reservoir located inside the chamber, a body extending from the reservoir to the housing, and a passage formed through the body.

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